In rapid prototyping processes such as Stereolithography (SLA), it is important to determine the laser beam’s interaction with the prototype resin. Specifically, the distribution of the laser beam’s radiant power at the surface of the resin and below will determine the voxel (volume pixel) geometry. The above equation describes the distribution of beam power at a depth = when the laser beam’s minimum radius coincides with the resin surface, and assumes a Beer-Lambert law of absorption for the resin. TeX format: H_{(r,z)} = H_{(r,0)} exp^{\left(\frac{-z}{D_p}\right)} Laser exposure within resin for SLA = Laser exposure at depth and distance from the beam centre (J.m-2) = Beam power (W) = Effective beam radius (m) = Scan velocity of beam (m.s-1) = Depth below resin surface (m) = Beam penetration depth, (when irradiance has reached 37% that of the surface) (m) = radius from centre of beam (m) In the rapid prototyping process stereolithography (SLA), the resin cures when exposed to energies above a critical exposure. The above equation describes the exposure on the surface of and within the resin for a laser beam of power moving at a velocity . TeX format: E_{(r,z)} = \sqrt{\frac{2}{\pi}} \left [\frac{P_L}{W_0 V_s} \right ] \cdot exp^{-\left \right )}
In rapid prototyping processes such as Stereolithography (SLA), it is important to determine the laser beam’s interaction with the prototype resin. Specifically, the distribution of the laser beam’s radiant power at the surface of the resin and below will determine the voxel (volume pixel) geometry. The above equation describes the distribution of beam power at a depth = when the laser beam’s minimum radius coincides with the resin surface, and assumes a Beer-Lambert law of absorption for the resin. TeX format: H_{(r,z)} = H_{(r,0)} exp^{\left(\frac{-z}{D_p}\right)} Laser exposure within resin for SLA = Laser exposure at depth and distance from the beam centre (J.m-2) = Beam power (W) = Effective beam radius (m) = Scan velocity of beam (m.s-1) = Depth below resin surface (m) = Beam penetration depth, (when irradiance has reached 37% that of the surface) (m) = radius from centre of beam (m) In the rapid prototyping process stereolithography (SLA), the resin cures when exposed to energies above a critical exposure. The above equation describes the exposure on the surface of and within the resin for a laser beam of power moving at a velocity . TeX format: E_{(r,z)} = \sqrt{\frac{2}{\pi}} \left [\frac{P_L}{W_0 V_s} \right ] \cdot exp^{-\left \right )}