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[0175] It is demonstrated in Tables 1 to 3 that resist compositions comprising amine compounds containing an iodized aromatic ring and a tertiary ester structure form patterns having a high sensitivity and a reduced value of CDU. 

[0176] Japanese Patent Application No. 2019-010892 is incorporated herein by reference. 

[0177] Although some preferred embodiments have been described, many modifications and variations may be made thereto in light of the above teachings. It is therefore to be understood that the invention may be practiced otherwise than as specifically described without departing from the scope of the appended claims. 

1. A resist composition comprising a base polymer and a quencher, the quencher containing at least one compound selected from amine compounds having the formula (A-1) and amine compounds having the formula (A-2): 

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wherein X is a single bond or a C 1 -C$_{20 }$ divalent linking group which may contain an ether bond, carbonyl moiety, ester bond, amide bond, sultone ring, lactam ring, carbonate bond, halogen, hydroxyl moiety or carboxyl moiety, 1 

R is hydrogen, hydroxyl, an optionally halo-substi› tuted C 1 -C$_{6 }$ alkyl group, optionally halo-substituted C 1 -C$_{6 }$ alkoxy group, optionally halo-substituted C 2 -C$_{6 }$ acyloxy group, optionally halo-substituted 

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C 1 -C 4 alkylsulfonyloxy group, fluorine, chlorine, bromine, amino, nitro, cyano, -NR 1 A---C(=O)› R1B, or -NR 1 A-C(=O)-O-R 1 B, R 1 A is hydro› gen or a C 1 -C$_{6 }$ alkyl group, R 1 B is a C 1 -C$_{6 }$ alkyl group or C 2 -C 5 alkenyl group, 

R 2 and R 3 are each independently a C 1 -C$_{6 }$ alkyl group, R 2 and R $^{3 }$may bond together to form a ring with the carbon atom to which they are attached, 

R 4 and R 6 are each independently hydrogen, a C 1 -C 4 straight or branched alkyl group, C 2 -C 12 straight or branched alkoxycarbonyl group, CcC 15 aryloxycar› bonyl group, or CcC 14 aralkyloxycarbonyl group, 

R 5 is a C 1 -C$_{6 }$ alkyl group, C 2 -C$_{6 }$ alkenyl group, C 2 -C$_{6 }$ alkynyl group, or CcC$_{12 }$ aryl group, 

R is a C 2 -C$_{10 }$ alicyclic group to form a ring with the nitrogen atom, 

m is an integer of 1 to 5, n is an integer of Oto 4, and lsm+ns5, and pis 1 or 2. 

2. The resist composition of claim 1, further comprising an acid generator capable of generating a sulfonic acid, imide acid or methide acid. 

3. The resist composition of claim 1, further comprising an organic solvent. 

4. The resist composition of claim 1 wherein the base polymer comprises recurring units having the formula (al) or recurring units having the formula (a2): 

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