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# c19) United States 

# c12) Patent Application Publication Mizutani 

# (54) POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 

(75) Inventor: Kazuyoshi Mizutani, Shizuoka (JP) 

Correspondence Address: SUGHRUE-265550 2100 PENNSYLVANIA AVE. NW WASHINGTON, DC 20037-3213 (US) 

(73) Assignee: FUJI PHOTO FILM CO., LTD. 

(21) Appl. No.: 11/529,442 

(22) Filed: Sep. 29, 2006 

## (30) Foreign Application Priority Data 

Sep. 29, 2005 (JP) ................................... P.2005-285022 

(51) Int. Cl. G03C 1100 (2006.01) 

(52) U.S. Cl. .......................................................... 430/270.1 

## (57) ABSTRACT 

A positive resist composition including: (A-1) a resin of which a solubility in an alkali developer increases under the 

## Publication Classification 

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US 20070072121Al 

# c10) Pub. No.: US 2007/0072121 Al 

# (43) Pub. Date: Mar. 29, 2007 

action of an acid, the resin including a repeating unit represented by formula (Ia) and a repeating unit represented by formula (Al); and (B) a compound capable of generating an acid upon irradiation with one of actinic ray and radia› tion: 

wherein 

in the formula (Ia), AR represents an aromatic group, and X$_{1 }$ represents a group having a carbon number of 5 or more and being capable of decomposing under the action of an acid, and in the formula (Al), m represents an integer of one of 1 and 2. 

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