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The photoacid generator can be used singly or in combi› nation of two or more kinds thereof. When the photoacid generator is used in combination of two or more kinds thereof, it is preferable to combine compounds that generate two different kinds of organic acids having the total number of atoms excluding hydrogen atoms of 2 or more. 

The content of the photoacid generator is preferably 0.1 % to 20% by mass, more preferably 0.5% to 10% by mass, and still more preferably 1 % to 7% by mass, with respect to the total solid content of the actinic ray-sensitive or radiation› sensitive resin composition. By setting the content of the photoacid generator to the range, the exposure latitude when a resist pattern is formed is improved, or the crosslinking reactivity of the crosslinking layer forming material is improved. 

(C) Solvent 

The actinic ray-sensitive or radiation-sensitive resin com› position of the present invention may contain a solvent. Examples of the solvent which can be used when the respective components are dissolved to prepare an actinic ray-sensitive or radiation-sensitive resin composition include organic solvents such as alkylene glycol monoalkyl ether carboxylate, alkylene glycol monoalkyl ether, alkyl lactate ester, alkyl alkoxypropionate, a cyclic lactone having 4 to 10 carbon atoms, a monoketone compound having 4 to 10 carbon atoms, which may have a ring, alkylene carbon› ate, alkyl alkoxyacetate, and alkyl pyruvate. 

Preferred examples of the alkylene glycol monoalkyl ether carboxylate include propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene gly› col monobutyl ether acetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether propi› onate, ethylene glycol monomethyl ether acetate, and eth› ylene glycol monoethyl ether acetate. 

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