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# c12) United States Patent 

# Tsuchihashi et al. 

# (54) NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN 

(75) Inventors: Toru Tsuchihashi, Shizuoka (JP); Tadateru Yatsuo, Shizuoka (JP); Koji Shirakawa, Shizuoka (JP); Hideaki Tsubaki, Shizuoka (JP); Akira Asano, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 35 days. 

(21) Appl. No.: 13/146,976 

(22) PCT Filed: Jan.29,2010 

(86) PCT No.: PCT I JP2010/051652 § 371 (c)(l), (2), ( 4) Date: Aug. 11, 2011 

(87) PCT Pub. No.: WO2010/087516 

PCT Pub. Date: Aug. 5, 2010 

## (65) Prior Publication Data 

US 2011/0287234 Al Nov. 24, 2011 

(60) Provisional application No. 61/148,517, filed on Jan. 30, 2009. 

## (30) Foreign Application Priority Data 

<img src='content_image/894571.jpg'>

(51) Int. Cl. G03C 5100 (2006.01) 

(52) U.S. Cl. USPC ........ 430/296; 430/270.1; 430/311; 430/325; 430/330; 430/331; 430/942 

( 58) Field of Classification Search USPC .............. 430/270.1, 296,311,325,330,331, 430/942 See application file for complete search history. 

## (56) References Cited 

<img src='content_image/894572.jpg'>

## Related U.S. Application Data 

## U.S. PATENT DOCUMENTS 

<img src='content_image/894583.jpg'>

# (IO) Patent No.: US 8,637,222 B2 

# (45) Date of Patent: Jan.28,2014 

<img src='content_image/894569.jpg'>

## FOREIGN PATENT DOCUMENTS 

<img src='content_image/894570.jpg'>

Extended European Search Report dated Oct. 29, 2012 in European Application No. 10735970.5. 

Search Report from the International Searching Authority, dated Mar. 2, 2010, issued in Application No. PCT/JP2010/051652, English. Written Opinion from the International Searching Authority, dated Mar. 2, 2010, issued in Application No. PCT/JP2010/051652, English. 

Office Action dated Nov. 26, 2013, issued by the Japanese Patent Office, in counterpart Japanese Application No. 2010-017489. 

* cited by examiner 

Primary Examiner - Christopher Young 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

A resist pattern forming method including in the following order, (1) a step of forming a film by using a negative chemi› cal-amplification resist composition capable of undergoing negative conversion by a crosslinking reaction, (2) a step of exposing the film, and (4) a step of developing the exposed film by using a developer containing an organic solvent; a developer and a negative chemical-amplification resist com› position used therefor; and a resist pattern formed by the pattern forming method. 

US00863 7222B2 

## OTHER PUBLICATIONS 

## 16 Claims, No Drawings 

