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# c12) United States Patent Kamimura et al. 

# (54) PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventors: Sou Kamimura, Haibara-gun (JP); Hidenori Takahashi, Haibara-gun (JP); Keita Kato, Haibara-gun (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 14/607,146 

(22) Filed: Jan. 28, 2015 

## (65) Prior Publication Data 

US 2015/0147699 Al May 28, 2015 

(63) Continuation of application No. PCT/JP2013/076178, filed on Sep. 19, 2013. 

## (30) Foreign Application Priority Data 

Sep. 28, 2012 (JP) ................................. 2012-217564 

(51) Int. Cl. 

<img src='content_image/914779.jpg'>

(52) U.S. Cl. CPC ........... G03F 710388 (2013.01); C08F 212114 (2013.01); C08F 220104 (2013.01); C08F 220118 (2013.01); C08F 220126 (2013.01); C08F 220128 (2013.01); C08F 220158 (2013.01); G03F 71038 (2013.01); G03F 710392 (2013.01); G03F 710397 (2013.01); G03F 7120 (2013.01); G03F 712002 (2013.01); G03F 712037 (2013.01); G03F 7130 (2013.01); G03F 71325 (2013.01); G03F 7140 (2013.01); C08F 212/32 (2013.01) 

( 58) Field of Classification Search None See application file for complete search history. 

## Related U.S. Application Data 

<img src='content_image/914753.jpg'>

# (IO) Patent No.: US 9,513,547 B2 

# (45) Date of Patent: Dec. 6, 2016 

## (56) References Cited 

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<img src='content_image/914778.jpg'>

Machine translation of JP 2010-164958 (2010).* 

Primary Examiner - Martin Angebranndt 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

The pattern forming method of the present invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin (A) which has a repeating unit including a group capable of generating a polar group by being decomposed due to an action of an acid and a repeating unit including a carboxyl group, a compound (B) which generates an acid according to irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film using a KrF excimer laser, extreme ultraviolet rays, or an electron beam; and (iii) forming a negative tone pattern by developing the exposed film using a developer which includes an organic solvent. 

US009513547B2 

## U.S. PATENT DOCUMENTS 

## FOREIGN PATENT DOCUMENTS 

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## OTHER PUBLICATIONS 

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## 22 Claims, No Drawings 

