Niobium capacitor
The development of solid electrolyte tantalum capacitors began in the early 1950s as a miniaturized, more reliable low-voltage support capacitor to complement the newly invented transistor. The solution found by R. L. Taylor and H. E. Haring of the Bell Labs was based on experience with ceramics. They ground down tantalum to a powder, pressed this powder into a cylindrical form and then sintered the powder particles into a pellet (“slug”) at high temperatures, between 1500 and 2000 °C, under vacuum conditions. These first sintered tantalum capacitors used a non-solid electrolyte not consistent with the concept of solid state electronics. 1952 a targeted search in the Bell Labs for a solid electrolyte by D. A. McLean and F. S. Power led to the invention of manganese dioxide as a solid electrolyte for a sintered tantalum capacitor.
Dynamic random-access memory
In 1964, Arnold Farber and Eugene Schlig, working for IBM, created a hard-wired memory cell, using a transistor gate and tunnel diode latch. They replaced the latch with two transistors and two resistors, a configuration that became known as the Farber-Schlig cell. In 1965, Benjamin Agusta and his team at IBM created a 16-bit silicon memory chip based on the Farber-Schlig cell, with 80 transistors, 64 resistors, and 4 diodes. In 1966, DRAM was invented by Dr. Robert Dennard at the IBM Thomas J. Watson Research Center. He was granted U.S. patent number 3,387,286 in 1968. Capacitors had been used for earlier memory schemes such as the drum of the Atanasoff–Berry Computer, the Williams tube and the Selectron tube.