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# c12) United States Patent 

# Oh et al. 

# (54) PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION 

(75) Inventors: Jung Hoon Oh, Cheonan-si (KR); Sang Jin Kim, Asan-si (KR); Jin Ho Kim, Asan-si (KR); Dae Hyeon Shin, Seoul (KR) 

(73) Assignee: Korea Kumho Petrochemical Co., Ltd., Seoul (KR) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by 128 days. 

(21) Appl. No.: 12/416,988 

(22) Filed: Apr. 2, 2009 

## (65) Prior Publication Data 

US 2010/0143843 Al Jun. 10, 2010 

## (30) Foreign Application Priority Data 

Dec. 4, 2008 (KR) ........................ 10-2008-0122403 

(51) Int. Cl. 

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<img src='content_image/887983.jpg'>

# (IO) Patent No.: US 8,283,102 B2 

# Oct. 9, 2012 (45) Date of Patent: 

(52) U.S. Cl. ..................... 430/270.1; 430/326; 430/330; 430/905; 430/910; 430/921; 526/282; 526/286; 560/221 

(58) Field of Classification Search ............... 430/270.1, 430/326, 330,910,921; 526/282, 286; 560/221 See application file for complete search history. 

## (56) References Cited 

<img src='content_image/887975.jpg'>

* cited by examiner 

Primary Examiner - John Chu 

(74) Attorney, Agent, or Firm - Ladas & Parry LLP 

## (57) ABSTRACT 

Disclosed are a photoacid generator, a copolymer, a chemi› cally amplified resist composition, and a method of forming a pattern using the chemically amplified resist composition. The photoacid is connected with a main chain of the copoly› mer, whereby the photoacid is equally dispersed within a resist layer, and characteristics of line edge roughness of a resist pattern is improved. 

US008283102B2 

## U.S. PATENT DOCUMENTS 

## 14 Claims, 28 Drawing Sheets 

