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# c12) United States Patent Sagehashi et al. 

# (54) MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventors: Masayoshi Sagehashi, Joetsu (JP); Takayuki Fujiwara, Joetsu (JP); Koji Hasegawa, Joetsu (JP); Ryosuke Taniguchi, Joetsu (JP) 

(73) Assignee: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 14/697,901 

(22) Filed: Apr. 28, 2015 

## (65) Prior Publication Data 

US 2015/0323865 Al Nov. 12, 2015 

## (30) Foreign Application Priority Data 

May 9, 2014 (JP) ................................. 2014-097347 

(51) Int. Cl. 

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(52) U.S. Cl. CPC ............ G03F 710397 (2013.01); C07D 307183 (2013.01); C07D 3071935 (2013.01); (Continued) 

( 58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

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## U.S. PATENT DOCUMENTS 

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# (IO) Patent No.: US 9,256,127 B2 

# (45) Date of Patent: Feb.9,2016 

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Primary Examiner - Sin Lee 

(74) Attorney, Agent, or Firm - Westerman, Hattori, Daniels & Adrian, LLP 

## (57) ABSTRACT 

A polymer for resist use is obtainable from a monomer having formula (1) wherein R$^{1 }$is H, CH$_{3 }$ or CF 3, R$^{2 }$andR$^{3 }$each are Hor a monovalent hydrocarbon group, X $^{1 }$is a divalent hydro› carbon group, k$^{1}$=0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, con› trolled acid diffusion and low roughness during both alkaline development and organic solvent development. 

US009256127B2 

## FOREIGN PATENT DOCUMENTS 

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## 17 Claims, 1 Drawing Sheet 

