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Positive resist compositions in solution form were pre- pared by dissolving a polymer (Polymers 1 to 15) and com- ponents in a solvent in accordance with the formulation of Table 1 and filtering through a filter with a pore size of0.2 µm. The solvent contained 100 ppm of surfactant FC-4430 ( com- mercially available from 3M). The components in Table 1 are identified below. 

Organic Solvents: 

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PGMEA (propylene glycol monomethyl ether acetate) 

CyH (cyclohexanone) 

CyP ( cyclopentanone) 

PGME (propylene glycol monomethyl ether) 

PGEE (propylene glycol monoethyl ether) 

PGPE (propylene glycol monopropyl ether) 

-continued 

Polymer 15 

Mw~7,600 

Mw/Mn~ 1.76 

Acid generator: PAGl of the following structural formula 

<img src='content_image/908796.jpg'>

Basic compound: Amine 1 of the following structural formula 

<img src='content_image/908797.jpg'>

Metal compounds: the following structural formulae 

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2,4-pentadionatosodium 

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b is(2,2,6 ,6-tetrametbyl-3 ,5- 

<img src='content_image/908815.jpg'>

tris (2 ,2 ,6 ,6-tetrametby 1-3 ,5- 

<img src='content_image/908800.jpg'>

tris (2 ,2 ,6 ,6-tetrametby 1-3 ,5- 

bis(2,4-pentadionato )magnesium 

heptanedionato) 

chromiwn 

heptanedionato) 

manganese 

heptanedionato) 

iron 

