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# c12) United States Patent 

# Inoue et al. 

# (54) PATTERN FORMING METHOD, COMPOSITION FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventors: Naoki Inoue, Haibara-gun (JP); Naohiro Tango, Haibara-gun (JP); Kei Yamamoto, Haibara-gun (JP); Michihiro Shirakawa, Haibara-gun (JP); Akiyoshi Goto, Haibara-gun (JP) 

(73) Assignee: FUJIFILM Corporation, Minato-kn, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by 0 days. 

(21) Appl. No.: 15/446,695 

(22) Filed: Mar. 1, 2017 

## (65) Prior Publication Data 

US 2017/0176862 Al Jun. 22, 2017 

(63) Continuation of application No. PCT/JP2015/076189, filed on Sep. 15, 2015. 

## (30) Foreign Application Priority Data 

Sep. 30, 2014 (JP) ................................. 2014-202362 

(51) Int. Cl. 

<img src='content_image/945825.jpg'>

(52) U.S. Cl. CPC .................. G03F 7111 (2013.01); C08F 2148 (2013.01); C08F 220118 (2013.01); C09D 133/08 (2013.01); C09D 133/10 (2013.01); G03F 71038 (2013.01); G03F 71039 (2013.01); G03F 710397 (2013.01); G03F 71091 (2013.01); G03F 7116 (2013.01); G03F 71168 (2013.01); G03F 712041 (2013.01); G03F 71325 (2013.01); G03F 71327 (2013.01); G03F 7138 (2013.01); G03F 7140 (2013.01) 

## Related U.S. Application Data 

<img src='content_image/945793.jpg'>

# (IO) Patent No.: US 10,175,578 B2 

# (45) Date of Patent: Jan.8,2019 

(58) Field of Classification Search CPC ... G03F 7/004; G03F 7/11; G03F 7/26; G03F 7/38; G03F 7/40; H0lL 21/0274; H01L 21/3114; H01L 21/02112 USPC .... 430/271.1, 434, 435, 322, 325, 329, 330, 430/331; 438/699 See application file for complete search history. 

## (56) References Cited 

<img src='content_image/945810.jpg'>

## FOREIGN PATENT DOCUMENTS 

<img src='content_image/945811.jpg'>

Machine translation of JP 2014-056194 (no date).* 

Machine translation of JP 2008-111102 (no date).* 

International Search Report for PCT/JP2015/076189 dated Dec. 22, 2015. 

Foreign Written Opinion for PCT/JP2015/076189 dated Dec. 22, 2015. 

Connnunication dated Jan. 9, 2018 from the Korean Intellectual Property Office in counterpart Application No. 10-2017-7005993. 

Primary Examiner - Amanda C. Walke (74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

A pattern forming method includes coating an actinic ray› sensitive or radiation-sensitive resin composition onto a substrate to form an actinic ray-sensitive or radiation-sen› sitive film, coating a composition for forming a protective film onto the actinic ray-sensitive or radiation-sensitive film to form a protective film, exposing the actinic ray-sensitive or radiation-sensitive film covered with the protective film, and developing the exposed actinic ray-sensitive or radia› tion-sensitive film using a developer containing an organic solvent, in which the protective film contains a compound (A) including at least one group or bond selected from the group consisting of an ether bond, a thioether bond, a hydroxyl group, a thiol group, a carbonyl bond, and an ester bond, and a resin (X). 

US010175578B2 

## U.S. PATENT DOCUMENTS 

(Continued) 

## OTHER PUBLICATIONS 

(Continued) 

## 15 Claims, No Drawings 

