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# c19) United States c12) Patent Application Publication 

# Fukushima et al. 

# (54) MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventors: Masahiro Fukushima, Joetsu-shi (JP); Masaki Ohashi, Joetsu-shi (JP); Kazuhiro Katayama, Joetsu-shi (JP) 

(73) Assignee: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(21) Appl. No.: 16/858,092 

(22) Filed: Apr. 24, 2020 

## (30) Foreign Application Priority Data 

May 27, 2019 (JP) ................................. 2019-098585 

<img src='content_image/901943.jpg'>

(51) Int. Cl. 

(52) U.S. Cl. CPC ................ G03F 71004 (2013.01); G03F 7120 (2013.01) 

## (57) ABSTRACT 

A molecular resist composition is provided comprising (A) a betaine type onium compound having a sulfonium cation moiety and a sulfonate anion moiety in a common molecule, the sulfonium cation moiety having a phenyl group substi› tuted with an optionally heteroatom-containing monovalent hydrocarbon group, the phenyl group being attached to the sulfur atom, and (B) an organic solvent, the resist compo› sition being free of a base resin. When processed by lithog› raphy using KrF, ArF excimer laser, EB or EUV, the resist composition is improved in dissolution contrast, EL, MEF, and LWR. 

US 20200379345Al 

# c10) Pub. No.: US 2020/0379345 Al 

# (43) Pub. Date: Dec. 3, 2020 

## Publication Classification 

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