content_image/892883.jpg content_image/892884.jpg
<img src='content_image/892883.jpg'>

<img src='content_image/892884.jpg'>

## Examples 1 to 33 and Comparative Examples 1 to 8 [0191] Preparation and Evaluation of Resist Compositions 

(1) Preparation of Resist Compositions 

[0192] Resist compositions were prepared, under LED illumination with UV of wavelength 400 nm and shorter cut off, by dissolving the polymer and selected components in a solvent in accordance with the recipe shown in Tables 1 to 3, and filtering through a filter having a pore size of 0.2 µm. The solvent contained 100 ppm of surfactant Polyfox PF-636 (Onmova Solutions). The resist compositions of Examples 1 to 21, Examples 23 to 33, and Comparative Examples 1 to 6 and 8 were of positive tone, while the resist compositions ofto Example 22 and Comparative Example 7 were of negative tone. 

[0193] The components in Tables 1 to 3 are as identified below. 

Organic Solvents: 

[0194] PGMEA (propylene glycol monomethyl ether acetate) 

[0195] CyH (cyclohexanone) 

