content_image/926740.jpg content_image/926744.jpg content_image/926722.jpg content_image/926741.jpg content_image/926743.jpg
# c19) United States c12) Patent Application Publication 

# MUKHERJEE et al. 

# (54) NEGATIVE RESIST FORMULATION FOR PRODUCING UNDERCUT PATTERN PROFILES 

(71) Applicant: Merck Patent GmbH, Darmstadt (DE) 

(72) Inventors: Anupama MUKHERJEE, Woodbridge, NJ (US); Medhat A. TOUKHY, Flemington, NJ (US) 

(21) Appl. No.: 16/496,986 

(22) PCT Filed: Apr. 23, 2018 

(86) PCT No.: PCT /EP2018/060272 § 371 (c)(l), (2) Date: Sep. 24, 2019 

(60) Provisional application No. 62/489,634, filed on Apr. 25, 2017, provisional application No. 62/491,458, filed on Apr. 28, 2017. 

(51) Int. Cl. 

<img src='content_image/926740.jpg'>

## Related U.S. Application Data 

## Publication Classification 

<img src='content_image/926744.jpg'>

Using Coumarin 7 Dye 

<img src='content_image/926722.jpg'>

## Example 14 

(52) U.S. Cl. CPC .......... G03F 710382 (2013.01); G03F 710045 (2013.01); G03F 710046 (2013.01); G03F 71168 (2013.01); C23C 14104 (2013.01); G03F 7138 (2013.01); G03F 71322 (2013.01); C23C 14134 (2013.01); C23C 14130 (2013.01); G03F 712004 (2013.01) 

## (57) ABSTRACT 

A negative-acting, photoresist composition, imageable by 365 nm radiation that is developable in aqueous base. Apart from solvent, this composition comprises: a) an aqueous base soluble phenolic film-forming polymeric binder resin having ring bonded hydroxyl groups; b) a photoacid gen› erator c) a crosslinking agent which comprises an etherified melamine; d) a dye as described herein; e) a quencher system consisting essentially of an amine quencher, or a mixture of such amine quenchers, as described. This inven› tion also pertains to processes of using this composition as a photoresist. 

US 20200319555Al 

# c10) Pub. No.: US 2020/0319555 Al 

# (43) Pub. Date: Oct. 8, 2020 

<img src='content_image/926741.jpg'>

## Example 15 

Using DI Dye 

<img src='content_image/926743.jpg'>

