a) b) c) d) e) f) g) Figure 6. Phase images at 5 x 5 µm scan size of latent fingermark left on polished silicon wafer at: a) 1 day, b) 8 days, c) 16 days, d) 23 days, e) 30 days, f) 44 days and g) 61 days after the deposition. a)
a) b) c) d) e) f) g) Figure 6. Phase images at 5 x 5 µm scan size of latent fingermark left on polished silicon wafer at: a) 1 day, b) 8 days, c) 16 days, d) 23 days, e) 30 days, f) 44 days and g) 61 days after the deposition. a)
PopovSearsJones_Migration_Fingerprints_NonPorous_AFM_Archive_Version.docx