Native oxide. All 5 × 5 mm Si substrates were cut from the same 4 inch wafer in order to start with the same native oxide thicknesses in all experiments. However, the thickness can change due to heating of the substrate in the presence of oxygen. Therefore, in situ X-ray Photoelectron Spectroscopy (XPS) was used to determine silicon oxide thicknesses of the substrates in different deposition conditions.