content_image/886423.jpg content_image/886424.jpg content_image/886421.jpg content_image/886422.jpg content_image/886425.jpg
ing is not essential. If rinsing is omitted, the amount of solvent used may be reduced. 

[0184] A hole or trench pattern after development may be shrunk by the thermal flow, RELACSfi or DSA process. A hole pattern is shrunk by coating a shrink agent thereto, and baking such that the shrink agent may undergo crosslinking at the resist surface as a result of the acid catalyst diffusing from the resist layer during bake, and the shrink agent may attach to the sidewall of the hole pattern. The bake is preferably at a temperature of 70 to 180° C., more preferably 80 to 170° C., for a time of 10 to 300 seconds. The extra shrink agent is stripped and the hole pattern is shrunk. 

[0185] Examples of the invention are given below by way of illustration and not by way of limitation. All parts are by weight (pbw). Mw and Mw/Mn are determined by GPC versus polystyrene standards using THF solvent. 

[1] Synthesis of Monomers 

[0186] Synthesis of Monomer 1 

[0187] Monomer 1 of the following formula was prepared by esterification reaction of 5-iodoanthranilic acid with 2-hydroxyethyl methacrylate in triethylamine containing carbodiimide hydrochloride as a condensing agent and 4,4- dimethyiaminopyridine (DMAP) as a catalyst and purifying by silica gel colunm chromatography. 

[0188] Synthesis of Monomer 2 

[0189] Monomer 2 of the following formula was obtained by the same procedure as in Synthesis Example 1-1 aside from using 3,5-diiodoanthranilic acid instead of 5-iodoan› thranilic acid. 

<img src='content_image/886423.jpg'>

<img src='content_image/886424.jpg'>

## EXAMPLES 

## Synthesis Example 1-1 

## Synthesis Example 1-2 

[0190] Synthesis of Monomer 3 

[0191] Monomer 3 of the following formula was obtained by the same procedure as in Synthesis Example 1-1 aside from using iodopanoic acid instead of 5-iodoanthranilic acid. 

<img src='content_image/886421.jpg'>

[0192] Synthesis of Monomer 4 

[0193] Monomer 4 of the following formula was obtained by the same procedure as in Synthesis Example 1-1 aside from using diatrizoic acid instead of 5-iodoanthranilic acid. 

<img src='content_image/886422.jpg'>

[2] Synthesis of Polymers 

[0194] PAG Monomers 1 to 3 and ALG Monomers (i.e., acid labile group-containing monomers) 1 to 3 identified below were used in the synthesis of polymers. 

<img src='content_image/886425.jpg'>

## Synthesis Example 1-3 

## Synthesis Example 1-4 

