We present a numerical scheme, grid generation and associated parallel algorithm for the simulation of silicon-based film growth in plasma enhanced chemical vapor deposition reactors. An MPI-based computing environment and advanced interactive software with graphic user interface, real-time visualization system and Web-based access were developed to provide distributed parallel multitask calculation and visualization on computer clusters. Analysis of system performance and cluster load-balancing indicates bottlenecks of the parallel implementation and ways to improve the algorithms.
['Valeria V. Krzhizhanovskaya', 'M. A. Zatevakhin', 'Alexander A. Ignatiev', 'Yu. E. Gorbachev', 'Peter M. A. Sloot']
Distributed simulation of silicon-based film growth