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(1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; 

(2) a process of exposing the film with an electron beam or an EUV ray; and 

( 4) a process of developing the film with a developer con› taining an organic solvent, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises: 

(A) the resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility in an organic solvent by the action of an acid; 

(B) a compound generating an acid upon irradiation with 15 an actinic ray or radiation; and 

(C) a solvent; and further wherein the resin (A) is a resin containing from 1 to 40 mo! % of a repeating unit represented by the following formula (1 ): 

<img src='content_image/913324.jpg'>

wherein 

A represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, or a cyano group; 

R represents a halogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group, an aralkyl group, an alkoxy group, an alkylcarbonyloxy group, an alkyl› sulfonyloxy group, an alkyloxycarbonyl group or an aryloxycarbonyl group, and when two or more R’s are present, each R may be the same as or different from every other R or when two or more R’s are present, they may form a ring in combination with each other; 

a represents an integer of 1 to 3; and 

b represents an integer ofO to (3-a). 

2. The pattern-forming method as claimed in claim 1, fur› ther comprising: 

a process of developing the film with an alkali aqueous solution. 

3. The pattern-forming method as claimed in claim 1, wherein the organic solvent contained in the developer used in the process ( 4) is one or more solvents selected from the group consisting of an ester solvent, a ketone solvent, an alcohol solvent, an amide solvent, an ether solvent, and a hydrocarbon solvent. 

4. The pattern-forming method as claimed in claim 1, wherein the organic solvent contained in the developer used in the process (4) is a solvent represented by the following formula (Sl): 

wherein 

each of R and R’ independently represents a hydrogen 65 atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, a carboxyl group, a 

<img src='content_image/913358.jpg'>

hydroxyl group, a cyano group, or a halogen atom, and R and R’ may be bonded to each other to form a ring. 

5. The pattern-forming method as claimed in claim 3, wherein the organic solvent contained in the developer used in the process (4) is a solvent represented by the following formula (S2): 

<img src='content_image/913354.jpg'>

wherein 

each of R" and R"" independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, a carboxyl group, a hydroxyl group, a cyano group, or a halogen atom, and R" and R"" may be bonded to each other to form a ring; and R"’ represents an alkylene group or a cycloalkylene group. 

6. The pattern-forming method as claimed in claim 1, wherein the organic solvent contained in the developer used in the process ( 4) is one or more solvents selected from the group consisting ofbutyl acetate, pentyl acetate, isopen› tyl acetate, propylene glycol monomethyl ether acetate, and anisole. 

7. The pattern-forming method as claimed in claim 1, fur› ther comprising: 

(5) a process of rinsing the film with a rinsing liquid con› taining an organic solvent after the process (4). 

8. The pattern-forming method as claimed in claim 7, wherein the organic solvent contained in the rinsing liquid used in the process ( 5) is one or more solvents selected from the group consisting of a monohydric alcohol and a hydro› carbon solvent. 

9. The pattern-forming method as claimed in claim 7, wherein the organic solvent contained in the rinsing liquid used in the process ( 5) is one or more solvents selected from the group consisting of 1-hexanol, 4-methyl-2-pentanol, and decane. 

10. The pattern-forming method as claimed in claim 1, further comprising: 

(3) a baking process between the exposure process (2) and the development process (4). 

11. The pattern-forming method as claimed in claim 1, wherein the resin (A) further contains a repeating unit represented by the following formula (AI): 

<img src='content_image/913323.jpg'>

wherein 

Xa$_{1 }$ represents a hydrogen atom or an alkyl group; 

T represents a single bond or a divalent linking group; and each ofRxi, Rx$_{2 }$and Rx$_{3 }$independently represents an alkyl group or a cycloalkyl group, and Rx$_{2 }$ and Rx$_{3 }$ may be bonded to each other to form a cyclic structure. 

