content_image/885795.jpg content_image/885794.jpg
The reason why in Examples 1 G and 2G, the sensitivity and LER were excellent and the variation of sensitivity after aging was small is considered to be the same as the reason described above in Example E. 

According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition excellent in sensitiv- ity, resolution, roughness performance and aging stability and less likely to cause outgassing, a pattern forming method and a resist film using the composition, and an electronic device manufacturing method and an electronic device using the composition, method or film, can be provided. 

While the invention has been described in detail and with reference to specific embodiments thereof, it will be apparent to one skilled in the art that various changes and modifications can be made therein without departing from the spirit and scope of the invention. 

This application is based on Japanese Patent Application (PatentApplicationNo. 2012-032099) filed on Feb. 16, 2012, the contents of which are incorporated herein by way of reference. 

The invention claimed is: 

1. An actinic ray-sensitive or radiation-sensitive resin com› position containing a compound capable of generating an acid upon irradiation with an actinic ray or radiation, repre› sented by the following formula (Zl): 

<img src='content_image/885795.jpg'>

in formula (Zl), 

each ofR 2 and R$_{3 }$independently represents an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group or a heterocyclic group; 

R$_{4 }$ represents a monovalent substituent, n$_{1 }$ represents an integer of0 to 4, and when n$_{1 }$is 2 or more, each R$_{4 }$ may be the same as or different from every other R$_{4}$ ; and 

R 2 and R$_{3}$ , R 2 and R$_{4}$ , R$_{3 }$ and R$_{4}$ , R 2 and the benzene ring in formula (Zl), R$_{3 }$ and the benzene ring, or R$_{4 }$ and R$_{4 }$ when n$_{1 }$ is 2 or more, may combine with each other to form a ring, provided that with respect to the benzene 

## INDUSTRIAL APPLICABILITY 

ring in formula (Zl ), when -L$_{1 }$-R$_{1 }$-A$_{1 }$ is substituted at the para-position relative to sulfonium cs+), Ll is not an oxygen atom (---0-). 

2. The actinic ray-sensitive or radiation-sensitive resin composition as claimed in claim 1, wherein the compound represented by formula (Zl) is a compound represented by the following formula (Z2): 

<img src='content_image/885794.jpg'>

in formula (Z2), 

L$_{1}$ , R$_{1}$,A$_{1}$ , R$_{4}$ andn$_{1 }$have the same meanings as L$_{1}$ , R$_{1}$,A$_{1}$ , R$_{4 }$ and n$_{1 }$ in formula (Zl ); 

each of Rs and R$_{6 }$ independently represents a monovalent substituent, and each of n 2 and n$_{3 }$ independently repre› sents an integer of 0 to 5; and 

the plurality ofR$_{4 }$ when n$_{1 }$ is 2 or more, the plurality of Rs when n 2 is 2 or more, or the plurality of R$_{6 }$when n$_{3 }$ is 2 or more, may be the same or different and may combine with each other to form a ring, R$_{4 }$ and Rs, Rs and R$_{6}$ , or R$_{4 }$ and R$_{6 }$ may combine with each other to form a ring, and in this case, each of R$_{4}$ , Rs and R$_{6 }$ may be a single bond; 

provided that with respect to the benzene ring in formula (Z2) to which -L$_{1}$-R$_{1}$-A$_{1 }$ is bonded, when -L$_{1 }$-R$_{1 }$-A$_{1 }$ is substituted at the para-position relative to s+, L$_{1 }$ is not ---0-. 

3. The actinic ray-sensitive or radiation-sensitive resin composition as claimed in claim 2, 

wherein with respect to the benzene ring in formula (Z2) to which -L$_{1 }$-R$_{1 }$-A$_{1 }$ is bonded, -L$_{1 }$-R$_{1 }$-A$_{1 }$ is substituted at the para-position relative to s+ and L$_{1 }$ is -S-, -OS (=0) 2 -, -S(=O) 2 O-, -OC(=O)- or -C(=O) 0-. 

4. The actinic ray-sensitive or radiation-sensitive resin composition as claimed in claim 2, 

wherein with respect to the benzene ring in formula (Z2) to which -L$_{1 }$-R$_{1 }$-A$_{1 }$ is bonded, -L$_{1 }$-R$_{1 }$-A$_{1 }$ is substituted at the meta- or ortho-position relative to s+. 

5. The actinic ray-sensitive or radiation-sensitive resin composition as claimed in claim 2, 

wherein A$_{1 }$ in formula (Z2) is -SO$_{3 }$ - . 

6. The actinic ray-sensitive or radiation-sensitive resin composition as claimed in claim 1, 

wherein with respect to the benzene ring in formula (Zl) to which -L$_{1 }$-R$_{1 }$-A$_{1 }$ is bonded, -L$_{1 }$-R$_{1 }$-A$_{1 }$ is substituted at the para-position relative to s+ and L$_{1 }$ is -S-, -OS (=0) 2 -, -S(=O) 2 O-, -OC(=O)- or -C(=O) 0-. 

7. The actinic ray-sensitive or radiation-sensitive resin composition as claimed in claim 1, 

wherein with respect to the benzene ring in formula (Zl) to which -L$_{1 }$-R$_{1 }$-A$_{1 }$ is bonded, -L$_{1 }$-R$_{1 }$-A$_{1 }$ is substituted at the meta- or ortho-position relative to s+. 

8. The actinic ray-sensitive or radiation-sensitive resin composition as claimed in claim 1, 

whereinA$_{1 }$ in formula (Zl) is -SO$_{3}$-. 

