content_image/901151.jpg content_image/901172.jpg content_image/901173.jpg
# c19) United States c12) Patent Application Publication 

# TAKAHASHI et al. 

# (54) ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventors: Toshiya TAKAHASHI, Shizuoka (JP); Hiroo TAKIZAWA, Shizuoka (JP); Hideaki TSUBAKI, Shizuoka (JP); Shuji HIRANO, Shizuoka (JP); Tomotaka TSUCHIMURA, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

(21) Appl. No.: 14/039,435 

(22) Filed: Sep.27,2013 

( 63) Continuation of application No. PCT /JP2012/059300, filed on Mar. 29, 2012. 

## (30) Foreign Application Priority Data 

Mar. 30, 2011 (JP) ................................. 2011-076093 

## Related U.S. Application Data 

<img src='content_image/901151.jpg'>

(51) Int. Cl. G03F 71004 (2006.01) 

(52) U.S. Cl. CPC .................................... G03F 710045 (2013.01) USPC ........................... 430/18; 430/270.1; 430/296 

## (57) ABSTRACT 

Provided is an actinic-ray- or radiation-sensitive resin com› position including a resin (P) containing an acid-decompos› able repeating unit (A), which resin when acted on by an acid, increases its solubility in an alkali developer, a compound (Q) that when exposed to actinic rays or radiation, generates an acid, and a compound (R) expressed by general formula (1) or (2) below. 

US 20140030643Al 

# c10) Pub. No.: US 2014/0030643 Al 

# (43) Pub. Date: Jan. 30, 2014 

## Publication Classification 

<img src='content_image/901172.jpg'>

<img src='content_image/901173.jpg'>

