content_image/914255.jpg content_image/914256.jpg content_image/914257.jpg
methyl ethyl ketone, methyl amyl ketone, methyl isobutyl ketone, acetyl acetone, acetonyl acetone, ionone, diacetonyl alcohol, acetyl carbinol, acetophenone, methyl naphthyl ketone, isophorone and propylene carbonate. Among these, an alkyl ketone-based solvent such as methyl isobutyl ketone, methyl amyl ketone, cyclopentanone and cycloheptane is preferred. 

Examples of the alcohol-based solvent include an alcohol such as methyl alcohol, ethyl alcohol, n-propyl alcohol, iso› propyl alcohol, n-butyl alcohol, sec-butyl alcohol, tert-butyl alcohol, isobutyl alcohol, hexyl alcohol (e.g., n-hexyl alco› hol), heptyl alcohol (e.g., n-heptyl alcohol), octyl alcohol ( e.g., n-octyl alcohol) and decanol ( e.g., n-decanol); a glycol› based solvent such as ethylene glycol, diethylene glycol, triethylene glycol, 1,2-propylene glycol, 1,3-propylene gly› col, 1,2-butylene glycol, 1,3-butylene glycol and 1,4-buty› lene glycol; an alkylene glycol monoalkyl ether-based sol› vent such as ethylene glycol monomethyl ether, propylene glycol monomethyl ether (PGME; another name: 1-methoxy- 2-propanol), ethylene glycol monoethyl ether, propylene gly› col monoethyl ether, di ethylene glycol monomethyl ether and triethylene glycol monoethyl ether; a glycol ether-based sol› vent such as methoxymethyl butanol and propylene glycol dimethyl ether; and a phenol-based solvent such as phenol and cresol. Among these, 1-hexanol, 2-hexanol, 1-octanol, 2-ethyl-hexanol, propylene glycol monomethyl ether and cresol are preferred. 

Examples of the amide-based solvent which can be used include N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide, hexamethylphosphoric triamide and 1,3-dimethyl-2-imidazolidinone. 

Examples of the ether-based solvent include, in addition to the alkylene glycol monoalkyl ether-based solvents and gly- col ether-based solvents above, dioxane, tetrahydrofuran and tetrahydropyran. 

Examples of the hydrocarbon-based solvent include an aromatic hydrocarbon-based solvent such as toluene and xylene, and an aliphatic hydrocarbon-based solvent such as pentane, hexane, octane, decane and dodecane. 

The developer preferably contains one or more kinds of solvents selected from an alkylene glycol monoalkyl ether carboxylate-based solvent, an alkylene glycol monoalkyl ether-based solvent, an alkyl carboxylate-based solvent and an alkyl ketone-based solvent, more preferably one or more kinds of solvents selected from propylene glycol monom› ethyl ether, propylene glycol monomethyl ether acetate, methyl isobutyl ketone, methyl amyl ketone, cyclopentanone, cyclohexanone, ethyl lactate and butyl acetate. 

The developer is preferably a developer containing at least one kind of an organic solvent selected from the group con› sisting of an ester-based solvent containing no hydroxyl group in the molecule, a ketone-based solvent containing no hydroxyl group in the molecule, and an ether-based solvent containing no hydroxyl group in the molecule. 

More specifically, the developer is preferably a developer containing an organic solvent that does not contain a hydroxyl group in the molecule, represented by any one of the follow- ing formulae (Sl) to (S3): 

<img src='content_image/914255.jpg'>

<img src='content_image/914256.jpg'>

<img src='content_image/914257.jpg'>

In formulae (S 1) to (S3 ), each of R and R’ independently represents an alkyl group, a cycloalkyl group, an alkoxyl group, an alkoxycarbonyl group, a cyano group or a halogen atom. The carbon number of the alkyl group, cycloalkyl group, alkoxy group and alkoxycarbonyl group is usually from 1 to 6. Rand R’ may combine with each other to form a ring (preferably a 5- or 6-membered ring). These groups and the ring formed by combining R and R’ with each other may be further substituted by a carbonyl group-containing group (e.g., acyl, aldehyde), a cyano group, an alkoxy group, an alkyl ester group or the like. 

The organic solvent having no hydroxyl group in the mol› ecule is preferably an ester-based solvent such as methyl acetate, butyl acetate, ethyl acetate, isopropyl acetate, amyl acetate, ethyl-3-ethoxypropionate, propylene glycol diac› etate, 3-methoxybutyl acetate and 3-methyl-3-methoxybutyl acetate, a ketone-based solvent other than a ketone-based solvent having a hydroxyl group in the molecule, such as diacetonyl alcohol and acetyl carbinol, out of the above› described ketone-based solvents, or an ether-based solvent such as dioxane, tetrahydrofuran and tetrahydropyran, and it is more preferred to contain one or more members selected from methyl isobutyl ketone, methyl amyl ketone, cyclohex- anone and butyl acetate. 

A plurality of these solvents may be mixed, or the solvent may be mixed with a solvent other than those described above or with water. 

The concentration of the organic solvent (in the case of mixing a plurality of solvents, the total concentration) in the developer is preferably 50 mass % or more, more preferably 70 mass % or more, still more preferably 90 mass % or more. It is particularly preferred that the developer is substantially composed of only an organic solvent. Here, the expression "substantially composed of only an organic solvent" includes a case where the developer contains a small amount of a surfactant, an antioxidant, a stabilizer, a defoaming agent or the like. 

The percentage of water content in the developer is pref› erably 10 mass % or less, more preferably 5 mass % or less, still more preferably 3 mass% or less, and it is most preferred to contain substantially no water. By virtue of setting the percentage of water content to 10 mass % or less, good development characteristics can be obtained. 

Surfactant: 

In the developer containing an organic solvent, an appro› priate amount of a surfactant can be added, if desired. 

As for the surfactant, the same as the later-described sur› factant used in the resist composition may be used. 

The amount of the surfactant used is usually from 0.001 to 5 mass %, preferably from 0.005 to 2 mass %, more prefer› ably from 0.01 to 0.5 mass %, based on the entire amount of the developer. 

Developing Method: 

As regards the developing method, for example, a method of dipping the substrate in a bath filled with the developer for a fixed time ( dipping method), a method of raising the devel- aper on the substrate surface by the effect of a surface tension and keeping it still for a fixed time, thereby performing the development (puddle method), a method of spraying the 

-continued 

