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# c12) United States Patent Takahashi et al. 

# (54) PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION 

(75) Inventors: Hidenori Takahashi, Shizuoka (JP); Tomotaka Tsuchimura, Shizuoka (JP); Toru Tsuchihashi, Shizuoka (JP); Katsuhiro Yamashita, Shizuoka (JP); Naoyuki Nishikawa, Kanagawa (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 70 days. 

(21) Appl. No.: 13/062,285 

(22) PCT Filed: Aug.26,2009 

(86) PCT No.: PCT I JP2009/065286 § 371 (c)(l), (2), ( 4) Date: Mar. 10, 2011 

(87) PCT Pub. No.: WO2010/026973 PCT Pub. Date: Mar. 11, 2010 

## (65) Prior Publication Data 

US 2011/0159433 Al Jun. 30, 2011 

(60) Provisional application No. 61/096,586, filed on Sep. 12, 2008. 

## (30) Foreign Application Priority Data 

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(51) Int. Cl. 

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## Related U.S. Application Data 

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# (IO) Patent No.: US 9,217,919 B2 

# (45) Date of Patent: Dec. 22, 2015 

(52) U.S. Cl. CPC .............. G03F 710392 (2013.01); C0SF 12120 (2013.01); C0SF 12122 (2013.01); C0SF 12130 (2013.01); C0SF 12132 (2013.01); C09D 125118 (2013.01); G03F 710045 (2013.01); G03F 710046 (2013.01) 

(58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

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Machine translation JP 2006-178317. Jul. 6, 2006. * 

Primary Examiner - Cynthia H Kelly 

Assistant Examiner - Alyssa L Cepluch 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

A radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradia› tion with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition. 

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US009217919B2 

## U.S. PATENT DOCUMENTS 

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## FOREIGN PATENT DOCUMENTS 

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## OTHER PUBLICATIONS 

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## 26 Claims, 1 Drawing Sheet 

