content_image/899784.jpg content_image/899783.jpg content_image/899781.jpg content_image/899782.jpg
agents, and is preferably used as a combination of two or more agents from the point of view of the pattern shape. 

For example, in a case where another cross-linking agent, for example, a compound or the like which has an N-alkoxymethyl groups described above, is also used in addition to the phenolic derivative described above, the ratio of the phenolic derivative described above and the other cross-linking agent is 100/0 to 20/80, preferably 90/10 to 40/60, and even more preferably 80/20 to 50/50 in a molar ratio. 

The acid cross-linkable compound (C) may be a resin which has a repeating unit having an acid-cross-linkable group (also referred to below as resin (C")). In a case where the acid cross-linkable compound (C) is the resin (C") described above, since the repeating unit in the resin (C") described above has an acid-cross-linkable group, it is possible to form a hard film with a higher cross-linking reactivity in comparison with the active light sensitive or radiation sensitive resin composition which contains a resin which does not have a repeating unit having an acid-cross- linkable group. As a result, it is considered that the dry etching resistance is improved. In addition, since the diffu› sion of the acid in the sections exposed to active light or radiation is suppressed, it is considered that, as a result, in a case of forming a fine pattern, the resolving power is improved, the pattern shape is improved, and the line edge roughness (LER) is further reduced. In addition, as in the repeating unit represented by General Formula (1) below, in a case where the reaction point of the resin and the reaction point of the cross-linkable group are close, it is considered that the sensitivity of the active light sensitive or radiation sensitive resin composition is improved. 

Examples of the resin (C’) include a resin which has the repeating unit represented by General Formula (1) below. The repeating unit represented by General Formula (1) is a structure including at least one methylol group which may have a substituent group. 

Here, the "methylol group" is a group represented by General Formula (M) below and is preferably a hydroxym› ethyl group or an alkoxymethyl group in an aspect of the present invention. 

R$_{2 }$ and R$_{3 }$ represent a hydrogen atom, an alkyl group, or a cycloalkyl group. 

Z represents a hydrogen atom or a substituent group. 

Description will be given below of General Formula (1 ). 

<img src='content_image/899784.jpg'>

<img src='content_image/899783.jpg'>

In General Formula (1), 

R$_{2}$ , R$_{3}$ , and Z are the same as in General Formula (M) described above. 

R$_{1 }$ represents a hydrogen atom, a methyl group, or a halogen atom. 

L represents a divalent linking group or a single bond. 

Y represents a substituent group other than a methylol group. 

m represents an integer of 0 to 4. 

n represents an integer of 1 to 5. 

m+n is 5 or less. 

In a case where mis 2 or more, a plurality of Y’s may be the same, or may be different from each other. 

In a case where n is 2 or more, a plurality of R/s, R/s, and Z’s may be the same, or may be different from each other. 

In addition, two or more of Y, R$_{2}$ , R$_{3}$ , and Z may bond with each other to form a ring structure. 

R1, R$_{2}$ , R$_{3}$ , L, and Y may each have a substituent group. 

The content ratio of the repeating unit which has an acid-cross-linkable group in the resin (C") is preferably 3 mass % to 40 mass % and more preferably 5 mass % to 30 mass %, with respect to all of the repeating units of the resin (C"). 

The content of the resin (C") is preferably 5 mass% to 95 mass % and more preferably 10 mass % to 90 mass %, in the total solid content of the negative type resist composition. 

The resin (C") may include two or more types of repeating unit having an acid-cross-linkable group, or two or more types ofresin (C") may be used in combination. In addition, it is also possible to use the compound (C) and the resin (C") in combination. 

Specific examples of the repeating unit which has an acid-cross-linkable group included in the resin (C") include the following structures. 

<img src='content_image/899781.jpg'>

<img src='content_image/899782.jpg'>

