Datasets:
waveguide_width
float32 0.5
2
| waveguide_height
float32 200
600
| cladding_material
stringclasses 3
values | cladding_thickness
float32 1
5
| deposition_method
stringclasses 3
values | etch_method
stringclasses 3
values | sidewall_roughness
float32 0.5
5
| annealing_params
stringclasses 4
values | wavelength
float32 1.5k
1.6k
| polarization
stringclasses 2
values | input_power
float32 -10
10
| temperature
float32 20
80
| bend_radius
float32 20
200
| device_length
float32 1
50
| insertion_loss
float32 0.53
26.5
| propagation_loss
float32 0.1
5
| coupling_efficiency_input
float32 40
90
| coupling_efficiency_output
float32 40
90
| scattering_loss
float32 0.01
0.5
| effective_index
float32 1.5
2
| mode_confinement_factor
float32 0.7
0.95
| batch_id
stringclasses 50
values | data_source
stringclasses 2
values | measurement_method
stringclasses 4
values | uncertainty
float32 0.01
0.2
|
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
0.663 | 527.22 | Air | 1.08 | LPCVD | RIE | 0.6 | 900C_1hr | 1,578.67 | TE | -7.61 | 65.51 | 150.87 | 32.89 | 3.687 | 0.584 | 89.57 | 52.61 | 0.392 | 1.595 | 0.827 | BATCH_37 | Measurement | OTDR | 0.151 |
1.246 | 532 | Air | 3.35 | Sputtering | ICP | 1.62 | 900C_1hr | 1,542.95 | TM | -6.01 | 57.71 | 68.37 | 29.1 | 10.55 | 3.389 | 79.95 | 45.62 | 0.023 | 1.557 | 0.824 | BATCH_23 | Synthetic | microring_Q | 0.098 |
0.755 | 323.63 | SiO2 | 4.45 | PECVD | RIE | 3.83 | 1000C_1hr | 1,508.9 | TM | -5.94 | 55.83 | 143.55 | 5.08 | 2.599 | 2.965 | 68.09 | 81.32 | 0.025 | 1.635 | 0.838 | BATCH_3 | Synthetic | cut-back | 0.082 |
1.67 | 506.22 | Air | 3.75 | Sputtering | ICP | 4.27 | 900C_1hr | 1,506.5 | TE | 3.98 | 53.46 | 191.97 | 35.47 | 9.543 | 2.383 | 77.51 | 50.45 | 0.168 | 1.692 | 0.759 | BATCH_15 | Synthetic | ring_resonance | 0.136 |
1.968 | 289.79 | Polymer | 2.55 | Sputtering | RIE | 2.82 | 900C_1hr | 1,540.96 | TM | -6.23 | 23.58 | 192.44 | 4.58 | 3.121 | 3.458 | 65.75 | 56.99 | 0.272 | 1.589 | 0.909 | BATCH_5 | Measurement | microring_Q | 0.045 |
1.654 | 343.59 | Polymer | 1.06 | LPCVD | RIE | 4.31 | No_Anneal | 1,526.73 | TM | -7.26 | 56.78 | 133.52 | 31.85 | 2.375 | 0.176 | 72.24 | 54.95 | 0.051 | 1.839 | 0.822 | BATCH_26 | Measurement | cut-back | 0.087 |
0.901 | 275.11 | Air | 1.34 | LPCVD | ICP | 1.74 | 900C_1hr | 1,554.85 | TM | -6.17 | 53.06 | 96.95 | 14.65 | 2.957 | 1.016 | 86.15 | 82.73 | 0.38 | 1.818 | 0.796 | BATCH_22 | Measurement | cut-back | 0.167 |
1.428 | 593.6 | Air | 3.81 | Sputtering | RIE | 2.7 | 900C_1hr | 1,564.02 | TE | 0.47 | 49.56 | 79.09 | 12.82 | 2.827 | 0.679 | 86.54 | 89.75 | 0.292 | 1.653 | 0.752 | BATCH_44 | Measurement | OTDR | 0.053 |
1.483 | 387.71 | Air | 3.84 | LPCVD | ICP | 1.69 | 900C_1hr | 1,517.17 | TM | -2.77 | 52.43 | 155.72 | 21.35 | 6.03 | 2.194 | 59.94 | 83.95 | 0.087 | 1.726 | 0.92 | BATCH_19 | Measurement | ring_resonance | 0.023 |
1.208 | 465.76 | SiO2 | 3.43 | LPCVD | RIE | 1.64 | 900C_3hr | 1,583.69 | TE | -5.33 | 66.39 | 162.31 | 12.77 | 4.787 | 2.329 | 63.14 | 72.31 | 0.191 | 1.885 | 0.798 | BATCH_38 | Synthetic | OTDR | 0.071 |
1.719 | 424.01 | Air | 4.59 | PECVD | RIE | 3.43 | 900C_3hr | 1,542.09 | TM | 3.85 | 40.46 | 24.19 | 45.6 | 7.551 | 1.4 | 60.17 | 80.26 | 0.482 | 1.614 | 0.921 | BATCH_22 | Measurement | cut-back | 0.142 |
1.926 | 438.77 | Polymer | 4.43 | PECVD | ICP | 2.51 | No_Anneal | 1,537.27 | TE | -4.16 | 59.71 | 26.59 | 47.01 | 16.572 | 3.102 | 49.04 | 84.42 | 0.253 | 1.644 | 0.732 | BATCH_9 | Synthetic | OTDR | 0.102 |
0.752 | 588.71 | SiO2 | 1.4 | PECVD | Wet Etch | 1.26 | No_Anneal | 1,564.57 | TM | -8.65 | 72.01 | 159.61 | 28.65 | 10.18 | 2.87 | 44.17 | 63.25 | 0.48 | 1.899 | 0.927 | BATCH_6 | Measurement | microring_Q | 0.169 |
0.82 | 239 | Polymer | 3.9 | PECVD | Wet Etch | 3.89 | 900C_1hr | 1,522.36 | TE | 2.35 | 68.09 | 63.96 | 5.41 | 3.645 | 3.915 | 59.56 | 62.55 | 0.032 | 1.729 | 0.764 | BATCH_45 | Synthetic | microring_Q | 0.147 |
0.532 | 264.36 | SiO2 | 1.06 | LPCVD | ICP | 4.16 | No_Anneal | 1,538.79 | TM | -6.77 | 26.95 | 29.5 | 39.24 | 9.282 | 2.039 | 81.15 | 50.4 | 0.042 | 1.674 | 0.87 | BATCH_17 | Measurement | OTDR | 0.174 |
1.616 | 311.8 | Air | 3.02 | PECVD | Wet Etch | 0.58 | 1000C_1hr | 1,533.49 | TM | -1.8 | 44.93 | 38.72 | 11.32 | 6.845 | 4.536 | 58.54 | 70.26 | 0.112 | 1.883 | 0.736 | BATCH_28 | Measurement | OTDR | 0.094 |
0.766 | 380.56 | SiO2 | 2.7 | LPCVD | ICP | 0.95 | 900C_1hr | 1,569.86 | TE | -3.71 | 46.42 | 67.79 | 34.99 | 5.328 | 1.099 | 74.09 | 78.68 | 0.185 | 1.848 | 0.733 | BATCH_13 | Measurement | OTDR | 0.12 |
0.905 | 210.83 | Polymer | 2.37 | PECVD | Wet Etch | 2.31 | 900C_3hr | 1,511.42 | TE | -5.16 | 30.03 | 72.23 | 45.41 | 10.023 | 1.861 | 84.33 | 51.96 | 0.269 | 1.544 | 0.935 | BATCH_45 | Measurement | microring_Q | 0.143 |
1.038 | 395.69 | Polymer | 4.41 | Sputtering | RIE | 4.19 | 900C_3hr | 1,545.49 | TM | -6.64 | 28.2 | 145.68 | 29.22 | 12.599 | 4.11 | 78.93 | 40.64 | 0.197 | 1.762 | 0.787 | BATCH_10 | Measurement | OTDR | 0.018 |
1.753 | 536.23 | SiO2 | 3.65 | PECVD | RIE | 2.48 | 900C_3hr | 1,520.92 | TE | -5.57 | 22.15 | 166.03 | 19.71 | 5.816 | 2.107 | 46.34 | 40.91 | 0.229 | 1.775 | 0.84 | BATCH_50 | Measurement | ring_resonance | 0.115 |
1.386 | 233.63 | Polymer | 2.65 | PECVD | RIE | 3.36 | 900C_1hr | 1,557.49 | TM | 0.68 | 70.28 | 168.2 | 28.6 | 14.47 | 4.685 | 40.1 | 47.54 | 0.315 | 1.52 | 0.794 | BATCH_17 | Measurement | microring_Q | 0.066 |
1.447 | 562.54 | SiO2 | 2.97 | Sputtering | ICP | 4.11 | 900C_3hr | 1,537.37 | TE | -3.08 | 28.39 | 114.78 | 34.17 | 6.386 | 1.703 | 89.26 | 57.91 | 0.395 | 1.593 | 0.806 | BATCH_21 | Measurement | OTDR | 0.13 |
1.671 | 388.02 | Polymer | 1.76 | Sputtering | RIE | 3.17 | 900C_3hr | 1,597.01 | TE | -5.56 | 72.94 | 152.47 | 10.36 | 2.171 | 0.175 | 45.73 | 60.23 | 0.034 | 1.595 | 0.881 | BATCH_38 | Measurement | cut-back | 0.051 |
0.979 | 545.44 | SiO2 | 4.72 | PECVD | Wet Etch | 4.57 | 900C_3hr | 1,570.65 | TE | -7.76 | 35.34 | 196.01 | 30.34 | 14.377 | 4.535 | 79.81 | 40.64 | 0.414 | 1.79 | 0.839 | BATCH_3 | Synthetic | cut-back | 0.072 |
1.072 | 325.03 | Polymer | 3.89 | LPCVD | ICP | 0.96 | No_Anneal | 1,583.37 | TE | 3.48 | 69.87 | 101.3 | 9.86 | 2.53 | 1.478 | 56.23 | 52.21 | 0.105 | 1.586 | 0.773 | BATCH_41 | Synthetic | microring_Q | 0.025 |
0.884 | 295.27 | Air | 3.87 | LPCVD | RIE | 2.76 | 900C_3hr | 1,599.8 | TM | 2.98 | 56.4 | 60.87 | 8.69 | 1.268 | 0.485 | 65.37 | 80.22 | 0.382 | 1.913 | 0.92 | BATCH_34 | Measurement | microring_Q | 0.113 |
1.281 | 331.37 | SiO2 | 2.94 | PECVD | Wet Etch | 4.91 | No_Anneal | 1,561.01 | TE | 3.28 | 64.94 | 130.89 | 8.25 | 5.135 | 4.553 | 81.15 | 84.1 | 0.322 | 1.972 | 0.921 | BATCH_34 | Synthetic | microring_Q | 0.142 |
1.631 | 383.08 | Polymer | 2.15 | LPCVD | Wet Etch | 0.53 | 900C_1hr | 1,547.3 | TM | 7.7 | 65.1 | 80.77 | 16.83 | 6.746 | 2.957 | 89.26 | 49.78 | 0.453 | 1.505 | 0.758 | BATCH_11 | Measurement | OTDR | 0.04 |
1.803 | 548.7 | SiO2 | 2.68 | PECVD | Wet Etch | 3.27 | 900C_1hr | 1,560.68 | TE | -8.88 | 76.68 | 46.38 | 26.61 | 3.666 | 1.096 | 82.88 | 54.37 | 0.282 | 1.918 | 0.793 | BATCH_26 | Synthetic | cut-back | 0.098 |
0.528 | 555.17 | Polymer | 3.68 | PECVD | Wet Etch | 1.21 | 900C_3hr | 1,568.06 | TE | 6.06 | 42.57 | 159.78 | 47.86 | 2.108 | 0.146 | 64.09 | 71.54 | 0.143 | 1.578 | 0.776 | BATCH_48 | Synthetic | cut-back | 0.098 |
1.875 | 503.81 | Polymer | 1.6 | PECVD | Wet Etch | 4.4 | No_Anneal | 1,594.58 | TM | -4.11 | 40.77 | 101.09 | 10.32 | 1.92 | 0.705 | 41.12 | 40.45 | 0.354 | 1.678 | 0.788 | BATCH_5 | Synthetic | microring_Q | 0.102 |
1.602 | 201.82 | Air | 1.91 | LPCVD | Wet Etch | 1.91 | No_Anneal | 1,557.27 | TE | 0.45 | 24.88 | 166.63 | 31.26 | 6.71 | 1.552 | 43.57 | 68.67 | 0.205 | 1.666 | 0.94 | BATCH_25 | Measurement | microring_Q | 0.175 |
1.168 | 447.03 | Air | 2.79 | PECVD | Wet Etch | 3.23 | 900C_3hr | 1,563.39 | TE | 9.07 | 47.52 | 78.48 | 9.37 | 5.298 | 3.57 | 74.21 | 53.89 | 0.49 | 1.664 | 0.946 | BATCH_15 | Measurement | cut-back | 0.092 |
1.62 | 282.65 | Polymer | 4.73 | LPCVD | ICP | 1.54 | No_Anneal | 1,513.72 | TM | -8.44 | 41.83 | 65.16 | 20.11 | 8.411 | 3.787 | 73.36 | 83.29 | 0.443 | 1.895 | 0.762 | BATCH_35 | Synthetic | ring_resonance | 0.177 |
0.635 | 395.96 | Air | 2.55 | Sputtering | ICP | 1.45 | 1000C_1hr | 1,588.41 | TM | 7.54 | 35.77 | 75.91 | 13.4 | 3.487 | 1.463 | 84.1 | 46.86 | 0.13 | 1.949 | 0.927 | BATCH_37 | Measurement | ring_resonance | 0.17 |
1.161 | 317.61 | Air | 3.34 | Sputtering | ICP | 2.52 | 1000C_1hr | 1,577.56 | TM | -8.94 | 40.93 | 108.82 | 16.14 | 7.945 | 3.885 | 70.26 | 53.07 | 0.283 | 1.854 | 0.737 | BATCH_23 | Measurement | cut-back | 0.061 |
1.223 | 451.7 | Air | 4.56 | PECVD | Wet Etch | 2.23 | 1000C_1hr | 1,573.17 | TE | -4.45 | 72.41 | 77.09 | 25.13 | 4.678 | 1.458 | 77.06 | 89.88 | 0.354 | 1.54 | 0.757 | BATCH_2 | Synthetic | ring_resonance | 0.097 |
1.973 | 555.84 | Polymer | 4.59 | Sputtering | Wet Etch | 0.78 | No_Anneal | 1,502.28 | TM | 8.91 | 30.86 | 32.89 | 20.56 | 1.917 | 0.267 | 78.58 | 51.48 | 0.203 | 1.696 | 0.803 | BATCH_20 | Measurement | cut-back | 0.075 |
1.141 | 576.82 | SiO2 | 3.53 | PECVD | ICP | 3.92 | No_Anneal | 1,569.25 | TM | 5.95 | 58.95 | 184.73 | 38.7 | 2.554 | 0.152 | 53.05 | 66.42 | 0.495 | 1.627 | 0.788 | BATCH_29 | Synthetic | microring_Q | 0.095 |
0.908 | 371 | Air | 1.52 | LPCVD | RIE | 1.57 | 1000C_1hr | 1,546.21 | TE | 2.18 | 55.15 | 167.92 | 19.04 | 3.871 | 1.568 | 75.34 | 70.88 | 0.28 | 1.592 | 0.745 | BATCH_39 | Measurement | cut-back | 0.138 |
0.628 | 290.13 | SiO2 | 4.1 | LPCVD | ICP | 3.52 | 1000C_1hr | 1,519.85 | TM | -7.74 | 20.85 | 198.84 | 31.27 | 4.341 | 1.12 | 80.89 | 51.13 | 0.231 | 1.719 | 0.896 | BATCH_46 | Synthetic | OTDR | 0.124 |
1.246 | 271.18 | Air | 4.19 | Sputtering | RIE | 4.91 | 1000C_1hr | 1,502.93 | TM | 0.3 | 62.57 | 50.43 | 26.82 | 3.095 | 0.543 | 42.82 | 46.71 | 0.242 | 1.793 | 0.929 | BATCH_3 | Synthetic | OTDR | 0.017 |
1.32 | 268.75 | Air | 4.53 | LPCVD | Wet Etch | 0.91 | 900C_1hr | 1,539.08 | TM | -1.45 | 26.58 | 25.26 | 8.39 | 3.79 | 3.226 | 88.32 | 55.71 | 0.012 | 1.884 | 0.926 | BATCH_11 | Synthetic | OTDR | 0.046 |
0.905 | 368.75 | Polymer | 2.7 | PECVD | ICP | 2.89 | 900C_1hr | 1,530.44 | TM | 1.8 | 66.94 | 188.22 | 1.82 | 1.523 | 1.494 | 43.67 | 61.96 | 0.487 | 1.824 | 0.777 | BATCH_26 | Synthetic | ring_resonance | 0.045 |
1.298 | 554.6 | Polymer | 4.72 | LPCVD | ICP | 3.15 | 900C_3hr | 1,515.93 | TE | 2.17 | 68.91 | 179.79 | 13.54 | 7.321 | 4.727 | 47.84 | 49.55 | 0.046 | 1.984 | 0.884 | BATCH_14 | Synthetic | microring_Q | 0.115 |
1.353 | 377.03 | Air | 1.07 | LPCVD | ICP | 2.48 | 900C_1hr | 1,516.76 | TE | 7.52 | 24.7 | 88.52 | 27.88 | 2.903 | 0.568 | 82.22 | 70.34 | 0.323 | 1.958 | 0.733 | BATCH_43 | Measurement | ring_resonance | 0.024 |
1.703 | 220.95 | SiO2 | 2 | LPCVD | RIE | 3.71 | 900C_1hr | 1,587.07 | TE | 9.45 | 39.21 | 198.39 | 33.5 | 8.01 | 2.031 | 60.91 | 70.12 | 0.139 | 1.956 | 0.933 | BATCH_34 | Synthetic | cut-back | 0.159 |
1.297 | 221.4 | SiO2 | 1.62 | LPCVD | Wet Etch | 0.85 | 1000C_1hr | 1,559.32 | TE | -7.58 | 23.08 | 195.1 | 44.04 | 12.671 | 2.699 | 89.88 | 82.19 | 0.098 | 1.587 | 0.91 | BATCH_16 | Synthetic | microring_Q | 0.154 |
1.35 | 326.62 | SiO2 | 2.21 | LPCVD | Wet Etch | 3.34 | No_Anneal | 1,504.29 | TE | -3.45 | 61.44 | 41.97 | 11.15 | 5.127 | 2.828 | 71.19 | 58.02 | 0.403 | 1.507 | 0.73 | BATCH_17 | Synthetic | microring_Q | 0.193 |
1.124 | 420.11 | Air | 2.04 | PECVD | RIE | 1.7 | 1000C_1hr | 1,598.23 | TE | 6.07 | 78.26 | 47.99 | 47.85 | 18.967 | 3.776 | 42.25 | 73.43 | 0.351 | 1.778 | 0.921 | BATCH_19 | Measurement | microring_Q | 0.076 |
1.64 | 583.21 | Polymer | 3.45 | Sputtering | ICP | 4.55 | No_Anneal | 1,538.79 | TE | -6.84 | 20.73 | 186.5 | 18.86 | 7.668 | 3.456 | 44.9 | 74.22 | 0.3 | 1.914 | 0.815 | BATCH_18 | Synthetic | OTDR | 0.066 |
1.661 | 501.6 | Polymer | 4.55 | PECVD | Wet Etch | 3.59 | No_Anneal | 1,559.25 | TM | 4.58 | 73.92 | 87.77 | 14.19 | 1.859 | 0.153 | 57.09 | 70.09 | 0.414 | 1.792 | 0.889 | BATCH_19 | Measurement | ring_resonance | 0.099 |
1.017 | 474.43 | Polymer | 1.91 | PECVD | RIE | 1.9 | 900C_1hr | 1,543.09 | TM | -3.29 | 46.47 | 126.34 | 9.95 | 1.92 | 0.537 | 56.19 | 44.87 | 0.118 | 1.919 | 0.926 | BATCH_39 | Measurement | ring_resonance | 0.152 |
1.357 | 400.12 | Air | 1.14 | PECVD | Wet Etch | 3.08 | 1000C_1hr | 1,554.44 | TM | -1.96 | 20.31 | 189.83 | 7.19 | 2.762 | 1.253 | 81.64 | 42.85 | 0.364 | 1.622 | 0.908 | BATCH_45 | Synthetic | OTDR | 0.046 |
1.998 | 318.78 | SiO2 | 1.32 | LPCVD | ICP | 3.92 | No_Anneal | 1,568.04 | TE | -2.52 | 26.89 | 83.58 | 5.4 | 2.113 | 1.794 | 48.07 | 58.39 | 0.054 | 1.919 | 0.806 | BATCH_47 | Measurement | cut-back | 0.089 |
1.387 | 560.96 | Polymer | 3.59 | Sputtering | Wet Etch | 4.34 | No_Anneal | 1,591.24 | TE | 7.24 | 22.32 | 130.46 | 28.13 | 4.817 | 1.098 | 54.87 | 86.08 | 0.073 | 1.987 | 0.735 | BATCH_45 | Synthetic | OTDR | 0.134 |
1.017 | 513.61 | SiO2 | 2.37 | LPCVD | RIE | 4.08 | 900C_3hr | 1,524.3 | TM | -4.85 | 32.88 | 99.42 | 42.88 | 12.361 | 2.579 | 43.98 | 85.51 | 0.36 | 1.586 | 0.864 | BATCH_12 | Measurement | microring_Q | 0.104 |
1.282 | 379.04 | Polymer | 3.95 | LPCVD | Wet Etch | 0.51 | 900C_3hr | 1,558.03 | TM | -8.02 | 78.65 | 111.52 | 47.13 | 20.554 | 3.97 | 56.43 | 59.77 | 0.256 | 1.748 | 0.74 | BATCH_48 | Measurement | ring_resonance | 0.017 |
0.764 | 467.38 | Polymer | 4.21 | Sputtering | RIE | 3.21 | 1000C_1hr | 1,560.55 | TM | -3.86 | 57.99 | 84.6 | 47.77 | 21.856 | 4.195 | 87.38 | 60.18 | 0.059 | 1.823 | 0.923 | BATCH_38 | Measurement | microring_Q | 0.139 |
1.998 | 321.86 | Air | 2.03 | Sputtering | RIE | 1.86 | No_Anneal | 1,570.86 | TM | -2.56 | 44.45 | 53.48 | 9.19 | 4.638 | 4.186 | 55.68 | 59.07 | 0.484 | 1.875 | 0.86 | BATCH_15 | Synthetic | cut-back | 0.172 |
1.309 | 313.31 | SiO2 | 3.92 | LPCVD | ICP | 4.43 | 900C_3hr | 1,516.09 | TE | -7.58 | 67.93 | 180.05 | 18.61 | 5.388 | 2.258 | 84.28 | 42.41 | 0.489 | 1.802 | 0.751 | BATCH_38 | Measurement | ring_resonance | 0.13 |
0.915 | 430.85 | SiO2 | 4.94 | Sputtering | RIE | 2.99 | 900C_3hr | 1,543.18 | TE | 7.12 | 41.79 | 26.7 | 2.93 | 2.401 | 4.391 | 58.67 | 40.09 | 0.252 | 1.814 | 0.759 | BATCH_10 | Measurement | microring_Q | 0.078 |
1.847 | 528.53 | SiO2 | 3.58 | LPCVD | ICP | 4.64 | No_Anneal | 1,566.04 | TM | -3.43 | 30.32 | 81.4 | 14.13 | 6.865 | 4.004 | 50.55 | 43.47 | 0.405 | 1.928 | 0.814 | BATCH_31 | Synthetic | cut-back | 0.015 |
0.782 | 241.96 | SiO2 | 2.38 | Sputtering | Wet Etch | 3.39 | No_Anneal | 1,531.74 | TE | -2.34 | 57 | 159.2 | 20.99 | 7.697 | 2.949 | 49.14 | 50.84 | 0.453 | 1.915 | 0.837 | BATCH_11 | Synthetic | ring_resonance | 0.095 |
1.524 | 368.86 | Polymer | 4.85 | Sputtering | RIE | 3.02 | 900C_1hr | 1,583.61 | TE | 8.37 | 72.58 | 99.49 | 47.87 | 11.033 | 1.98 | 72.84 | 47.31 | 0.068 | 1.694 | 0.753 | BATCH_9 | Synthetic | OTDR | 0.069 |
1.756 | 550.2 | SiO2 | 3.17 | LPCVD | ICP | 3.9 | 900C_1hr | 1,511.87 | TM | 9.42 | 64.56 | 68.63 | 11.99 | 2.464 | 0.646 | 47.65 | 58.3 | 0.222 | 1.889 | 0.855 | BATCH_9 | Measurement | cut-back | 0.065 |
0.907 | 359.18 | Air | 4.4 | PECVD | Wet Etch | 4.65 | No_Anneal | 1,501.43 | TM | -9.72 | 36.01 | 104 | 31.66 | 8.389 | 2.16 | 47.59 | 86.99 | 0.011 | 1.594 | 0.895 | BATCH_19 | Synthetic | microring_Q | 0.19 |
1.616 | 210.1 | Air | 2.42 | LPCVD | ICP | 1.76 | 1000C_1hr | 1,517 | TM | -8.85 | 36.39 | 127.32 | 17.15 | 4.353 | 1.934 | 61 | 67.71 | 0.23 | 1.61 | 0.933 | BATCH_39 | Measurement | ring_resonance | 0.044 |
1.084 | 239.82 | Polymer | 4 | Sputtering | RIE | 1.54 | 900C_3hr | 1,597.01 | TE | -9.68 | 39.3 | 196.09 | 45.85 | 10.412 | 2.151 | 86.33 | 72.06 | 0.487 | 1.794 | 0.735 | BATCH_1 | Measurement | ring_resonance | 0.036 |
0.514 | 404.35 | Air | 1.87 | Sputtering | Wet Etch | 2.78 | 900C_3hr | 1,587.69 | TM | -9.69 | 39.68 | 38.21 | 16.75 | 8.78 | 4.307 | 41.93 | 52.64 | 0.343 | 1.861 | 0.721 | BATCH_15 | Measurement | microring_Q | 0.086 |
1.38 | 353.43 | SiO2 | 1.08 | LPCVD | Wet Etch | 3.67 | 900C_1hr | 1,501.03 | TE | 7.85 | 23.13 | 57.34 | 40.8 | 4.751 | 0.945 | 72.12 | 60.1 | 0.373 | 1.933 | 0.881 | BATCH_11 | Synthetic | microring_Q | 0.104 |
1.57 | 414.14 | Polymer | 3.12 | Sputtering | ICP | 0.56 | 900C_3hr | 1,540.07 | TE | -9.31 | 74.27 | 131.28 | 13.43 | 6.501 | 3.963 | 57.81 | 80.69 | 0.429 | 1.774 | 0.883 | BATCH_26 | Synthetic | cut-back | 0.056 |
1.231 | 353.61 | Polymer | 4.35 | PECVD | ICP | 4.45 | 900C_3hr | 1,528.36 | TM | 5.61 | 44.4 | 166.93 | 4.83 | 2.177 | 2.103 | 79.2 | 43.09 | 0.387 | 1.782 | 0.845 | BATCH_49 | Synthetic | ring_resonance | 0.062 |
0.613 | 232.04 | Polymer | 2.22 | Sputtering | ICP | 2.05 | 900C_1hr | 1,585.61 | TM | -9.82 | 77.8 | 139.3 | 27.47 | 6.038 | 1.774 | 46.82 | 46.4 | 0.174 | 1.923 | 0.937 | BATCH_7 | Synthetic | microring_Q | 0.164 |
1.389 | 332.76 | Polymer | 3.78 | LPCVD | ICP | 4.78 | No_Anneal | 1,525.45 | TM | -0.27 | 54.85 | 193.23 | 28.62 | 13.063 | 3.867 | 61.17 | 84.35 | 0.097 | 1.564 | 0.71 | BATCH_7 | Measurement | microring_Q | 0.013 |
1.12 | 417.29 | Air | 1.83 | Sputtering | RIE | 3.77 | 1000C_1hr | 1,588.2 | TE | -0.59 | 74.91 | 60.76 | 5.76 | 3.677 | 4.472 | 68.06 | 49.64 | 0.047 | 1.769 | 0.706 | BATCH_29 | Synthetic | ring_resonance | 0.154 |
0.646 | 432.78 | Polymer | 4.38 | PECVD | RIE | 1.11 | 900C_3hr | 1,521.57 | TM | -7.11 | 35.53 | 113.13 | 5.86 | 3.12 | 2.19 | 41.07 | 51.14 | 0.426 | 1.661 | 0.862 | BATCH_35 | Synthetic | microring_Q | 0.098 |
0.725 | 200.51 | Polymer | 1.96 | PECVD | ICP | 2.66 | 900C_3hr | 1,501.81 | TM | 2.84 | 73.9 | 90.56 | 41.04 | 2.49 | 0.152 | 88.23 | 40.74 | 0.219 | 1.643 | 0.82 | BATCH_40 | Synthetic | microring_Q | 0.192 |
1.584 | 387.36 | SiO2 | 2.76 | Sputtering | Wet Etch | 2.78 | 1000C_1hr | 1,541.28 | TM | -3.98 | 44.81 | 89.25 | 44 | 9.903 | 2.121 | 85.75 | 76.58 | 0.464 | 1.774 | 0.921 | BATCH_44 | Synthetic | OTDR | 0.028 |
1.521 | 578.28 | SiO2 | 2.39 | Sputtering | Wet Etch | 1.35 | No_Anneal | 1,580.54 | TE | 6.49 | 67.78 | 115.16 | 4.85 | 3.518 | 3.486 | 56 | 70.31 | 0.497 | 1.625 | 0.735 | BATCH_32 | Measurement | cut-back | 0.074 |
1.605 | 421.32 | Air | 3.03 | PECVD | RIE | 1.1 | 900C_1hr | 1,543.95 | TE | 4.33 | 24.82 | 149.51 | 31.27 | 8.335 | 2.151 | 76.73 | 55.27 | 0.269 | 1.93 | 0.877 | BATCH_28 | Measurement | microring_Q | 0.113 |
0.815 | 302.05 | Air | 2.29 | LPCVD | RIE | 3.59 | 900C_1hr | 1,544.76 | TE | -2.22 | 42.99 | 138.43 | 22.35 | 11.866 | 4.479 | 84.78 | 43.92 | 0.105 | 1.589 | 0.777 | BATCH_1 | Measurement | microring_Q | 0.153 |
1.934 | 272.32 | SiO2 | 2.78 | LPCVD | Wet Etch | 3.91 | 1000C_1hr | 1,538.78 | TM | -7.55 | 20.39 | 144.19 | 33.19 | 13.821 | 3.859 | 83.93 | 81.85 | 0.264 | 1.922 | 0.89 | BATCH_33 | Synthetic | ring_resonance | 0.129 |
1.441 | 490.13 | SiO2 | 2.22 | PECVD | Wet Etch | 1.09 | 900C_1hr | 1,507.54 | TM | -1.59 | 66.94 | 80.32 | 7.52 | 1.109 | 0.655 | 73.88 | 82 | 0.304 | 1.844 | 0.707 | BATCH_39 | Measurement | cut-back | 0.133 |
0.989 | 540.97 | SiO2 | 4.39 | PECVD | ICP | 4.34 | 1000C_1hr | 1,524.11 | TE | -1.97 | 27.65 | 71.91 | 38.92 | 8.382 | 2.021 | 48.69 | 71.41 | 0.456 | 1.775 | 0.767 | BATCH_1 | Measurement | cut-back | 0.14 |
0.514 | 466.78 | Air | 2.68 | LPCVD | RIE | 1.86 | 900C_3hr | 1,530.74 | TE | -3.56 | 27.55 | 99.43 | 2.07 | 2.24 | 4.566 | 44.45 | 59.04 | 0.052 | 1.544 | 0.918 | BATCH_22 | Measurement | ring_resonance | 0.194 |
1.24 | 200.54 | SiO2 | 1.54 | PECVD | Wet Etch | 1.81 | No_Anneal | 1,586.05 | TM | 9.36 | 55.3 | 137.4 | 12.51 | 7.302 | 4.94 | 63.63 | 66.58 | 0.221 | 1.799 | 0.884 | BATCH_20 | Measurement | ring_resonance | 0.128 |
1.629 | 525.21 | Polymer | 3.97 | LPCVD | Wet Etch | 3.27 | 900C_3hr | 1,582.47 | TM | 0.87 | 49.96 | 30.02 | 14.75 | 8.788 | 4.896 | 40.01 | 84.55 | 0.32 | 1.706 | 0.884 | BATCH_26 | Synthetic | cut-back | 0.03 |
0.676 | 501.15 | Air | 3.87 | Sputtering | RIE | 2 | 900C_1hr | 1,582.26 | TE | -2.78 | 78.94 | 182.62 | 26.58 | 12.971 | 4.189 | 56.84 | 62.31 | 0.011 | 1.977 | 0.754 | BATCH_41 | Synthetic | OTDR | 0.116 |
1.015 | 387.99 | Polymer | 2.76 | PECVD | Wet Etch | 4.32 | 900C_3hr | 1,558.59 | TM | -0.12 | 39.06 | 85.75 | 23.94 | 13.49 | 4.921 | 66.8 | 71.27 | 0.027 | 1.648 | 0.768 | BATCH_25 | Measurement | ring_resonance | 0.161 |
1.981 | 500.37 | SiO2 | 1.45 | PECVD | Wet Etch | 4.9 | 900C_3hr | 1,515.43 | TE | -5.15 | 53.77 | 61.42 | 12.96 | 5.399 | 2.835 | 81.72 | 86.09 | 0.128 | 1.806 | 0.865 | BATCH_44 | Measurement | cut-back | 0.113 |
1.529 | 202.84 | Polymer | 1.75 | LPCVD | ICP | 1.47 | 1000C_1hr | 1,567.12 | TM | 0.01 | 54.46 | 76.4 | 19.8 | 9.584 | 4.37 | 66.58 | 87.4 | 0.155 | 1.743 | 0.853 | BATCH_29 | Measurement | microring_Q | 0.037 |
0.65 | 239.92 | Air | 4.35 | Sputtering | Wet Etch | 3.89 | No_Anneal | 1,579.33 | TM | -3.67 | 53.05 | 105.03 | 26.94 | 7.314 | 2.372 | 41.76 | 84.67 | 0.172 | 1.842 | 0.741 | BATCH_10 | Synthetic | OTDR | 0.104 |
1.309 | 355.72 | Polymer | 3.61 | Sputtering | ICP | 2.12 | 900C_1hr | 1,506.14 | TE | -9.38 | 37.71 | 127.33 | 39.66 | 7.538 | 1.46 | 49.39 | 79.57 | 0.118 | 1.647 | 0.907 | BATCH_33 | Synthetic | OTDR | 0.155 |
0.717 | 242.92 | SiO2 | 4.44 | Sputtering | RIE | 2.19 | No_Anneal | 1,564.91 | TM | -9.68 | 68.5 | 58.51 | 6.2 | 3.505 | 3.82 | 76.21 | 76.42 | 0.387 | 1.509 | 0.829 | BATCH_16 | Measurement | cut-back | 0.063 |
1.244 | 242.79 | Polymer | 4.2 | LPCVD | ICP | 0.87 | 900C_3hr | 1,584.35 | TE | -1.94 | 51.44 | 153.28 | 8.39 | 1.615 | 1.27 | 81.29 | 67.84 | 0.018 | 1.605 | 0.729 | BATCH_14 | Measurement | ring_resonance | 0.058 |
1.673 | 515.09 | Polymer | 4.88 | LPCVD | Wet Etch | 3.39 | 900C_3hr | 1,587.76 | TM | -7.2 | 75.87 | 81.53 | 9.51 | 4.745 | 3.459 | 78.3 | 44.65 | 0.314 | 1.788 | 0.829 | BATCH_41 | Synthetic | ring_resonance | 0.198 |
1.381 | 401.29 | SiO2 | 1.34 | PECVD | Wet Etch | 2.55 | 900C_1hr | 1,556.31 | TM | -2.57 | 26.07 | 84.74 | 12.22 | 4.313 | 2.262 | 89.04 | 55.46 | 0.489 | 1.545 | 0.877 | BATCH_44 | Synthetic | microring_Q | 0.068 |
0.986 | 335.15 | SiO2 | 1.48 | PECVD | Wet Etch | 3.35 | No_Anneal | 1,507.37 | TE | -9.14 | 22.22 | 112.03 | 5.12 | 2.255 | 1.827 | 70.23 | 59.69 | 0.022 | 1.919 | 0.878 | BATCH_49 | Synthetic | ring_resonance | 0.059 |
0.874 | 577.78 | SiO2 | 1.79 | PECVD | ICP | 2.12 | No_Anneal | 1,539.77 | TE | -4.59 | 22.98 | 192.88 | 41.6 | 9.747 | 1.945 | 68.65 | 79.7 | 0.398 | 1.922 | 0.874 | BATCH_18 | Measurement | ring_resonance | 0.118 |
SiN Photonic Waveguide Loss & Efficiency Dataset
Description
This dataset provides 90,000 synthetic rows of silicon nitride (Si₃N₄) photonic waveguide parameters, focusing on waveguide loss and efficiency metrics. The data is useful for modeling, simulation, or LLM fine tuning to predict and understand the relationship between fabrication/design parameters and optical performance.
Key Highlights ✨
- Material Focus: Silicon Nitride (Si₃N₄)
- Columns: 25 structured columns capturing waveguide geometry, fabrication method, operational conditions, and measured/synthetic performance metrics
- Size: 90,000 rows (ideal for both training and validation splits)
- Use Cases:
- Straight and Bent Waveguide loss prediction
- Process control and optimization
- Photonic design parameter studies
- Synthetic data augmentation for AI/ML tasks
Dataset Structure 🏗️
Each row corresponds to a single waveguide configuration or measurement instance, including:
Waveguide Geometry
waveguide_width
(µm)waveguide_height
(nm or µm)bend_radius
(µm)device_length
(mm)
Material & Fabrication
cladding_material
cladding_thickness
(µm)deposition_method
etch_method
sidewall_roughness
(nm)annealing_params
Operational Parameters
wavelength
(nm)polarization
(TE/TM)input_power
(dBm)temperature
(°C)
Performance Metrics
insertion_loss
(dB)propagation_loss
(dB/cm)coupling_efficiency_input
(%)coupling_efficiency_output
(%)scattering_loss
(dB/cm)effective_index
mode_confinement_factor
(0–1)
Metadata
batch_id
(fabrication batch/wafer ID)data_source
(Synthetic or Measurement)measurement_method
(e.g., cut-back, ring_resonance)uncertainty
(± dB or %)
Example Row
waveguide_width = 1.212
waveguide_height = 400.00
cladding_material = SiO2
cladding_thickness = 2.50
deposition_method = LPCVD
etch_method = RIE
sidewall_roughness = 2.05
annealing_params = 900C_3hr
wavelength = 1552.23
polarization = TE
input_power = 0.00
temperature = 25.00
bend_radius = 50.00
device_length = 10.00
insertion_loss = 3.50
propagation_loss = 0.300
coupling_efficiency_input = 72.00
coupling_efficiency_output = 68.00
scattering_loss = 0.15
effective_index = 1.800
mode_confinement_factor = 0.80
batch_id = BATCH_12
data_source = Synthetic
measurement_method = ring_resonance
uncertainty = 0.05
How to Use 💡
Download/Clone
- You can download the CSV file manually or use Hugging Face’s
datasets
library:from datasets import load_dataset dataset = load_dataset("username/SiN_Photonic_Waveguide_Loss_Efficiency")
- You can download the CSV file manually or use Hugging Face’s
Loading & Exploration
- Load into your favorite Python environment (
pandas
,polars
, etc.) to quickly explore the data distribution:import pandas as pd df = pd.read_csv("SiN_Photonic_Waveguide_Loss_Efficiency.csv") print(df.head())
- Load into your favorite Python environment (
Model Training
- For tasks like waveguide loss prediction, treat the waveguide geometry/fabrication columns as input features, and the
insertion_loss
orpropagation_loss
columns as the labels or targets. - Example ML scenario:
features = df[[ "waveguide_width", "waveguide_height", "sidewall_roughness", "wavelength", "polarization", "temperature" ]] target = df["propagation_loss"] # Then train a regression model, e.g., scikit-learn, XGBoost, etc.
- For tasks like waveguide loss prediction, treat the waveguide geometry/fabrication columns as input features, and the
Synthetic Data Augmentation
- Use this synthetic dataset to supplement smaller real datasets
Caveats & Limitations ⚠️
- Synthetic Nature: While ranges are inspired by real-world photonic designs, actual values may differ based on specific foundries, tools, and processes.
- Statistical Simplifications: Not all real-world correlations or distributions (e.g., non-uniform doping profiles, advanced thermal effects) are captured.
- Measurement Noise: The
uncertainty
column does not fully replicate complex measurement artifacts.
License 📄
This dataset is available under the MIT License. You are free to modify, distribute, and use it for commercial or non-commercial purposes—just provide attribution.
Citation & Acknowledgments 🙌
If you use this dataset in your research or applications, please cite it as follows (example citation):
Author: https://huggingface.co/Taylor658
Title: SiN Photonic Waveguide Loss & Efficiency (Synthetic)
Year: 2025
@misc{sin_waveguide_loss_efficiency_2025,
title = {SiN Photonic Waveguide Loss & Efficiency (Synthetic)},
author = {atayloraeropsace},
year = {2025},
howpublished = {\url{https://huggingface.co/datasets/username/SiN_Photonic_Waveguide_Loss_Efficiency}}
}
Contributing 🧑💻
We welcome community contributions, ideas, and corrections:
- Add additional columns
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