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# c12) United States Patent Matsuzawa et al. 

# (54) RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND 

(75) Inventors: Kensuke Matsuzawa, Kawasaki (JP); Jun Iwashita, Kawasaki (JP); Yoshitaka Komuro, Kawasaki (JP); Masatoshi Arai, Kawasaki (JP) 

(73) Assignee: Tokyo Ohka Kogyo Co., Ltd., Kawaski-shi (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 13/402,820 

(22) Filed: Feb.22,2012 

## (65) Prior Publication Data 

US 2012/0282551 Al Nov. 8, 2012 

## (30) Foreign Application Priority Data 

Feb. 23, 2011 (JP) ............................... P2011-037534 

(51) Int. Cl. 

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(52) U.S. Cl. CPC ............ G03F 710045 (2013.01); C08F 220118 (2013.01); C08F 220128 (2013.01); C08F 220138 (2013.01); C08F 228106 (2013.01); G03F 710046 (2013.01); G03F 710397 (2013.01); G03F 712039 (2013.01); C08F 2220/382 (2013.01); G03F 7/38 (2013.01) 

( 58) Field of Classification Search CPC ....... G03F 7/0045; G03F 7/0397; G03F 7/38; C08F 220/18; C08F 220/28; C08F 220/38; C08F 228/06; C08F 2220/382 USPC .............. 430/270.1, 905, 910, 921, 922, 326; 526/243, 287 See application file for complete search history. 

## (56) References Cited 

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## U.S. PATENT DOCUMENTS 

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# (IO) Patent No.: US 9,104,101 B2 

# (45) Date of Patent: Aug. 11, 2015 

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Office Action issued on Nov. 20, 2013 in U.S. Appl. No. 13/653,930. 

Office Action issued on May 20, 2014 in U.S. Appl. No. 13/653,930. 

Office Action in Japanese Application No. 2011-037534, mailed Aug. 26, 2014. 

Office Action in Japanese Patent Application No. 2011-228066, mailed Mar. 24, 2015. 

Primary Examiner - John Chu 

(74) Attorney, Agent, or Firm -Knobbe Martens Olson & BearLLP 

## (57) ABSTRACT 

A resist composition including a resin component which gen› erates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resin com› ponent including a resin component having a structural unit represented by a general formula (a0-0-1) shown below 

in which R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R 0 - 1 represents a single bond or a divalent linking group, each of R 2 , R 3 and R 4 independently represents a linear, branched or cyclic alkyl group which may have a non-aromatic substituent, or R$^{3 }$andR$^{4 }$may be bonded to each other to form a ring together with the sulfur atom, and X represents a non-aromatic divalent linking group or a single bond. 

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US009104101B2 

## FOREIGN PATENT DOCUMENTS 

(Continued) 

## OTHER PUBLICATIONS 

## 11 Claims, No Drawings 

