Monday, August 15, 2016 Poster Session I A-105 Tracking Nanoparticles in the Aquatic Environments in Taiwan Wen-Che Hou, Department of Environmental Engineering, National Cheng Kung University Hui-Ying Tsai, Department of Environmental Engineering, National Cheng Kung University To enable environmental risk assessment of nanoscale pollutants, the information regarding the nanoparticle concentrations across environmental compartments is urgently needed. In Taiwan, the semiconductor manufacturing industry is the major driver in the regional economy. Chemical mechanical planarization (CMP) process involved in semiconductor manufacturing uses a large amount of nanoparticle (NP) slurries usually containing SiO2, CeO2, and/or Al2O3 NPs that are discharged into the waste treatment systems after use before releasing into the receiving waters. The polishing process could also produce nanoscale fragments from the wafers. In this project, we aimed to survey a range of nanoparticles relevant to industrial and consumer usages such as CeO2, Al2O3, ZnO, TiO2, Au, and Ag across industrial and municipal wastewater treatment plants in Taiwan using single-particle ICP-MS (spICP-MS). We hypothesize that industrially relevant NPs such as CeO2 are more abundant in wastewater samples from industrial parks than those in municipal wastewater samples. Our preliminary result indicates that CeO2 NPs were detected in the CMP wastewater effluents with a size between 20 to 25 nm and particle number concentration at ~3000 particles/mL. In this talk, the changes in sizes and particle number concentrations across the treatment trains will also be presented.
Monday, August 15, 2016 Poster Session I A-105 Tracking Nanoparticles in the Aquatic Environments in Taiwan Wen-Che Hou, Department of Environmental Engineering, National Cheng Kung University Hui-Ying Tsai, Department of Environmental Engineering, National Cheng Kung University To enable environmental risk assessment of nanoscale pollutants, the information regarding the nanoparticle concentrations across environmental compartments is urgently needed. In Taiwan, the semiconductor manufacturing industry is the major driver in the regional economy. Chemical mechanical planarization (CMP) process involved in semiconductor manufacturing uses a large amount of nanoparticle (NP) slurries usually containing SiO2, CeO2, and/or Al2O3 NPs that are discharged into the waste treatment systems after use before releasing into the receiving waters. The polishing process could also produce nanoscale fragments from the wafers. In this project, we aimed to survey a range of nanoparticles relevant to industrial and consumer usages such as CeO2, Al2O3, ZnO, TiO2, Au, and Ag across industrial and municipal wastewater treatment plants in Taiwan using single-particle ICP-MS (spICP-MS). We hypothesize that industrially relevant NPs such as CeO2 are more abundant in wastewater samples from industrial parks than those in municipal wastewater samples. Our preliminary result indicates that CeO2 NPs were detected in the CMP wastewater effluents with a size between 20 to 25 nm and particle number concentration at ~3000 particles/mL. In this talk, the changes in sizes and particle number concentrations across the treatment trains will also be presented.
NANO_Abstract_Program.docx