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1. A chemically-amplified, negative-acting, photoresist composition, imageable by 365 nm radiation that is devel› opable in aqueous base, the photoresist composition com› prising solids components a), b ), c) d) and e) and solvent component f); 

a) an aqueous base soluble phenolic film-forming poly› meric binder resin having ring bonded hydroxyl groups; 

b) a photoacid generator that forms an acid upon exposure to radiation at 365 nm, in an amount sufficient to initiate crosslinking of the film-forming binder resin; 

c) a crosslinking agent that forms a carbonium ion upon exposure to the acid from step b) generated by exposure to radiation, and which comprises an etherified melamine; 

d) a dye having a molar attenuation coefficient at 365 nm ranging from about 1.74xl0 $^{4 }$to about 0.94xl0$^{4 }$mole-i L cm-i as measured in PGMEA 

e) a quencher system consisting essentially of an amine quencher, or a mixture of such amine quenchers, having a pKa in water from about 6.0 to about 12, where the amine quencher has a boiling point of at least 100° C., at 1 atmosphere pressure, and comprises at least one C2-C25 alkyl substituent, a -(CH$_{2}$)nOH substituent, or a -(CH$_{2}$)n,---O-(CH$_{2}$)n,---O-R’ substituent or comprises a mixture of these substituents, where n and n’ are independently an integer ranging from 2 to 4 and R’ is a Cl-C4 alkyl or H; 

f) a photoresist solvent. 

2. The photoresist composition of claim 1, wherein said solid component e) is one wherein, further, said amine quencher or a mixture of such amine quenchers are ones having structure (1), wherein Ri, and Ria may be individu› ally selected from H, a Cl to CS, alkyl, or an aryl, where further at least one of Ri, and Ria, is Cl0 to C25 alkyl substituent, or a -(CH$_{2}$)nOH substituent, wherein n is an integer ranging from 2 to 4, and further wherein position 3 and 2 are connected by either a single bond or a double bond. 

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3. The photoresist composition of claim 1, wherein said solid component d), said dye, is soluble in aqueous base; and further wherein said solid component e) is one wherein, further, said amine quencher or a mixture of such amine quenchers are ones having structure (1 ), wherein Ri, and Ria may be individually selected from H, a Cl to CS, alkyl, or an aryl, where further at least one ofRi, and Ria, is Cl0 to C25 alkyl substituent, or a -(CH$_{2}$)nOH substituent, wherein n is an integer ranging from 2 to 4, and further wherein position 3 and 2 are connected by either a single bond or a double bond. 

4. The photoresist composition of claim 1, wherein said solid component b ), said photoacid generator, is a photoacid generator based on a trihalomethyl derivative (halo=Cl or Br) that forms an acid upon exposure to radiation at 365 nm, in an amount sufficient to initiate crosslinking of the film› forming binder resin, wherein the halo moiety is chlorine or bromine; and further wherein said solid component e) is one wherein, further, said amine quencher or a mixture of such amine quenchers are ones having structure (1), wherein Ri, and Ria may be individually selected from H, a Cl to CS, alkyl, or an aryl, where further at least one of Ri, and Ria, is Cl0 to C25 alkyl substituent, or a -(CH$_{2}$)nOH substitu› ent, wherein n is an integer ranging from 2 to 4, and further wherein position 3 and 2 are connected by either a single bond or a double bond. 

5. The photoresist composition of claim 1, wherein said solid component d), said dye, is soluble in aqueous base; wherein further said solid component b ), said photoacid generator, is a photoacid generator based on a trihalomethyl derivative (halo=Cl or Br) that forms an acid upon exposure to radiation at 365 nm, in an amount sufficient to initiate crosslinking of the film-forming binder resin, wherein the halo moiety is chlorine or bromine; and further wherein said solid component e) is one wherein, further, said amine quencher or a mixture of such amine quenchers are ones having structure (1), wherein Ri, and Ria may be individu› ally selected from H, a Cl to CS, alkyl, or an aryl, where further at least one of Ri, and Ria, is Cl0 to C25 alkyl substituent, or a -(CH$_{2}$)nOH substituent, wherein n is an integer ranging from 2 to 4, and further wherein position 3 and 2 are connected by either a single bond or a double bond; 

(1) 

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(1) 

(1) 

