content_image/901390.jpg content_image/901359.jpg content_image/901382.jpg
# c12) United States Patent 

# Hatakeyama et al. 

# (54) RESIST COMPOSITION AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventors: Jun Hatakeyama, Joetsu (JP); Masaki Ohashi, Joetsu (JP) 

(73) Assignee: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

( * ) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 15/666,731 

(22) Filed: Aug. 2, 2017 

## (65) Prior Publication Data 

US 2018/0039173 Al Feb. 8, 2018 

## (30) Foreign Application Priority Data 

Aug. 8, 2016 (JP) ................................. 2016-155516 

(51) Int. Cl. 

<img src='content_image/901390.jpg'>

(52) U.S. Cl. CPC ............ G03F 710045 (2013.01); C07C 69/63 (2013.01); C07C 303132 (2013.01); C07C 309/04 (2013.01); C07C 309/06 (2013.01); C07C 309/17 (2013.01); C07C 309/19 (2013.01); C07C 309/23 (2013.01); C07C 309124 (2013.01); C08F 212102 (2013.01); C08F 220118 (2013.01); C08F 220122 

<img src='content_image/901359.jpg'>

# (IO) Patent No.: US 10,101,653 B2 

# Oct. 16, 2018 (45) Date of Patent: 

(58) Field of Classification Search CPC .... G03F 7/0045; G03F 7/0382; G03F 7/0397; G03F 7/2006; G03F 7/2037; G03F 7/38; G03F 7/40; C07C 303/32; C07C 309/04; C07C 309/06; C07C 309/09; C07C 309/17; C07C 309/19; C07C 309/23; C07C 309/24; C07C 69/63; C08F 212/02; C08F 220/22; C08F 220/24; C08F 220/38; C08F 2220/282; C08F 2220/283; C08F 2220/303; C08F 2220/382; C08F 224/00; C08F 228/02 USPC ..... 430/270.1, 905, 907, 910, 921; 526/243, 526/245, 247, 248, 249, 266, 280, 281, 526/282, 286, 287, 288, 291, 292.1, 526/292.5, 292.9, 293, 294; 560/147, 560/149, 226, 227, 228; 562/41, 42, 100, 562/109, 110, 111, 113 

## (56) References Cited 

<img src='content_image/901382.jpg'>

* cited by examiner 

Primary Examiner - John S Chu 

(74) Attorney, Agent, or Firm - Westerman, Hattori, Daniels & Adrian, LLP 

## (57) ABSTRACT 

A resist composition comprising a base polymer and a sulfonium or iodonium salt of iodinated phenoxy or iodi› nated phenylalkoxy-containing fluorinated sulfonic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone. 

See application file for complete search history. 

US010101653B2 

(2013.01); C08F 220124 (2013.01); C08F 220128 (2013.01); C08F 220138 (2013.01); C08F 224100 (2013.01); C08F 228102 (2013.01); G03F 710046 (2013.01); G03F 710048 (2013.01); G03F 710382 (2013.01); G03F 710392 (2013.01); G03F 710397 (2013.01); G03F 71162 (2013.01); G03F 71168 (2013.01); G03F 712004 (2013.01); G03F 712006 (2013.01); G03F 712037 (2013.01); G03F 712041 (2013.01); G03F 71322 (2013.01); G03F 71325 (2013.01); G03F 7138 (2013.01); C08F 2220/185 (2013.01); C08F 2220/1866 (2013.01); C08F 2220/281 (2013.01); C08F 2220/282 (2013.01); C08F 2220/283 (2013.01); C08F 2220/303 (2013.01); C08F 2220/382 (2013.01) 

## U.S. PATENT DOCUMENTS 

## 13 Claims, No Drawings 

