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Rs, R 6 , and R $^{7 }$are each independently an unsubstituted or substituted Ci-i$_{4 }$ hydrocarbyl, wherein two of Rs, R 6 , and R $^{7 }$can be connected to form a cyclic structure; and wherein the total number of carbon atoms in Rs, R 6 , and R 7 does not exceed 16; 

xi is independently at each occurrence Ci-i$_{2 }$ alkyl, or C$_{2}$_i 2 alkoxy carbonyl; and 

z- is an anion comprising a sulfonate group, a sulfona› midate group, a sulfonimidate group, a methide group, or a borate group. 

6. The photoacid-generating compound of claim 1, having the structure 

<img src='content_image/888547.jpg'>

wherein 

q is 0, 1, 2, or 3; 

xi is independently at each occurrence an unsubstituted or substituted Ci-is alkyl; and 

z- is an anion comprising a sulfonate group, a sulfona› midate group, a sulfonimidate group, a methide group, or a borate group. 

7. The photoacid-generating compound of claim 1, wherein one of R i or R 2 or z-, or one occurrence of X, or one occurrence ofY, is a polymerizable group, provided that if one occurrence ofX is the polymerizable group, then n is 1, 2, or 3, and provided that if one occurrence of Y is the polymerizable group, then mis 1, 2, or 3. 

8. A polymer comprising repeat units derived from the photoacid-generating compound of claim 7. 

9. A photoresist composition comprising the photoacid› generating compound of any one of claims 1 to 6. 

10. A method of forming a photoresist relief image, comprising: 

(a) applying a layer of the photoresist composition of claim 9 on a substrate to form a photoresist layer; 

(b) pattern-wise exposing the photoresist layer to activat› ing radiation to form an exposed photoresist layer; and 

( c) developing the exposed photoresist layer to provide a photoresist relief image. 

11. A photoresist composition comprising the polymer of claim 8. 

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