content_image/895900.jpg content_image/895907.jpg content_image/895901.jpg content_image/895906.jpg content_image/895908.jpg
wherein, in the formula (M), 

Y $_{1 }$ and Y $_{2 }$ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group; 

Z represents a hydrogen atom or a substituent; and * represents a linking site with the aromatic ring. 17. A compound represented by the following general formula (I): 

<img src='content_image/895900.jpg'>

wherein, in the formula (I), 

M + represents a sulfonium cation; 

X represents an alkyl group, a cycloalkyl group, an aryl group, a halogen atom, a hydroxyl group, an alkoxy group, or an acyl group; 

Z represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an acyl group; 

n represents an integer of 1 to 3; 

o represents an integer of 1 to 5; 

p represents an integer of O to 4; and o+ps5 is satisfied. 

18. An actinic ray-sensitive or radiation-sensitive resin composition comprising: 

a compound (A) which generates an acid by irradiation with actinic rays or radiation, 

wherein the acid includes an aromatic heterocyclic struc› ture, and the aromatic heterocyclic structure is linked with at least one group represented by the following 35 general formula (M), 

wherein, in the formula (M), 

Y $_{1 }$ and Y $_{2 }$ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group; 

Z represents a hydrogen atom or a substituent; and * represents a linking site with a residue of the aromatic heterocyclic structure. 

19. A negative-tone pattern forming method comprising: forming a film using an actinic ray-sensitive or radiation› sensitive resin composition comprising a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid includes a structure represented by the following general formula (9); exposing the film; 

<img src='content_image/895907.jpg'>

(I) 

(M) 

and developing the exposed film with a developer con› taining an organic solvent, 

wherein the actinic ray-sensitive or radiation-sensitive resin composition further comprises a compound (Bl) having a phenolic hydroxyl group and a compound (B2) having a group which is capable of decomposing by the action of an acid, 

the compound (Bl) having a phenolic hydroxyl group includes a polymer compound having at least one kind of repeating unit represented by the following general formula (1 ), 

wherein, in the formula (9), 

A represents a divalent linking group; 

B represents an aromatic ring; 

Y $_{1 }$ and Y $_{2 }$ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group; 

Z represents a hydrogen atom or a substituent; and o represents an integer of 1 to 5, and 

wherein, in the general formula (1 ), 

R$_{11 }$ represents a hydrogen atom, a methyl group which may have a substituent, or a halogen atom; 

B$_{1 }$ represents a single bond or a divalent linking group; 

Ar represents an aromatic ring; and 

ml represents an integer of 1 or more. 

20. The negative-tone pattern forming method according to claim 19, wherein the following group in the general formula (9) is a hydroxymethyl group or an alkoxymethyl group 

<img src='content_image/895901.jpg'>

<img src='content_image/895906.jpg'>

<img src='content_image/895908.jpg'>

* 

* 

* 

* 

* 

(9) 

(1) 

