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# c12) United States Patent Hatakeyama et al. 

# (54) RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME 

(71) Applicant: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

(72) Inventors: Jun Hatakeyama, Jyoetsu (JP); Koji Hasegawa, Jyoetsu (JP) 

(73) Assignee: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by O days. days. 

(21) Appl. No.: 15/195,387 

Jun. 28, 2016 (22) Filed: 

## (65) Prior Publication Data 

US 2017/0029547 Al Feb. 2, 2017 

## (30) Foreign Application Priority Data 

Jul. 29, 2015 (JP) ................................. 2015-149895 

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(52) U.S. Cl. CPC ........ C0SF 222114 (2013.01); C0SF 2161165 (2013.01); C0SF 220168 (2013.01); 

( 58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

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"Sigma Steroids",ThermoFischer Scientific, (2007) 43 pages.* 

Primary Examiner - Martin J Angebranndt 

(74) Attorney, Agent, or Firm - Oliff PLC 

## (57) ABSTRACT 

The present invention provides a resist composition con› taining a base resin composed of a polymer compound 

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## OTHER PUBLICATIONS 

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# (IO) Patent No.: US 10,005,868 B2 

# (45) Date of Patent: Jun.26,2018 

having a repeating unit in which a hydrogen atom of a carboxyl group is substituted with one or more acid-labile groups selected from groups shown by the following general formulae (1-1) to (1-5), 

wherein R $^{1 }$to R$^{5 }$represent a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms, an alkenyl group having 2 to 4 carbon atoms, or an alkynyl group having 2 to 4 carbon atoms; R $^{6 }$represents a hydroxyl group or an alkoxy group or acyloxy group having 1 to 6 carbon atoms; and "m" represents 1 or 2. There can be provided a resist composition 

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US010005868B2 

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