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# c12) United States Patent Takizawa et al. 

# (54) PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET-SENSITIVE COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventors: Hiroo Takizawa, Shizuoka (JP); Kaoru Iwato, Shizuoka (JP); Hideaki Tsubaki, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 14 days. 

(21) Appl. No.: 14/227,344 

(22) Filed: Mar. 27, 2014 

## (65) Prior Publication Data 

US 2014/0212796 Al Jul. 31, 2014 

(63) Continuation of application No. PCT/JP2012/074315, filed on Sep. 14, 2012. 

## (30) Foreign Application Priority Data 

Sep.30,2011 (JP) ................................. 2011-218546 

(51) Int. Cl. 

<img src='content_image/892784.jpg'>

(52) U.S. Cl. CPC ............ G03F 710388 (2013.01); G03F 710045 (2013.01); G03F 710046 (2013.01); G03F 71038 (2013.01); G03F 710392 (2013.01); G03F 710397 (2013.01); G03F 7111 (2013.01); G03F 712041 (2013.01); G03F 71325 (2013.01); G03F 71405 (2013.01) 

( 58) Field of Classification Search CPC ... G03F 7/0045; G03F 7/0046; G03F 7/0388; G03F 7/325; G03F 7/2041; G03F 7/038; G03F 7/0392; G03F 7/11; G03F 7/405; G03F 7/0397; G03F 7/2059; G03F 7/2004 USPC .......................... 430/9, 18,270.1, 288.1, 325 See application file for complete search history. 

## (56) References Cited 

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## Related U.S. Application Data 

## U.S. PATENT DOCUMENTS 

<img src='content_image/892752.jpg'>

# (IO) Patent No.: US 9,411,230 B2 

# (45) Date of Patent: Aug. 9, 2016 

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Computer-generated translation of JP 2010-085499 (Apr. 2010).* 

Primary Examiner - John A McPherson 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer, wherein the electron beam-sensitive or extreme ultraviolet-sensitive resin composition contains (A) a resin containing (R) a repeating unit having a structural moiety capable of decom› posing upon irradiation with an electron beam or an extreme ultraviolet ray to generate an acid, and (B) a solvent. 

US009411230B2 

## FOREIGN PATENT DOCUMENTS 

## OTHER PUBLICATIONS 

(Continued) 

## 25 Claims, No Drawings 

