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# c12) United States Patent Kim et al. 

# (54) COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION METHOD EMPLOYING THE SAME 

(71) Applicant: SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-do (KR) 

(72) Inventors: Hyun-woo Kim, Seongnam-si (KR); Cheol hong Park, Seoul (KR); Tetsuo Okayasu, Kakegawa (JP); Xiaowei Wang, Kakegawa (JP); Georg Pawlowski, Kakegawa (JP); Yusuke Hama, Kakegawa (JP) 

(73) Assignees: Samsung Electronics Co., LTD., Suwon-Si, Gyeonggi-do (KR); AZ Electronics Materials (Luxembourg) S.A.R.L., Luxembourg (LU) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 14/549,911 

(22) Filed: Nov. 21, 2014 

## (65) Prior Publication Data 

US 2015/0147701 Al May 28, 2015 

## (30) Foreign Application Priority Data 

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(51) Int. Cl. 

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(52) U.S. Cl. CPC ............. G03F 712004 (2013.01); C09D 5100 (2013.01); C09D 711225 (2013.01); G03F 71091 (2013.01); G03F 7111 (2013.01) 

(58) Field of Classification Search CPC ............ G03F 7/09; G03F 7/11; G03F 7/2004; G03F 7/091; C09D 5/00 

See application file for complete search history. 

## (56) References Cited 

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## U.S. PATENT DOCUMENTS 

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# (IO) Patent No.: US 9,804,493 B2 

# (45) Date of Patent: Oct. 31, 2017 

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Machine translation of JP 2012-117052, published on Jun. 21, 2012 (Year: 2012). * 

Machine translation of JP 2013-079176, published on May 2, 2013 (Year: 2013). * 

CD Uniformity Improvement for EUV Resists Process: EUV Reso› lution Enhancement Layer; Proc. of SPIE, vol. 7969 7969-1; Kim, et al. 

Japanese Office Action dated Aug. 22, 2017. 

Primary Examiner - Anca Eoff 

(74) Attorney, Agent, or Firm - Lee & Morse, P.C. 

## (57) ABSTRACT 

Provided is a composition for forming a topcoat layer, the composition including a graphene derivative including a hydrophilic group; and a solvent. Also provided is a pattern formation method, including disposing a resist composition on a substrate, to form a resist layer; coating the resist layer with a composition including a graphene derivative includ› ing a hydrophilic group, and a solvent; heating the compo› sition to harden the composition; subjecting the resist layer to exposure using extreme ultraviolet light; and developing exposed resist layer with an alkali aqueous solution. 

US009804493B2 

## FOREIGN PATENT DOCUMENTS 

(Continued) 

## OTHER PUBLICATIONS 

## 10 Claims, No Drawings 

