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# c19) United States c12) Patent Application Publication 

# Hatakeyama et al. 

# (54) RESIST COMPOSITION AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventors: Jun Hatakeyama, Joetsu-shi (JP); Masaki Ohashi, Joetsu-shi (JP); Takayuki Fujiwara, Joetsu-shi (JP) 

(73) Assignee: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(21) Appl. No.: 16/787,743 

(22) Filed: Feb. 11, 2020 

## (30) Foreign Application Priority Data 

Feb. 27, 2019 (JP) ................................. 2019-033684 

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(51) Int. Cl. 

(52) U.S. Cl. CPC ............ G03F 710045 (2013.01); G03F 7/162 (2013.01); G03F 710382 (2013.01); G03F 710392 (2013.01) 

## (57) ABSTRACT 

A resist composition comprising a base polymer and a quencher in the form of a salt of a cyclic ammonium cation with a carboxylate, sulfonamide, halogenated phenoxide or halide anion offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone. 

US 20200272048Al 

# c10) Pub. No.: US 2020/0272048 Al 

# (43) Pub. Date: Aug. 27, 2020 

## Publication Classification 

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