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A series of polymers for use in resist compositions were synthesized by dissolving selected monomers in propylene glycol monomethyl ether acetate (PGMEA), copolymeriza› tion reaction, crystallizing from methanol, repeatedly wash› ing with methanol, isolation and drying. The composition of a polymer was analyzed by $^{1}$H-NMR spectroscopy, and the Mw and Mw/Mn determined by GPC. The polymers are designated Resist Polymers 1 to 18 and Comparative Resist Polymers 1 to 7. 

Resist Polymer 1 

Mw=S,500 

Mw/Mn=l.67 

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## Synthesis Example 2 

## Synthesis of Polymers 

Resist Polymer 2 

Mw=S,400 

Mw/Mn=l.65 

Resist Polymer 3 

Mw=S,300 

Mw/Mn=l.67 

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