(SiO2, SiN, HfO2, HFN) Spin on Glass and Organic/Biology Spin on Molecules Dopants prepared- with or without Salt buffers Tool Category 2: Silicon Based Substrates and Select Refractory Metals Allowed Not Allowed Tool category 1/1+ No Glass materials Substrates Silicon Based Materials No Class A or Class only B metals- and Si, SiC, oxides/compounds SiO2 of (exposed or substrates buried) All Furnace grown or i.e. deposited (Magnesium, Zinc, films Barium, Calcium) No Gold, Silver or PECVD Copper (Exposed Films or buried) ALD dielectric No High Vapor films pressure materials CNF Refractory Metals (i.e. Al, Ti, No III/V Ta, W, Pt, Compound Mo, Cr, Ni) Semiconductors Nitrides No and Oxides Organic/Biology
(SiO2, SiN, HfO2, HFN) Spin on Glass and Spin on Dopants Organic/Biology Molecules prepared- with or without Salt buffers Tool Category 2: Silicon Based Substrates and Select Refractory Metals Allowed Not Allowed Tool category 1/1+ materials No Glass Substrates Silicon Based Materials only No Class A or Class B metals- Si, SiC, SiO2 substrates and oxides/compounds of (exposed or buried) All Furnace grown or deposited films i.e. (Magnesium, Zinc, Barium, Calcium) PECVD Films No Gold, Silver or Copper (Exposed or buried) ALD dielectric films No High Vapor pressure materials CNF Refractory Metals (i.e. Al, Ti, Ta, W, Pt, Mo, Cr, Ni) No III/V Compound Semiconductors Nitrides and Oxides No Organic/Biology