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# c12) United States Patent 

# Gallagher et al. 

# (54) COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY 

(75) Inventors: Michael K. Gallagher, Hopkinton, MA (US); Gerald B. Wayton, Leicester, MA (US); Gregory P. Prokopowicz, Lancaster, MA (US); Stewart A. Robertson, Shrewsbury, MA (US) 

(73) Assignee: Rohm and Haas Electronic Materials LLC, Marlborough, MA (US) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 11/173,932 

(22) Filed: Jul. 1, 2005 

## (65) Prior Publication Data 

US 2006/0105272Al May 18, 2006 

(60) Provisional application No. 60/585,119, filed on Jul. 2, 2004. 

(51) Int. Cl. 

<img src='content_image/938182.jpg'>

(52) U.S. Cl. ................. 430/270.1; 430/330; 430/272.1; 430/273.1; 430/327; 430/322; 430/494 

(58) Field of Classification Search .............. 430/272.1, 430/273.1, 327,330, 322, 494 See application file for complete search history. 

## (56) References Cited 

4,617,057 A 10/1986 Plueddemann 

## Related U.S. Application Data 

## U.S. PATENT DOCUMENTS 

<img src='content_image/938193.jpg'>

# (10) Patent No.: US 7,781,141 B2 

# (45) Date of Patent: Aug. 24, 2010 

<img src='content_image/938181.jpg'>

## FOREIGN PATENT DOCUMENTS 

EP 0239108 9/1987 

Proceedings of SPIE, vol. 5754, May 2004, pp. 13-22 (XP002341982). 

Proceedings of SPIE, vol. 5376, May 2004, pp. 63-70 (XP002341983). 

* cited by examiner 

Primary Examiner-Amanda C. Walke 

(74) Attorney, Agent, or Firm-Peter F. Corless; Darryl P. Frickey; Edwards Angell Palmer & Dodge LLP 

## (57) ABSTRACT 

The present invention relates to barrier layer compositions that are applied above a photoresist composition for immer› sion lithography processing. In a further aspect, new methods are provided for immersion lithography processing. 

US007781141B2 

## OTHER PUBLICATIONS 

## 13 Claims, No Drawings 

