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# c19) United States c12) Patent Application Publication 

# Hatakeyama 

# (54) CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventor: Jun Hatakeyama, Joetsu-shi (JP) 

(73) Assignee: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(21) Appl. No.: 16/919,366 

(22) Filed: Jul. 2, 2020 

## (30) Foreign Application Priority Data 

Aug. 2, 2019 (JP) ................................. 2019-142875 

<img src='content_image/885061.jpg'>

(51) Int. Cl. 

(52) U.S. Cl. CPC .......... G03F 710045 (2013.01); G03F 712004 (2013.01); G03F 710392 (2013.01); G03F 710382 (2013.01) 

## (57) ABSTRACT 

A chemically amplified resist composition comprising a quencher containing an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group exclu› sive of an iodized or brominated aromatic ring and an acid generator exerts a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having satisfactory resolution, LWR and CDU. 

US 20210033969Al 

# c10) Pub. No.: US 2021/0033969 Al 

# (43) Pub. Date: Feb. 4, 2021 

## Publication Classification 

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