From fundamentals to application: one universal solution toward ceria PCMP cleaning for different demands in advanced FEOL processing Jhih-Fong Lin, Dupont – The Last Puzzle toward Cost-Effective CMP Processing: New-generation PCMP Cleaner for Positive-charged Silica Slurry Jhih-Fong Lin, Dupont – Polysilicon Post CMP Cleaning: Material Solution beyond the Emerging Technical Hurdle in FEOL Processing Jhih-Fong Lin, Dupont – Post-CMP W Cleaners with Excellent Tungsten Compatibility for Both Buffing and Brush Clean Zoey Dupont – Characterization of High Purity Ultrasonic Final Cleaning of Metal Oxide Plasma Coated Parts Osama Khalil, QuantumClean – Single Nanoparticle ICP-MS Analysis of Process Chemicals and UPW Used in Surface Cleaning and Preparation Lisa Mey-Ami, Air Liquide - Balazs NanoAnalysis – Filter material cleanliness characterization by electrophoretic purification/analysis Makonnen Payne, Pall – Metrologies of Amine and Ammonium in Post Etch Residue Removal Formulations Jingjing Wang, ECI Technology –
From fundamentals to application: one universal solution toward ceria PCMP cleaning for different demands in advanced FEOL processing – Jhih-Fong Lin, Dupont The Last Puzzle toward Cost-Effective CMP Processing: New-generation PCMP Cleaner for Positive-charged Silica Slurry – Jhih-Fong Lin, Dupont Polysilicon Post CMP Cleaning: Material Solution beyond the Emerging Technical Hurdle in FEOL Processing – Jhih-Fong Lin, Dupont Post-CMP W Cleaners with Excellent Tungsten Compatibility for Both Buffing and Brush Clean – Zoey Dupont Characterization of High Purity Ultrasonic Final Cleaning of Metal Oxide Plasma Coated Parts – Osama Khalil, QuantumClean Single Nanoparticle ICP-MS Analysis of Process Chemicals and UPW Used in Surface Cleaning and Preparation – Lisa Mey-Ami, Air Liquide - Balazs NanoAnalysis Filter material cleanliness characterization by electrophoretic purification/analysis – Makonnen Payne, Pall Metrologies of Amine and Ammonium in Post Etch Residue Removal Formulations – Jingjing Wang, ECI Technology
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