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2. The resist composition of claim 1 wherein the amine compound has the formula (A): 

<img src='content_image/898593.jpg'>

wherein R 1 is hydroxyl, C 1 -C$_{6 }$ alkyl group, C 1 -C$_{6 }$ alkoxy group, C$_{2}$-C$_{6 }$ acyloxy group, fluorine, chlorine, bromine, amino group, -NR 1 A----C(=0)-R 1$_{B,}$ or -NR 1 A----C (=0)-0-R 1$_{B, }$ R 1 A is hydrogen or a C 1 -C$_{6 }$ alkyl group, RIB is a C$_{1 }$-C$_{6 }$ alkyl, C$_{2}$-C$_{8 }$ alkenyl, CcC$_{12 }$ aryl or C$_{7}$-C$_{13 }$ aralkyl group, 2 

R is hydrogen, nitro, or a C$_{1 }$-C$_{20 }$ monovalent hydrocar› bon group which may contain at least one moiety selected from hydroxyl, carboxyl, thiol, ether bond, ester bond, nitro, cyano, halogen and amino moiety, in case of p= 1, R $^{2 }$may bond together to form a ring with the nitrogen atom to which they are attached, the ring optionally containing a double bond, oxygen, sulfur or nitrogen, or R $^{2 }$and X may bond together to form a ring with the nitrogen atom to which they are attached, the ring optionally containing a double bond, oxygen, sulfur or nitrogen, 

X is a C$_{1 }$-C$_{20 }$ divalent hydrocarbon group which may contain at least moiety selected from ester bond and ether bond, 

m and n are independently an integer meeting lsms5, 0sns4 and lsm+ns5, and pis 1, 2 or 3. 

3. The resist composition of claim 1, further comprising an acid generator capable of generating a sulfonic acid, imide acid or methide acid. 

4. The resist composition of claim 1, further comprising an organic solvent. 

5. The resist composition of claim 1 wherein the base polymer comprises recurring units having the formula (al) or recurring units having the formula (a2): 

<img src='content_image/898594.jpg'>

<img src='content_image/898595.jpg'>

wherein RA is each independently hydrogen or methyl, R 11 and R 12 each are an acid labile group, Y 1 is a single bond, phenylene group, naphthylene group, or C$_{1 }$-C$_{12 }$ linking group containing at least one moiety selected from ester bond and lactone ring, and Y $^{2 }$is a single bond or ester bond. 

6. The resist composition of claim 5 which is a chemically amplified positive resist composition. 

7. The resist composition of claim 1 wherein the base polymer is free of an acid labile group. 

8. The resist composition of claim 7 which is a chemically amplified negative resist composition. 

9. The resist composition of claim 1 wherein the base polymer further comprises recurring units of at least one type selected from recurring units having the formulae (fl) to (f3): 

<img src='content_image/898596.jpg'>

<img src='content_image/898597.jpg'>

<img src='content_image/898598.jpg'>

wherein RA is each independently hydrogen or methyl, 

Z 1 is a single bond, phenylene group, ---O-Z 11 -, ----C(=O)---O-Z 11 - or ----C(=O)-NH-Z 11 -, Z 11 is a C$_{1 }$-C$_{6 }$ alkanediyl group, C$_{2}$-C$_{6 }$ alkenediyl group, or phenylene group, which may contain a car› bonyl, ester bond, ether bond or hydroxyl moiety, 

Z 2 is a single bond, -Z 21 -C(=0)---0-, -Z 21 -0- or -Z 21 -0----C(=0)-, Z 21 is a C 1 -C$_{12 }$ alkanediyl group which may contain a carbonyl moiety, ester bond or ether bond, 

Z 3 is a single bond, methylene, ethylene, phenylene, fluorinated phenylene, -O-Z 31 -, ----C(=0)-0- Z31-, or ----C(=0)-NH-Z 31 -, Z 31 is a C 1 -C$_{6 }$ alkanediyl group, C$_{2}$ -C$_{6 }$ alkenediyl group, phenylene group, fluorinated phenylene group, or trifluoromethyl› substituted phenylene group, which may contain a carbonyl moiety, ester bond, ether bond or hydroxy moiety, 

