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It should be noted that the present invention is not limited to the foregoing embodiment. The embodiment is just an exemplification, and any examples that have substantially the same feature and demonstrate the same functions and effects as those in the technical concept described in claims of the present invention are included in the technical scope of the present invention. 

What is claimed is: 

1. A resist composition comprising: 

an organic solvent; 

an acid generator, and 

a base resin comprising a polymer compound having one or more repeating units selected from repeating units al to a5 shown by the following general formulae (2-1) to (2-5), the polymer compound having a weight average molecular weight ranging from 1,000 to 500,000, 

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wherein R 1 and R 3 to R 5 represent a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms, an alkenyl group having 2 to 4 carbon atoms, or an alkynyl group having 2 to 4 carbon atoms; R $^{2 }$represents a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms, an alkenyl group having 2 to 4 carbon atoms, or an alkynyl group having 3 to 4 carbon atoms; R $^{6 }$represents a hydroxyl group or an alkoxy group or an acyloxy group having 1 to 6 carbon atoms; and "m" represents 1 or 2; X$^{1 }$to X$^{5 }$represent a single bond or -C(=0)---0-R 12 - where R $^{12 }$represents a lin› ear, branched, or cyclic alky lene group having 1 to 10 carbon atoms and optionally containing an ester group, an ether group, or a lactone ring; R $^{7 }$to R $^{11 }$represent a hydrogen atom or a methyl group; al to a5 satisfy 0sal <0.2, 0sa2<0.2, 0sa3<0.2, 0sa4<0.2, 0sa5<0.2, and 0<al+a2+a3+a4+ a5<0.2. 

2. The resist composition according to claim 1, wherein the polymer compound is further copolymerized with one or more repeating units b each containing an adhesion group selected from a hydroxyl group, a lactone ring, an ether group, an ester group, a carbonyl group, a cyano group, a sulfonate ester group, a sulfonamide group, cyclic -0----C (=0)-S-, and cyclic ---0-C(=O)-NH-, with a con› tent ratio of the repeating unit b of 0<b<l .0. 

3. The resist composition according to claim 2, wherein the repeating unit b contains either or both of a phenolic hydroxyl group and a lactone ring. 

4. The resist composition according to claim 3, wherein the repeating unit containing the phenolic hydroxyl group is selected from repeating units bl to b8 shown by the follow› ing general formulae (3), 

-continued 

