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## Examples 1-1 to 1-20 and Comparative Examples 1-1 to 1-7 

A resist solution was prepared by selecting a carboxylic acid sulfonium salt (Q-1 to Q-7, prepared in the above Syn- thesis Examples), polymer, PAG, and alkali-soluble surfac- tant SF-1 in accordance with the formulation shown in Table 5, dissolving the components in a solvent, and filtering through a Teflonfi filter having a pore size of 0.2 µm. The solvent contained 0.01 wt% of surfactant A. A comparative resist solution was prepared by the same procedure aside from using an amine compound oronium salt (Q-A to Q-G) instead of the carboxylic acid sulfonium salt. The formulation of comparative resist solution is also shown in Table 5. 

The solvent, PAG, alkali-soluble surfactant SF-1, surfac- tant A, and comparative quenchers (Q-A to Q-G) in Table 5 are identified below. 

PGMEA: propylene glycol monomethyl ether acetate 

GBL: y-butyrolactone 

PAG-X: triphenylsulfonium 2-(adamantane-l-carbonyloxy)- 1, 1,3,3,3-pentafluoropropane-l-sulfonate 

PAG-Y: triphenylsulfonium 2-(adamantane-l-carbonyloxy)- 3,3,3-trifluoro-2-trifluoromethy lpropane-1-sulfonate 

Surfactant SF-1: poly(2,2,3,3,4,4,4-heptafluoro-l-isobutyl- l-butyl methacrylate/9-(2,2,2-trifluoro-l-trifluoroethy- loxycarbonyl)-4-oxatricyclo-[ 4.2. l .0 $^{3}$-7Jnonan-5-on-2-yl methacrylate) of the structural formula shown below 

## TABLE4 

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