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The total amount of compounds (Al) of the general for› mula (I) added, based on the total solid content of the photo› sensitive composition is preferably in the range of 0.1 to 40 mass %, more preferably 0.5 to 35 mass % and further pref› erably 3 to 30 mass%. 

The molecular weight of any of the compounds (Al) of the general formula (I) is preferably in the range of 200 to 2000, especially preferably 400 to 1000. 

The compounds (Al) of the general formula (I) can be synthesized by, for example, a method of sulfonating an aro› matic compound of cyclic aliphatic skeleton. For example, the compounds substituted with a cycloalkyl group (Cy) according to the present invention can be synthesized by the following scheme. 

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With respect to the counter cations, the conversion to desired cation M+ can be effected by, for example, a conver› sion method using an ion exchange resin or a generally known anion exchange method as described in JP-A-6-184170, etc. 

[2] Compound that when Exposed to Actinic Rays or Radiation, Generates an Acid (Acid Generator A2) 

The photosensitive composition of the present invention may contain, together with the acid generator (Al), another acid generator. Hereinafter, the acid generator other than the acid generator (Al) will be referred to as an "acid generator (A2)." 

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-continued 

As the acid generator (A2), use can be made of a member appropriately selected from among a photoinitiator for pho› tocationic polymerization, a photoinitiator for photoradical polymerization, a photo-achromatic agent and photo-discol- oring agent for dyes, any of generally known compounds that when exposed to actinic rays or radiation, generate an acid, employed in microresists, etc., and mixtures thereof. 

For example, as the acid generator, there can be mentioned a diazonium salt, a phosphonium salt, a sulfonium salt, an iodonium salt, an imide sulfonate, an oxime sulfonate, dia› zosulfone, disulfone or o-nitrobenzyl sulfonate. 

Further, use can be made of compounds obtained by intro› ducing any of the above groups or compounds that when exposed to actinic rays or radiation, generate an acid in a polymer principal chain or side chain, for example, com› pounds described in U.S. Pat. No. 3,849,137, DE 3914407, JP-A’ s-63-26653, 55-164824, 62-69263, 63-146038, 63-163452, 62-153853, 63-146029, etc. 

Furthermore, use can be made of compounds that when exposed to light, generate an acid described in U.S. Pat. No. 3,779,778 and EP 126,712. 

As preferred compounds among the acid generators, there can be mentioned those of the following general formulae (ZI), (ZII) and (ZIII). 

In the above general formula (ZI), 

each of R$_{201}$, R$_{202 }$and R$_{203 }$ independently represents an organic group. 

The number of carbon atoms of the organic group repre› sented by R$_{20}$i, R$_{202 }$and R$_{203 }$is generally in the range of 1 to 30, preferably 1 to 20. 

Two of R$_{201 }$ to R$_{203 }$ may be bonded with each other to thereby form a ring structure, and the ring within the same may contain an oxygen atom, a sulfur atom, an ester bond, an amido bond or a carbonyl group. As the group formed by bonding of two of R$_{201 }$ to R$_{203}$ , there can be mentioned an alkylene group (for example, a butylene group or a pentylene group). 

z- represents a normucleophilic anion. 

As the normucleophilic anion represented by z-, there can be mentioned, for example, a sulfonate anion, a carboxylate anion, a sulfonylimido anion, a bis(alkylsulfonyl)imido anion, a tris(alkylsulfonyl)methyl anion or the like. 

The normucleophilic anion means an anion whose capa› bility of inducing a nucleophilic reaction is extremely low and is an anion capable of inhibiting any temporal decomposition by intramolecular nucleophilic reaction. This would realize an enhancement of the temporal stability of the resist. 

As the sulfonate anion, there can be mentioned, for example, an aliphatic sulfonate anion, an aromatic sulfonate anion, a camphor sulfonate anion or the like. 

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