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# c12) United States Patent 

# Ahmadpour 

# (54) SHELF-STABLE HYDROGEN PEROXIDE ANTIMICROBIAL COMPOSITIONS 

(71) Applicant: VIROX TECHNOLOGIES INC., Oakville, Ontario (CA) 

(72) Inventor: Faraz Ahmadpour, Mississauga (CA) 

(73) Assignee: VIROX TECHNOLOGIES INC., Oakville, Ontario (CA) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by 118 days. 

(21) Appl. No.: 15/786,632 

(22) Filed: Oct. 18, 2017 

## (65) Prior Publication Data 

US 2019/0112553 Al Apr. 18, 2019 

(51) Int. Cl. 

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(52) U.S. Cl. CPC ............ CllD 3/3942 (2013.01); A0lN 37110 (2013.01); A0lN 37140 (2013.01); A0lN 41104 (2013.01); 

(58) Field of Classification Search CPC ................................ CllD 3/48; CllD 3/3942 

## (56) References Cited 

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## U.S. PATENT DOCUMENTS 

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# (IO) Patent No.: US 10,450,535 B2 

# (45) Date of Patent: Oct. 22, 2019 

## FOREIGN PATENT DOCUMENTS 

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Baldry, M .. G.C., "The bactericidal, fungicidal and sporicidal prop› erties of hydrogen perioxide and peracetic acid", Journal of Applied Bacteriology, 34, 417-423, and especially p. 418 (top left column) and 421 (top right column) thereof, 1982. 

Primary Examiner - Gregory E Webb (74) Attorney, Agent, or Firm - Clark & Brody 

## (57) ABSTRACT 

A disinfecting solution includes hydrogen peroxide at a concentration of from about 1.5% w/w to 8% w/w; at least one readily biodegradable anionic surfactant in a concen› tration of from about 10% w/w to about 25% w/w; at least one of salicylic acid and salts thereof, in a concentration of from about 1 % w/w to about 8% w/w; at least one chelating agent in a concentration of from about 0.005% w/w to about 10% w/w; and at least one low-corrosive non-surfactant sulfonic acid selected from benzenesulfonic acid, benzene disulfonic acid, xylene sulfonic acid, toluene sulfonic acid, cumene sulfonic acid, sulfosalicylic acid, naphthalene mono- or di-sulfonic acid, methane sulfonic acid, and ise› thionic acid in a concentration of from about 1 % w/w to about 15% w/w. The solution is free of acetic acid, furoic acid, phenylacetic acid, cationic surfactants, amphoteric surfactants, aromatic alcohols, halogen acids, phenols, peracid activators, bleaches, and (optionally) benzoic acid. 

US010450535B2 

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## OTHER PUBLICATIONS 

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## 24 Claims, 2 Drawing Sheets 

