The groups of Y. Shi and W. Adam published another enantioselective variant of the Rubottom oxidation in 1998 using the Shi chiral ketone in the presence of oxone in a buffered system to furnish α-hydroxy ketones in high yield and high enantiomeric excess. The Adam group also published another paper in 1998 utilizing manganese(III)-(Salen)complexes in the presence of NaOCl (bleach) as the oxidant and 4-phenylpyridine N-oxide as an additive in a phosphate buffered system. This methodology also gave high yields and enentioselectivities for silyl enol ethers as well as silyl ketene acetals derived from esters. Along with chiral oxidants, variants of mCPBA have been examined. Stankovic and Espenson published a variation of the Rubottom oxidation where methyltrioxorhenium is used as a catalytic oxidant in the presence of stoichiometric hydrogen peroxide. This methodology gives acyclic and cyclic α-hydroxy ketones in high yield with a cheap, commercially available oxidant. An inherent problem with mCPBA is its inability to oxidize silyl ketene acetals. In order to synthesize α-hydroxy esters, different oxidants are needed such as NaOCl (see above), lead(IV) acetate, or a hypofluorous acid-acetonitrile (HOF-ACN) complex. The Rubottom group found that lead(IV) acetate in DCM or benzene gave good yields of acyclic and cyclic α-hydroxy esters after treatment of the crude reaction mixture with triethylammonium fluoride. Later, the highly electrophilic HOF-ACN complex was used by S. Rozen to oxidize a variety of electron rich silyl enol ethers, silyl ketene acetals, and bis(silyl acetals), derived from carboxylic acids, in good yields at or below room temperature. The following examples represent only a small portion of syntheses that highlight the use of the Rubottom oxidation to install an important α-hydroxy functionality. Some of the major features of the following syntheses include the use of buffered conditions to protect sensitive substrates and the diastereoselective installation of the α-hydroxy group due to substrate controlled facial bias.