content_image/908005.jpg content_image/908021.jpg content_image/908008.jpg
# c12) United States Patent 

# Mizutani et al. 

# (54) POSITIVE RESIST COMPOSITION 

(75) Inventors: Kazuyoshi Mizutani, Shizuoka (JP); Shoichiro Yasunami, Shizuoka (JP) 

(73) Assignee: Fujifilm Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 10/812,092 

(22) Filed: Mar. 30, 2004 

## (30) Foreign Application Priority Data 

Mar. 31, 2003 (JP) ......................... P. 2003-096390 

(51) Int. Cl. G03F 71039 (2006.01) G03F 7126 (2006.01) 

(52) U.S. Cl. .................................... 430/270.1; 430/326 

(58) Field of Classification Search .............. 430/270.1 See application file for complete search history. 

## (56) References Cited 

<img src='content_image/908005.jpg'>

## U.S. PATENT DOCUMENTS 

<img src='content_image/908021.jpg'>

# (10) Patent No.: US 7,232,640 Bl 

# (45) Date of Patent: Jun.19,2007 

2003/0224287 Al* 12/2003 Fujimori .................. 430/270.1 

## FOREIGN PATENT DOCUMENTS 

<img src='content_image/908008.jpg'>

Toru et al, Publication No. 2002-049156, English abstract of JP2002-049156 published Feb. 15, 2002 with attached machine translated Claims and Example of Document from Patent Abstracts of Japan, copyright 2003, Japan Patent Office, 9 pages.* 

Tsiartas et al , "The Mechanism of Phenolic Polymer Dissolution: A New Perspective", Macromolecules, 1977, vol. 30, pp. 4656- 4664.* 

Thomson translation of JP 2002-49156 published Feb. 15, 2002, 96 pages.* 

Flanigan et al, "Surface roughness development during photoresist dissolution," J. Vac. Sci. Technol. B 17 (4), Jul./Aug. 1999, Ameri› can Vacuum Society, pp. 1371-1379.* 

* cited by examiner 

Primary Examiner--Cynthia Hamilton 

(74) Attorney, Agent, or Firm-Sughrue Mion, PLLC 

## (57) ABSTRACT 

A positive resist composition comprising a polymer capable of increasing its solubility in an alkali developer under action of an acid, wherein the resin comprises repeating units containing at least two special types of acetal structures separately, a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and a solvent. 

US007232640B 1 

## OTHER PUBLICATIONS 

## 13 Claims, No Drawings 

