content_image/897925.jpg content_image/897926.jpg content_image/897924.jpg
Ar$_{1 }$ represents an aromatic ring group, and alternatively, R$_{03 }$andAr$_{1 }$may be simultaneously alkylene groups and bonded to each other so as to form a 5-membered or 6-membered ring in cooperation with -C----C-; 

each of n Y’s independently represents a hydrogen atom or a group that is eliminated by the action of an acid, provided that at least one of the Y’s is a group that is eliminated by the action of an acid; and 

n is an integer of 1 to 4. 

6. The actinic-ray- or radiation-sensitive resin composition according to claim 5, wherein in general formula (A), at least one group ofY s that is eliminated by the action of an acid has a structure represented by the following general formula (B): 

<img src='content_image/897925.jpg'>

in which 

each of L$_{1 }$ and L$_{2 }$ independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group; 

M represents a single bond or a bivalent connecting group; 

Q represents an alkyl group, a cycloalkyl group, an alicy- clic group, an aromatic ring group, an amino group, an ammonium group, a mercapto group, a cyano group or an aldehyde group, and the alicyclic group and the aro› matic ring group may contain a heteroatom; and 

at least two ofQ, M andL$_{1 }$maybe bonded to each other to thereby form a 5-membered or 6-membered ring. 

7. The actinic-ray- or radiation-sensitive resin composition according to claim 1, further comprising a resin soluble in an alkali developer and an acid crosslinking agent capable of eras slinking with the resin soluble in an alkali developer under the action of an acid. 

8. A resist film formed from the actinic-ray- or radiation› sensitive resin composition according to claim 1. 

9. A method of forming a pattern, comprising forming the actinic-ray- or radiation-sensitive resin composition accord› ing to claim 1 into a film, exposing the film and developing the exposed film. 

10. The method of forming a pattern according to claim 9, wherein the exposure is performed using X-rays, an electron beamorEUV. 

11. The actinic-ray- or radiation-sensitive resin composi- tion according to claim 1, wherein p is 3 in general formula (V). 

12. The actinic-ray- or radiation-sensitive resin composi› tion according to claim 11, wherein B is a cycloaliphatic group in general formula (V). 

13. The actinic-ray- or radiation-sensitive resin composi› tion according to claim 12, wherein Bis a cyclohexyl group in general formula (V). 

14. The actinic-ray- or radiation-sensitive resin composi- tion according to claim 1, wherein the anion moiety of general formula (II) has the following structure: 

<img src='content_image/897926.jpg'>

15. The actinic-ray- or radiation-sensitive resin composi› tion according to claim 1, wherein in general formula (V), the cycloaliphatic group represented by B is limited to a cyclo› hexyl group. 

16. The actinic-ray-or radiation-sensitive resin composi- tion according to claim 1, wherein in general formula (I), Ar 1 is a phenyl group substituted at its m-position by at least one -(OR 1 ) group. 

17. The actinic-ray- or radiation-sensitive resin composi› tion according to claim 1, wherein in general formula (I), the two members selected from among mAr$^{1}$s and n R$^{2}$s are not bonded to each other. 

18. The actinic-ray- or radiation-sensitive resin composi› tion according to claim 1, wherein in general formula (I), mis an integer of 3. 

19. A compound of general formula (VI) that when exposed to actinic rays or radiation, generates an acid having a volume of 240 A3 or greater, 

<img src='content_image/897924.jpg'>

in which 

Ari represents an aromatic ring, in which a substituent other than -(ORI) groups may further be introduced, 

Rl represents a linear or branched alkyl group or a cycloalkyl group, 

R2 represents an optionally substituted aryl group, an optionally substituted alkyl group or an optionally sub› stituted cycloalkyl group, 

1 is an integer of 1 or greater, 

mis an integer of 1 to 3, and nan integer of0 to 2, provided that m+n=3 is satisfied, 

provided that when mis 1 and n is 2, two R $^{2}$s may be bonded to each other to thereby form a tetrahy› drothiophene ring or a tetrahydrothiopyran ring in coop› eration with the sulfur atom appearing in the formula, and provided that when mis 2 and n is 1, or when mis 3 and n is 0, two Ar$^{1}$s, or Ar$^{1 }$and R $^{2 }$may be bonded to each other to thereby form a ring structure in cooperation with the sulfur atom appearing in the formula, in which two Ar$^{1}$s, or Ar 1 and R 2 are simultaneously phenyl groups and the ring structure formed is a dibenzothiophene ring or a dibenzothiopyran ring, 

