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[0390] Specific examples of the group represented by Gen› eral Formula (F3) include those exemplified in "0500" of US2012/0251948Al. 

[0391] Specific examples of the group represented by Gen› eral Formula (F4) include ----C(CF$_{3}$ ) $_{2}$OH, -C(C$_{2}$F$_{5}$ ) $_{2}$OH, -C(CF$_{3}$)(CH$_{3}$)OH, and -CH(CF$_{3}$)OH, with ----C(CF$_{3}$ ) $_{2}$OH being preferable. 

[0392] The partial structure having a fluorine atom may be bonded directly to the main chain or may be bonded to the main chain through a group selected from the group consist› ing of an alkylene group, a phenylene group, an ether bond, a thioether bond, a carbonyl group, an ester bond, an amide bond, a urethane bond, and a ureylene bond, or a group formed by combination of two or more thereof. 

[0393] The hydrophobic resin may contain a silicon atom. As a partial structure having a silicon atom, a resin having an alkylsilyl structure (preferably a trialkylsilyl group), or a cyclic siloxane structure is preferable. 

[0394] Examples of the alkylsilyl structure or the cyclic siloxane structure include the partial structures described in paragraphs "0304" to "0307" of JP2013-l 78370A. 

[0395] Examples of the repeating unit having a fluorine atom or a silicon atom include those exemplified in "0519" of US2012/0251948Al. 

[0396] Furthermore, it is also preferable that the hydropho› bic resin contains a CH$_{3 }$ partial structure in the side chain portion as described above. 

[0397] Here, the CH$_{3 }$ partial structure contained in the side chain portion in the hydrophobic resin includes a CH$_{3 }$ partial structure contained in an ethyl group, a propyl group, and the like. 

[0398] On the other hand, a methyl group bonded directly to the main chain of the hydrophobic resin (for example, an ao-methyl group in the repeating unit having a methacrylic acid structure) makes only a small contribution of uneven distribution to the surface of the hydrophobic resin due to the effect of the main chain, and it is therefore not included in the CH$_{3 }$ partial structure. 

[0399] More specifically, in the case where the hydropho› bic resin contains a repeating unit derived from a monomer having a polymerizable moiety with a carbon-carbon double bond, such as a repeating unit represented by the following General Formula (M), and in addition, R$_{11 }$ to R$_{14 }$are CH$_{3 }$ "themselves", such CH$_{3 }$ is not included in the CH$_{3 }$ partial structure contained in the side chain portion in the present invention. 

[0400] On the other hand, a CH$_{3 }$ partial structure which is present via a certain atom from a C----C main chain corre› sponds to the CH$_{3 }$ partial structure in the present invention. For example, in a case where R$_{11 }$is an ethyl group (CH$_{2}$CH$_{3}$), the structure has "one" CH$_{3 }$ partial structure in the present invention. 

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[0401] In General Formula (M), 

[0402] R$_{11 }$to R$_{14 }$each independently represent a side chain portion. 

[0403] Examples of R$_{11 }$ to R$_{14 }$ at the side chain portion include a hydrogen atom and a monovalent organic group. 

[0404] Examples of the monovalent organic group for R$_{11 }$ to R$_{14 }$ include an alkyl group, a cycloalkyl group, an aryl group, an alkyloxycarbonyl group, a cycloalkyloxycarbonyl group, an aryloxycarbonyl group, an alkylaminocarbonyl group, a cycloalkylaminocarbonyl group, and an arylami› nocarbonyl group, each of which may further have a substitu› ent. 

[0405] The hydrophobic resin is preferably a resin includ› ing a repeating unit having the CH$_{3 }$partial structure in the side chain portion thereof. Further, the hydrophobic resin prefer› ably has, as such a repeating unit, at least one repeating unit (x) selected from a repeating unit represented by the follow› ing General Formula (II) and a repeating unit represented by the following General Formula (III). 

[0406] Hereinafter, the repeating unit represented by Gen› eral Formula (II) will be described in detail. 

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[0407] In General Formula (II), X$_{61 }$represents a hydrogen atom, an alkyl group, a cyano group, or a halogen atom, and R$_{2 }$ represents an organic group which has one or more CH$_{3 }$ partial structures and is stable against an acid. Here, more specifically, the organic group which is stable against an acid is preferably an organic group which does not have "the acid-decomposable group" as mentioned with respect to the resin (A). 

[0408] The alkyl group ofX$_{61 }$ is preferably an alkyl group having 1 to 4 carbon atoms, and examples include a methyl group, an ethyl group, a propyl group, a hydroxymethyl group, and a trifluoromethyl group, with the methyl group being preferable. 

[0409] X$_{61 }$ is preferably a hydrogen atom or a methyl group. 

[0410] Examples ofR$_{2 }$include an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an aryl group, and an aralkyl group, each of which has one or more CH$_{3 }$ partial structures. Each of the cycloalkyl group, the alkenyl group, the cycloalkenyl group, the aryl group and the aralkyl group may further have an alkyl group as a substituent. 

[0411] R$_{2 }$ is preferably an alkyl group or an alkyl-substi› tuted cycloalkyl group, each of which has one or more CH$_{3 }$ partial structures. 

[0412] The number of the CH$_{3 }$ partial structures contained in the organic group which has one or more CH$_{3 }$ partial structures and is stable against an acid as R$_{2 }$ is preferably 2 to 10, and more preferably 2 to 8. 

[0413] Specific preferred examples of the repeating unit represented by General Formula (II) are set forth below, but the present invention is not limited thereto. 

