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The following lithographic results (set forth in Table 5 below) were obtained upon patterned exposure (193 nm) of the photoresist with specified barrier composition layers (i.e. barrier composition layers of Example 1 and 6). 

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## Optical Properties of Barrier Composition Layer 

Optical properties of barrier compositions were evaluated at 193 nm and 248 nm. Results are set forth in Table 6 below. 

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## EXAMPLE9 

## Lithographic Processing 

## EXAMPLE 10 

What is claimed is: 

1. A method for processing a photoresist composition, comprising: 

(a) applying on a substrate a photoresist composition; 

(b) applying above the photoresist composition an organic barrier composition layer; 

( c) in a single step, thermally treating the applied photore› sist composition and barrier layer composition to remove solvent from the applied photoresist composi› tion and barrier layer composition; and 

( d) immersion exposing the photoresist layer to activating radiation. 

2. The method of claim 1 wherein solvent of the photoresist composition is not removed by thermal treatment prior to applying the barrier layer composition. 

3. The method of claim 1 wherein the barrier composition comprises one or more resins that comprise Si atoms. 

4. The method of claim 1 wherein the barrier composition comprises one or more silsesquioxane or siloxane resins. 

5. The method of claim 1 wherein the barrier composition comprises one or more fluorinated organic resins. 

6. The method of claim 1 wherein the barrier composition is substantially free of aromatic groups. 

7. A method for processing a photoresist composition, comprising: 

(a) applying on a substrate a photoresist composition; 

(b) applying above the photoresist composition a barrier composition that comprises zirconia or hafnia; 

( c) immersion exposing the photoresist layer to radiation activating for the photoresist composition. 

8. The method of claim 7 wherein the barrier composition comprises zirconia. 

9. The method of claim 7 wherein the barrier composition comprises hafnia. 

10. The method of claim 7 wherein the barrier composition comprises one or more fluorinated organic resins. 

11. The method of claim 7 wherein the barrier composition is substantially free of aromatic groups. 

12. The method of claim 8 wherein the barrier composition comprises one or more fluorinated organic resins. 

13. The method of claim 8 wherein the barrier composition is substantially free of aromatic groups. 

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