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# c12) United States Patent 

# Hatakeyama et al. 

# (54) RESIST COMPOSITION AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventors: Jun Hatakeyama, Joetsu (JP); Masaki Ohashi, Joetsu (JP) 

(73) Assignee: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 15/375,353 

(22) Filed: Dec. 12, 2016 

## (65) Prior Publication Data 

US 2017 /0184962 Al Jun. 29, 2017 

## (30) Foreign Application Priority Data 

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(51) Int. Cl. 

<img src='content_image/908636.jpg'>

(52) U.S. Cl. CPC .......... G03F 710045 (2013.01); C07C 303132 (2013.01); G03F 710382 (2013.01); G03F 710397 (2013.01); G03F 71162 (2013.01); G03F 71168 (2013.01); G03F 712004 (2013.01); G03F 712006 (2013.01); G03F 712037 (2013.01); G03F 712041 (2013.01); G03F 71322 (2013.01) 

( 58) Field of Classification Search CPC ... G03F 7/0045; G03F 7/0397; C07C 303/32; C07C 63/08; C07C 279/02 

<img src='content_image/908614.jpg'>

# (IO) Patent No.: US 10,222,696 B2 

# Mar.5,2019 (45) Date of Patent: 

USPC ........ 430/270.1, 919, 920; 526/287, 292.95; 556/35, 36 See application file for complete search history. 

## (56) References Cited 

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## FOREIGN PATENT DOCUMENTS 

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Hinsberg et al., "Extendibility of Chemically Amplified Resists : Another Brick Wall?", SPIE, 2003, vol. 5039, pp. 1-14, (14 pages). Kishikawa et al., "Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithogra› phy", SPIE, 2007, vol. 6520, pp. 65203L 1-9, (9 pages). Wang et al., "Photobase generator and photo decomposable quencher for high-resolution photoresist applications", SPIE, 2010, vol. 7639, pp. 76390W 1-15, (15 pages). 

* cited by examiner 

Primary Examiner - John S Chu (74) Attorney, Agent, or Firm - Westerman, Hattori, Daniels & Adrian, LLP 

## (57) ABSTRACT 

A resist composition comprising a base polymer and a biguanide salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD. 

USO 10222696B2 

## U.S. PATENT DOCUMENTS 

## OTHER PUBLICATIONS 

## 16 Claims, No Drawings 

