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in general formulae (aal-2-3) and (aal-3-3), 

Ra$_{1 }$ represents a hydrogen atom or a methyl group, and each of Rf$_{1 }$ and Rf$_{2 }$ independently represents an organic group containing a fluorine atom. 

[5] The composition according to any of items [1] to [4], wherein in general formula (aa2-1) above, Rb represents a hydrogen atom; S la represents an optionally substituted alkyl 25 group, an organic group containing a silicon atom, or a halo› gen atom; and pis an integer of 1 to 5. 

[ 6] The composition according to any of items [ 1] to [ 5], wherein in general formula (aa2-1) above, S$_{1}$ a represents an alkyl group, an alkyl group substituted with a halogen atom or 30 an organic group containing a silicon atom. 

[7] The composition according to any of items [ 1] to [ 6], wherein in general formula (aa2-1) above, S$_{1}$ a represents an alkyl group or any of groups of general formula (aal-2-1) below, 

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in which 

each ofR$_{11}$, R$_{21 }$and R$_{31 }$independently represents an alkyl group, and 

L$_{1 }$represents a single bond or a bivalent connecting group. 

[8] The composition according to any of items [ 1] to [7], further comprising a compound that when exposed to actinic rays or radiation, generates an acid. 

[9] The composition according to any of items [ 1] to [8], wherein the resin (Ab) comprises a repeating unit (B) con› taining a structural moiety that when exposed to actinic rays or radiation, generates an acid. 

[1 OJ The composition according to any of items [1] to [9], 55 wherein the resin (Ab) comprises at least one of repeating units (A) of general formula (A) below, 

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-continued 

in which 

n is an integer of 1 to 5, and m is an integer of O to 4 satisfying the relationship lsm+ns5, and 

S$_{1 }$ represents a substituent, provided that when mis 2 or greater, two or more S’s may be identical to or different from each other. 

[11] The composition according to item [10], wherein the resin (Ab) comprises at least a repeating unit of formula below as the at least one of repeating units (A) of general formula (A) above. 

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[12] The composition according to any ofitems [1] to [11], wherein the resin (Aa) is contained in an amount of0.01 to 20 mass% based on total solids of the composition. 

[13] The composition according to item [12], wherein the resin (Aa) is contained in an amount of0.01 to 10 mass% based on total solids of the composition. 

[14] The composition according to item [13], wherein the resin ( Aa) is contained in an amount ofO .01 to 5 mass % based on total solids of the composition. 

[15] The composition according to any ofitems [1] to [14], wherein the resin (Ab) comprises at least one of repeating units of general formulae (Al) and (A2) below, 

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in general formula (Al) 

n is an integer of 1 to 5, and m is an integer of O to 4 satisfying the relationship lsm+ns5, 

S$_{1 }$ represents a substituent, provided that when mis 2 or greater, two or more S$_{1 }$s may be identical to or different from each other, and 

A$_{1 }$ represents a hydrogen atom or a group that when acted on by an acid, is cleaved, provided that at least oneA$_{1 }$ repre› sents a group that when acted on by an acid, is cleaved, and that when n is 2 or greater, two or more A$_{1 }$s may be identical to or different from each other, and 

in general formula (A2) 

X represents a hydrogen atom, an alkyl group, a hydroxyl group, an alkoxy group, a halogen atom, a cyano group, a nitro group, an acyl group, an acyloxy group, a cycloalkyl group, a cycloalkyloxy group, an aryl group, a carboxyl group, an alkyloxycarbonyl group, an alkylcarbonyloxy group or an aralkyl group, and 

