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From the results shown in Table 11, it is understood that the Examples lG to 14G which used the active light sensi› tive or radiation sensitive resin composition of the present invention are excellent in sensitivity, resolving power, pat› tern shape, and LER in comparison with Comparative Examples lG to 4G which did not use the compound (A). Examples 1 G, 2G, 4G; 6G and 8G which used the compound where X$_{1 }$ or X$_{2 }$ was a group represented by -S- in General Formula (I) or (II) are particularly excellent in the LER performance, while Examples 3G, 5G, 7Q, 9G to 14G which used the compound where X$_{1 }$ or X$_{2 }$ was a group represented by -NH- and -NR 1 - in General Formula (I) or (II) are particularly excellent in the resolving power. 

According to the present invention, it is possible to provide a compound and an active light sensitive or radia› tion sensitive resin composition which are able to form ultrafine (for example, a line width of 50 nm or less) patterns in a state in which high resolution (for example, high resolving power), excellent pattern shape, and low line edge roughness (LER) are satisfied at the same time. 

In addition, according to the present invention, it is possible to provide a resist film using the active light sensitive or radiation sensitive resin composition described above, a resist-coated mask blank, a photomask, a pattern forming method, a method for manufacturing an electronic device, and an electronic device. 

Detailed description was given of the present invention with reference to specific embodiments; however, it will be obvious to a person skilled in the art that it is possible to make various changes and modifications without departing from the spirit and scope of the present invention. 

This application is based on Japanese Patent Application (JP 2013-145015) filed on Jul. 10, 2013 and Japanese Patent Application (JP 2014-026904) filed on Feb. 14, 2014, the contents of which are incorporated herein by reference. 

What is claimed is: 

1. An active light sensitive or radiation sensitive resin composition comprising: 

a compound (A) represented by General Formula (I) below, 

in the formula, 

Y$_{1 }$ represents a monovalent organic group; 

M$_{1 }$ + represents an organic onium ion; 

X$_{1 }$ represents a group which is represented by -S-, -NH-, or -NR 1 -; R 1 represents a monovalent organic group; 

nl represents an integer of 1 or more; and 1 

R and Y $_{1 }$ may bond with each other to form a ring; (B) a resin, and a solvent, 

## INDUSTRIAL APPLICABILITY 

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(I) 

(II) 

wherein, in General Formula (I), Y$_{1 }$ is a monovalent hydrocarbon group which has an alicyclic hydrocarbon structure having 5 or more carbon atoms. 

2. The active light sensitive or radiation sensitive resin composition according to claim 1, 

wherein, in General Formula (I), X$_{1 }$ is a group which is represented by -NH- or -NR 1 -. 

3. The active light sensitive or radiation sensitive resin composition according to claim 1, 

wherein, in General Formula (I), X$_{1 }$ is a group which is represented by -S-. 

4. The active light sensitive or radiation sensitive resin composition according to claim 1, 

wherein the resin (B) has a phenolic hydroxyl group. 

5. The active light sensitive or radiation sensitive resin composition according to claim 4, 

wherein the resin (B) is a resin which has a repeating unit represented by General Formula (1) below: 

in General Formula (1), 

R$_{11 }$ represents a hydrogen atom, a methyl group, or a halogen atom; 

B$_{1 }$ represents a single bond or a divalent linking group; Ar represents an aromatic ring; and ml represents an integer of 1 or more. 

6. The active light sensitive or radiation sensitive resin composition according to claim 4, 

wherein the resin (B) is a resin which has a repeating unit represented by General Formula (A) below: 

in General Formula (A), 

R$_{0}$ $^{i, R}$02, and R$_{03 }$each independently represent a hydro› gen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group; 

Ar $_{1 }$represents an aromatic ring group; 

R$_{03 }$ and Ar$_{1 }$ may bond with each other to form a 5- or 6-membered ring with a main chain of the repeating unit represented by General Formula (A); 

n Y’s each independently represent a hydrogen atom or a group which is released due to an action of an acid; 

at least one Y represents a group which is released due to an action of an acid; and n represents an integer of 1 to 4. 

7. The active light sensitive or radiation sensitive resin composition according to claim 1, further comprising: an acid cross-linkable compound (C). 

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(1) 

(A) 

