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# c19) United States c12) Patent Application Publication 

# YAMANO et al. 

# (54) RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 

(71) Applicant: TOKYO OHKA KOGYO CO., LTD., Kawasaki-shi (JP) 

(72) Inventors: Hitoshi YAMANO, Kawasaki-shi (JP); Takahiro KOJIMA, Kawasaki-shi (JP); Yoichi HORI, Kawasaki-shi (JP); Yasuhiro YOSHII, Kawasaki-shi (JP); Masahito YAHAGI, Kawasaki-shi (JP) 

(21) Appl. No.: 16/222,758 

(22) Filed: Dec. 17, 2018 

## (30) Foreign Application Priority Data 

Dec. 28, 2017 (JP) ................................. 2017-254665 

(51) Int. Cl. 

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## Publication Classification 

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(52) U.S. Cl. CPC ............ G03F 710397 (2013.01); C08F 12124 (2013.01); C08F 220130 (2013.01); C08F 220118 (2013.01); C08F 212114 (2013.01) 

## (57) ABSTRACT 

A resist composition including a resin component whose solubility in a developing solution is changed due to the action of the acid, in which the resin component has a constitutional unit derived from a compound represented by Formula (a0-1) and a constitutional unit containing an acid decomposable group whose polarity is increased due to the action of the acid. In the formula, W represents a polymer› izable group-containing group, Ya 0 represents a carbon atom, Xa 0 represents a group that forms a monocyclic aliphatic hydrocarbon group together with Ya 0 , some or all hydrogen atoms in the monocyclic aliphatic hydrocarbon group may be substituted with substituents, and Ra$^{00 }$rep› resents an aromatic hydrocarbon group which may have a substituent. 

US 20190204738Al 

# c10) Pub. No.: US 2019/0204738 Al 

# (43) Pub. Date: Jul. 4, 2019 

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