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Plasma spray can be used to produce coatings. of virtually any metallic, cermet, or ceramic ma-. terial. The coatings are used for most of the types. of applications described in a subsequent section. The transferred plasma-arc process adds to. plasma spray the capability of substrate surface heat-. ing and melting. Figure 7 is a schematic repre-. sentation of the process.
Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon.agnetic fields Magnetron sputtering is somewhat different from general sputtering technology. The difference is that magnetron sputtering technology uses magnetic fields to keep the plasma in front of the target, intensifying the bombardment of ions. A highly dense plasma is the result of this PVD coating technology.