content_image/912319.jpg content_image/912328.jpg content_image/912327.jpg content_image/912326.jpg content_image/912329.jpg
<img src='content_image/912319.jpg'>

wherein X 6 and X 7 represent a single bond, ----C(=O)- O-R 15 -, or ----C(=O)-NH-; X 8 and X 9 represent -C(=0)---0-R 15 -, where R $^{15 }$represents a single bond or a linear, branched or cyclic alkylene group having 1 to 10 carbon atoms; R$^{14 }$represents a cyano group, a nitro group, a halogen atom, or a linear, branched, or cyclic alkyl group, alkoxy group, acyl group, acyloxy group, or alkoxycarbonyl group having 1 to 5 carbon atoms; R$^{13 }$may be the same or different and represents a hydrogen atom or a methyl group; Y$^{1 }$and Y$^{2 }$represent a methylene group or an ethylene group; Z$^{1 }$represents a methylene group, an oxygen atom, or a sulfur atom; "p" represents 1 or 2; "q" represents an integer ofO to 4; and bl to b8 satisfy Osbl <1.0, Osb2<1.0, Osb3<1.0, Osb4<1.0, Osb5<1.0, Osb6<1.0, Osb7<1.0, Osb8<1.0, and O<bl +b2+b3+b4+b5+b6+b7 +b8<1.0. 

5. The resist composition according to claim 2, wherein the polymer compound is further copolymerized with one or more repeating units selected from repeating units cl to c5 shown by the following general formulae ( 4 ), 

<img src='content_image/912328.jpg'>

wherein R$^{16 }$to R$^{20 }$each represent a hydrogen atom, an alkyl group having 1 to 30 carbon atoms, an alkyl group partially or wholly substituted with a halogen atom, an alkoxy group, an alkanoyl group, an alkoxycarbonyl group, an aryl group having 6 to 10 carbon atoms, a halogen atom, or a 1,1,1,3, 3,3-hexafluoro-2-propanol group; Z $^{2 }$represents a methylene group, an oxygen atom, or a sulfur atom; and cl to c5 satisfy Osei <1.0, Osc2<1.0, Osc3<1.0, Osc4<1.0, Osc5<1.0, and O<cl +c2+c3+c4+c5<1.0. 

6. The resist composition according to claim 1, wherein the polymer compound is further copolymerized with one or more repeating units selected from repeating units cl to c5 shown by the following general formulae ( 4), 

<img src='content_image/912327.jpg'>

wherein R$^{16 }$to R$^{20 }$each represent a hydrogen atom, an alkyl group having 1 to 30 carbon atoms, an alkyl group partially or wholly substituted with a halogen atom, an alkoxy group, an alkanoyl group, an alkoxycarbonyl group, an aryl group having 6 to 10 carbon atoms, a halogen atom, or a 1,1,1,3, 3,3-hexafluoro-2-propanol group; Z $^{2 }$represents a methylene group, an oxygen atom, or a sulfur atom; and cl to c5 satisfy Osei <1.0, Osc2<1.0, Osc3<1.0, Osc4<1.0, Osc5<1.0, and O<cl +c2+c3+c4+c5<1.0. 

7. The resist composition according to claim 1, wherein the polymer compound is further copolymerized with one or more repeating units selected from repeating units dl to d3 each having a sulfonium salt, shown by the following general formulae (5), 

<img src='content_image/912326.jpg'>

<img src='content_image/912329.jpg'>

-continued 

