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# c19) United States c12) Patent Application Publication 

# UTSUMI et al. 

# (54) POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 

(75) Inventors: Yoshiyuki UTSUMI, Kawasaki-shi (JP); Makiko IRIE, Kawasaki-shi (JP) 

Correspondence Address: KNOBBE MARTENS OLSON & BEAR LLP 2040 MAIN STREET, FOURTEENTH FLOOR IRVINE, CA 92614 (US) 

(73) Assignee: TOKYO OHKA KOGYO CO., LTD., Kawasaki-shi (JP) 

(21) Appl. No.: 12/758,650 

(22) Filed: Apr. 12, 2010 

## (30) Foreign Application Priority Data 

Apr. 15, 2009 (JP) ................................. 2009-099218 

(51) Int. Cl. 

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(52) U.S. Cl. ...................................... 430/285.1; 430/326 

## Publication Classification 

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## (57) ABSTRACT 

A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator compo› nent (B) which generates acid upon exposure, the component (A) including a polymeric compound (Al) having a structural unit (a0) represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R 1 represents an acid dissociable, dissolution inhibiting group; and R $^{2 }$represents a divalent hydrocarbon group), and the acid generator (B) including an acid generator (Bl) having an anion moiety represented by general formula (I) (wherein X represents a hydrocarbon group of3 to 30 carbon atoms; Q 1 represents a divalent linking group containing an oxygen atom; and Y$^{1 }$represents an alkylene group of 1 to 4 carbon atoms or a fluorinatedalkylene group ofl to 4 carbon atoms). 

US 20100266955Al 

# c10) Pub. No.: US 2010/0266955 Al 

# (43) Pub. Date: Oct. 21, 2010 

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