content_image/924742.jpg content_image/924743.jpg content_image/924761.jpg content_image/924744.jpg content_image/924745.jpg
# c12) United States Patent 

# Dimov et al. 

# (54) CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION 

(75) Inventors: Ognian N. Dimov, Warwick, RI (US); Binod B. De, Attleboro, MA (US) 

(73) Assignee: FUJIFILM ELECTRONIC MATERIALS U.S.A., INC., North Kingstown, RI (US) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by 581 days. 

(21) Appl. No.: 12/791,397 

(22) Filed: Jun.1,2010 

## (65) Prior Publication Data 

US 2010/0304299 Al Dec. 2, 2010 

(60) Provisional application No. 61/182,911, filed on Jun. 1, 2009. 

(51) Int. Cl. 

<img src='content_image/924742.jpg'>

(52) U.S. Cl. CPC ............ G03F 710045 (2013.01); G03F 710392 (2013.01); G03F 710397 (2013.01) 

( 58) Field of Classification Search USPC ............... 430/270.1, 326; 540/484, 485, 492, 540/500, 504, 515; 558/315; 570/111, 113 See application file for complete search history. 

## (56) References Cited 

<img src='content_image/924743.jpg'>

## Related U.S. Application Data 

## U.S. PATENT DOCUMENTS 

<img src='content_image/924761.jpg'>

# (IO) Patent No.: US 9,034,557 B2 

# May 19, 2015 (45) Date of Patent: 

<img src='content_image/924744.jpg'>

## FOREIGN PATENT DOCUMENTS 

<img src='content_image/924745.jpg'>

Ferreira et al., "Choice of Amines as Stabilizers for Chemically Amplified Resist Systems", Proceedings of SPIE, vol. 3333, pp. 236-244. (1998).* 

International Search Report Application No. PCT/USl0/36868, dated Aug. 13, 2010. 

Ferreira, L., et al., "Choice of Amines as Stabilizers for Chemically Amplified Resist Systems", Olin Microelectronic Materials, E. Providence, RI, SPIE vol. 3333, pp. 236-244. 

Endo, Y. et al., "Reaction of Benzene with Diphenyl Sulfoxides," Faculty of Pharmaceutical Sciences, Univ. of Tokyo, Tokyo, Japan, vol. 29, Aug. 27, 1981, pp. 3753-3755. 

PCT International Preliminary Report on Patentability for related PCT Patent Application No. PCT/US2010/036868, Dec. 15, 2011, 7 pgs. 

Supplementary European Search Report and Written Opinion from EP 10 78 3909 completed on Oct. 30, 2012, 6 pgs. 

Office Action from Japanese Patent Application No. 2012-513356 mailed Jul. 22, 2014 3 pgs. 

Search Report and Written Opinion from Singapore Application No. 201108287-2 mailed Aug. 5, 2014, 19 pgs. 

Search Report from Taiwan Application No. 99117405 mailed Jul. 22, 2014, 1 pgs. 

* cited by examiner 

Primary Examiner - Anca Eoff 

(7 4) Attorney, Agent, or Firm - Blakely, Sokoloff, Taylor & Zafman, LLP 

## (57) ABSTRACT 

A photoresist composition. The composition has the follow› ing: (a) one or more resin binders that include one or more acid sensitive groups and that are substantially free of phe› nolic groups protected by acetal or ketal groups; (b) one or more photo acid generators, that, upon exposure to a source of high energy, decompose and generate a photoacid strong enough to remove the one or more acid sensitive groups; (c) one or more ionic non-photosensitive additives including an iminium salt; and ( d) one or more solvents. There is also a process for patterning relief structures on a substrate employ› ing the photoresist composition. 

US009034557B2 

## OTHER PUBLICATIONS 

## 27 Claims, No Drawings 

