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# (19) United States 

# (12) Patent Application Publication Berger et al. 

# (54) BASES AND SURFACTANTS AND THEIR USE IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY 

(76) Inventors: Larry L. Berger, Chadds Ford, PA (US); Michael Karl Crawford, Glens Mills, PA (US); Frank L. Schadt III, Wilmington, DE (US); Frederick Claus Zumsteg Jr, Wilmington, DE (US) 

Correspondence Address: Jessica M Sinnott EI du Pont de Nemours & Company Legal Patents Wilmington, DE 19898 (US) 

(21) Appl. No.: 10/399,375 

(22) PCT Filed: Nov. 26, 2001 

(86) PCT No.: PCT/US0l/44294 

(60) Provisional application No. 60/253,820, filed on Nov. 29, 2000. 

(51) Int. Cl.7 ..... G03F 7/00; G03F 7/20; G03F 7/004; G03F 7/30 

## Related U.S. Application Data 

## Publication Classification 

<img src='content_image/941393.jpg'>

US 20050100814Al 

# (10) Pub. No.: US 2005/0100814 Al 

# ( 43) Pub. Date: May 12, 2005 

(52) U.S. Cl. ................... 430/270.1; 430/311; 430/281.1; 430/326; 526/72; 526/242; 526/250; 525/328.8 

## (57) ABSTRACT 

A photoresist composition having: (A) a polymer selected from the group consisting of: ( a) a fluorine-containing copolymer having a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: -C(Ri)(R/)OH, wherein Rf and R/ are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF$_{2}$)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro(2, 2-dimethyl-1,3-dioxole) or CX$_{2}$=CY$_{2 }$ where X=F or CF$_{3 }$ and Y=-H or amorphous vinyl copolymers of perfluoro(2, 2-dimethyl-1,3-dioxole) and CX$_{2}$=CY 2 ; and ( e) nitrile/ fluoroalcohol-containing polymers prepared from substi› tuted or unsubstituted vinyl ethers; (B) at least one photoactive component; and (C) a functional compound selected from the group consisting of a base and a surfactant. The polymer may have an absorption coefficient of less than about 5.om?-l at a wavelength of about 157 nm. These photoresist compositions have improved imaging properties. 

