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[0203] It is demonstrated in Tables 1 to 3 that resist compositions comprising an iodized aromatic ring-contain› ing amine compound form patterns having a high sensitivity and a reduced value of CDU. 

[0204] Japanese Patent Application No. 2018-150050 is incorporated herein by reference. 

[0205] Although some preferred embodiments have been described, many modifications and variations may be made thereto in light of the above teachings. It is therefore to be $^{("}$ 

understood that the invention may be practiced otherwise than as specifically described without departing from the scope of the appended claims. 

1. A resist composition comprising a base polymer and a quencher, the quencher being an amine compound having an iodine-substituted aromatic ring bonded to the nitrogen atom via a C$_{1 }$-C$_{20 }$divalent hydrocarbon group which may contain at least one moiety selected from ester bond and ether bond. 

