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# c12) United States Patent Takizawa et al. 

# (54) PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventors: Hiroo Takizawa, Shizuoka (JP); Takuya Tsuruta, Shizuoka (JP); Tomotaka Tsuchimura, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 15/011,863 

(22) Filed: Feb. 1, 2016 

## (65) Prior Publication Data 

US 2016/0147155 Al May 26, 2016 

(63) Continuation of application PCT/JP2014/066448, filed on Jun. 20, 2014. No. 

## (30) Foreign Application Priority Data 

Aug. 1, 2013 (JP) ................................. 2013-160616 

(51) Int. Cl. 

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(52) U.S. Cl. CPC .............. G03F 71325 (2013.01); C08F 12122 (2013.01); C08F 12132 (2013.01); G03F 710045 (2013.01); G03F 710046 (2013.01); G03F 71038 (2013.01); G03F 710382 (2013.01); G03F 710388 (2013.01); G03F 710392 (2013.01); G03F 710397 (2013.01); G03F 712004 (2013.01); G03F 712059 (2013.01) 

( 58) Field of Classification Search None 

See application file for complete search history. 

## (56) References Cited 

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## Related U.S. Application Data 

## U.S. PATENT DOCUMENTS 

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# (IO) Patent No.: US 9,829,796 B2 

# Nov. 28, 2017 (45) Date of Patent: 

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Google English translation for WO 2013/129864 Al (2013).* 

Preliminary Report (PCT/IB/373) dated Feb. 2, 2016, issued by the International Searching Authority in counterpart International Application No. PCT/JP2014/066448. 

Translation ofWritten Opinion (PCT/ISA/237) dated Aug. 19, 2014, issued by the International Searching Authority in counterpart International Application No. PCT/JP2014/066448. 

Search Report dated Aug. 19, 2014, issued by the International Searching Authority in counterpart International Application No. PCT/JP2014/066448 (PCT/ISA/210). 

Written Opinion dated Aug. 19, 2014, issued by the International Searching Authority in counterpart International Application No. PCT/JP2014/066448 (PCT/ISA/237). 

Office Action dated Oct. 25, 2016 issued by the Japanese Patent Office in counterpart Japanese Patent Application No. 2013-160616. Office Action dated Feb. 17, 2017, issued by the Korean Intellectual Property Office in counterpart Korean Application No. 10-2016- 7002776. 

Notification of Reason for Refusal, dated Aug. 28, 2017, issued in corresponding KR Application No. 10-2016-7002776, 17 pages in English and Korean. 

Office Action dated Sep. 6, 2017 in corresponding Taiwanese Application No. 103125994. 

* cited by examiner 

Primary Examiner - Sin Lee 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

There are provided A pattern formation method, including: 

(1) forming a film using an active light-sensitive or radiation-sensitive resin composition; 

(2) exposing the film to active light or radiation; and 

(3) developing the exposed film using a developer includ› ing an organic solvent, 

wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific 3 repeating units. 

US009829796B2 

## FOREIGN PATENT DOCUMENTS 

## OTHER PUBLICATIONS 

## 54 Claims, No Drawings 

