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# c19) United States c12) Patent Application Publication 

# Cui et al. 

# (54) SILICON-CONTAINING UNDERLAYERS 

(71) Applicant: Rohm and Haas Electronic Materials LLC, Marlborough, MA (US) 

(72) Inventors: Li Cui, Westborough, MA (US); Paul J. LaBeaume, Auburn, MA (US); James F. Cameron, Brookline, MA (US); Charlotte A. Cutler, Hopkinton, MA (US); Shintaro Yamada, Shrewsbury, MA (US); Suzanne M. Coley, Mansfield, MA (US); Iou-Sheng Ke, Andover, MA (US) 

(21) Appl. No.: 16/022,874 

(22) Filed: Jun. 29, 2018 

(60) Provisional application No. 62/541,139, filed on Aug. 4, 2017. 

## Related U.S. Application Data 

<img src='content_image/927740.jpg'>

(51) Int. Cl. 

(52) U.S. Cl. CPC .............. G03F 7111 (2013.01); C08F 230/08 (2013.01); C09D 143104 (2013.01); G03F 71162 (2013.01); G03F 7140 (2013.01); G03F 71322 (2013.01); G03F 71422 (2013.01); G03F 71168 (2013.01); G03F 712002 (2013.01) 

## (57) ABSTRACT 

Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising one or more condensed polymers having an organic polymer chain having pendently-bound moieties having an acidic proton and a pKa in water from -5 to 13 and having pendently› bound siloxane moieties are provided. 

US 20190041751Al 

# c10) Pub. No.: US 2019/0041751 Al 

# (43) Pub. Date: Feb. 7, 2019 

## Publication Classification 

<img src='content_image/927757.jpg'>

