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# c19) United States c12) Patent Application Publication 

# Hatakeyama et al. 

# (54) RESIST COMPOSITION AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventors: Jun Hatakeyama, Joetsu-shi (JP); Koji Hasegawa, Joetsu-shi (JP); Masahiro Fukushima, Joetsu-shi (JP) 

(73) Assignee: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(21) Appl. No.: 16/005,988 

(22) Filed: Jun. 12, 2018 

## (30) Foreign Application Priority Data 

Jun. 21, 2017 (JP) ................................. 2017-121532 

(51) Int. Cl. 

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## Publication Classification 

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(52) U.S. Cl. CPC .............. G03F 71038 (2013.01); G03F 71162 (2013.01); G03F 71168 (2013.01); G03F 7138 (2013.01); G03F 71322 (2013.01); G03F 712004 (2013.01); C08F 2220/302 (2013.01); C08F 220116 (2013.01); G03F 71039 (2013.01); C08F 220130 (2013.01); C08F 212114 (2013.01); C08F 2800/10 (2013.01); G03F 712006 (2013.01) 

## (57) ABSTRACT 

A resist composition comprising a polymer comprising recurring units having an optionally substituted brominated phenol has advantages including high sensitivity, high reso› lution and reduced acid diffusion and forms a pattern of good profile with improved CDU. 

US 20180373148Al 

# c10) Pub. No.: US 2018/0373148 Al 

# (43) Pub. Date: Dec. 27, 2018 

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