content_image/941456.jpg
34. The photoresist composition of claim 1, wherein the polymer is derived from at least one ethylenically unsatur› ated compound containing a fluoroalcohol functional group having the structure: 

<img src='content_image/941456.jpg'>

wherein Rf and Rf’ are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF$_{2}$ )n wherein n is 2 to about 10. 

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