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substituted on the alkyl group includes a halogen atom, an alkyl group, a hydroxyl group with a hydrogen atom being substituted for, and an amino group with a hydrogen atom being substituted for. 

Examples of the substituent for the hydrogen atom include an alkyl group, a cycloalkyl group, an aralkyl group, a sub› stituted methyl group, a substituted ethyl group, an alkoxy› carbonyl group, and an aralkyloxycarbonyl group. The alkyl group is preferably an alkyl group having a carbon number of 1 to 4; the substituted methyl group is preferably a meth- oxymethyl group, a methoxythiomethyl group, a benzy› loxymethyl group, a tert-butoxymethyl group or a 2-meth› oxyethoxymethyl group; the substituted ethyl group is preferably a 1-ethoxyethyl group or a l-methyl-1-methoxy› ethyl group; the acyl group is preferably an aliphatic acyl group having a carbon number of 1 to 6, such as formyl group, acetyl group, propionyl group, butyryl group, isobutyryl group, valeryl group and pivaloyl group; and the alkoxycar› bonyl group includes, for example, an alkoxycarbonyl group having a carbon number of 1 to 4. 

The resin (P) may or may not contain a repeating unit having an alicyclic hydrocarbon structure free from a polar group and not exhibiting acid decomposability, but in the case of containing this repeating unit, the content thereof is pref› erably from 1 to 20 mo! %, more preferably from 5 to 15 mo! 25 %, based on all repeating units in the resin (P). 

Specific examples of the repeating unit having an alicyclic hydrocarbon structure free from a polar group and not exhib› iting acid decomposability are illustrated below, but the present invention is not limited thereto. In the formulae, Ra represents H, CH$_{3}$ , CH$_{2}$0H or CFy 

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From the standpoint of elevating Tg, improving dry etching resistance and producing an effect such as internal filter for out-of-band-light, the resin (P) may contain the following monomer component. 

-continued 

