text: fig1 is a schematic top view of a micromachined movable stage with a microlens , actuation mechanism , suspension system and a fixed light emitter of the present invention . the fixed light emitter may take the form of any light source , for example , vertical cavity surface emitting lasers ( vcsels ), light emitting diodes ( leds ), and edge emitting lasers . in the particular embodiment shown in fig1 rnicrolens shuttle 1 has movable microlens stage 10 which supports microlens 12 . microlens stage 10 has one mechanical degree of freedom ( x ) and is suspended with springs 16 - 19 . springs 16 - 19 may take the form of folded bending springs ( as shown ), and may also include other configurations known from the silicon art , for example , straight beams . movement of microlens stage 10 is actuated with electrostatic comb drives 30 and 31 , all anchored to substrate 50 . the electrostatic comb drives may be replaced with any actuation system as is well known in the microelectromechanical systems ( mems ) art . as shown , microlens stage 10 is moved by applying voltage v1 between static fingers 32 and movable fingers 34 of electrostatic comb 30 and applying a voltage v2 between static fingers 33 and movable fingers 35 of electrostatic comb 31 . electrostatic forces cause movable fingers 34 and 35 of combs 30 and 31 to ` pull in ` to minimize the energy stored in the system . since movable fingers 34 and 35 are attached to the stage with its integrated microlens 12 the electrostatic actuation causes the stage to move to a new position . folded spring arms 16 and 17 are respectively connected to spring arms 18 and 19 at connecting beams 20 and 21 and are anchored to substrate 50 at anchor points 22 and 23 . static combs 32 and 33 are anchored to substrate 50 at comb spines 36 and 37 . in a first order system , the stage position is proportional to the force , which is proportional to the square of the applied voltage . the in - plane shape of structures ( stage , springs , combs ) is arbitrary within fairly wide limits . mechanical designs such as straight beam suspensions , tapered or stepped comb fingers , x / y folded spring suspensions , torsional springs , archimedian spiral springs for a rotational degree of freedom , etc ., which are well - known in silicon structures , may be implemented in the silicon . following the direction of the electrostatic force generated by either electrostatic comb drives 30 or 31 , folded beams 16 - 19 deflect and microlens stage 10 moves away from the neutral position . the scan resonant frequency of the microlens stage is on the order of kilohertz or more depending on the thickness of the mass of the microlens stage 10 and the spring constant of the folded beam . fig2 is a cross - sectional view of fig1 with the scanning shuttle integrated with a vcsel 65 . the vcsel is at the focal point of the microlens . 2 so that the optical beam passing through the lens is collimated . moving the lens laterally relative to the vcsel bends the light beam and sweeps the far field spot of the light beam ( see fig4 and 5 ). the vcsel structure includes layers of a iii - v substrate 60 , n quarter wave distributed bragg reflector ( dbr ) mirror layers 62 , active region 64 , p dbr mirror 66 and p + contact layer 68 . the vcsel structure may be formed using well - known processes . a spacer layer 70 is formed between the vcsel structure and the microlens shuttle 10 . the spacer layer may be polyimide , which is coated on the vcsel surface by conventional coating techniques , for example , spin coated . the spacer layer should be insulative and light transmitting . the function of the spacer is to adjust the distance between the microlens and the vcsel . the thickness of the spacer varies depending on the focal point of microlens 12 and the thickness of substrate 50 . the microlens shutter might be fabricated from a ( soi ) ( si / sio 2 / si ) wafer having si layer 72 , sio 2 layer 74 and si layer 76 . one approach to fabricate microlens 12 is by melting a photoresist pedestal deposited on top of the sio 2 layer 74 . through melting and reflow , the photoresist pedestal changes to a spherical shape due to the surface tension [ z . popovic , r . sprague , and g . a . n . connell , &# 34 ; technique for monolithic fabrication of microlens arrays &# 34 ;, applied optics , vol . 27 , pp . 1281 - 1284 ( 1988 ), hereby incorporated by reference ]. this technique has been well adopted for fabrication of large arrays of microlenses . for post - processing protection , a layer of sio 2 can be deposited on top of the photoresist lens ( not shown ). for a 7 μm high and 100 μm diameter spherical - shape lens , the radius of the sphere is calculated to be 180 μm . assuming that the refractive index of the photoresist is 1 . 6 , the focal point of the concave lens is 300 μm . another approach to fabricate the microlens is by bonding a sio 2 and a soi wafer together , then polishing the sio 2 wafer down to 8 μm thick . after reflowing the photoresist microlens pattern , the pattern is transferred onto the sio 2 layer by dry etching . the fabrication may start with the substrate etch to form cavity 15 using a wet chemical etching solution such as koh . the etch would stop at the sio 2 etch stop layer . then a circular hole is formed from the top by etching away the si in region 13 by dry or wet chemical etching . after this , a photoresist microlens is formed over the region 13 by photolithography and resist reflow . the last step is the etching of comb drive structure and the stage . in some applications , not only linear scanning but also focus adjustment is needed . fig3 depicts the schematic of the scanning plus focusing microlens si shuttle . the focusing can be realized by moving the microlens 12 up and down ( y - direction ) relative to the light source 65 . the microlens stage 10 can be pulled toward the vcsel 65 by electro - static force between electrodes 80 and 81 on the spacer substrate 70 and the si frame forming space 15 below the microlens . electrodes 80 and 81 may be , for example , indium tin oxide ( ito ) electrodes . to guarantee a large focus adjustment , the fingers need to be thick enough to maintain a large force between the fingers of the movable and the stationary comb drives in a pull - down position . for example , with 50 μm thick fingers , the resonance frequency and the dynamic scanning range in the linear direction do not change at all , which is desirable . preferably the gap between the electrode and the microlens platform is around 10 μm to make the electrostatic force large enough to pull the platform downward . so the si substrate has to be thinned or the ito electrode needs to sit on top of a mesa to reduce the gap . fig4 shows an optical imaging system for polygon - less printing using a secondary focusing microlens array and a scanning microlens / vcsel array described above . a secondary microlens array focuses the collimated light from the scanning microlens / vcsel array onto imaging plane 150 . an array 100 of vcsels 165 and scanning microlenses 112 are formed on substrates having layers and actuators as described with respect to fig2 and 3 . only the scanning aspect of the microlens array is shown in fig4 . each microlens 112 moves back and forth in the x direction . as the electrostatic comb actuators ( not shown ) are actuated , each microlens 112 is moved from a first position forming light rays 120 , to a second position forming light rays 122 , and to a third position forming light rays 124 , all of these rays being further focused by secondary lens array 130 . the secondary lens array can be fabricated on a glass substrate to decrease the requirement of its alignment with the light sources . this way , the secondary lenses do not have to be mounted and aligned individually , but instead , can be aligned as a single group or array . secondary lens 120 redirects the light to form light rays 140 , 142 and 144 which intersect the imaging plane 160 at points 150 , 152 and 154 . in the case of xerography , imaging plane 150 is a conductive surface or photoreceptor . in one example with a printing resolution of 1200 dpi , the first order optical system parameters are : f s = 1 . 9875 mm , focal length of lens in array ; x scan =± 25 . 0 μm , distance microlens is moved to produce a scanning beam ; θ scan = x scan / f m =± 0 . 083333 radians , angle of scanning beam produced by scanning microlens ; fwhm vcsel ≈ 3 . 2 μm , full width at half the maximum intensity of the beam at the vcsel ; fwhm ip ≈ 21 . 2 μm , full width at half the maximum intensity of the beam at the imaging plane ; m = fwhm ip / fwhm vcsel = f s / f m = 6 . 625 , vcsel to imaging plane magnification ; and l scan = 2 f s | θ scan |= 331 . 25 μm , length of scan produced by a single vcsel at the imaging plane . for 8 inch page width printing , an array of 570 microlens is needed . fig5 shows a polygon - less printing configuration using one large projection lens 230 . the projection lens focuses the collimated light from the scanning microlens / vcsel array onto imaging plane 260 . an array 200 of vcsels 265 and scanning microlenses 212 are formed on substrate 250 having layers and actuators as described with respect to fig2 and 3 . only the scanning aspect of the microlens array is shown in fig5 . each microlens 212 moves back and forth in the x direction . as the electrostatic comb actuators ( not shown ) are actuated , each microlens 212 is moved from a first position forming light rays 220 , to a second position forming light rays 222 , and to a third position forming light rays 224 , all of these rays being further focused by secondary projection lens 230 . projection lens 230 redirects the light to form light rays 240 , 242 and 244 which intersect the imaging plane 260 at points 250 , 252 and 254 . in the case of xerography , imaging plane 260 is a conductive surface or photoreceptor . in another example with a printing resolution of 1200 dpi , the first order optical system parameters are : m p = 6 . 625 , projection lens object plane to imaging plane magnification ; x scan =± 12 . 5 μm , distance microlens is moved in x direction to produce a scanning beam ; fwhm vcsel ≈ 3 . 2 μm , full width at half the maximum intensity of the beam at the vcsel ; fwhm ip ≈ 21 . 2 μm , full width at half the maximum intensity of the beam at the imaging plane ; m = fwhm ip / fwhm vscel = m m m p = 6 . 625 , vcsel to imaging plane magnification ; s mobj = f m ( m + 1 )/ m = 600 μm , distance between microlens object plane and microlens ; s mimg = m m s mobj = 600 μm , distance between microlens and microlens image plane ; s pobj = 100 mm , distance between projection lens object plane and first principle plane of the projection lens ; s pimg = m p s pobj = 662 . 5 mm , distance between projection lens object plane and the second principle plane of the projection lens f p =( s pobj m p )/( m p + 1 ), focal length of projection lens ; and l scan = 2 ( m m + 1 ) m p | x scan |= 331 . 25 μm , length of scan produced by a single vcsel at the imaging plane . since the spacing between the microlenses is only 50 μm , it is too small for the array to be arranged linearly . due to the space constraints , the microlens array needs to be staggered two - dimensionally . there are many uses for the microlens assemblies . for example , if the microlenses are used in a polygon ros , they can be used to do dynamic focusing to correct for manufacturing errors or field curvature , and sub - pixel scanning in the cross scanning direction . as those skilled in the art will appreciate , other various modifications , extensions , and changes to the foregoing disclosed embodiments of the present invention are contemplated to be within the scope and spirit of the invention as defined in the following claims .