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[0574] The method of forming a resist pattern according to the present invention is also applicable to a double exposure method or a double patterning method. 

[0575] As follows is a description of examples of the present invention, although the scope of the present invention is by no way limited by these examples. 

[0576] In the following examples, a unit represented by a chemical formula (1) is designated as "compound (1)", and the same applies for compounds represented by other formu› las. 

[0577] <Synthesis of Base Component (A)> 

[0578] Each of the polymeric compounds 1 to 6 used as the base component (A) in the present examples were synthe› sized by a conventional polymerization method, using com› pounds (1) to (7) as monomers for deriving the corresponding structural units of the polymeric compound with a predeter› mined molar ratio and charge ratio. 

[Chemical Formula 64] 

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## Polymer Synthesis Examples 1 to 6 

## Synthesis of Polymeric Compounds 1 to 6 

## EXAMPLES 

Compound (1) 

Compound (2) 

Compound (3) 

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[0579] For example, with respect to the polymeric com› pound 2, the weight average molecular weight (Mw) and the dispersity (Mw/Mn) were determined by the polystyrene equivalent value as measured by gel permeation chromatog› raphy (GPC). As a result, it was found that the weight average molecular weight was 7,900, and the dispersity was 1.80. Further, as a result of an analysis by carbon 13 nuclear mag› netic resonance spectroscopy (600 MHz, $^{13}$C-NMR), it was found that the composition of the copolymer (ratio (molar 

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Compound (4) 

Compound (5) 

Compound (6) 

Compound (7) 

