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# c12) United States Patent Hatakeyama 

# (54) RESIST COMPOSITION AND PATTERNING PROCESS 

(75) Inventor: Jun Hatakeyama, Joetsu (JP) 

(73) Assignee: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by 61 days. 

(21) Appl. No.: 13/542,014 

(22) Filed: Jul. 5, 2012 

## (65) Prior Publication Data 

US 2013/0029270Al Jan. 31, 2013 

## (30) Foreign Application Priority Data 

Jul. 25, 2011 (JP) ................................. 2011-161640 

(51) Int. Cl. 

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(52) U.S. Cl. CPC ............ G03F 710043 (2013.01); G03F 710045 (2013.01); G03F 710046 (2013.01); G03F 710392 (2013.01); G03F 710397 (2013.01) 

( 58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

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## U.S. PATENT DOCUMENTS 

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# (10) Patent No.: US 9,360,753 B2 

# (45) Date of Patent: Jun.7,2016 

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Translation of JP 53-126929. Nov. 6, 1978.* 

Machine translation JP 2010-152136. Jul. 8, 2010.* 

Translation JP 58-202441. Nov. 25, 1983.* 

Bodner Research Web, Transition Metals, Purdue Chem, http:// chemed.chem.purdue.edu/genchem/topicreview/bp/chl2/trans.php, access date Jan. 26, 2014. * 

Kishikawa et al., "Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithogra› phy", Proc. of SPIE, 2007, pp. 65203Ll-L9, vol. 6520. 

Hinsberg et al., "Extendibility of Chemically Amplified Resists: Another Brick wall?", Proc. of SPIE, 2003, pp. 1-14, vol. 5039. 

Primary Examiner - Cynthia H Kelly 

Assistant Examiner - Alyssa L Cepluch 

(74) Attorney, Agent, or Firm - Westerman, Hattori, Daniels & Adrian, LLP 

## (57) ABSTRACT 

A resist composition is provided comprising a ( co )polymer comprising recurring units of acid labile group-substituted (meth)acrylic acid, styrenecarboxylic acid or vinylnaphtha› lenecarboxylic acid and/or recurring units having an acid labile group-substituted phenolic hydroxyl group, an acid generator, and a metal salt of carboxylic acid or a metal complex of ~-diketone. Due to a high contrast of alkaline dissolution rate before and after exposure, high resolution, high sensitivity, and controlled acid diffusion rate, the com› position forms a pattern with satisfactory profile and minimal LER. 

US009360753B2 

## FOREIGN PATENT DOCUMENTS 

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## OTHER PUBLICATIONS 

(Continued) 

## 8 Claims, No Drawings 

