waveguide_width
float32
0.5
2
waveguide_height
float32
200
600
cladding_material
stringclasses
3 values
cladding_thickness
float32
1
5
deposition_method
stringclasses
3 values
etch_method
stringclasses
3 values
sidewall_roughness
float32
0.5
5
annealing_params
stringclasses
4 values
wavelength
float32
1.5k
1.6k
polarization
stringclasses
2 values
input_power
float32
-10
10
temperature
float32
20
80
bend_radius
float32
20
200
device_length
float32
1
50
insertion_loss
float32
0.53
26.5
propagation_loss
float32
0.1
5
coupling_efficiency_input
float32
40
90
coupling_efficiency_output
float32
40
90
scattering_loss
float32
0.01
0.5
effective_index
float32
1.5
2
mode_confinement_factor
float32
0.7
0.95
batch_id
stringclasses
50 values
data_source
stringclasses
2 values
measurement_method
stringclasses
4 values
uncertainty
float32
0.01
0.2
0.663
527.22
Air
1.08
LPCVD
RIE
0.6
900C_1hr
1,578.67
TE
-7.61
65.51
150.87
32.89
3.687
0.584
89.57
52.61
0.392
1.595
0.827
BATCH_37
Measurement
OTDR
0.151
1.246
532
Air
3.35
Sputtering
ICP
1.62
900C_1hr
1,542.95
TM
-6.01
57.71
68.37
29.1
10.55
3.389
79.95
45.62
0.023
1.557
0.824
BATCH_23
Synthetic
microring_Q
0.098
0.755
323.63
SiO2
4.45
PECVD
RIE
3.83
1000C_1hr
1,508.9
TM
-5.94
55.83
143.55
5.08
2.599
2.965
68.09
81.32
0.025
1.635
0.838
BATCH_3
Synthetic
cut-back
0.082
1.67
506.22
Air
3.75
Sputtering
ICP
4.27
900C_1hr
1,506.5
TE
3.98
53.46
191.97
35.47
9.543
2.383
77.51
50.45
0.168
1.692
0.759
BATCH_15
Synthetic
ring_resonance
0.136
1.968
289.79
Polymer
2.55
Sputtering
RIE
2.82
900C_1hr
1,540.96
TM
-6.23
23.58
192.44
4.58
3.121
3.458
65.75
56.99
0.272
1.589
0.909
BATCH_5
Measurement
microring_Q
0.045
1.654
343.59
Polymer
1.06
LPCVD
RIE
4.31
No_Anneal
1,526.73
TM
-7.26
56.78
133.52
31.85
2.375
0.176
72.24
54.95
0.051
1.839
0.822
BATCH_26
Measurement
cut-back
0.087
0.901
275.11
Air
1.34
LPCVD
ICP
1.74
900C_1hr
1,554.85
TM
-6.17
53.06
96.95
14.65
2.957
1.016
86.15
82.73
0.38
1.818
0.796
BATCH_22
Measurement
cut-back
0.167
1.428
593.6
Air
3.81
Sputtering
RIE
2.7
900C_1hr
1,564.02
TE
0.47
49.56
79.09
12.82
2.827
0.679
86.54
89.75
0.292
1.653
0.752
BATCH_44
Measurement
OTDR
0.053
1.483
387.71
Air
3.84
LPCVD
ICP
1.69
900C_1hr
1,517.17
TM
-2.77
52.43
155.72
21.35
6.03
2.194
59.94
83.95
0.087
1.726
0.92
BATCH_19
Measurement
ring_resonance
0.023
1.208
465.76
SiO2
3.43
LPCVD
RIE
1.64
900C_3hr
1,583.69
TE
-5.33
66.39
162.31
12.77
4.787
2.329
63.14
72.31
0.191
1.885
0.798
BATCH_38
Synthetic
OTDR
0.071
1.719
424.01
Air
4.59
PECVD
RIE
3.43
900C_3hr
1,542.09
TM
3.85
40.46
24.19
45.6
7.551
1.4
60.17
80.26
0.482
1.614
0.921
BATCH_22
Measurement
cut-back
0.142
1.926
438.77
Polymer
4.43
PECVD
ICP
2.51
No_Anneal
1,537.27
TE
-4.16
59.71
26.59
47.01
16.572
3.102
49.04
84.42
0.253
1.644
0.732
BATCH_9
Synthetic
OTDR
0.102
0.752
588.71
SiO2
1.4
PECVD
Wet Etch
1.26
No_Anneal
1,564.57
TM
-8.65
72.01
159.61
28.65
10.18
2.87
44.17
63.25
0.48
1.899
0.927
BATCH_6
Measurement
microring_Q
0.169
0.82
239
Polymer
3.9
PECVD
Wet Etch
3.89
900C_1hr
1,522.36
TE
2.35
68.09
63.96
5.41
3.645
3.915
59.56
62.55
0.032
1.729
0.764
BATCH_45
Synthetic
microring_Q
0.147
0.532
264.36
SiO2
1.06
LPCVD
ICP
4.16
No_Anneal
1,538.79
TM
-6.77
26.95
29.5
39.24
9.282
2.039
81.15
50.4
0.042
1.674
0.87
BATCH_17
Measurement
OTDR
0.174
1.616
311.8
Air
3.02
PECVD
Wet Etch
0.58
1000C_1hr
1,533.49
TM
-1.8
44.93
38.72
11.32
6.845
4.536
58.54
70.26
0.112
1.883
0.736
BATCH_28
Measurement
OTDR
0.094
0.766
380.56
SiO2
2.7
LPCVD
ICP
0.95
900C_1hr
1,569.86
TE
-3.71
46.42
67.79
34.99
5.328
1.099
74.09
78.68
0.185
1.848
0.733
BATCH_13
Measurement
OTDR
0.12
0.905
210.83
Polymer
2.37
PECVD
Wet Etch
2.31
900C_3hr
1,511.42
TE
-5.16
30.03
72.23
45.41
10.023
1.861
84.33
51.96
0.269
1.544
0.935
BATCH_45
Measurement
microring_Q
0.143
1.038
395.69
Polymer
4.41
Sputtering
RIE
4.19
900C_3hr
1,545.49
TM
-6.64
28.2
145.68
29.22
12.599
4.11
78.93
40.64
0.197
1.762
0.787
BATCH_10
Measurement
OTDR
0.018
1.753
536.23
SiO2
3.65
PECVD
RIE
2.48
900C_3hr
1,520.92
TE
-5.57
22.15
166.03
19.71
5.816
2.107
46.34
40.91
0.229
1.775
0.84
BATCH_50
Measurement
ring_resonance
0.115
1.386
233.63
Polymer
2.65
PECVD
RIE
3.36
900C_1hr
1,557.49
TM
0.68
70.28
168.2
28.6
14.47
4.685
40.1
47.54
0.315
1.52
0.794
BATCH_17
Measurement
microring_Q
0.066
1.447
562.54
SiO2
2.97
Sputtering
ICP
4.11
900C_3hr
1,537.37
TE
-3.08
28.39
114.78
34.17
6.386
1.703
89.26
57.91
0.395
1.593
0.806
BATCH_21
Measurement
OTDR
0.13
1.671
388.02
Polymer
1.76
Sputtering
RIE
3.17
900C_3hr
1,597.01
TE
-5.56
72.94
152.47
10.36
2.171
0.175
45.73
60.23
0.034
1.595
0.881
BATCH_38
Measurement
cut-back
0.051
0.979
545.44
SiO2
4.72
PECVD
Wet Etch
4.57
900C_3hr
1,570.65
TE
-7.76
35.34
196.01
30.34
14.377
4.535
79.81
40.64
0.414
1.79
0.839
BATCH_3
Synthetic
cut-back
0.072
1.072
325.03
Polymer
3.89
LPCVD
ICP
0.96
No_Anneal
1,583.37
TE
3.48
69.87
101.3
9.86
2.53
1.478
56.23
52.21
0.105
1.586
0.773
BATCH_41
Synthetic
microring_Q
0.025
0.884
295.27
Air
3.87
LPCVD
RIE
2.76
900C_3hr
1,599.8
TM
2.98
56.4
60.87
8.69
1.268
0.485
65.37
80.22
0.382
1.913
0.92
BATCH_34
Measurement
microring_Q
0.113
1.281
331.37
SiO2
2.94
PECVD
Wet Etch
4.91
No_Anneal
1,561.01
TE
3.28
64.94
130.89
8.25
5.135
4.553
81.15
84.1
0.322
1.972
0.921
BATCH_34
Synthetic
microring_Q
0.142
1.631
383.08
Polymer
2.15
LPCVD
Wet Etch
0.53
900C_1hr
1,547.3
TM
7.7
65.1
80.77
16.83
6.746
2.957
89.26
49.78
0.453
1.505
0.758
BATCH_11
Measurement
OTDR
0.04
1.803
548.7
SiO2
2.68
PECVD
Wet Etch
3.27
900C_1hr
1,560.68
TE
-8.88
76.68
46.38
26.61
3.666
1.096
82.88
54.37
0.282
1.918
0.793
BATCH_26
Synthetic
cut-back
0.098
0.528
555.17
Polymer
3.68
PECVD
Wet Etch
1.21
900C_3hr
1,568.06
TE
6.06
42.57
159.78
47.86
2.108
0.146
64.09
71.54
0.143
1.578
0.776
BATCH_48
Synthetic
cut-back
0.098
1.875
503.81
Polymer
1.6
PECVD
Wet Etch
4.4
No_Anneal
1,594.58
TM
-4.11
40.77
101.09
10.32
1.92
0.705
41.12
40.45
0.354
1.678
0.788
BATCH_5
Synthetic
microring_Q
0.102
1.602
201.82
Air
1.91
LPCVD
Wet Etch
1.91
No_Anneal
1,557.27
TE
0.45
24.88
166.63
31.26
6.71
1.552
43.57
68.67
0.205
1.666
0.94
BATCH_25
Measurement
microring_Q
0.175
1.168
447.03
Air
2.79
PECVD
Wet Etch
3.23
900C_3hr
1,563.39
TE
9.07
47.52
78.48
9.37
5.298
3.57
74.21
53.89
0.49
1.664
0.946
BATCH_15
Measurement
cut-back
0.092
1.62
282.65
Polymer
4.73
LPCVD
ICP
1.54
No_Anneal
1,513.72
TM
-8.44
41.83
65.16
20.11
8.411
3.787
73.36
83.29
0.443
1.895
0.762
BATCH_35
Synthetic
ring_resonance
0.177
0.635
395.96
Air
2.55
Sputtering
ICP
1.45
1000C_1hr
1,588.41
TM
7.54
35.77
75.91
13.4
3.487
1.463
84.1
46.86
0.13
1.949
0.927
BATCH_37
Measurement
ring_resonance
0.17
1.161
317.61
Air
3.34
Sputtering
ICP
2.52
1000C_1hr
1,577.56
TM
-8.94
40.93
108.82
16.14
7.945
3.885
70.26
53.07
0.283
1.854
0.737
BATCH_23
Measurement
cut-back
0.061
1.223
451.7
Air
4.56
PECVD
Wet Etch
2.23
1000C_1hr
1,573.17
TE
-4.45
72.41
77.09
25.13
4.678
1.458
77.06
89.88
0.354
1.54
0.757
BATCH_2
Synthetic
ring_resonance
0.097
1.973
555.84
Polymer
4.59
Sputtering
Wet Etch
0.78
No_Anneal
1,502.28
TM
8.91
30.86
32.89
20.56
1.917
0.267
78.58
51.48
0.203
1.696
0.803
BATCH_20
Measurement
cut-back
0.075
1.141
576.82
SiO2
3.53
PECVD
ICP
3.92
No_Anneal
1,569.25
TM
5.95
58.95
184.73
38.7
2.554
0.152
53.05
66.42
0.495
1.627
0.788
BATCH_29
Synthetic
microring_Q
0.095
0.908
371
Air
1.52
LPCVD
RIE
1.57
1000C_1hr
1,546.21
TE
2.18
55.15
167.92
19.04
3.871
1.568
75.34
70.88
0.28
1.592
0.745
BATCH_39
Measurement
cut-back
0.138
0.628
290.13
SiO2
4.1
LPCVD
ICP
3.52
1000C_1hr
1,519.85
TM
-7.74
20.85
198.84
31.27
4.341
1.12
80.89
51.13
0.231
1.719
0.896
BATCH_46
Synthetic
OTDR
0.124
1.246
271.18
Air
4.19
Sputtering
RIE
4.91
1000C_1hr
1,502.93
TM
0.3
62.57
50.43
26.82
3.095
0.543
42.82
46.71
0.242
1.793
0.929
BATCH_3
Synthetic
OTDR
0.017
1.32
268.75
Air
4.53
LPCVD
Wet Etch
0.91
900C_1hr
1,539.08
TM
-1.45
26.58
25.26
8.39
3.79
3.226
88.32
55.71
0.012
1.884
0.926
BATCH_11
Synthetic
OTDR
0.046
0.905
368.75
Polymer
2.7
PECVD
ICP
2.89
900C_1hr
1,530.44
TM
1.8
66.94
188.22
1.82
1.523
1.494
43.67
61.96
0.487
1.824
0.777
BATCH_26
Synthetic
ring_resonance
0.045
1.298
554.6
Polymer
4.72
LPCVD
ICP
3.15
900C_3hr
1,515.93
TE
2.17
68.91
179.79
13.54
7.321
4.727
47.84
49.55
0.046
1.984
0.884
BATCH_14
Synthetic
microring_Q
0.115
1.353
377.03
Air
1.07
LPCVD
ICP
2.48
900C_1hr
1,516.76
TE
7.52
24.7
88.52
27.88
2.903
0.568
82.22
70.34
0.323
1.958
0.733
BATCH_43
Measurement
ring_resonance
0.024
1.703
220.95
SiO2
2
LPCVD
RIE
3.71
900C_1hr
1,587.07
TE
9.45
39.21
198.39
33.5
8.01
2.031
60.91
70.12
0.139
1.956
0.933
BATCH_34
Synthetic
cut-back
0.159
1.297
221.4
SiO2
1.62
LPCVD
Wet Etch
0.85
1000C_1hr
1,559.32
TE
-7.58
23.08
195.1
44.04
12.671
2.699
89.88
82.19
0.098
1.587
0.91
BATCH_16
Synthetic
microring_Q
0.154
1.35
326.62
SiO2
2.21
LPCVD
Wet Etch
3.34
No_Anneal
1,504.29
TE
-3.45
61.44
41.97
11.15
5.127
2.828
71.19
58.02
0.403
1.507
0.73
BATCH_17
Synthetic
microring_Q
0.193
1.124
420.11
Air
2.04
PECVD
RIE
1.7
1000C_1hr
1,598.23
TE
6.07
78.26
47.99
47.85
18.967
3.776
42.25
73.43
0.351
1.778
0.921
BATCH_19
Measurement
microring_Q
0.076
1.64
583.21
Polymer
3.45
Sputtering
ICP
4.55
No_Anneal
1,538.79
TE
-6.84
20.73
186.5
18.86
7.668
3.456
44.9
74.22
0.3
1.914
0.815
BATCH_18
Synthetic
OTDR
0.066
1.661
501.6
Polymer
4.55
PECVD
Wet Etch
3.59
No_Anneal
1,559.25
TM
4.58
73.92
87.77
14.19
1.859
0.153
57.09
70.09
0.414
1.792
0.889
BATCH_19
Measurement
ring_resonance
0.099
1.017
474.43
Polymer
1.91
PECVD
RIE
1.9
900C_1hr
1,543.09
TM
-3.29
46.47
126.34
9.95
1.92
0.537
56.19
44.87
0.118
1.919
0.926
BATCH_39
Measurement
ring_resonance
0.152
1.357
400.12
Air
1.14
PECVD
Wet Etch
3.08
1000C_1hr
1,554.44
TM
-1.96
20.31
189.83
7.19
2.762
1.253
81.64
42.85
0.364
1.622
0.908
BATCH_45
Synthetic
OTDR
0.046
1.998
318.78
SiO2
1.32
LPCVD
ICP
3.92
No_Anneal
1,568.04
TE
-2.52
26.89
83.58
5.4
2.113
1.794
48.07
58.39
0.054
1.919
0.806
BATCH_47
Measurement
cut-back
0.089
1.387
560.96
Polymer
3.59
Sputtering
Wet Etch
4.34
No_Anneal
1,591.24
TE
7.24
22.32
130.46
28.13
4.817
1.098
54.87
86.08
0.073
1.987
0.735
BATCH_45
Synthetic
OTDR
0.134
1.017
513.61
SiO2
2.37
LPCVD
RIE
4.08
900C_3hr
1,524.3
TM
-4.85
32.88
99.42
42.88
12.361
2.579
43.98
85.51
0.36
1.586
0.864
BATCH_12
Measurement
microring_Q
0.104
1.282
379.04
Polymer
3.95
LPCVD
Wet Etch
0.51
900C_3hr
1,558.03
TM
-8.02
78.65
111.52
47.13
20.554
3.97
56.43
59.77
0.256
1.748
0.74
BATCH_48
Measurement
ring_resonance
0.017
0.764
467.38
Polymer
4.21
Sputtering
RIE
3.21
1000C_1hr
1,560.55
TM
-3.86
57.99
84.6
47.77
21.856
4.195
87.38
60.18
0.059
1.823
0.923
BATCH_38
Measurement
microring_Q
0.139
1.998
321.86
Air
2.03
Sputtering
RIE
1.86
No_Anneal
1,570.86
TM
-2.56
44.45
53.48
9.19
4.638
4.186
55.68
59.07
0.484
1.875
0.86
BATCH_15
Synthetic
cut-back
0.172
1.309
313.31
SiO2
3.92
LPCVD
ICP
4.43
900C_3hr
1,516.09
TE
-7.58
67.93
180.05
18.61
5.388
2.258
84.28
42.41
0.489
1.802
0.751
BATCH_38
Measurement
ring_resonance
0.13
0.915
430.85
SiO2
4.94
Sputtering
RIE
2.99
900C_3hr
1,543.18
TE
7.12
41.79
26.7
2.93
2.401
4.391
58.67
40.09
0.252
1.814
0.759
BATCH_10
Measurement
microring_Q
0.078
1.847
528.53
SiO2
3.58
LPCVD
ICP
4.64
No_Anneal
1,566.04
TM
-3.43
30.32
81.4
14.13
6.865
4.004
50.55
43.47
0.405
1.928
0.814
BATCH_31
Synthetic
cut-back
0.015
0.782
241.96
SiO2
2.38
Sputtering
Wet Etch
3.39
No_Anneal
1,531.74
TE
-2.34
57
159.2
20.99
7.697
2.949
49.14
50.84
0.453
1.915
0.837
BATCH_11
Synthetic
ring_resonance
0.095
1.524
368.86
Polymer
4.85
Sputtering
RIE
3.02
900C_1hr
1,583.61
TE
8.37
72.58
99.49
47.87
11.033
1.98
72.84
47.31
0.068
1.694
0.753
BATCH_9
Synthetic
OTDR
0.069
1.756
550.2
SiO2
3.17
LPCVD
ICP
3.9
900C_1hr
1,511.87
TM
9.42
64.56
68.63
11.99
2.464
0.646
47.65
58.3
0.222
1.889
0.855
BATCH_9
Measurement
cut-back
0.065
0.907
359.18
Air
4.4
PECVD
Wet Etch
4.65
No_Anneal
1,501.43
TM
-9.72
36.01
104
31.66
8.389
2.16
47.59
86.99
0.011
1.594
0.895
BATCH_19
Synthetic
microring_Q
0.19
1.616
210.1
Air
2.42
LPCVD
ICP
1.76
1000C_1hr
1,517
TM
-8.85
36.39
127.32
17.15
4.353
1.934
61
67.71
0.23
1.61
0.933
BATCH_39
Measurement
ring_resonance
0.044
1.084
239.82
Polymer
4
Sputtering
RIE
1.54
900C_3hr
1,597.01
TE
-9.68
39.3
196.09
45.85
10.412
2.151
86.33
72.06
0.487
1.794
0.735
BATCH_1
Measurement
ring_resonance
0.036
0.514
404.35
Air
1.87
Sputtering
Wet Etch
2.78
900C_3hr
1,587.69
TM
-9.69
39.68
38.21
16.75
8.78
4.307
41.93
52.64
0.343
1.861
0.721
BATCH_15
Measurement
microring_Q
0.086
1.38
353.43
SiO2
1.08
LPCVD
Wet Etch
3.67
900C_1hr
1,501.03
TE
7.85
23.13
57.34
40.8
4.751
0.945
72.12
60.1
0.373
1.933
0.881
BATCH_11
Synthetic
microring_Q
0.104
1.57
414.14
Polymer
3.12
Sputtering
ICP
0.56
900C_3hr
1,540.07
TE
-9.31
74.27
131.28
13.43
6.501
3.963
57.81
80.69
0.429
1.774
0.883
BATCH_26
Synthetic
cut-back
0.056
1.231
353.61
Polymer
4.35
PECVD
ICP
4.45
900C_3hr
1,528.36
TM
5.61
44.4
166.93
4.83
2.177
2.103
79.2
43.09
0.387
1.782
0.845
BATCH_49
Synthetic
ring_resonance
0.062
0.613
232.04
Polymer
2.22
Sputtering
ICP
2.05
900C_1hr
1,585.61
TM
-9.82
77.8
139.3
27.47
6.038
1.774
46.82
46.4
0.174
1.923
0.937
BATCH_7
Synthetic
microring_Q
0.164
1.389
332.76
Polymer
3.78
LPCVD
ICP
4.78
No_Anneal
1,525.45
TM
-0.27
54.85
193.23
28.62
13.063
3.867
61.17
84.35
0.097
1.564
0.71
BATCH_7
Measurement
microring_Q
0.013
1.12
417.29
Air
1.83
Sputtering
RIE
3.77
1000C_1hr
1,588.2
TE
-0.59
74.91
60.76
5.76
3.677
4.472
68.06
49.64
0.047
1.769
0.706
BATCH_29
Synthetic
ring_resonance
0.154
0.646
432.78
Polymer
4.38
PECVD
RIE
1.11
900C_3hr
1,521.57
TM
-7.11
35.53
113.13
5.86
3.12
2.19
41.07
51.14
0.426
1.661
0.862
BATCH_35
Synthetic
microring_Q
0.098
0.725
200.51
Polymer
1.96
PECVD
ICP
2.66
900C_3hr
1,501.81
TM
2.84
73.9
90.56
41.04
2.49
0.152
88.23
40.74
0.219
1.643
0.82
BATCH_40
Synthetic
microring_Q
0.192
1.584
387.36
SiO2
2.76
Sputtering
Wet Etch
2.78
1000C_1hr
1,541.28
TM
-3.98
44.81
89.25
44
9.903
2.121
85.75
76.58
0.464
1.774
0.921
BATCH_44
Synthetic
OTDR
0.028
1.521
578.28
SiO2
2.39
Sputtering
Wet Etch
1.35
No_Anneal
1,580.54
TE
6.49
67.78
115.16
4.85
3.518
3.486
56
70.31
0.497
1.625
0.735
BATCH_32
Measurement
cut-back
0.074
1.605
421.32
Air
3.03
PECVD
RIE
1.1
900C_1hr
1,543.95
TE
4.33
24.82
149.51
31.27
8.335
2.151
76.73
55.27
0.269
1.93
0.877
BATCH_28
Measurement
microring_Q
0.113
0.815
302.05
Air
2.29
LPCVD
RIE
3.59
900C_1hr
1,544.76
TE
-2.22
42.99
138.43
22.35
11.866
4.479
84.78
43.92
0.105
1.589
0.777
BATCH_1
Measurement
microring_Q
0.153
1.934
272.32
SiO2
2.78
LPCVD
Wet Etch
3.91
1000C_1hr
1,538.78
TM
-7.55
20.39
144.19
33.19
13.821
3.859
83.93
81.85
0.264
1.922
0.89
BATCH_33
Synthetic
ring_resonance
0.129
1.441
490.13
SiO2
2.22
PECVD
Wet Etch
1.09
900C_1hr
1,507.54
TM
-1.59
66.94
80.32
7.52
1.109
0.655
73.88
82
0.304
1.844
0.707
BATCH_39
Measurement
cut-back
0.133
0.989
540.97
SiO2
4.39
PECVD
ICP
4.34
1000C_1hr
1,524.11
TE
-1.97
27.65
71.91
38.92
8.382
2.021
48.69
71.41
0.456
1.775
0.767
BATCH_1
Measurement
cut-back
0.14
0.514
466.78
Air
2.68
LPCVD
RIE
1.86
900C_3hr
1,530.74
TE
-3.56
27.55
99.43
2.07
2.24
4.566
44.45
59.04
0.052
1.544
0.918
BATCH_22
Measurement
ring_resonance
0.194
1.24
200.54
SiO2
1.54
PECVD
Wet Etch
1.81
No_Anneal
1,586.05
TM
9.36
55.3
137.4
12.51
7.302
4.94
63.63
66.58
0.221
1.799
0.884
BATCH_20
Measurement
ring_resonance
0.128
1.629
525.21
Polymer
3.97
LPCVD
Wet Etch
3.27
900C_3hr
1,582.47
TM
0.87
49.96
30.02
14.75
8.788
4.896
40.01
84.55
0.32
1.706
0.884
BATCH_26
Synthetic
cut-back
0.03
0.676
501.15
Air
3.87
Sputtering
RIE
2
900C_1hr
1,582.26
TE
-2.78
78.94
182.62
26.58
12.971
4.189
56.84
62.31
0.011
1.977
0.754
BATCH_41
Synthetic
OTDR
0.116
1.015
387.99
Polymer
2.76
PECVD
Wet Etch
4.32
900C_3hr
1,558.59
TM
-0.12
39.06
85.75
23.94
13.49
4.921
66.8
71.27
0.027
1.648
0.768
BATCH_25
Measurement
ring_resonance
0.161
1.981
500.37
SiO2
1.45
PECVD
Wet Etch
4.9
900C_3hr
1,515.43
TE
-5.15
53.77
61.42
12.96
5.399
2.835
81.72
86.09
0.128
1.806
0.865
BATCH_44
Measurement
cut-back
0.113
1.529
202.84
Polymer
1.75
LPCVD
ICP
1.47
1000C_1hr
1,567.12
TM
0.01
54.46
76.4
19.8
9.584
4.37
66.58
87.4
0.155
1.743
0.853
BATCH_29
Measurement
microring_Q
0.037
0.65
239.92
Air
4.35
Sputtering
Wet Etch
3.89
No_Anneal
1,579.33
TM
-3.67
53.05
105.03
26.94
7.314
2.372
41.76
84.67
0.172
1.842
0.741
BATCH_10
Synthetic
OTDR
0.104
1.309
355.72
Polymer
3.61
Sputtering
ICP
2.12
900C_1hr
1,506.14
TE
-9.38
37.71
127.33
39.66
7.538
1.46
49.39
79.57
0.118
1.647
0.907
BATCH_33
Synthetic
OTDR
0.155
0.717
242.92
SiO2
4.44
Sputtering
RIE
2.19
No_Anneal
1,564.91
TM
-9.68
68.5
58.51
6.2
3.505
3.82
76.21
76.42
0.387
1.509
0.829
BATCH_16
Measurement
cut-back
0.063
1.244
242.79
Polymer
4.2
LPCVD
ICP
0.87
900C_3hr
1,584.35
TE
-1.94
51.44
153.28
8.39
1.615
1.27
81.29
67.84
0.018
1.605
0.729
BATCH_14
Measurement
ring_resonance
0.058
1.673
515.09
Polymer
4.88
LPCVD
Wet Etch
3.39
900C_3hr
1,587.76
TM
-7.2
75.87
81.53
9.51
4.745
3.459
78.3
44.65
0.314
1.788
0.829
BATCH_41
Synthetic
ring_resonance
0.198
1.381
401.29
SiO2
1.34
PECVD
Wet Etch
2.55
900C_1hr
1,556.31
TM
-2.57
26.07
84.74
12.22
4.313
2.262
89.04
55.46
0.489
1.545
0.877
BATCH_44
Synthetic
microring_Q
0.068
0.986
335.15
SiO2
1.48
PECVD
Wet Etch
3.35
No_Anneal
1,507.37
TE
-9.14
22.22
112.03
5.12
2.255
1.827
70.23
59.69
0.022
1.919
0.878
BATCH_49
Synthetic
ring_resonance
0.059
0.874
577.78
SiO2
1.79
PECVD
ICP
2.12
No_Anneal
1,539.77
TE
-4.59
22.98
192.88
41.6
9.747
1.945
68.65
79.7
0.398
1.922
0.874
BATCH_18
Measurement
ring_resonance
0.118

SiN Photonic Waveguide Loss & Efficiency Dataset

Description
This dataset provides 90,000 synthetic rows of silicon nitride (Si₃N₄) photonic waveguide parameters, focusing on waveguide loss and efficiency metrics. The data is useful for modeling, simulation, or LLM fine tuning to predict and understand the relationship between fabrication/design parameters and optical performance.

Key Highlights ✨

  • Material Focus: Silicon Nitride (Si₃N₄)
  • Columns: 25 structured columns capturing waveguide geometry, fabrication method, operational conditions, and measured/synthetic performance metrics
  • Size: 90,000 rows (ideal for both training and validation splits)
  • Use Cases:
    • Straight and Bent Waveguide loss prediction
    • Process control and optimization
    • Photonic design parameter studies
    • Synthetic data augmentation for AI/ML tasks

Dataset Structure 🏗️

Each row corresponds to a single waveguide configuration or measurement instance, including:

  1. Waveguide Geometry

    • waveguide_width (µm)
    • waveguide_height (nm or µm)
    • bend_radius (µm)
    • device_length (mm)
  2. Material & Fabrication

    • cladding_material
    • cladding_thickness (µm)
    • deposition_method
    • etch_method
    • sidewall_roughness (nm)
    • annealing_params
  3. Operational Parameters

    • wavelength (nm)
    • polarization (TE/TM)
    • input_power (dBm)
    • temperature (°C)
  4. Performance Metrics

    • insertion_loss (dB)
    • propagation_loss (dB/cm)
    • coupling_efficiency_input (%)
    • coupling_efficiency_output (%)
    • scattering_loss (dB/cm)
    • effective_index
    • mode_confinement_factor (0–1)
  5. Metadata

    • batch_id (fabrication batch/wafer ID)
    • data_source (Synthetic or Measurement)
    • measurement_method (e.g., cut-back, ring_resonance)
    • uncertainty (± dB or %)

Example Row

waveguide_width = 1.212
waveguide_height = 400.00
cladding_material = SiO2
cladding_thickness = 2.50
deposition_method = LPCVD
etch_method = RIE
sidewall_roughness = 2.05
annealing_params = 900C_3hr
wavelength = 1552.23
polarization = TE
input_power = 0.00
temperature = 25.00
bend_radius = 50.00
device_length = 10.00
insertion_loss = 3.50
propagation_loss = 0.300
coupling_efficiency_input = 72.00
coupling_efficiency_output = 68.00
scattering_loss = 0.15
effective_index = 1.800
mode_confinement_factor = 0.80
batch_id = BATCH_12
data_source = Synthetic
measurement_method = ring_resonance
uncertainty = 0.05

How to Use 💡

  1. Download/Clone

    • You can download the CSV file manually or use Hugging Face’s datasets library:
      from datasets import load_dataset
      
      dataset = load_dataset("username/SiN_Photonic_Waveguide_Loss_Efficiency")
      
  2. Loading & Exploration

    • Load into your favorite Python environment (pandas, polars, etc.) to quickly explore the data distribution:
      import pandas as pd
      
      df = pd.read_csv("SiN_Photonic_Waveguide_Loss_Efficiency.csv")
      print(df.head())
      
  3. Model Training

    • For tasks like waveguide loss prediction, treat the waveguide geometry/fabrication columns as input features, and the insertion_loss or propagation_loss columns as the labels or targets.
    • Example ML scenario:
      features = df[[
          "waveguide_width", "waveguide_height", "sidewall_roughness", 
          "wavelength", "polarization", "temperature"
      ]]
      target = df["propagation_loss"]
      
      # Then train a regression model, e.g., scikit-learn, XGBoost, etc.
      
  4. Synthetic Data Augmentation

    • Use this synthetic dataset to supplement smaller real datasets

Caveats & Limitations ⚠️

  • Synthetic Nature: While ranges are inspired by real-world photonic designs, actual values may differ based on specific foundries, tools, and processes.
  • Statistical Simplifications: Not all real-world correlations or distributions (e.g., non-uniform doping profiles, advanced thermal effects) are captured.
  • Measurement Noise: The uncertainty column does not fully replicate complex measurement artifacts.

License 📄

This dataset is available under the MIT License. You are free to modify, distribute, and use it for commercial or non-commercial purposes—just provide attribution.

Citation & Acknowledgments 🙌

If you use this dataset in your research or applications, please cite it as follows (example citation):

Author: https://huggingface.co/Taylor658
Title: SiN Photonic Waveguide Loss & Efficiency (Synthetic)
Year: 2025

@misc{sin_waveguide_loss_efficiency_2025,
  title  = {SiN Photonic Waveguide Loss & Efficiency (Synthetic)},
  author = {atayloraeropsace},
  year   = {2025},
  howpublished = {\url{https://huggingface.co/datasets/username/SiN_Photonic_Waveguide_Loss_Efficiency}}
}

Contributing 🧑‍💻

We welcome community contributions, ideas, and corrections:

  • Add additional columns

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