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# c12) United States Patent Tsuchimura et al. 

# (54) NEGATIVE RESIST COMPOSITION, RESIST FILM USING SAME, PATTERN FORMING METHOD, AND MASK BLANK PROVIDED WITH RESIST FILM 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventors: Tomotaka Tsuchimura, Shizuoka (JP); Tadateru Yatsuo, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by O days. days. 

(21) Appl. No.: 14/794,393 

(22) Filed: Jul. 8, 2015 

## (65) Prior Publication Data 

US 2015/0309408 Al Oct. 29, 2015 

(63) Continuation of application No. PCT/JP2014/050162, filed on Jan. 8, 2014. 

## (30) Foreign Application Priority Data 

Jan. 10, 2013 (JP) ................................. 2013-002922 

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(52) U.S. Cl. CPC ................ G03F 71038 (2013.01); G03F 1150 (2013.01); G03F 1176 (2013.01); G03F 710045 (2013.01); G03F 710046 (2013.01); G03F 710382 (2013.01); G03F 7120 (2013.01); G03F 7140 (2013.01) 

(58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

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## Related U.S. Application Data 

## U.S. PATENT DOCUMENTS 

<img src='content_image/889105.jpg'>

# (IO) Patent No.: US 10,007,180 B2 

# (45) Date of Patent: Jun.26,2018 

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## FOREIGN PATENT DOCUMENTS 

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Machine translation of JP 2005-308969 (2005).* 

Machine translation of JP 2003-307839 (2003).* 

Machine translation of JP 09-241234 (1997).* 

Machine translation of JP 2012-159688 (2012).* 

Machine translation of JP 2003-121999 (2003).* 

Machine translation of JP 2009-053665 (2009). * 

Office Action dated Feb. 23, 2016 in Japanese Application No. 2013-002922. 

International Preliminary Report on Patentability dated Jul. 23, 2015, issued by the International Bureau of WIPO in counterpart Application No. PCT/JP2014/050162. 

International Search Report for PCT/JP2014/050162 dated Mar. 25, 2014. 

Office Action dated Jan. 25, 2017 from the Taiwanese Patent Office in counterpart Taiwanese Application No. 103100840. 

Office Action dated Oct. 19, 2016, in corresponding Korean Appli› cation No. 10-2015-7018164, 10 pages in Korean and English. 

Office Action dated Aug. 23, 2016, from the Japanese Patent Office in counterpart Japanese Application No. 2013-002922. 

Office Action dated Nov. 24, 2017 from the Korean Patent Office in counterpart Korean Application No. 10-2015-7018164. 

Notification of Reason for Refusal, dated April 23, 2018, issued in corresponding Korean Application No. 10-2015-7018164, 9 pages in Korean and English. 

* cited by examiner 

Primary Examiner - Martin J Angebranndt 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

A negative resist composition includes an onium salt com› pound (A) containing a nitrogen atom in its cation moiety, a compound (B) that is configured to produce an acid when exposed to actinic rays or radiation, and a compound (C) containing an acid-crosslinkable group. 

USO 10007180B2 

## OTHER PUBLICATIONS 

## 12 Claims, No Drawings 

