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Plasma spray can be used to produce coatings. of virtually any metallic, cermet, or ceramic ma-. terial. The coatings are used for most of the types. of applications described in a subsequent section. The transferred plasma-arc process adds to. plasma spray the capability of substrate surface heat-. ing and melting. Figure 7 is a schematic repre-. sentation of the process.
Sputtering deposition usually uses an argon plasma because argon, a noble gas, will not react with the target material. ===Etching=== In the semiconductor industry sputtering is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.