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Plasma spray can be used to produce coatings. of virtually any metallic, cermet, or ceramic ma-. terial. The coatings are used for most of the types. of applications described in a subsequent section. The transferred plasma-arc process adds to. plasma spray the capability of substrate surface heat-. ing and melting. Figure 7 is a schematic repre-. sentation of the process.
DC plasma (violet) enhances the growth of carbon nanotubes in laboratory-scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.