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# c19) United States c12) Patent Application Publication 

# Hatakeyama et al. 

# (54) RESIST COMPOSITION AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventors: Jun Hatakeyama, Joetsu-shi (JP); Masaki Ohashi, Joetsu-shi (JP) 

(73) Assignee: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(21) Appl. No.: 16/142,918 

(22) Filed: Sep. 26, 2018 

## (30) Foreign Application Priority Data 

Oct. 13, 2017 (JP) ................................. 2017-199418 

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(51) Int. Cl. 

(52) U.S. Cl. CPC .......... G03F 710045 (2013.01); G03F 710392 (2013.01); G03F 710382 (2013.01); G03F 71162 (2013.01); G03F 712004 (2013.01); G03F 7138 (2013.01); G03F 71322 (2013.01); G03F 712006 (2013.01); G03F 712037 (2013.01); G03F 71168 (2013.01) 

## (57) ABSTRACT 

A resist composition comprising a base polymer and a sulfonium salt of thiophenecarboxylic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone. 

US 20190113844Al 

# c10) Pub. No.: US 2019/0113844 Al 

# (43) Pub. Date: Apr. 18, 2019 

## Publication Classification 

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