Sample Fabrication and Characterizations: Fabrication of artificial honeycomb lattice involves the synthesis of porous hexagonal diblock template on top of a silicon substrate, calibrated reactive ion etching using CF4 gas to transfer the hexagonal pattern to the underlying silicon substrate, and the deposition of magnetic material (permalloy) on top of the uniformly rotating substrate in near‐parallel configuration (≈1°) to achieve the 2D character of the system. The sample fabrication process utilized diblock copolymer polystyrene(PS)‐b‐poly‐4‐vinyl pyridine (P4VP) of molecular weight 23K Dalton with the volume fraction of 70% PS and 30% P4VP. The self‐assembly of diblock copolymer was driven by microphase separation arising from the immiscibility of the polymer blocks. A microphase separated diblock copolymer film can take various forms from spherical to cylindrical to lamellar, depending upon the volume fraction of each block. At this volume fraction, the diblock copolymer tends to self‐assemble, under right condition, in a hexagonal cylindrical structure of P4VP in the matrix PS.38 A 0.5% PS‐b‐P4VP copolymer solution in toluene was spin casted onto cleaned silicon wafers at 2500 rpm for 30 s and placed in vacuum for 12 h to dry. The samples were solvent annealed at 25 °C for 12 h in a mixture of THF/toluene (80:20 v/v) environment. The process results in the self‐assembly of P4VP cylinders in a hexagonal pattern within a PS matrix. The average diameter of a P4VP cylinder was ≈ 12 nm and the center‐to‐center distance between two cylinders was ≈ 30 nm, also consistent with that reported by Park et al.38 Submerging the samples in ethanol for 20 min releases the P4VP cylinders yielding a porous hexagonal template. The diblock template was used as a mask to transfer the topographical pattern to the underlying silicon substrate. The top surface of the reactively etched silicon substrate resembles a honeycomb lattice pattern. This property is exploited to create metallic honeycomb lattice by depositing permalloy, Ni0.81Fe0.19, in near parallel configuration in an electron‐beam evaporation. For this purpose, a new sample holder was designed and setup inside the e‐beam chamber. The substrate was rotated uniformly about its axis during the deposition to create uniformity. This allowed evaporated permalloy to coat the top surface of the honeycomb only, producing the desired magnetic honeycomb lattice with a typical element size of 12 nm (length) × 5 nm (width) × 8 nm (thickness). Atomic force microscopy image of a typical honeycomb lattice is shown in Figure 1a (also see Figure S6 in the Supporting Information where it is shown that the average roughness in the thickness of a honeycomb element is less than 0.5 nm). The center‐to‐center spacing between neighboring honeycombs is ≈ 30 nm. Thus, each honeycomb is about 30 nm wide. Further details about the fabrication procedure can be found somewhere else. GISAXS, at an incident angle of 0.15o, confirmed the good structural quality of the sample.