content_image/910906.jpg content_image/910927.jpg
# c19) United States c12) Patent Application Publication 

# TSUCHIMURA 

# (54) ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD, AND PHOTO MASK 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventor: Tomotaka TSUCHIMURA, Yoshida-cha (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

(21) Appl. No.: 15/229,896 

(22) Filed: Aug. 5, 2016 

(63) Continuation of application No. PCT/JP2015/ 051293, filed on Jan. 20, 2015. 

## (30) Foreign Application Priority Data 

Feb. 21, 2014 (JP) ................................. 2014-031433 

## Related U.S. Application Data 

<img src='content_image/910906.jpg'>

(51) Int. Cl. 

(52) U.S. Cl. CPC ............... G03F 71322 (2013.01); G03F 71039 (2013.01); G03F 1150 (2013.01); G03F 712063 (2013.01); G03F 712004 (2013.01); G03F 1176 (2013.01) 

## (57) ABSTRACT 

An actinic ray-sensitive or radiation-sensitive resin compo› sition includes (A) a polymer compound having a structure in which a hydrogen atom of a phenolic hydroxyl group is substituted by a group represented by specific General Formula (I), and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation. 

US 20160342090Al 

# c10) Pub. No.: US 2016/0342090 Al 

# (43) Pub. Date: Nov. 24, 2016 

## Publication Classification 

<img src='content_image/910927.jpg'>

