Though not particularly limited, the number of carbon atoms that the alkyl group represented by R has is generally from 1 to 20 and preferably from 1 to 12. 

Though not particularly limited, the number of carbon atoms that the cycloalkyl group represented by R has is gen- erally from 3 to 20 and preferably from 5 to 15. 

Though not particularly limited, the number of carbon atoms that the aryl group represented by R has is generally from 6 to 20, and preferably from 6 to 10. Specific examples of the aryl group include a phenyl group, a naphthyl group, 10 and the like. 

Though not particularly limited, the number of carbon atoms that the aralkyl group represented by R has is generally from 7 to 20 and preferably from 7 to 11. Specific examples of the aralkyl group include a benzyl group and the like. 

In the alkyl group, the cycloalkyl group, the aryl group, and the aralkyl group represented by R, a hydrogen atom may be substituted with a substituent. Examples of the substituent include an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, a hydroxyl group, a carboxyl group, an alkoxy group, an aryloxy group, an alkylcarbonyloxy group, an alky› loxycarbonyl group, and the like. 

In the compound represented by General Formula (BS-1 ), at least two of Rs are preferably organic groups. 

Specific examples of the compound represented by Gen› eral Formula (BS-1) include tri-n-butylamine, tri-n-penty› lamine, tri-n-octylamine, tri-n-decylamine, triisodecylamine, dicyclohexylmethylamine, tetradecylamine, pentadecy› lamine, hexadecy !amine, octadecy !amine, didecy !amine, methyl octadecylamine, dimethylundecyl amine, N,N-dim› ethyldodecylamine, methyldioctadecylamine, N,N-dibutyla› niline, N,N-dihexylaniline, 2,6-diisopropylaniline, and2,4,6- tri(t-butyl)aniline. 

Examples of preferable basic compounds represented by General Formula (BS-1) include a compound in which at least one R is an alkyl group substituted with a hydroxyl group. Specific examples thereof include triethanolamine and N-di› hydroxyethylaniline. 

The alkyl group represented by R may have an oxygen atom in an alkyl chain. That is, an oxyalkylene chain may be formed. The oxyalkylene chain is preferably ----CH$_{2}$CH$_{2}$0-. Specific examples thereof include tris(methoxyethoxyethyl) amine and compounds exemplified from Line 60 of Column 

3 in U.S. Pat. No. 6,040,112A. 

(2) Compound Having Nitrogen-Containing Heterocyclic Structure 

The nitrogen-containing heterocycle may or may not be aromatic, and may have a plurality of nitrogen atoms. This heterocycle may also contain hetero atoms other than nitro› gen. Specific examples thereof include compounds having an imidazole structure (2-phenylbenzimidazole, 2,4,5-triph› enylimidazole, and the like), compounds having a piperidine structure (N-hydroxyethylpiperidine, bis(l ,2,2,6,6-pentam› ethyl-4-piperidyl)sebacate, and the like), compounds having a pyridine structure ( 4-dimethylaminopyridine and the like), and compounds having an antipyrine structure (antipyrine, hydroxyantipyrine, and the like). 

In addition, compounds having two or more ring structures are preferably used, and specific examples thereof include 1,5-diazabicyclo[4.3.0]nona-5-ene and 1,8-diazabicyclo [5.4.0]-undeca-7-ene. 

(3) Amine Compound Having Phenoxy Group 

An amine compound having a phenoxy group is a com› pound that has a phenoxy group at an end positioned opposite to an N atom of an alkyl group contained in an amine com- pound. The phenoxy group may have a substituent such as an alkyl group, an alkoxy group, a halogen atom, a cyano group, 

a nitro group, a carboxyl group, a carboxylic acid ester group, a sulfonic acid ester group, an aryl group, an aralkyl group, an acyloxy group, and an aryloxy group. 

This compound more preferably has at least one oxyalky› lene chain between a phenoxy group and a nitrogen atom. The number of the oxyalkylene chain in a single molecule is preferably from 3 to 9, and more preferably from 4 to 6. Among the oxyalkylene chains, -CH$_{2}$CH$_{2}$0- is particu› larly preferable. 

Specific examples of the compound include 2-[2-{2-(2,2- dimethoxy-phenoxyethoxy )ethy I }-bis-(2-methoxyethy I)]› amine and compounds (Cl-1) to (C3-3) exemplified in Para› graph [0066] ofUS2007/0224539Al. 

( 4) Ammonium Salt 

An ammonium salt can also be appropriately used. This ammonium salt is preferably a hydroxide or a carboxylate. More specifically, the anmionium salt is preferably a tet› raalkylammonium hydroxide such as tetrabutyl anmionium hydroxide. 

In addition, examples of compounds usable for the com› position of the present invention include compounds synthe› sized in examples of JP2002-363146A, compounds disclosed in Paragraph [0108] of JP2007-298569A, and the like. 

As the basic compound, a photosensitive basic compound may also be used. As the photosensitive basic compound, compounds disclosed in, for example, JP2003-524799A and J. Photopolym. Sci & Tech. Vol. 8, pp. 543-553 (1995) can be used. 

The molecular weight of the basic compound is preferably from 250 to 2000 and more preferably from 400 to 1000. 

These basic compounds may be used alone, or two or more kinds thereof may be used in combination. 

When the composition according to the present invention further contains the basic compound, the content of the basic compound is generally from 0.001 % by mass to 10% by mass, and preferably from 0.01 % by mass to 5% by mass, based on the total solid contents of the composition. 

The molar ratio of the photoacid generator described later to the basic compound is preferably from 1.5 to 300. That is, from the viewpoint of improving sensitivity and resolution, the molar ratio is preferably 1.5 or higher, and from the viewpoint of inhibiting resolution deterioration caused by pattern thickening that occurs before a post exposure bake, the molar ratio is preferably 300 or lower. The molar ratio is more preferably from 2.0 to 200, and even more preferably from 2.5 to 150. 

When the compound (P) contains the repeating unit repre› sented by the General Formula (4) described above, the pho› toacid generator in the above molar ratio is based on the total amount of the repeating unit and the photoacid generator described later. 

[3] Acid Degradable Resin 

The composition according to the present invention may further contain a resin of which a dissolution rate in an alka› line developer is increased due to the degradation of the resin caused by the action of an acid, that is, an acid-degradable resin, in addition to the compound (P). 

The acid-degradable resin typically has a group (hereinbe› low, also referred to as an acid-degradable group) that is degraded by the action of an acid and generates an alkali› soluble group. This resin may have the acid-degradable group on one of or both the main chain and side chain. It is prefer› able that the resin have the acid-degradable group on the side chain. 

As disclosed in EP254853B, JP1990-25850A (JP-H02- 25850A), JP1991-223860A (JP-H03-223860A), and JP1992-251259A (JP-H04-251259A), the acid-degradable 

