content_image/924290.jpg content_image/924292.jpg
from H, C$_{1}$ _ $_{4}$-alkyl, C$_{1}$ _ $_{4}$-haloalkyl, halogen, and CN; each of R$^{17 }$and R$^{18 }$is independently chosen from OR$^{19 }$and N(R 20 ) 2 ; R 19 is chosen from H, C$_{1}$ _ $_{20}$-alkyl, C$_{5}$ _ $_{30}$-aryl, C$_{6}$ _ 20 - aralkyl and a monovalent organic residue having a lactone moiety; and each R 20 is independently chosen from H, C$_{1}$ _ $_{20}$-alkyl, and C$_{6}$ _ $_{20}$-aryl; wherein Zand R $^{14 }$may be taken together to form a 5 to 7-membered unsaturated ring. 

11. The composition of claim 10 wherein at least one third monomer has the formula (5) 

<img src='content_image/924290.jpg'>

wherein ADG is an acid decomposable group; and R 21 is chosen from H, C$_{1}$ _ $_{4}$-alkyl, C$_{1}$ _ $_{4}$-haloalkyl, halogen, and CN. 

12. The composition of claim 1 wherein the organic polymer further comprises as polymerized units one or more unsaturated monomers having a chromophore moiety. 

13. The composition of claim 12 wherein the chro› mophore moiety is pendent from the organic polymer back› bone. 

14. The composition of claim 13 wherein the chro› mophore moiety is selected from the group consisting of from fury!, pyryl, thiophenyl, pyridyl, phenyl, naphthyl, acenaphthyl, fluorenyl, carbazolyl, anthracenyl, phenan› thryl, pyrenyl, coronenyl, tetracenyl, pentacenyl, tetraphe› nyl, benzotetracenyl, triphenylenyl, perylenyl, benzyl, phen› ethyl, tolyl, xylyl, styrenyl, vinylnaphthyl, vinylanthracenyl, dibenzothiophenyl, thioxanthonyl, indolyl, and acridinyl. 

15. The compos1t10n of claim 1 wherein at least one condensable silicon monomer has the formula (9) 

<img src='content_image/924292.jpg'>

wherein each R 50 is independently chosen from a C$_{1}$ _ 30 hydrocarbyl moiety and a substituted C$_{1}$_ 30 hydrocarbyl moiety; and each X is independently chosen from halogen, cl-10 alkoxy, -OH, -O----C(O)-R 50 , -(O-Si(R 51 )2) P$_{2}$-X 1 , and -(Si(R 51 ) $_{2}$)P$_{3}$ -X 1 ; X 1 is independently cho› sen from halogen, C$_{1}$ _ $_{10 }$alkoxy, -OH, -O----C(O)-R 50 ; each R 51 is independently chosen from R$^{50 }$and X; p is an integer from Oto 3; p2 is an integer from 1 to 10; and p3 is an integer from 1 to 10. 

(5) 

16. The composition of claim 15 wherein p=0 or 1. 

17. A composition comprising: (a) one or more solvents; and (b) one or more condensed polymers having an organic polymer chain having pendently-bound moieties having an acidic proton and a pKa in water from -5 to 13 and having pendently-bound siloxane moieties. 

18. A method comprising (a) coating a substrate with the composition of claim 1 to form a coating layer; (b) curing the coating layer to form a polymeric underlayer; ( c) dis› posing a layer of a photoresist on the polymeric underlay er; (d) pattern-wise exposing the photoresist layer to form a latent image; ( e) developing the latent image to form a patterned photoresist layer having a relief image therein; (f) transferring the relief image to the substrate; and (g) remov› ing the polymeric underlayer by wet stripping. 

19. The method of claim 18 wherein the polymeric underlay er is removed by wet stripping at room temperature. 

20. A method comprising (a) coating a substrate with the composition of claim 17 to form a coating layer; (b) curing the coating layer to form a polymeric underlayer; ( c) dis› posing a layer of a photoresist on the polymeric underlay er; (d) pattern-wise exposing the photoresist layer to form a latent image; ( e) developing the latent image to form a patterned photoresist layer having a relief image therein; (f) transferring the relief image to the substrate; and (g) remov› ing the polymeric underlayer by wet stripping. 

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