content_image/900704.jpg content_image/900705.jpg
<img src='content_image/900704.jpg'>

<img src='content_image/900705.jpg'>

When used, the quencher is preferably added in an amount of0.001 to 12 parts, more preferably 0.01 to 8 parts by weight per 100 parts by weight of the base resin (A). The inclusion of the quencher allows for easy control of resist sensitivity and holds down the diffusion rate of acid in the resist film, which leads to many advantages including improved resolution, minimized sensitivity change follow› ing exposure, reduced substrate poisoning and environment dependency, and improved exposure latitude and pattern profile. The quencher is also effective for improving adhe› sion to the substrate. The quencher may be used alone or in admixture. 

## Surfactant 

The resist composition may further comprise a surfactant which is insoluble or substantially insoluble in water and soluble in alkaline developer, and/or a surfactant which is insoluble or substantially insoluble in water and alkaline 

