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# c12) United States Patent 

# Kawabata et al. 

# (54) ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 

(75) Inventors: Takeshi Kawabata, Haibara-gun (JP); Tomotaka Tsuchimura, Haibara-gun (JP); Takayuki Ito, Haibara-gun (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by 250 days. 

(21) Appl. No.: 13/015,874 

(22) Filed: Jan.28,2011 

## (65) Prior Publication Data 

US 2011/0189609 Al Aug. 4, 2011 

## (30) Foreign Application Priority Data 

Jan. 29, 2010 (JP) ................................. 2010-019284 

(51) Int. Cl. 

<img src='content_image/905996.jpg'>

(52) U.S. Cl. USPC ........ 430/270.1; 430/311; 430/325; 430/326; 430/905; 430/910; 430/919; 430/921; 430/925; 430/942; 430/966; 562/30; 562/45; 562/74; 562/79; 562/82; 562/91; 562/100; 564/82; 564/96 

( 58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

<img src='content_image/905997.jpg'>

## U.S. PATENT DOCUMENTS 

<img src='content_image/906012.jpg'>

# (IO) Patent No.: US 8,962,233 B2 

# (45) Date of Patent: Feb.24,2015 

<img src='content_image/905998.jpg'>

## FOREIGN PATENT DOCUMENTS 

<img src='content_image/905999.jpg'>

JPO English abstract for JPl 1-30856 (Feb. 1999).* 

Machine-assisted English translation of JP 11-30856, provided by JPO (Feb. 1999).* 

Edited by Hirai, Y., Fundamentals of nano imprint and its technology development/application deployment-technology of nanoimprint substrate and its latest technology deployment-Science and New Technology in Nanoprint, Jun. 2006, Frontier Publishing. 

Japanese Office Action dated Apr. 15, 2014 issued in application No. 2010-019284. 

Japanese Office Action issued in application No.2010-019284 dated Sep.17,2013. 

* cited by examiner 

Primary Examiner - Sin J. Lee 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

According to one embodiment, an actinic-ray- or radiation› sensitive resin composition includes an arylsulfonium salt that when exposed to actinic rays or radiation, generates an acid, the arylsulfonium salt containing at least one aryl ring on which there are a total of one or more electron donating groups, the acid generated upon exposure to actinic rays or radiation having a volume of 240 A $^{3 }$or greater. 

US008962233B2 

## OTHER PUBLICATIONS 

## 21 Claims, No Drawings 

