a polishing head adapted to press a substrate against said polishing surface; 

a first electrode coupled to one of poles of a power source and arranged below said polishing pad; 

a second electrode coupled to another of the poles of the power source and adapted to supply an electric current to a conductive film on the substrate; 

an electrolytic-solution supply section for supplying an electrolytic solution to said polishing pad; and 

a moving mechanism for providing relative movement between said polishing pad and the substrate held by said polishing head, 

wherein each of said through-holes has an upper opening with a smaller diameter than a diameter of a lower open› ing thereof. 

20. The electrochemical mechanical polishing apparatus according to claim 19, wherein 

a diameter of each of said through-holes is decreased gradually from said lower opening to said upper open› ing. 

21. The electrochemical mechanical polishing apparatus according to claim 19, wherein 

each of said through-holes comprises plural holes arranged vertically in series with different diameters. 

22. A method of conditioning a processing electrode and/or a polishing pad of an electrochemical mechanical polishing apparatus, said method comprising: 

polishing a conductive material of a workpiece by provid› ing sliding contact between the conductive material and the polishing pad, which is arranged between the pro› cessing electrode and the conductive material, and by applying a voltage between the conductive material and 

the processing electrode in the presence of an electro› lytic solution containing an organic acid and a corrosion inhibitor; and 

before or after said polishing, conditioning the processing electrode and/or the polishing pad using a conditioning solution including components of the electrolytic solu› tion other than the corrosion inhibitor. 

23. The method according to claim 22, wherein the condi› tioning solution further containing an oxidizing agent. 

24. The method according to claim 22, wherein the organic acid comprises at least one of acetic acid, propionic acid, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, maleic acid, fumaric acid, citric acid, aconitic acid, glyoxylic acid, glycolic acid, lactic acid, gluconic acid, malic acid, and tartaric acid. 

25. The method according to claim 22, wherein the organic acid comprises a strong acid having a sulfonic acid group. 

26. The method according to claim 22, wherein the strong acid having a sulfonic acid group comprises benzenesulfonic acid, methanesulfonic acid, taurine, cysteic acid, analkylben› zene sulfonic acid having one to six carbons in an alkyl group, trifluoromethanesulfonic acid, and fluorosulfonic acid. 

27. A conditioning solution for use in conditioning a pro› cessing electrode and/or a polishing pad of an electrochemi› cal mechanical polishing apparatus, said conditioning solu› tion comprising: 

at least one organic acid or its salt; and 

at least one strong acid having a sulfonic acid group, 

wherein said conditioning solution does not contain a cor- rosion inhibitor. 

28. The conditioning solution according to claim 27, fur› ther comprising an oxidizing agent. 

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