The first part describes the breakdown processes of monohalogenated silacyclohexanes (CH2) 5 SiHX; X = F, Cl, Br, I. In order to obtain the breakdown diagrams, Threshold Photoelectron Photoion coincidence (TPEPICO) analysis were carried out on the compounds.
Fyrri hluti verkefnisins fjallar um niðurbrot á halógen-einsetnum kísilsexhringjum (CH2) 5 SiHX; X = F, Cl, Br, I. Til að kanna niðurbrotsferla efnanna voru gerðar svokallaðar Threshold Photoelectron Photoion coincidence (TPEPICO) [1] mælingar á efnunum.