Line Item Revision to SEMI S2-0712b, ENVIRONMENTAL, HEALTH, AND SAFETY GUIDELINE FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT Developing/Revising Body S2 Chemical Exposure Task Force Name/Type: Environmental, Health and Safety Technical Committee: North America Region: Leadership Position Last First Affiliation Leader Visty John Salus Engineering International Technical Editor Larsen Sean Lam Research * Only necessary if different from leaders Documents, Conflicts, and Consideration Safety related codes, standards, and practices used in developing the safety guideline, and the manner in which each item was considered by the technical committee # and Title Manner of Consideration SEMI S6-0707 EHS Guideline for Exhaust Ventilation Align criteria and terminology – of Semiconductor Manufacturing Equipment Known inconsistencies between the safety guideline and any other safety related codes, standards, and practices cited in the safety guideline # and Title Inconsistency with This Safety Guideline 2014 ACGIH TLVs® and BEIs® Based on the Documentation – of the Threshold Limit Values for Chemical Substances and The exposure limits in this Safety Guideline Physical Agents & Biological Exposure Indices (both are more as published and as proposed) OSHA 29CFR 1910.1000 Toxic and Hazardous Substances, Air – stringent than the limits published in the Contaminants referenced documents. The MAK-Collection for Occupational Health and Safety: Part I: MAK Value Documentations, Volume 25 Other conflicts with known codes, standards, and practices or with commonly accepted safety and health principles to the extent practical # and Title Nature of Conflict with This Safety Guideline NONE Participants and Contributors Last First Affiliation Barsky Joe TUV Rheinland Belk Bill DECON Breder Paul ESTEC Solutions Brody Steve Product EHS Consulting Claes Brian Lam Research Crockett Alan KLA-Tencor DeFrain Steve ESTEC Derbyshire Pauline TUV Sud Ergete Nigusu Intertek-GS3 Fessler Mark TEL Frankfurth Mark Cymer Galatis Ermias TEL Giles Andy Estec Solutions Greenberg Cliff Nikon Precision Hamilton Jeff Tokyo Electron
Line Item Revision to SEMI S2-0712b, ENVIRONMENTAL, HEALTH, AND SAFETY GUIDELINE FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT Developing/Revising Body Name/Type: S2 Chemical Exposure Task Force Technical Committee: Environmental, Health and Safety Region: North America Leadership Position Last First Affiliation Leader Visty John Salus Engineering International Technical Editor Larsen Sean Lam Research * Only necessary if different from leaders Documents, Conflicts, and Consideration Safety related codes, standards, and practices used in developing the safety guideline, and the manner in which each item was considered by the technical committee # and Title Manner of Consideration SEMI S6-0707 – EHS Guideline for Exhaust Ventilation of Semiconductor Manufacturing Equipment Align criteria and terminology Known inconsistencies between the safety guideline and any other safety related codes, standards, and practices cited in the safety guideline # and Title Inconsistency with This Safety Guideline 2014 ACGIH TLVs® and BEIs® – Based on the Documentation of the Threshold Limit Values for Chemical Substances and Physical Agents & Biological Exposure Indices The exposure limits in this Safety Guideline (both as published and as proposed) are more stringent than the limits published in the referenced documents. OSHA 29CFR 1910.1000 – Toxic and Hazardous Substances, Air Contaminants The MAK-Collection for Occupational Health and Safety: Part I: MAK Value Documentations, Volume 25 Other conflicts with known codes, standards, and practices or with commonly accepted safety and health principles to the extent practical # and Title Nature of Conflict with This Safety Guideline NONE Participants and Contributors Last First Affiliation Barsky Joe TUV Rheinland Belk Bill DECON Breder Paul ESTEC Solutions Brody Steve Product EHS Consulting Claes Brian Lam Research Crockett Alan KLA-Tencor DeFrain Steve ESTEC Derbyshire Pauline TUV Sud Ergete Nigusu Intertek-GS3 Fessler Mark TEL Frankfurth Mark Cymer Galatis Ermias TEL Giles Andy Estec Solutions Greenberg Cliff Nikon Precision Hamilton Jeff Tokyo Electron
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