(a) XPS Zr3d and Si2p spectra of films grown at total pressures of 2*10−2 mbar at (a) different pO2 or (b) with different laser repetition rates. A low flux of oxygen compared to Zr, caused by low pO2 or high laser repetition rate, led to silicide formation and an increased ratio of silicate/SiOx to SiO2 bonds.