content_image/884803.jpg content_image/884791.jpg content_image/884812.jpg content_image/884813.jpg
# c12) United States Patent 

# Hatakeyama et al. 

# (54) RESIST COMPOSITION AND PATTERNING PROCESS 

(71) Applicant: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

(72) Inventors: Jun Hatakeyama, Joetsu (JP); Masaki Ohashi, Joetsu (JP) 

(73) Assignee: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

( * ) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 15/292,772 

(22) Filed: Oct. 13, 2016 

## (65) Prior Publication Data 

US 2017 /0115565 Al Apr. 27, 2017 

## (30) Foreign Application Priority Data 

Oct. 23, 2015 (JP) ................................. 2015-208575 

(51) Int. Cl. 

<img src='content_image/884803.jpg'>

(52) U.S. Cl. CPC .......... G03F 710397 (2013.01); C08F 220122 (2013.01); C08F 220124 (2013.01); C08F 220128 (2013.01); C08F 220130 (2013.01); C08F 220134 (2013.01); C08F 220138 (2013.01); C08F 224100 (2013.01); C08F 228102 (2013.01); G03F 710045 (2013.01); G03F 710046 (2013.01); G03F 712004 (2013.01); G03F 712006 (2013.01); C08F 2220/283 (2013.01); C08F 2220/301 (2013.01); C08F 2220/303 (2013.01); C08F 2220/382 (2013.01); C08F 2800/20 (2013.01) 

<img src='content_image/884791.jpg'>

# (IO) Patent No.: US 10,162,262 B2 

# (45) Date of Patent: Dec. 25, 2018 

(58) Field of Classification Search CPC .... G03F 7/0397; G03F 7/0045; G03F 7/2004; G03F 7/2006; C08F 220/22; C08F 220/24; C08F 220/34; C08F 220/38; C08F 2220/283; C08F 2220/303; C08F 2220/382; C08F 224/00; C08F 228/02 USPC ..... 430/270.1, 910, 921, 326, 942; 526/243, 526/245, 266,281,282,287 See application file for complete search history. 

## (56) References Cited 

<img src='content_image/884812.jpg'>

## FOREIGN PATENT DOCUMENTS 

<img src='content_image/884813.jpg'>

Hinsberg et al., Extendibility of Chemically Amplified Resists: Another Brick Wall?, SPIE vol. 5039 p. 1 (2003). Kishikawa et al., Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithogra› phy, SPIE vol. 6520 p. 65203L-l (2007). Office Action dated Aug. 28, 2018, counterpart to Japanese Appli› cation No. 2015-208575, with English translation (7 pages). 

* cited by examiner 

Primary Examiner - John S Chu (74) Attorney, Agent, or Firm - Westerman, Hattori, Daniels & Adrian, LLP 

## (57) ABSTRACT 

A resist composition comprising a base resin comprising recurring units having an acid labile group and recurring units containing a rubidium or cesium salt of a-fluorinated sulfonic acid exhibits a high sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development. 

USO 10162262B2 

## U.S. PATENT DOCUMENTS 

## OTHER PUBLICATIONS 

## 12 Claims, No Drawings 

