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4. A method of forming a pattern, comprising the steps of forming the actinic-ray- or radiation-sensitive resin compo› sition according to claim 1 into a film, exposing the film and developing the exposed film. 

5. The method of forming a pattern according to claim 4, wherein the exposure is carried out by use of X-rays, electron beams or EUV. 

6. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1, wherein in general formula (I), the three -(A-B) groups are the same. 

7. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1, wherein in general formula (I), A represents a single bond. 

8. An actinic ray-sensitive or radiation-sensitive resin com- position comprising any of the compounds of general formula (I) below, a resin soluble in an alkali developer and an acid crosslinking agent capable of crosslinking with the resin soluble in an alkali developer by the action of an acid; 

wherein: 

Ar represents a benzene ring that may have a substituent other than the -(A-B) groups and two a-positions of the benzene ring are substituted with the -(A-B) groups; 

n is an integer of 2 to 5; 

A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, ---0-, -S-, ----C(=O)-, -S(=O)-, -S(=0)$_{2}$ - and -OS(=0)$_{2}$-, provided that ----C(=O)O-is excluded; 

B represents a group containing a noncyclic hydrocarbon group having 5 or more carbon atoms or a cycloaliphatic group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, 

the two or more -(A-B) groups may be identical to or different from each other; and 

M+ represents an organic onium ion. 

9. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 8, wherein in the general formula (I), B represents a cycloaliphatic group having 4 or more carbon atoms. 

10. A method of forming a pattern, comprising the steps of forming the actinic-ray- or radiation-sensitive resin compo› sition according to claim 8 into a film, exposing the film and developing the exposed film. 

11. The method of forming a pattern according to claim 10, wherein the exposure is carried out by use of X-rays, electron beams or EUV. 

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12. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 8, wherein in general formula (I), n=3. 

13. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 12, wherein in general for› mula (I), the three -(A-B) groups are substituted at two a-po› sitions and one p-position of the benzene ring. 

14. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 12, wherein in general for- mula (I), the three -(A-B) groups are the same. 

15. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 8, wherein in general formula (I), A represents a single bond. 

16. A compound of general formula (I) below; 

wherein: 

Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; 

n is an integer of 2 to 5; 

A represents a single bond; 

B represents a group containing a cycloaliphatic group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, 

the two or more -(A-B) groups may be identical to or different from each other; and 

M+ represents an organic onium ion, and 

wherein a substituent other than -(A-B) groups which aro› matic ring Ar in general formula (I) may have is selected from a group consisting of: 

alkoxy group, an aryloxy group, an alkylthioxy group, an arylthioxy group, an alkoxycarbonyl group, a phenoxycarbo- nyl group, and acetoxy group, a liner or branched alkyl group, an alkenyl group, an alkynyl group, an aryl group, an acyl group, a hydroxyl group, a carboxyl group and a sulfonate group. 

17. A compound of general formula (I) according to claim 16, wherein two a-positions of the benzene ring are substi› tuted with the -(A-B) groups. 

18. A compound of general formula (I) according to claim 16, wherein, n=3. 

19. A compound of general formula (I) according to claim 16, wherein the three -(A-B) groups are substituted at two a-positions and one p-position of the benzene ring. 

20. A compound of general formula (I) according to claim 16, wherein the three -(A-B) groups are the same. 

21. A compound of general formula (I) according to claim 16, wherein the aromatic ring represented by Ar has no sub› stituent other than the -(A-B) groups. 

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