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# c12) United States Patent Tsuchimura 

# (54) COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventor: Tomotaka Tsuchimura, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 0 days. 

(21) Appl. No.: 14/982,759 

(22) Filed: Dec. 29, 2015 

## (65) Prior Publication Data 

US 2016/0116840 Al Apr. 28, 2016 

(63) Continuation of application No. PCT/JP2014/065498, filed on Jun. 11, 2014. 

## (30) Foreign Application Priority Data 

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(51) Int. Cl. 

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(52) U.S. Cl. CPC ............ G03F 710045 (2013.01); C07C 25118 (2013.01); C07C 309115 (2013.01); C07C 309/19 (2013.01); C07C 311114 (2013.01); C07C 311/16 (2013.01); C07C 311148 (2013.01); C07C 311151 (2013.01); C07C 321128 (2013.01); C07C 323109 (2013.01); C07C 323120 (2013.01); C07C 327122 (2013.01); C07C 327124 (2013.01); C07C 327126 (2013.01); C07C 381112 (2013.01); C07D 209/48 (2013.01); C07D 327108 (2013.01); C07D 333/46 (2013.01); C07D 333176 (2013.01); C07D 335/16 (2013.01); C07D 339/08 (2013.01); C07D 347100 (2013.01); C07D 493/08 (2013.01); C07J 31/006 (2013.01); C07J 4110055 (2013.01); C07J 4110061 (2013.01); G03F 710382 (2013.01); G03F 710392 (2013.01); G03F 710397 (2013.01); H0JL 2110271 (2013.01); H0JL 2110276 (2013.01); H0JL 29116 

## Related U.S. Application Data 

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# (IO) Patent No.: US 9,904,167 B2 

# Feb.27,2018 (45) Date of Patent: 

(58) Field of Classification Search CPC ...... G03F 7/004; G03F 7/0045; G03F 7/0382; G03F 7/0397; C07C 381/12; C08F 220/30; H0lL 21/0271 USPC 430/270.1, 322, 325, 329, 330, 913; 526/319, 326, 346; 560/129, 14, 15, 19; 562/625 

## (56) References Cited 

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Machine translation of JP 2007-291032 (no date).* 

International Search Report dated Sep. 16, 2014 issued by Interna› tional Searching Authority in counterpart International Patent Application No. PCT/JP2014/065498 (PCT/ISA/210). 

Written Opinion dated Sep. 16, 2014 issued by International Search› ing Authority in counterpart International Patent Application No. PCT/JP2014/065498 (PCT/ISA/237). 

Primary Examiner - Amanda C. Walke 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) repre› sented by General Formula (I) or (II): 

in the formulae, each ofY$_{1 }$ and Y$_{2 }$ represents a monovalent organic group; each of M$_{1 }$ + and M$_{2 }$ + represents an organic onium ion; each of X$_{1 }$ and X$_{2 }$ represents a group that is represented by -S-, -NH-, or -NR 1 -; R $^{1 }$represents a monovalent organic group; each of nl and n2 represents an integer of 1 or more; and R 1 and Y $_{1 }$ or Y $_{2 }$ may bond with each other to form a ring. 

See application file for complete search history. 

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US009904167B2 

(2013.01); C07C 2601/08 (2017.05); C07C 2601/14 (2017.05); C07C 2602/42 (2017.05); 

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## U.S. PATENT DOCUMENTS 

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## FOREIGN PATENT DOCUMENTS 

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## OTHER PUBLICATIONS 

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## 17 Claims, No Drawings 

