content_image/890929.jpg content_image/890930.jpg content_image/890934.jpg content_image/890931.jpg content_image/890932.jpg content_image/890933.jpg
which at least one hydrogen atom may be substituted by halogen, trifluoromethyl, C$_{1 }$-C$_{10 }$ straight, branched or cyclic alkyl, C$_{1 }$-C$_{10 }$ straight, branched or cyclic alkoxy, hydroxyl, carboxyl, C$_{2}$-C$_{10 }$ straight, branched or cyclic alkoxycarbonyl, nitro and/or cyano; m is an 5 integer of 1 to 5, n is an integer of0 to 3, pis an integer of 1 to 4, and q is an integer of 1 to 3. 

2. The resist composition of claim 1 wherein m is equal to 3. 

3. The resist composition of claim 1 wherein the acid generator is capable of generating a sulfonic acid, imide acid or methide acid. 

4. The resist composition of claim 1, further comprising an organic solvent. 

5. The resist composition of claim 1 wherein the base polymer comprises recurring units having the formula (al) or recurring units having the formula (a2): 

wherein RA is each independently hydrogen or methyl, R$^{11 }$and R$^{12 }$each are an acid labile group, Y$^{1 }$is a single bond, phenylene group, naphthylene group, or C$_{1 }$-C$_{12 }$ linking group containing an ester moiety and/or lactone ring, and Y 2 is a single bond or ester group. 

6. The resist composition of claim 5, further comprising a dissolution inhibitor. 

7. The resist composition of claim 5 which is a chemically amplified positive resist composition. 

8. The resist composition of claim 1 wherein the base polymer is free of an acid labile group. 

9. The resist composition of claim 8, further comprising a crosslinker. 

10. The resist composition of claim 8 which is a chemi› cally amplified negative resist composition. 

11. The resist composition of claim 1, further comprising a surfactant. 

<img src='content_image/890929.jpg'>

<img src='content_image/890930.jpg'>

12. A resist composition comprising a base polymer and a quencher containing an iodonium salt having the formula (A): 

<img src='content_image/890934.jpg'>

wherein R 1 is a hydroxyl group, C$_{1}$-C$_{6 }$ straight, branched or cyclic alkyl or alkoxy group, C$_{2}$-C$_{6 }$ straight, branched or cyclic acyloxy group, fluorine, chlorine, bromine, amino, -NR$^{5}$-C(=O)-R 6 , or-NR $^{5}$----C (=O)-O-R 6 , R 5 is hydrogen or a C$_{1}$-C$_{6 }$ straight, branched or cyclic alkyl group, R 6 is a C$_{1 }$-C$_{6 }$ straight, branched or cyclic alkyl group or C$_{2}$ -C$_{8 }$ straight, branched or cyclic alkenyl group, X $^{1 }$is a single bond or a ( q+ 1 )-valent C$_{1 }$-C$_{20 }$ linking group which may contain at least one moiety selected from ether, carbonyl, ester, amide, sultone, lactam, carbonate, halogen, hydroxyl and carboxyl; X 2 is an ether, ester or amide group; R 2 and R 3 are each independently trifluoromethyl or a C$_{6}$-C$_{10 }$ aryl, C$_{2}$ -C$_{6 }$ alkenyl or C$_{2}$-C$_{6 }$ alkynyl group in which at least one hydrogen atom may be substituted by halogen, trifluoromethyl, C$_{1 }$-C$_{10 }$ straight, branched or cyclic alkyl, C$_{1 }$-C$_{10 }$ straight, branched or cyclic alkoxy, hydroxyl, carboxyl, C$_{2}$-C$_{10 }$ straight, branched or cyclic alkoxycarbonyl, nitro and/or cyano; m is an integer of 1 to 5, n is an integer of0 to 3, pis an integer of 1 to 4, and q is an integer of 1 to 3, 

wherein the base polymer further comprises recurring units of at least one type selected from the formulae (fl) to (f3): 

<img src='content_image/890931.jpg'>

<img src='content_image/890932.jpg'>

<img src='content_image/890933.jpg'>

