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# c12) United States Patent Hirano et al. 

# (54) PATTERN FORMING METHOD, ELECTRON BEAM- OR EXTREME ULTRAVIOLET-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventors: Shuji Hirano, Shizuoka (JP); Hiroo Takizawa, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 14/838,326 

Aug. 27, 2015 (22) Filed: 

## (65) Prior Publication Data 

US 2015/0370170 Al Dec. 24, 2015 

(63) Continuation of application No. PCT/JP2014/051019, filed on Jan. 20, 2014. 

## (30) Foreign Application Priority Data 

Feb. 28, 2013 (JP) ................................. 2013-039705 

(51) Int. Cl. 

<img src='content_image/914455.jpg'>

(52) U.S. Cl. CPC ............ G03F 712059 (2013.01); C08F 12124 (2013.01); G03F 710045 (2013.01); G03F 710046 (2013.01); G03F 71038 (2013.01); G03F 710392 (2013.01); G03F 710397 (2013.01); G03F 710758 (2013.01); G03F 7111 (2013.01); G03F 712004 (2013.01); G03F 712041 (2013.01); G03F 71325 (2013.01); C08F 20/30 (2013.01); C08F 20/58 (2013.01) 

( 58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

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## Related U.S. Application Data 

## U.S. PATENT DOCUMENTS 

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# (IO) Patent No.: US 9,612,535 B2 

# Apr. 4, 2017 (45) Date of Patent: 

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"International Search Report of PCT/JP2014/051019 (Form PCT/ ISA/210)", mailed on Apr. 15, 2014, with English translation thereof, pp. 1-5. 

"International Preliminary Report on Patentability; this report con› tains the following items :Form PCT/IB/373, PCT/ISA237(cover sheet), PCT/ISA237(Box No. I),PCT/ISA237(Box No. V),", mailed on Sep. 1, 2015, which is English translation of "Written Opinion of the International Searching Authority", p. 1-p. 7. 

"Office Action of Japanese Counterpart Application," issued on Sep. 1, 2015, with English translation thereof, p. 1-p. 10. 

"Office Action of Japan Counterpart Application," issued on Mar. 29, 2016, with Machine translation thereof, p. 1-p. 7. 

"Office Action of Japan Counterpart Application" with machine English translation, issued on Sep. 27, 2016, p. 1-p. 5. 

"Office Action of Korea Counterpart Application" with English translation thereof, issued on Dec. 1, 2016, p. 1-p. 14, in which the listed reference was cited. 

"Office Action of Taiwan Counterpart Application" with English translation thereof, issued on Dec. 21, 2016, p. 1-p. 10, in which the listed reference was cited. 

* cited by examiner 

Primary Examiner - Sin Lee 

(74) Attorney, Agent, or Firm - Jianq Chyun IP Office 

## (57) ABSTRACT 

According to one aspect of the present invention, there is provided a pattern forming method comprising, in this order: 

(1) forming a film by using an electron beam- or extreme ultraviolet-sensitive resin composition containing, in a specific amount, a resin (Aa) having a specific atom or substituent; 

(2) exposing the film by using an electron beam or extreme ultraviolet ray; and 

(3) forming a negative pattern by performing develop› ment using a developer including an organic solvent after the exposure. 

US009612535B2 

## FOREIGN PATENT DOCUMENTS 

## OTHER PUBLICATIONS 

## 14 Claims, No Drawings 

