content_image/916368.jpg content_image/916373.jpg content_image/916369.jpg content_image/916370.jpg content_image/916371.jpg content_image/916372.jpg
wherein R 1 , R 2 , R 3 , and R 4 are as defined above, L’ is a single bond or C$_{2}$-C$_{5 }$ alkylene group, RY is a straight C$_{1 }$-C$_{20 }$or branched or cyclic C$_{3}$-C$_{20 }$monovalent hydro- carbon group which may be substituted with or sepa› rated by a heteroatom, A is hydrogen or trifluoromethyl, L" is a single bond or a straight C$_{1 }$-C$_{20 }$or branched or cyclic C$_{3}$-C$_{20 }$divalent hydrocarbon group which may be substituted with or separated by a heteroatom, n is O or 1, with the proviso that n is O when L" is a single bond. 

15. The resist composition of claim 13, further comprising a photoacid generator having the general formula ( 4 ): 

whereinR 2 , R 3 , andR $^{4 }$areas definedabove,x- is an anion of any one of the general formulae ( 5) to (8): 

<img src='content_image/916368.jpg'>

-continued 

<img src='content_image/916373.jpg'>

whereinRa 1 , R 61 , R 62 , Rel, Rc 2 , andRc3 are each indepen› dently fluorine or a straight C$_{1 }$-C$_{40 }$or branched or cyclic C$_{3}$-C$_{40 }$monovalent hydrocarbon group which may be substituted with or separated by a heteroatom, R$^{61 }$and R 62 , or Rel and Rc 2 may bond together to form a ring with -CF $_{2}$-S0$_{2}$ - group to which they are attached, Rd 1 is a straight C$_{1}$-C$_{40 }$ or branched or cyclic C$_{3}$ -C$_{40 }$ monovalent hydrocarbon group which may be substi› tuted with or separated by a heteroatom. 

16. The resist composition of claim 13, further comprising a nitrogen-containing compound. 

17. The resist composition of claim 13, further comprising surfactant which is insoluble in water and soluble in alkaline developer. 

<img src='content_image/916369.jpg'>

<img src='content_image/916370.jpg'>

<img src='content_image/916371.jpg'>

<img src='content_image/916372.jpg'>

* * * * * 

