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Resist compositions were prepared by dissolving the polymer and selected components in a solvent in accordance with the recipe shown in Tables 1 and 2, and filtering through a filter having a pore size of 0.2 µm. The solvent contained 100 ppm of surfactant FC-4430 (3M). The com- ponents in Tables 1 and 2 are as identified below. Organic Solvents: 

PGMEA (propylene glycol monomethyl ether acetate) GBL (y-butyrolactone) CyH (cyclohexanone) PGME (propylene glycol monomethyl ether) 

## Examples and Comparative Examples 

Polymer 2 Mw~ 8,100 

Polymer 3 Mw~7,900 Mw/Mn~ 1.83 

## Acid Generators: 

PAG 1 to PAG 4 of the following structural formulae 

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