content_image/935355.jpg content_image/935339.jpg content_image/935354.jpg
# c19) United States c12) Patent Application Publication 

# ASAKAWA et al. 

# (54) ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventors: Daisuke ASAKAWA, Haibara-gun (JP); Hironori OKA, Haibara-gun (JP); Kyohei SAKITA, Haibara-gun (JP); Michihiro SHIRAKAWA, Haibara-gun (JP); Akiyoshi GOTO, Haibara-gun (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

(21) Appl. No.: 17/001,805 

(22) Filed: Aug. 25, 2020 

(63) Continuation of application No. PCT/JP2019/ 006235, filed on Feb. 20, 2019. 

## (30) Foreign Application Priority Data 

Feb. 28, 2018 (JP) ................................. 2018-035948 

(51) Int. Cl. 

<img src='content_image/935355.jpg'>

## Related U.S. Application Data 

## Publication Classification 

<img src='content_image/935339.jpg'>

(52) U.S. Cl. CPC ............ G03F 71039 (2013.01); G03F 710045 (2013.01); C08F 2201283 (2020.02); C08F 220/1808 (2020.02); C08F 220/1804 (2020.02); G03F 71038 (2013.01) 

## (57) ABSTRACT 

An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having an excellent pattern line width roughness (LWR). In addition, another object of the present invention is to provide: 

a resist film, a pattern forming method, and a method for manufacturing an electronic device, each of which uses the actinic ray-sensitive or radiation-sensitive resin composition. 

The actinic ray-sensitive or radiation-sensitive resin com› position of the present invention includes a resin including a repeating unit derived from a monomer having a salt structure and a repeating unit having a group whose polarity increases through decomposition by the action of an acid, 

the salt structure consists of an anionic structure moiety and an actinic ray-sensitive decomposable or radiation› sensitive decomposable cationic structure moiety, and 

a pKa of a monomer obtained by substituting the cationic structure moiety in the salt structure with a hydrogen atom is -0.80 or more. 

US 20200401045Al 

# c10) Pub. No.: US 2020/0401045 Al 

# (43) Pub. Date: Dec. 24, 2020 

<img src='content_image/935354.jpg'>

