Chemical vapour deposition of chromium on the surface of carbon steel has been investigated using a novel CVD method that combines the low cost of pack cementation method with advantages of vacuum technique. The processes have been performed in chromium chlorides atmosphere at a low pressure range from 1 to 800 hPa, the treatment temperature 800 to 950℃. Studies of the layers thickness, the phase composition, Cr, C and Fe depth profiles in diffusion zone have been conducted. The effect of the vacuum level during the process and the process parameters such as time and temperature on layer diffusion growth on the carbon steel surface has been investigated.