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n is an integer of 1 or greater. 

A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, -0-, -S-, -C(=0)-, -S(=0)-, -S(=0)$_{2}$-and -0S(=0)$_{2}$ -, provided that ----C(=0)0- is excluded. 

B represents a group containing a hydrocarbon group hav› ing 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained. 

Whennis 2 or greater, the two or more -(A-B) groups may be identical to or different from each other. 

M+ represents an organic onium ion. 

(2) The actinic ray-sensitive or radiation-sensitive resin composition according to item (1) above, wherein in the general formula (I), B represents a cycloaliphatic group hav› ing 4 or more carbon atoms. 

(3) The actinic ray-sensitive or radiation-sensitive resin composition according to item (1) or (2) above, characterized by further containing a resin (B) that is decomposed by the action of an acid to thereby exhibit an increased solubility in an alkali developer. 

(5) The actinic ray-sensitive or radiation-sensitive resin composition according to item (3) above, wherein the resin (B) contains a repeating unit having a hydroxystyrene struc› ture. 

(6) The actinic ray-sensitive or radiation-sensitive resin composition according to item (3) above, wherein the resin (B) contains a repeating unit having a cyclic hydrocarbon structure of a single ring or multiple rings. 

(8) The actinic ray-sensitive or radiation-sensitive resin composition according to item (7) above, wherein the repeat› ing unit having an alcoholic hydroxyl group of the resin (B) is a repeating unit having at least one member selected from among a monohydroxyadamantane structure, a dihydroxy› adamantane structure and a trihydroxyadamantane structure. 

(9) The actinic ray-sensitive or radiation-sensitive resin composition according to item (3) above, wherein the resin (B) contains a repeating unit having a lactone structure. 

(10) The actinic ray-sensitive or radiation-sensitive resin composition according to item (3) above, wherein the resin (B) is a resin containing at least one methacrylic ester repeat- ing unit or at least one acrylic ester repeating unit. 

(11) The actinic ray-sensitive or radiation-sensitive resin composition according to item (3) above, wherein the resin (B) has a fluorine atom in its principal chain or side chain. 

(12) The actinic ray-sensitive or radiation-sensitive resin 55 composition according to item (3) above, characterized in that the resin (B) has a hexafluoro-2-propanol structure. 

(13) The actinic ray-sensitive or radiation-sensitive resin composition according to any of items (5) to (12) above, further containing a dissolution inhibiting compound of3000 60 or less molecular weight (E) that is decomposed by the action of an acid to thereby increase the solubility in an alkali devel› oper. 

(14) The actinic ray-sensitive or radiation-sensitive resin composition according to any of items (5) to (13) above, further containing a basic compound (F) and/or a fluorinated and/or siliconized surfactant (G). 

(15) The actinic ray-sensitive or radiation-sensitive resin composition according to item (5) above, wherein the resin (B) contains at least one repeating unit selected from among 2-alkyl-2-adamantyl (meth)acrylates and dialkyl(l-adaman- tyl)methyl (meth)acrylates, at least one repeating unit having a lactone structure and at least one repeating unit having two or more hydroxyl groups. 

(16) The actinic ray-sensitive or radiation-sensitive resin composition according to item (15) above, wherein the resin (B) further contains a carboxylated repeating unit. 

(17) The actinic ray-sensitive or radiation-sensitive resin composition according to item (5) above, wherein the resin (B) contains at least one repeating unit selected from among 2-alkyl-2-adamantyl (meth)acrylates and dialkyl(l-adaman- tyl)methyl (meth)acrylates and at least one repeating unit having a hydroxystyrene structure. 

(18) A method of forming a pattern, comprising the steps of forming the actinic ray-sensitive or radiation-sensitive resin composition according to any of items (1) to (17) above into a film, exposing the film and developing the exposed film. 

(19) The method of forming a pattern according to item (18) above, wherein the exposure is carried out by use of X-rays, electron beams or EUV. 

(20) A compound of general formula (I) below. 

In the formula, 

Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups, and 

n is an integer of 1 or greater. 

A represents any one, or a combination of two or more members selected from among a single bond, an alkylene group, ---0-, -S-, ----C(=0)-, -S(=0)-, -S(=0)$_{2}$ - and ---OS(=0)$_{2}$ - (provided that -C(=0) 0- is excluded). 

B represents a group containing a hydrocarbon group hav- ing 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained. 

Whennis 2 or greater, the two or more -(A-B) groups may be identical to or different from each other. 

M+ represents an organic onium ion. 

(21) A compound of general formula (I) below that when exposed to actinic rays or radiation, generates an acid. 

In the formula, 

Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups, and 

n is an integer of 1 or greater. 

A represents any one, or a combination of two or more members selected from among a single bond, an alkylene 

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