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# c12) United States Patent 

# Hatakeyama et al. 

# (54) RESIST COMPOSITION AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventors: Jun Hatakeyama, Joetsu (JP); Masaki Ohashi, Joetsu (JP) 

(73) Assignee: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

( * ) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by 298 days. 

(21) Appl. No.: 16/006,063 

(22) Filed: Jun. 12, 2018 

## (65) Prior Publication Data 

US 2018/0373150 Al Dec. 27, 2018 

## (30) Foreign Application Priority Data 

Jun. 21, 2017 (JP) ................................. 2017-121568 

(51) Int. Cl. 

<img src='content_image/898733.jpg'>

(52) U.S. Cl. CPC .......... G03F 710382 (2013.01); C08F 212114 (2013.01); C08F 220116 (2013.01); G03F 710045 (2013.01); G03F 710392 (2013.01); G03F 710397 (2013.01); G03F 71162 (2013.01); G03F 71168 (2013.01); G03F 712004 (2013.01); G03F 712006 (2013.01); G03F 712037 (2013.01); G03F 71322 (2013.01); G03F 7138 (2013.01); C08F 12/24 (2013.01); C08F 2800/20 (2013.01) 

<img src='content_image/898729.jpg'>

# (IO) Patent No.: US 10,802,400 B2 

# Oct. 13, 2020 (45) Date of Patent: 

(58) Field of Classification Search CPC .... G03F 7/0392; G03F 7/0397; G03F 7/0382; G03F 7/2002; G03F 7/2004; G03F 7/2006; G03F 7/039; G03F 7/038; C08F 212/14; C08F 212/21 USPC ....................................................... 430/270.1 See application file for complete search history. 

## (56) References Cited 

<img src='content_image/898731.jpg'>

## FOREIGN PATENT DOCUMENTS 

<img src='content_image/898732.jpg'>

Yamamoto et al., "Polymer-Structure Dependence of Acid Genera› tion in Chemically Amplified Extreme Ultraviolet Resists", Japa› nese Journal of Applied Physics, 2007, vol. 46, No. 7, pp. Ll42- Ll44 (3 pages). 

* cited by examiner 

Primary Examiner - John A McPherson (74) Attorney, Agent, or Firm - Westerman, Hattori, Daniels & Adrian, LLP 

## (57) ABSTRACT 

A resist compos1t10n compnsmg a polymer-bound acid generator, i.e., a polymer comprising recurring units derived from a sulfonium or iodonium salt having a brominated linker between a polymerizable unsaturated bond and a fluorosulfonic acid offers a high sensitivity and reduced LWR or improved CDU independent of whether it is of positive or negative tone. 

USO 10802400B2 

## U.S. PATENT DOCUMENTS 

## OTHER PUBLICATIONS 

## 12 Claims, No Drawings 

