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the resolution is excellent, the PEB temperature dependency is low, the pattern profile is rectangular and the sensitivity and etching resistance are high, a resist film using the same, a pattern forming method, a manufacturing method of an elec› tronic device, and an electronic device can be provided. 

This application is based on a Japanese patent application filed on Jul. 27, 2012 (Japanese Patent Application No. 2012- 167816), and Japanese patent application filed on Mar. 15, 2013 (Japanese Patent Application No. 2013-054403), and the contents thereof are incorporated herein by reference. 

The invention claimed is: 

1. An actinic ray-sensitive or radiation-sensitive resin com› position comprising: 

a compound capable of generating an acid upon irradiation with an actinic ray or radiation, 

a resin (P) containing a repeating unit represented by the following formula (1) and a repeating unit represented by the following formula (A), and 

a solvent: 

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wherein each of R’ and Li independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, Li may combine with L to form a ring and in this case, Li represents a single bond, an alkylene group or a carbonyl group, 

L represents a single bond or a divalent linking group, and in the case of forming a ring together with Li, L repre› sents a trivalent linking group, 

each of Ria, Ri$_{6 }$and Ric independently represents an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or a heterocyclic group, 

at least two of Ria, Ri$_{6 }$ and Ric may combine with each other to form a ring, or at least one of Ria, Ri$_{6 }$ and Ric may combine with R$_{2 }$ to form a ring, 

R$_{2 }$ represents an alkyl group or a cycloalkyl group, and 

R$_{3 }$ represents a hydrogen atom or an alkyl group; 

<img src='content_image/898374.jpg'>

wherein each ofR$_{21}$, R$_{22 }$and R$_{23 }$independently represents 65 a hydrogen atom, an alkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, provided that 

R$_{22 }$may combine withAr $_{2 }$to form a ring and in this case, 

R$_{22 }$represents a single bond or an alkylene group, 

X$_{2 }$ represents a single bond, -COO- or ----CONR$_{30}$ -, wherein R$_{30 }$ represents a hydrogen atom or an alkyl group, 

L$_{2 }$ represents a single bond or an alkylene group, 

Ar$_{2 }$ represents an (n+l)-valent aromatic ring group and in the case of combining with R$_{22 }$ to form a ring, Ar$_{2 }$ represents an (n+2)-valent aromatic ring group, and 

n represents an integer of 1 to 4. 

2. The actinic ray-sensitive or radiation-sensitive resin composition as claimed in claim 1, 

wherein in formula (1), each of Ria, Ri$_{6 }$ and Ric is inde› pendently an alkyl group or a cycloalkyl group. 

3. The actinic ray-sensitive or radiation-sensitive resin composition as claimed in claim 1, 

wherein in formula (1 ), R$_{3 }$ is a hydrogen atom. 

4. The actinic ray-sensitive or radiation-sensitive resin composition as claimed in claim 1, 

wherein in formula (1), L is a single bond, a divalent aromatic group, a divalent group having a norbornylene group, or a divalent group having an adamantylene group. 

5. The actinic ray-sensitive or radiation-sensitive resin composition as claimed in claim 1, 

wherein the repeating unit represented by formula (1) is a repeating unit represented by any one of the following formulae (1-1) to (1-4): 

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