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# c12) United States Patent Kato et al. 

# (54) METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND ACTINIC-RAY› OR RADIATION-SENSITIVE FILM 

(75) Inventors: Keita Kato, Shizuoka (JP); Atsushi Nakamura, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 24 days. 

(21) Appl. No.: 13/598,087 

(22) Filed: Aug. 29, 2012 

## (65) Prior Publication Data 

US 2013/0049149 Al Feb. 28, 2013 

## (30) Foreign Application Priority Data 

Aug. 30, 2011 (JP) ................................. 2011-187055 

(51) Int. Cl. 

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(52) U.S. Cl. CPC ............ G03F 710045 (2013.01); C08F 212108 (2013.01); C08F 220110 (2013.01); G03F 710046 (2013.01); G03F 710392 (2013.01); G03F 710397 (2013.01); G03F 71325 (2013.01); H0JL 2110274 (2013.01); H0JL 2113081 (2013.01); C07C 2102/14 (2013.01); C07C 2103/56 (2013.01); C07C 2103/74 (2013.01); YJ0S 430/114 (2013.01) 

( 58) Field of Classification Search CPC ....... G03F 7/004; G03F 7/397; G03F 7/2041; G03F 7/0045; G03F 7/0046; G03F 7/0392; G03F 7/32; C08F 220/10; C08F 212/08; Yl0S 430/114; C07C 2103/56; C07C 2103/74; C07C 2102/14; H0lL 21/0274; H0lL 21/3081 USPC ............... 430/270.1, 434, 435, 905, 913, 914 See application file for complete search history. 

## (56) References Cited 

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## U.S. PATENT DOCUMENTS 

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# (IO) Patent No.: US 9,086,623 B2 

# Jul. 21, 2015 (45) Date of Patent: 

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Japanese Office Action dated Jul. 9, 2013 issued in Japanese Patent Application No. 2011-187055. 

Japanese Office Action dated May 20, 2014 issued in corresponding application No. 2011-187055. 

* cited by examiner 

Primary Examiner - Amanda C Walke 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

Provided is a method of forming a pattern, including forming an actinic-ray- or radiation-sensitive resin composition into a film, the actinic-ray- or radiation-sensitive resin composition including a resin (A) including a repeating unit containing a group that when acted on by an acid, is decomposed to thereby produce a polar group and including an aromatic group, which resin when acted on by an acid, decreases its solubility in an organic solvent, a nonionic compound (B) that when exposed to actinic rays or radiation, generates an acid and a solvent (C), exposing the film to actinic rays or radia› tion, and developing the exposed film with a developer including an organic solvent to thereby form a negative pat› tern. 

US009086623B2 

## FOREIGN PATENT DOCUMENTS 

## OTHER PUBLICATIONS 

## 18 Claims, No Drawings 

