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. (B) may . he base resm . foregoing umts, ~ n oxetane nng or In addition to the ring units havmg a oxirane ring- rise recur . f oxetane or .nk din further comp lymerizat10n o . film is crossh e •rane ring. Capo that the resist . t film is thus ox1 . . units ensures d region of res1s contammg . The expose . d reg10n. h es1stance. •t the expose . and etc r rring um d • retent10n . . the recu improve m mer prov1dmg h below, but f the mono • are s own Examples o ring or oxir~e nndg fined above. h •ng an oxetane . RA is as e av1 h to Herem not limited t ere . 

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