content_image/906438.jpg
using a scanning electron microscope (S-4300 manufactured by Hitachi, Ltd.). In the cross-sectional shape of the line pattern, for the ratio represented by [the line width in the bottom section of the line pattern/the line width in the center section (the height position of half the height of the line pattern) of the line pattern], a line pattern having a ratio of 1.2 or more was set as a "forward taper", a line pattern having a ratio of 1.05 or more to less than 1.2 was set as a "slightly forward taper", and a line pattern having a ratio of less than 1.05 was set as a "rectangle", and evaluation was performed. 

## [Line Edge Roughness (LER)] 

A 1: 1 line and space resist pattern with a line width of 50 nm was formed with the exposure amount indicating the sensitivity described above. Then, for an arbitrary 30 points in 10 µm in the length direction, the distance from a reference line where an edge should be present was mea› sured using a scanning electron microscope (S-9220 manu› factured by Hitachi, Ltd.). Then, the standard deviation of this distance was determined and 3a was calculated. A smaller value indicates a more favorable performance. 

<img src='content_image/906438.jpg'>

## [Example 2G] to [Example 14G] and [Comparative Example lG] to [Comparative Example 4G] 

In the resist solution formula, the preparation of the resist solution (negative type resist compositions 2D to 14D, negative type resist comparative compositions ID to 4D), the negative type pattern forming, and the evaluation were performed in the same manner as Example 1 G except for the components described in Table 10 below. 

The evaluation results are shown in Table 11 below. 

Abbreviations of the materials other than those described above used in the Examples/Comparative Examples described above are described below. 

## [Acid-Decomposable Resin] 

The structure of the resin, composition ratio (molar ratio), weight-average molecular weight, and degree of dispersity used in the Examples and the Comparative Examples are shown below. 

