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# c12) United States Patent 

# Takemura et al. 

# (54) POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS 

(75) Inventors: Katsuya Takemura, Joetsu (JP); Keiichi Masunaga, Joetsu (JP); Daisuke Dornon, Joetsu (JP); Masayoshi Sagehashi, Joetsu (JP) 

(73) Assignee: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by 840 days. 

(21) Appl. No.: 12/623,155 

(22) Filed: Nov. 20, 2009 

## (65) Prior Publication Data 

US 2010/0129738Al May 27, 2010 

## (30) Foreign Application Priority Data 

Nov. 21, 2008 (JP) ................................. 2008-297828 

(51) Int. Cl. 

<img src='content_image/896968.jpg'>

(52) U.S. Cl. USPC .................. 430/270.1; 430/273.1; 430/275.1; 430/311; 430/326; 430/330; 430/905; 430/907; 430/910; 430/942 

( 58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

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## U.S. PATENT DOCUMENTS 

## FOREIGN PATENT DOCUMENTS 

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# (10) Patent No.: US 8,968,979 B2 

# (45) Date of Patent: Mar.3,2015 

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Derwent English abstract of JP2004-292740 (2004). * 

Primary Examiner - Sin Lee 

(74) Attorney, Agent, or Firm -Birch, Stewart, Kolasch & Birch, LLP 

## (57) ABSTRACT 

A positive resist composition comprises a polymer compris› ing repeat units having formula (1) or (2). 

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Herein 

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denotes an aromatic hydrocarbon group, R$^{1 }$is H, methyl or trifluoromethyl, R 2 is H, C$_{1}$-C$_{12 }$alkyl or aromatic hydrocar› bon group, R$^{3 }$is C$_{1 }$-C$_{12 }$alkyl, or R $^{2 }$and R$^{3 }$may bond together to form a ring, and a is 1 or 2. When used in the ArF lithog› raphy, the resist composition exhibits high resolution. When used in the EB image writing for mask processing, the resist composition exhibits high resolution and sensitivity sufficient to comply with high-accelerating-voltage EB irradiation, and high etch resistance. 

US008968979B2 

(Continued) 

## OTHER PUBLICATIONS 

(Continued) 

## 16 Claims, No Drawings 

(1) 

(2) 

