capability. Higher POU filter performance Unless effective new incident particle criteria should be driven by particle monitoring is To provide efficient particle concentrations may result the definition of the critical available in future, it capture and not allow particle in higher levels of particle size at given is recommended that shedding, nor leaching of particles in the UPW process step where POU after installation of harmful contaminants from the product. filter is installed POU Filters, process POU filter. metrology techniques and monitor wafers be Upon installation, POU To evaluate filter employed to ensure Filters should be rinsed performance, it is POU UPW quality with UPW to wafer recommended using SEMI meets wafer processing requirements. C79. processing If online monitoring is requirements. not available, POU filters POU Filter flow rates should be rinsed to filter should match process flow There is not a for manufacturer’s ‘one needs and be aligned with recommendations or for a one’ relationship filter manufacturer’s time consistent with between particles in recommendations for flow wafer processing needs. UPW vs. particles and flux. deposited on wafers. POU Filters are subject to Cleanliness of POU Filter on demand flow (metals, TOC, NVR, etc.) requirements. Such should be consistent with dynamic flow and/or wafer processing UPW pressure conditions may requirements. impact filter performance.
To provide efficient particle capture and not allow particle shedding, nor leaching of harmful contaminants from the POU filter. POU filter performance criteria should be driven by the definition of the critical particle size at given process step where POU filter is installed To evaluate filter performance, it is recommended using SEMI C79. POU Filter flow rates should match process flow needs and be aligned with filter manufacturer’s recommendations for flow and flux. Cleanliness of POU Filter (metals, TOC, NVR, etc.) should be consistent with wafer processing UPW requirements. capability. Higher incident particle concentrations may result in higher levels of particles in the UPW product. Upon installation, POU Filters should be rinsed with UPW to wafer processing requirements. If online monitoring is not available, POU filters should be rinsed to filter manufacturer’s recommendations or for a time consistent with wafer processing needs. POU Filters are subject to on demand flow requirements. Such dynamic flow and/or pressure conditions may impact filter performance. Unless effective new particle monitoring is available in future, it is recommended that after installation of POU Filters, process metrology techniques and monitor wafers be employed to ensure POU UPW quality meets wafer processing requirements. There is not a ‘one for one’ relationship between particles in UPW vs. particles deposited on wafers.
6129.docx