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C-4 50 

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3) Preparation of Resist Composition 

## Examples 3-1 to 3-8 & Comparative Examples 1-1 to 1-7 

Resist compositions in solution form were prepared by dissolving a base resin (Polymers P-1 to P-15), optionally a sulfonium salt other than the sulfonium salts of Examples 1-1 to 1-7 (PAG-A to PAG-C), quencher (Q-1), and alkali- soluble surfactant (SF-1) in an organic solvent containing 0.01 wt % of surfactant A, and filtering through a Teflonfi filter with a pore size of 0.2 µm. Tables 5 and 6 show the formulation of the resulting resist compositions. 

The solvent, quencher (Q-1 ), sulfonium salt other than the above-synthesized sulfonium salts (PAG-A to PAG-C), alkali-soluble surfactant (SF-1) and surfactant A used herein are identified below. 

