content_image/905399.jpg content_image/905397.jpg content_image/905398.jpg content_image/905400.jpg content_image/905401.jpg
wherein, in the general formula (A), 

R$_{41}$ , R $_{42 }$and R$_{43 }$each independently represents an hydro› gen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, and, R$_{42 }$may be bonded to Ar$_{4 }$ to form a ring and in this case, R$_{42 }$represents a single bond or an alkylene group; 

X$_{4 }$represents a single bond, --COO-or----CONR$_{64}$ , and, R$_{64 }$represents a hydrogen atom or an alkyl group; 

L$_{4 }$ represents a single bond or an alkylene group; 

Ar$_{4 }$ represents a (n+ 1 )-valent aromatic ring group and in a case of being bonded to R$_{42 }$to form a ring, represents a (n+2)-valent aromatic ring group; and 

n represents an integer of 1 to 4. 

7. An actinic ray-sensitive or radiation-sensitive film com› prising the actinic ray-sensitive or radiation-sensitive resin composition according to claim 1. 

8. A pattern forming method comprising: forming a film including a composition according to claim 1, irradiating the film with actinic rays or radiation, and developing the irradi› ated film with actinic rays or radiation. 

9. The pattern forming method according to claim 8, wherein the actinic rays or radiation is EUV light. 

10. An actinic ray-sensitive or radiation-sensitive resin composition comprising a nitrogen-containing compound (N) which is represented by any of the following general formulas, and, at least one of 

a resin (Ab) of which the polarity changes by the action of an acid, containing a repeating unit (B) having a struc› tural site which generates an acid by irradiation with actinic rays or radiation and 

a compound which generates an acid by irradiation with 55 actinic rays or radiation: 

<img src='content_image/905399.jpg'>

<img src='content_image/905397.jpg'>

<img src='content_image/905398.jpg'>

<img src='content_image/905400.jpg'>

wherein, in the general formulas, R$_{3 }$represents a hydrogen atom or-COOR$_{4 }$ and R$_{4 }$ represents an alkyl group, an aryl group, an aralkyl group, an alkenyl group or a cycloalkyl group. 

11. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 10, wherein R$_{3 }$is a hydrogen atom or ----COOR$_{4 }$ and a carbon atom in R$_{4 }$ which is bonded to the --COO group in -COOR$_{4 }$ is a tertiary carbon atom. 

12. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 10, wherein R$_{3 }$is a hydrogen atom or -COO R$_{4 }$ and R$_{4 }$ is a tertiary alky 1 group having 5 or more carbon atoms. 

13. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 10, wherein R$_{3 }$ is -COOR$_{4 }$ and R$_{4 }$ is t-amyl. 

14. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 10, wherein the resin (Ab) contains at least one kind of repeating unit (A) which is represented by the following general formula (A): 

wherein, in the general formula (A), 

R$_{4}$ i, R$_{42 }$and R$_{43 }$each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, and, R$_{42 }$may be bonded to Ar$_{4 }$ to form a ring and in this case, R$_{42 }$represents a single bond or an alkylene group; 

X$_{4 }$ represents a single bond, -COO-or----CONR$_{64}$ , and, R$_{64 }$represents a hydrogen atom or an alkyl group; 

L$_{4 }$ represents a single bond or an alkylene group; 

Ar$_{4 }$ represents a (n+ 1 )-valent aromatic ring group and in a case of being bonded to R$_{42 }$to form a ring, represents a (n+2)-valent aromatic ring group; and 

n represents an integer of 1 to 4. 

15. An actinic ray-sensitive or radiation-sensitive film comprising the actinic ray-sensitive or radiation-sensitive resin composition according to claim 10. 

16. A pattern forming method comprising: forming a film including a composition according to claim 10, irradiating the film with actinic rays or radiation, and developing the irradi› ated film with actinic rays or radiation. 

17. The pattern forming method according to claim 16, wherein the actinic rays or radiation is EUV light. 

-continued 

<img src='content_image/905401.jpg'>

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