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[0713] From the results shown in the table, it was con› firmed that in a case where the value of n in the repeating unit A was 2 or greater, the pattern collapse during pattern formation could be further suppressed (Comparison of Examples 1, 5, 11, and 12 vs. others Examples). 

[0714] It was confirmed that in a case where J in the repeating unit A was an alicyclic group, the pattern collapse during pattern formation could be further suppressed ( com› parison of Examples 2, 7, 8, and 13 vs. Examples 3, 4, 6, 9, 10, 14, and 15 (comparison between Examples in which the value of n in the repeating unit A was 2 or greater). Comparison of Example 5 vs. Examples 1, 11, and 12 ( comparison between Examples in which the value of n in repeating unit A was 1). 

[0715] It was confirmed that in a case where the resin X has a repeating unit represented by General Formula (II-1) or (II-2), the sensitivity of the resist film was more excellent (comparison of Examples 2, 6, 11, and 13 vs. other Examples). 

[0716] It was confirmed that in a case where the total content of the repeating units A to C in the resin X with respect to the total mass of the resin X was more than 90% by mass, the sensitivity of the resist film was more excellent (comparison of Examples 3 to 5, 14, and 15 vs. other Examples). 

[0717] It was confirmed that in a case where the dispersity of the resin X was 1.0 to 1.5, pattern collapse during pattern formation could be further suppressed ( comparison of Examples 1, 11, and 12 vs. other Examples). 

[0718] It was confirmed that in a case where the com› pound Y generates an acid with a pka of 1.00 to 4.50 upon irradiation with actinic rays or radiation, the LER perfor› mance of the obtained pattern was more excellent (compari› son of Examples 2 to 12, and 14 vs. other Examples). 

[0719] It was confirmed that in a case where the difference between the pka of an acid generated by the compound Y and the pka of an acid generated by the photoacid generator Z was 3 .00 or greater, the LER performance of a pattern thus obtained was more excellent ( comparison of Examples 4 to 6 and 8 to 12 vs. other Examples). 

[0720] It was confirmed that in a case where the content of the photoacid generator Z whose volume of generated acid was 240 A $^{3 }$or more was 60% to 100% by mass with respect to the total mass of the photoacid generator Z in the actinic ray-sensitive or radiation-sensitive resin composition, it was confirmed that the LER performance of a pattern thus obtained was more excellent ( comparison of Example 2 vs. Examples 3 to 12 and 14 (comparison between Examples in which a pka difference between the acid generated from the compound Y and the acid generated from the photoacid generator was 3.00 or greater)). 

[0721] In a case where the resist composition includes two or more kinds of the photoacid generators Z, it was con› firmed that the obtained pattern had better LER performance (the results of Examples 5 and 8; comparison of Example 7 vs. Examples 2, 3, and 14 (comparison between Examples in which the pka of the acid generated from the compound Y was 1 or more, and a pka difference between the acid 

generated from the compound Y and the acid generated from the photoacid generator was less than 3.00)). 

What is claimed is: 

1. An actinic ray-sensitive or radiation-sensitive resm composition comprising: 

a resinX having a repeating unitArepresented by General Formula (I), a repeating unit B having an acid-decom› posable group, and a repeating unit C selected from the group consisting of a repeating unit cl represented by General Formula (II), a repeating unit c2 represented by General Formula (III), a repeating unit c3 having a carbonate ring group, and a repeating unit c4 having an anhydride ring group; 

a compound Y which is a basic compound or ammonium salt compound whose basicity is reduced upon irradia› tion with actinic rays or radiation; and 

a photoacid generator Z which is a compound other than the compound Y, 

<img src='content_image/915018.jpg'>

<img src='content_image/915019.jpg'>

<img src='content_image/915020.jpg'>

in General Formula (I), RI represents a hydrogen atom or a monovalent organic group, 

n represents an integer of 1 or greater, and 

J represents a (n+l)-valent linking group, 

in General Formula (II), RII represents a hydrogen atom or a monovalent organic group, 

Q represents a divalent linking group, and 

T represents a monovalent organic group, and 

in General Formula (III), RIII’s each independently rep› resent a hydrogen atom or a substituent, and 

lac represents a lactone ring group. 

2. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1, 

wherein n represents an integer of 2 or greater. 

3. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1, 

wherein J represents an (n+l)-valent group having an alicyclic group. 

