## Efficient Confinement of Ultraviolet Light into the Self-Assembled, Dielectric Colloidal Monolayer on a Flat Aluminum Film

Seungwoo Lee 1* , Juyoung Kim 2

1 SKKU Advanced Institute of Nanotechnology (SAINT) &amp; School of Chemical Engineering, Sungkyunkwan University (SKKU), Suwon 440-746, Republic of Korea

2 Department of Neurobiology, Stanford University School of Medicine, Stanford, CA 94305, USA

*Email: seungwoo@skku.edu

## Abstract

Here we propose the efficient confinement of ultraviolet (UV) light into the plasmonicphotonic  crystal  hybrid,  which  can  be  practically  developed  by  the  self-assembly  of dielectric  colloidal  nanosphere  monolayer  onto  a  flat  aluminum  (Al)  film.  Using  a numerical approach, we analyzed modal characteristics of each different resonant mode at the UV wavelengths including surface plasmon polariton (SPP) mode and waveguided (WG) mode and tuned these resonant modes from deep to far UV simply by adjusting the size  of  dielectric  colloidal  nanosphere.  The  calculated  quality-factor  ( Q -factor)  of  such plasmonic-photonic crystal hybrid is at least one order of magnitude higher than that of the existing Al nanostructures (Al nanoparticles, nanodisks, nanovoids, or nanogratings) standing on the dielectric substrate. Also, we systematically studied how the amount of native oxide, which can be generated during the general process for the deposition of Al, can influence on both the SPP and WG modes of such plasmonic-photonic crystal hybrid in  order  to  guide  strategies  for  a  realistic  experimental  fabrication  and  exploitation  of relevant optical responses. We anticipate that the theoretical results in this paper enable a promising  step  in  the  enhancement  of  UV  light  interaction  with  the  nanophotonic structure in a versatile, but highly efficient way.

## 1. Introduction

In  contrast  to  noble  metals  (e.g.,  gold  and  silver),  aluminum  (Al),  due  to  its  d-band located above its Fermi level, allows us to push the near-infrared (IR)/visible-frequency regime of plasmon to the ultraviolet (UV), so as to open up the emerging applications of UV  plasmonics  [1-11].  In  particular,  as  the  relatively  high  energy  level  of  UV  well corresponds to the various electronic transition levels of organic molecules, the development  of  advanced  molecular  spectroscopy  based  on  enhanced  fluorescence sensing  or  surface  enhanced  Raman  scattering  (SERS)  can  be  further  boosted  up  by taking  advantage  of  UV  wavelength  plasmonics.  Furthermore,  its  natural  abundance

together with high compatibility with CMOS process makes Al highly promising material candidate for a new opportunity of other transformative applications in UV plasmonics as well [1-11]. This unique ability to instantiate UV plasmonics has driven the creation of Al nanostructures  and  exploitation  of  the  relevant  plasmonic  modes;  there  has  been  little advancement,  however,  of  rationally  designed  Al  nanophotonic  structures,  capable  of high  quality-factor  ( Q -factor)  at  UV  wavelength  [2 -7,  11].  Although  the  most  of  Almediated  UV  plasmonics  has  been  indeed  exploited  mainly  by  the  localized  modes  in individual Al nanoparticles/nanodisks/nanovoids or the propagating modes in Al gratings, the obtainable Q -factor of such general plasmonic structure on a dielectric substrate has been still relatively low (generally less than 50) [2 -7, 11]. This relatively low Q -factor of UV  light resonance, especially, limits the availability of UV  plasmon-enhanced molecular spectroscopy or sensing; thus, the currently available Q -factor of Al nanophotonic structure, in practice, needs to be further increased.

This  paper  theoretically  proposes  the  efficient  UV  light  confinement  and  the resultant high Q -factor by using the plasmonic-photonic crystal hybrid. The coupling of dielectric photonic crystal structure to a flat metallic film (i.e., plasmonic-photonic crystal hybrid) has proved to be a versatile platform for the efficient confinement of the light into the nanoscaled space and the achievement of high Q -factor (at least over 100) at the near infrared (NIR)/visible wavelength [12 -15]. Particularly, the dielectric colloidal monolayer  on  a  flat  noble  metal  film  (e.g.,  Au),  supporting  both  dielectric  optical (whispering  gallery-like  resonant  waveguided  modes,  abbreviated  as  WG)  and  surface plasmonic  resonance  (surface  plasmonic  polariton  modes,  abbreviated  as  SPP),  has actually shown to conceive a high Q -factor (up to 600) at a NIR or visible wavelength [12 -15].  This  ability  to  contain  high Q -factor  together  with  a  versatile-to-implement fabrication method  makes  the  structural motifs, consisting of dielectric colloidal monolayer and a flat metal film, highly amenable to the various practical applications of plasmonic-photonic crystal hybrid including sensing platform, light emitting device, and solar  cells  [13,  14,  16].  Here,  we  have  extended  this  strategy  to  enable  the  efficient confinement of UV light and the resultant high Q -factor with the Al-mediated plasmonicphotonic  crystal  hybrid,  which  can  be  simply  developed  via  the  self-assembly  of dielectric colloidal monolayer (polystyrene (PS) colloidal nanospheres) on a flat Al film rather than other noble metal films (Figure 1). With respect to the spatial distribution of electric field intensity (| E | 2 ), we confirmed that Al plasmonic-photonic crystal hybrid can support both WG and SPP modes at the UV wavelength. Also, we figured out that Q -factor at each WG and SPP modes can be generally as high as several hundreds at the UV wavelengths;  the  resonant  wavelengths  of  its  WG  and  SPP  modes  can  be  easily  tuned from deep and far UV merely by adjusting the size of PS nanospheres. Meanwhile, Al can be easily contaminated by oxidization (aluminum  oxide, Al2O3) during the fabrication  process  (i.e.,  Al  deposition  by  e-beam  evaporation):  Al  has  been  generally known to be encapsulated or mixed with oxide according to the deposition condition [11]. Thus,  in  order  to  set  out  the  general  guide  for  the  experimental  fabrication  and reproducible  exploitation  of  the  relevant  optical  responses,  we  systematically  analyzed the influence of Al2O3 to be in Al film (as form of composite) or onto Al surface (as form

of  encapsulation  layer)  on  the  WG  and  SPP  modes  of  Al  plasmonic-photonic  crystal hybrid.

## 2. Stepwise evolution of optical responses of plasmonic-photonic crystal hybrid

In order to confirm the possible resonant modes, three different structural primitives were  systematically  exploited  including  the  hexagonally  close-packed,  PS  colloidal monolayers, which are assembled (i) in air (Figure 1a), (ii) onto 600 µm thick Si wafer (Figure 1b), and (iii) onto 100 nm thick flat Al film/ 600 µm thick Si wafer (Figure 1c). The size of PS colloidal nanosphere was varied from 230 nm to 330 nm (300 nm-sized PS colloidal monolayer was employed as a main structural primitive, herein): 330 nmsized PS nanosphere was found to be upper limit for conceiving the far UV wavelength resonant modes, as will be discussed later. By using numerical approach (finite-difference time-domain, FDTD), the collective set of optical responses of the plasmonic-photonic crystal  hybrid,  including  the  reflection  spectra  (by  Fourier  transformation  of  the  timetransient  pulse  signal),  | E | 2 spatial  distribution,  and Q -factor  ( ω Δω / ,  where ω is  the resonant  frequency  and Δω is  the  resonant  linewidth)  [12-15,  17]  was  systematically rationalized:  all  of  the  optical  responses  was  obtained  by  simulating  unit  cell  (the  box highlighted by blue dotted line, as shown in Figure 1d) of the close-packed, PS colloidal monolayer array with the periodic boundary conditions. An ultra-fine grid (at least 60 pts per  wavelength  in  a x -, y -, z -direction)  was  employed;  the  time-transient  response  was collected for a relatively long time (at least 3 ps). The dielectric constants of Si wafer and Al2O3  were  empirically  obtained  by  the  ellipsometric  measurement,  while  the  PS  was assumed  to  be  a  non-dispersive  dielectric  material  with n of  1.549.  The  complex permittivity of Al was characterized by a modified Drude model, ε = ε ∞ - ( ω p 2 /( ω 2 +i ωγ ) ), where ε ∞ is  background  dielectric  constant  (high-frequency  response), ω p is  plasma frequency, and   is damping frequency. The adapted Drude model fitting parameters were γ as follows: ε ∞ = 3.0 eV, ω p = 16.3 eV, and γ = 0.8 eV. The employed electric polarization was x -axis  in  Figure  1a;  due  to  the  6-folded  symmetric  geometry  (hexagonally  closepacked geometry), such structure does not show the dependency of optical response to two orthogonal polarizations ( x - or y -directions), when the light is normally irradiated ( z -direction).

Figure 2 summarizes the optical responses of 300 nm-sized PS colloidal monolayers  in  air  (see  Figure  2a),  including  reflection  spectra  (Figure  2b)  and  spatial distribution  of  | E | 2 (Figure  2c).  In  this  case,  the  incident  light  can  be  coupled  to  the individual PS nanospheres by whispering gallery mode [16]. Also, more importantly, the periodically  close-packed,  PS  nanospheres  can  support  both  the  in-plane  waveguided modes  (slab  guided  mode,  confined  by  total  internal  refraction)  and  the  resonant waveguided  modes,  as  with  other  2D  photonic  crystal  slabs  [17].  The  latter,  in  turn, results  in  the  coupling  of  resonant  light  to  the  surrounding  air  (i.e.,  resonant  radiation losses),  as  evidenced  by  several  peaks  (Lorentzian  shaped)  of  reflection  spectra  (see Figure 2b) [14, 15, 17]. The nature of each resonant radiation mode (marked by WG1, WG2, and WG3 in Figure 2) is revealed with the | E | 2 spatial distributions, as presented in Figure 2c; the structural symmetry in the vertical direction makes PS colloidal monolayer

to support the purely dielectric resonant modes. Interestingly, the sharp and asymmetric resonant  behavior  is  well  observed  in  the  reflection  spectra  (Figure  2b),  owing  to  the interference  between  the  reflection  and  the  exponentially  degraded  amplitude  of  the resonances [17] within the PS colloidal monolayer; the obtainable Q -factors vary from 40 to 70 with respect to each resonant radiation mode.

When such PS colloidal monolayer is directly attached to the dielectric Si substrate (Figure 3a), the symmetry of the structure in the vertical direction becomes broken and the relevant efficiency of light confinement is found to be further reduced (see Figure 3bc). The resonant radiation modes, supported by the PS colloidal monolayer onto a flat Si wafer (Figure 3a), were rationalized by the responses of reflection spectra, presented in Figure  3b  (the  resonant  behaviors  are  revealed  by  the  deeps  rather  than  peaks  of reflection spectra, due to the interference between the resonant radiation modes and the reflected  wave  from  the  high  refractive  index  Si  wafer);  especially,  WG1,  WG2,  and WG3 of these modes show a lowered | E | 2 with more oriented spatial distribution toward the Si wafer, compared with a freestanding counterpart (Figure 3b). This is because the resonant  waveguided  light  within  PS  colloidal  monolayer  eventually  gets  coupled  to  a high refractive index dielectric substrate (Si, n of 3.4): this is radiative loss. As a result, the Q -factors of such resonant modes tend to be smaller than those of a freestanding PS colloidal  monolayer,  as  evidenced  by  broaden  resonant  behavior  in  reflection  spectra. Furthermore, the implementation of a high refractive index dielectric substrate into the PS colloidal  monolayer  causes  the  resonant  modes  to  red  shift.  Meanwhile,  such  direct coupling of PS colloidal monolayer to the high refractive index substrate newly results in the generation of higher resonant radiation mode, marked by WG4, showing much higher | E | 2 and Q -factor than other three modes. These four-different modes can be divided into two  groups,  depending  on  the  | E | 2 spatial  distribution  (Figure  3c):  coupled  (WG1  and WG3) or non-coupled (WG2 and WG4) modes to the Si wafer substrate.

The resonant behavior of these four-different modes can be further boosted up or reconfigured  by  the  implementation  of  a  flat  Al  film  into  the  back-plane  substrate,  as shown  in  Figure  4a.  Figure  4b  presents  the  reflection  spectra  of  the  PS  colloidal monolayer, assembled onto a 100 nm thick, flat Al layer/Si backing layer; we can clearly observe that the resonant behavior becomes shaper and deeper, indicating enhanced Q -factors and coupling efficiencies, respectively. Particularly, the previous WG1 and WG3 can be strongly coupled to the Al substrate layer and transformed into SPP-like resonant modes  (re-named  as  SPP1  and  SPP3),  as  clearly  revealed  by  the  | E | 2 (upper  panel  in Figure 4c) and E Ðvector spatial distribution (bottom panel in Figure 4c): the E Ðvectors of both  SPP1  and  SPP3  modes  near  the  surface  of  a  flat  Al  film  are  vertically  oriented (transverse magnetic (TM)-like mode), while simultaneously | E | 2 is  highly  concentrated between PS nanosphere and a flat Al film. These further confinements of the UV light into the vicinity between PS nanosphere and Al layer via strongly coupled SPP allows us to  obtain  the  enhanced Q -factors  (from  48.2  to  126.1  for  SPP1;  from  32.2  to  66.5  for SPP3).  WG2  and  WG4  modes,  resonant  modes  formed  by  the  dielectric  PS  colloidal monolayer,  also  can  be  greatly  facilitated  by  their  interaction  with  a  flat  Al  layer.  As clearly  shown in Figure 4c, in both WG2 and WG4 modes, the | E | 2 ,  confined  within  a

dielectric PS spherical nanoparticle, is strongly enhanced, while the relevant Q -factors are significantly  boosted  up,  for  example,  from  46.1  to  475.9  for  WG2  and  from  183.7  to 590.3 for WG4. These simply conceivable high Q -factors merely by the self-assembly of PS colloidal monolayer onto a flat Al film allow us to emphasize one of strengths of such Al  plasmonic-photonic  crystal  hybrid  system:  these  calculated Q -factors  at  the  UV wavelengths are at least one order of magnitude higher than those, which are obtainable with  the  existing  Al-based  UV  plasmonic  systems  (e.g.,  Al  nanoparticles,  nanodisks, nanovoids, or nanogratings) [2 -7, 11]. Meanwhile, the implementation of a flat Al layer into  the  PS  colloidal  monolayer  makes  the  system  to  have  additional  higher  modes, indicated  by  SPP5  and  WG6,  with  the  moderated  | E | 2 amplitude  and Q -factors  (See Figure 4c).

## 3. Tuning resonant wavelength and Q -factors with high flexibility

Another strength of Al plasmonic-photonic crystal hybrid lie on the ability to tune its resonant wavelength with a high flexibility; this can be achieved simply by the change in the size of PS colloidal nanoparticles. As shown in Figure 5a, just varying the size of PS  colloidal  nanosphere,  for  example,  from  230  nm  to  330  nm,  indeed  enables  the complement of the wide UV spectrum (from deep to far UV) of the achievable resonant SPP1  and  WG2  modes,  even  though  the  other  modes  shows  the  limited  range  of  the tunability,  due  to  the  scales  law.  The  further  extending  the  size  range  of  PS  colloidal nanosphere could allow other resonant modes to obtain wider UV spectrum, as with SPP1 and WG2.

Figure 5b summarizes the obtainable Q -factors at the varied resonant wavelengths, which were controlled by the adjustment of PS colloidal sizes; it is important to note that the Q -factor  of  WG1  mode  can  be  dramatically  increased  to  1388  at  a  resonant wavelength of 270 nm (corresponding size of PS colloidal nanosphere is 230 nm). Also, the Q -factors of WG and SPP modes show a dispersive behavior, as shown in Figure 5b. In particular, even if some fluctuations are clearly visible, the Q -factors of WG modes are decreased, as the resonant wavelengths are increased. Meanwhile, the Q -factors of SPP modes are increased with the resonant wavelength. One of the key determinants for Q -factor is the intrinsic loss including the radiation losses resulting from the light coupling to the surrounding area and the ohmic metallic absorption losses [15, 18]. Given that the overall trend of Q -factor variations according to the resonant wavelengths can be directly associated  with  such  losses  in  the  system.  In  the  case  of  WG  modes,  their  resonant behaviors are supported almost in the dielectric PS nanospheres (see Figure 4c and its detailed  modal  analysis  in  Figure  6a-b).  As  these  dielectric  modes  are  maintained dominantly via total internal refraction, the refractive index contrast between PS colloidal monolayer  and  surrounding  environments  can  have  significant  influence  on  the  WG modes.  Indeed,  the  lower  refractive  index  of  a  flat  Al  film  (0.2~0.4  at  the  UV wavelengths of interest, as shown in Figure 5c) than both that of air (1.0) and effective refractive index of the structure (1.38, average refractive index, calculated by weighting the  filling  ratio  of  PS  colloidal  monolayer  in  air)  allows  PS  colloidal  monolayer  to minimize the radiative loss; greatly enhancing the Q -factors of WG modes. The trend of

Q -factors evolution of WG modes according to the resonant wavelengths, which is well matched to the dispersive behavior of Al refractive index (Figure 5c), further supports this analysis.

In the case of SPP modes, as shown in Figure 4c and 7a-b (more detailed modal analysis of Figure 4c), both E x and E z can be highly confined within the vicinity between PS  nanospheres  and  a  flat  Al  film;  thus,  the  ohmic  absorptive  loss  of  Al  should  have significantly  influence  on  the Q -factors  of  SPP  modes.  Indeed,  the Q -factors  of  SPP modes are much smaller than those of WG modes owing to large ohmic absorptive loss of Al; indeed, the dispersive lossy nature of Al, presented in the dispersion diagram of k of Al  (Figure  5c),  is  well  correlated  with  the  trend  of Q -factor  enhancement  with  the resonant wavelengths.

## 4. Effect of Al2O3 on the resonant behaviors

We next demonstrate the effect of oxide contamination on the optical response of Al  plasmonic-photonic  crystals,  as  Al  has  been  shown  to  be  more  vulnerable  to  oxide contamination, compared to Au [11]. These studies can make a contribution to setting out a  general  guide  for  a  realistic  experimental  fabrication  and  reproducible  plasmonic characterizations of Al plasmonic-photonic crystal hybrid. According to the recent result, reported by Naomi Halas group, two typical types of oxide (Al2O3) contaminations can preferably  occur  in  the  Al  nanostructures:  (i)  Al2O3 encapsulation  of  the  pristine  Al nanostructure and (ii) uniform distribution of Al2O3 within Al (i.e., Al/Al2O3 composite) [11]. First, we investigated the effect of Al2O3 encapsulation layer on the resonant WG and  SPP  modes:  herein,  300  nm-sized  PS  colloidal  monolayers  are  assembled  on  the stacked Al2O3/Al/Si wafer (Figure 8a). The thickness of Al2O3 was varied from 1 nm to 5 nm,  as this range of oxide layer thickness has been generally observed in an experimentally  developed  Al  nanostructure  [11].  In  this  case,  the  effect  of  Al2O3 encapsulation  layer  on  the  resonant  WG  and  SPP  modes  can  be  interpreted  by  using perturbation theory [19]. According to perturbation theory, the material perturbation of the resonator can give rise to the shift of the resonant wavelengths, as follows:

$$\frac { \Delta \lambda _ { r e s } } { \lambda _ { 0 } } = \frac { - \iiint d V \left [ \left ( \Delta \vec { \mu } \cdot \vec { H } \right ) \cdot \vec { H } _ { 0 } ^ { * } + \left ( \Delta \overleftarrow { \varepsilon } \cdot \vec { E } \right ) \cdot \vec { E } _ { 0 } ^ { * } \right ] } { \iiint d V \left ( \mu \left | \vec { H } _ { 0 } \right | ^ { 2 } + \varepsilon \left | \vec { E } _ { 0 } \right | ^ { 2 } \right ) }$$

where 𝜆 !"# and 𝜆 ! indicate the perturbed and unperturbed resonant wavelength, respectively; both Δ 𝜇 and Δ 𝜇 represent the material perturbation by external sources; 𝐻 ! and 𝐸 ! present the unperturbed electromagnetic (EM) wave, whereas 𝐻 and 𝐸 correspond to the EM wave under perturbed status; the complex conjugates are expressed by 𝐻 ! ∗ and 𝐸 ! ∗ .  Thus,  the  dominator  and  numerator  of  the  right  side  of  the  equation  present  the unperturbed total EM energy and the variation of EM energy by material perturbation, respectively. Conclusively, this theory indicates that the shift of the resonant wavelength

can be effectively caused by the overlap between the material perturbation (herein, Al2O3 encapsulation layer) and the | E | 2 .

.

Figure 8b summarizes the resonant wavelength shifts of WG and SPP modes (red shift),  which  are  driven  by  the  implementation  of  the  Al2O3  encapsulation  layer  with different thickness. SPP5 mode becomes disappeared, when Al2O3 is inserted between Al and PS nanospheres; thus, we excluded this mode for clarity. From this result, we can observe that both SPP1 and SPP3 modes are more sensitive to the change in the thickness of  Al2O3 encapsulation  layer  than  WG2  and  WG4  modes.  This  result  is  highly  related with the relationship between | E | 2 spatial distribution and the material perturbation (i.e., Al2O3 encapsulation layer). Since both SPP1 and SPP3 modes can strongly confine the UV light  between  PS  nanospheres  and  a  flat  Al  film,  we  can  expect  that  the  overlap between materials perturbation (Al2O3 encapsulation layer) and | E | 2 can get maximized in the SPP1 and SPP3 modes. In contrast, for both WG2 and WG4 modes, most of | E | 2 is confined merely within the dielectric PS nanospheres, so as to induce a relatively small portion of the overlap between materials perturbation (Al2O3 encapsulation layer) and | E | 2 Indeed,  the  red  shifts  of  these  pure  dielectric  resonant  wavelengths  with  respect  to  the change in the thickness of Al2O3 encapsulation layer is relatively limited, compared with those  of  SPP  resonant  modes.  Interestingly,  WG6  mode,  despite  of  its  main  dielectric resonance,  shows  the  red  shifts  of  resonant  wavelengths,  comparable  to  the  SPP1  and SPP3  modes,  since  certain  portion  of  its  resonant  | E | 2 can  be  confined  in  the  vicinity between PS nanospheres and Al layer as well as the inside of PS nanospheres (see Figure 4c).

Meanwhile,  the  obtainable Q -factors  of  WG  and  SPP  modes  together  with  the efficiency of light confinement also get reduced simultaneously, as the thickness of Al2O3 encapsulation  layer  increases  (Figure  8c-d).  Regarding  WG2  and  WG4  modes,  the insertion  of  a  relatively  high  refractive  index  Al2O3 (1.78-1.83  at  the  UV  wavelengths) into  the  interface  between  PS  nanospheres  and  Al  can  facilitate  the  radiative  losses  of such waveguided resonant modes; therefore, reducing the amplitude of light confinement and Q -factors, simultaneously. Regarding SPP1 and SPP3 modes, the Al2O3 encapsulation  layer  significantly  hinders  the  intimate  coupling  between  PS  nanosphere and a metallic Al, in that the efficiency of the Al-mediated plasmonic light confinement and Q -factors are reduced (Figure 8c). These resonant wavelength red shifts and Q -factor changes appear to be quite sensitive to just few nanometer changes in the thickness of Al2O3 encapsulation layer; these exotic abilities can be used for the plasmonic/photonic reporter of oxide contamination.

Finally, we  exploited  the  effect  of another  typed  oxide  contamination  (i.e., Al/Al2O3  composite)  on  the  optical  response  of  Al  plasmonic-photonic  crystal  hybrid: herein, Al2O3 encapsulation layer was set to be 0 nm in order to elucidate the effect of Al/Al2O3  composite.  Toward  this  direction,  there  is  an  additional  need  to  obtain  the dielectric properties of Al/Al2O3 composite with varying the oxide ratio; the Bruggeman effective  medium  approximation  allows  us  to  calculate  the  complex  permittivity  of Al/Al2O3 composite, as follows [20]:

$$n _ { A l } \frac { ( \varepsilon _ { A l } - \varepsilon ) } { ( \varepsilon _ { A l } + 2 \varepsilon ) } + n _ { o x i d e } \left ( \frac { \varepsilon _ { o x i d e } - \varepsilon } { \varepsilon _ { o x i d e } + 2 \varepsilon } \right ) = 0$$

where 𝑛 !" and 𝑛 !"#$% are  the  volume  ratios  of  Al  and  Al2O3,  respectively; 𝜀 is the permittivity of Al/Al2O3 composite. The both 𝜀 !" and 𝜀 !"#$% were obtained by a modified Drude model and empirical measurement, respectively, as mentioned before. Figure 9a-c presents  the  calculated  complex  permittivity  (Figure  9a-b)  and  refractive  index  (Figure 9c):  with  the  ratio  of  Al O3  to  Al,  the  overall  refractive  index  of  Al/Al2O3  composite 2 intrinsically increases.

Figure 10a shows the reflection spectra of 300 nm-sized PS colloidal monolayers onto the flat Al/Al2O3 composite with different oxide ratio. As the ratio of Al2O3 to Al increases, the intrinsic metallic properties of Al become weaken and get closed more to a dielectric  material  (see  the  change  in  the  complex  permittivity  of  Al/Al2O3  composite, according to the oxide ratio, as shown in Figure 9a-b). Therefore, eventually, three SPP modes (SPP1, SPP3, and SPP5) cannot be supported anymore, when the ratio of Al2O3 to Al reaches a relatively high ratio (40 %). Also, we can clearly see that two higher WG modes (i.e., WG4 and WG6) get emerged together in the end; only two WG modes (WG2 and  WG6)  are  visible  even  at  the  high  ratio  of  Al2O3  to  Al  (50%).  In  this  case,  the enhanced refractive index of back-plane substrate via adding 50 % of Al2O3 to pure Al results in the reduction of the refractive index contrast between PS colloidal monolayer and environments, so as to decrease both Q -factors and the light confinement, as shown in Figure 10b. Nonetheless, Al/Al2O3 composite with 50 % oxide can still show the lower refractive index (0.82 at the wavelength of interest) than both air (1.00) and PS colloidal monolayer (effective refractive index of 1.38); thus, can confine a certain portion of UV light within the dielectric PS nanosphere.

## 5. Conclusion

In this paper, we have demonstrated the efficient confinement of UV light into the Al plasmonic-photonic crystal hybrid, which can be developed in a highly versatile way: the  self-assembly  of  PS  colloidal  monolayer  onto  a  flat  Al  film.  The  stepwise  modal analyses  of  the  plasmonic/photonic  crystal  hybrid  with  respect  to  the  surrounding environments  (i.e.,  reflection  spectra, Q -factors,  and  electric-field  spatial  distribution) details each resonant WG and SPP mode; highlighting the role of these resonant modes in the  confinement  of  UV  light  within  the  structure.  Importantly,  we  confirmed  that  Al plasmonic-photonic  crystal  hybrid  can  achieve  the  high Q -factors,  at  least  one-order magnitude  higher  than  other  existing  UV  plasmonic  nanostructures;  thus,  playing  an important and versatile role in UV-mediated molecular sensing or spectroscopy. Finally, we  highlighted  the  effect  of  the  oxide  contamination  on  the  optical  responses  of  Al plasmonic-photonic  crystal  hybrid,  as  this  oxide  contamination  can  be  more  realistic circumstance especially from the fabrication point of view. Thus, such collective set of theoretical exploitation can provide the general guide for the practical applications of Al

plasmonic-photonic crystal hybrid to the efficient manipulation and confinement of UV light with a high flexibility.

## Acknowledgements

This  work  was  supported  by  Samsung  Scholarship  Research  Fund  2014  program  at Sungkyunkwan University (no. S-2014-0883-000).

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Figure 1. Schematic for three different structural primitives, numerically simulated in this paper: close-packed, polystyrene (PS) colloidal monolayer (a) in air; (b) onto silicon (Si) wafer; (c) onto 100 nm thick Al/Si wafer. (d) Schematic for unit cell of the model structure.

![image](https://ac.marcodsn.me/arxiv-markdown-images/1408.0656v1-figure-90c88236-06b9-4d02-8d72-3c076ec12229.jpg)

Figure 2. (a) Schematic for close-packed, 300 nm-sized PS colloidal monolayer in air. (b) UV regime reflection spectra of close-packed, 300 nm-sized PS colloidal monolayer in air. (c) Spatial distribution ( x z -plane) of electric field intensity | E | 2 and Q -factors at WG1, WG2, and WG3 modes.

![image](https://ac.marcodsn.me/arxiv-markdown-images/1408.0656v1-figure-2e4eb414-9315-48d0-9bcc-26521c33ae6d.jpg)

Figure 3. (a) Schematic for close-packed, 300 nm-sized PS colloidal monolayer, assembled onto Si wafer. (b) UV regime reflection spectra of close-packed, 300 nm-sized PS colloidal monolayer, assembled onto Si wafer. (c) Spatial distribution ( x z -plane) of electric field intensity | E | 2 and Q -factors at WG1, WG2, WG3, and WG4 modes.

![image](https://ac.marcodsn.me/arxiv-markdown-images/1408.0656v1-figure-6a703525-1268-4b9f-86d7-05151e552153.jpg)

![image](https://ac.marcodsn.me/arxiv-markdown-images/1408.0656v1-figure-bd7a5781-bfdb-4c38-897b-fd51c5bf2f7f.jpg)

![image](https://ac.marcodsn.me/arxiv-markdown-images/1408.0656v1-figure-8c7750d0-dd38-4409-94e6-7ceffddb1f1c.jpg)

E-Vector

Figure 4. (a) Schematic for close-packed, 300 nm-sized PS colloidal monolayer, assembled onto 100 nm thick Al/Si wafer. (b) UV regime reflection spectra of closepacked, 300 nm-sized PS colloidal monolayer, assembled onto 100 nm thick Al/Si wafer. (c) Spatial distribution ( x z -plane) of electric field intensity | E | 2 / Q -factors (upper panel) and E -vector (bottom panel) at SPP1, WG2, SPP3, WG4, SPP5, and WG6 modes.

![image](https://ac.marcodsn.me/arxiv-markdown-images/1408.0656v1-figure-9a2c1bd6-af18-4a55-9e1c-a3b79d989c5a.jpg)

Wavelength (nm)

Figure 5. Tuning of (a) resonant wavelengthes and (b) Q -factors of each mode by the adjustment of the size of PS nanosphere, assembled onto a flat Al/Si wafer. (c) Dispersion diagram of Al refractive index.

Figure 6. Resonant properties of WG2, WG4, and WG6 modes of close-packed, 300 nmsized PS colloidal monolayer, assembled onto 100 nm thick Al/Si wafer. Spatial distribution of (a) Ez at x z -plane (at x 1 plane of schematic in Figure 6b) and (b) Ex at x y -plane (at z 1 plane of Figure 4c).

![image](https://ac.marcodsn.me/arxiv-markdown-images/1408.0656v1-figure-d0f45201-4d29-437e-990f-3ecfb5deb9a4.jpg)

Figure 7. Resonant properties of SPP1, SPP3, and SPP5 modes of close-packed, 300 nmsized PS colloidal monolayer, assembled onto 100 nm thick Al/Si wafer. Spatial distribution of (a) Ez at x z -plane (at x 1 plane of schematic in Figure 6b) and (b) Ex at x y -plane (at z 2 plane of Figure 4c).

![image](https://ac.marcodsn.me/arxiv-markdown-images/1408.0656v1-figure-2cde60f5-5dc2-41ee-beab-be0a58eb71dd.jpg)

Figure 8. (a) Schematic for close-packed, 300 nm-sized PS colloidal monolayer, assembled onto Al2O3/Al/Si wafer. (b) The resonant wavelength shift of each modes according to the thickness of Al2O3 (from 1 nm to 5 nm). (c) Q -factors variations of each mode according to the thickness of Al2O3 from 1 nm to 5 nm. (d) Spatial distribution ( x z -plane) of electric field intensity | E | 2 / Q -factors at WG2 and SPP1 modes, when the thickness of Al2O3 is 1 nm or 5 nm.

![image](https://ac.marcodsn.me/arxiv-markdown-images/1408.0656v1-figure-ce3523d8-9bea-4218-9459-63f08118e55d.jpg)

Figure 9. Complex permittivity of Al/Al2O3 composite with the controlled oxide ratio, which was calculated by Bruggeman model [20]. (a) Real permittivity. (b) Imaginary permittivity. (c) Refractive index.

![image](https://ac.marcodsn.me/arxiv-markdown-images/1408.0656v1-figure-5802e029-c2d3-45db-9fb2-20b96a1165d2.jpg)

Figure 10. (a) UV regime reflection spectra of close-packed, 300 nm-sized PS colloidal monolayer, assembled onto 100 nm thick Al/Al2O3 composite with differernt oxide ratio. (b) Spatial distribution ( x z -plane) of electric field intensity | E | 2 and Q -factors at WG2 and WG4 modes.

![image](https://ac.marcodsn.me/arxiv-markdown-images/1408.0656v1-figure-4642c45a-ce49-4035-860a-de6d0a608093.jpg)
Seungwoo Lee Juyoung Kim
Efficient Confinement of Ultraviolet Light into the Self-Assembled, Dielectric Colloidal Monolayer on a Flat Aluminum Film
Here we propose the efficient confinement of ultraviolet (UV) light into the
plasmonic-photonic crystal hybrid, which can be practically developed by the
self-assembly of dielectric colloidal nanosphere monolayer onto a flat aluminum
(Al) film. Using a numerical approach, we analyzed modal characteristics of
each different resonant mode at the UV wavelengths including surface plasmon
polariton (SPP) mode and waveguided (WG) mode and tuned these resonant modes
from deep to far UV simply by adjusting the size of dielectric colloidal
nanosphere. The calculated quality-factor (Q-factor) of such plasmonic-photonic
crystal hybrid is at least one order of magnitude higher than that of the
existing Al nanostructures (Al nanoparticles, nanodisks, nanovoids, or
nanogratings) standing on the dielectric substrate. Also, we systematically
studied how the amount of native oxide, which can be generated during the
general process for the deposition of Al, can influence on both the SPP and WG
modes of such plasmonic-photonic crystal hybrid in order to guide strategies
for a realistic experimental fabrication and exploitation of relevant optical
responses. We anticipate that the theoretical results in this paper enable a
promising step in the enhancement of UV light interaction with the nanophotonic
structure in a versatile, but highly efficient way.