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## TABLE 2-continued 

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## T_A_B_L_E_3 __________ $_{45 }$ Preparation of Resist Composition 

A resist composition in solution form was prepared by dissolving the acid diffusion controlling agent (Q-1) synthe› sized above or comparative acid diffusion controlling agents (Q-2) to (Q-7), each polymer (Polymers P-1 to P-12 syn- thesized above), a photoacid generator (PAG-X, PAG-Y), and alkali-soluble surfactant (SF-1) in an organic solvent containing 0.01 wt % of surfactant A, and filtering through a Teflonfi filter with a pore size of0.2 µm. Table 4 shows the formulation of the resulting resist solution. 

The solvent, photoacid generator (PAG-X, PAG-Y), alkali-soluble surfactant (SF-1 ), surfactant A, and compara› tive acid diffusion controlling agents (Q-2 to Q-7) used herein are identified below. 

PGMEA: propylene glycol monomethyl ether acetate 

GBL: y-butyrolactone 

PAG-X: triphenylsulfonium 2-(adamantane-l-carbony› loxy )-1, 1,3 ,3 ,3-pentafluoropropane-1-sulfonate 

PAG-Y: triphenylsulfonium 2-(adamantane-l-carbony› loxy )-3 ,3 ,3-trifluoro-2-trifluoromethy lpropane- l -sul- fonate 

Q-2: 2-( 4-morpholinyl)ethyl octadecanoate 

Q-3: triphenylsulfonium camphorsulfonate 

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## Examples 1-1 to 1-14 and Comparative Examples 1-1 to 1-7 

## TABLE 3-continued 

