content_image/909909.jpg content_image/909928.jpg
# c19) United States c12) Patent Application Publication 

# NAITO et al. 

# (54) PHOTOSENSITIVE COMPOUND, PHOTOACID GENERATOR AND RESIST COMPOSITION CONTAINING THE PHOTOSENSITIVE COMPOUND, AND METHOD FOR MANUFACTURING DEVICE USING THE RESIST COMPOSITION 

(71) Applicant: TOYO GOSEI CO., LTD., Chiba (JP) 

(72) Inventors: Michiya NAITO, Chiba (JP); Masamichi HAYAKAWA, Chiba (JP); Yoshiyuki UTSUMI, Chiba (JP) 

(73) Assignee: TOYO GOSEI CO., LTD., Chiba (JP) 

(21) Appl. No.: 16/339,014 

(22) PCT Filed: Dec. 20, 2017 

(86) PCT No.: PCT/JP2017/045771 

§ 371 (c)(l), (2) Date: Apr. 3, 2019 

## (30) Foreign Application Priority Data 

Dec. 21, 2016 (JP) ................................. 2016-248109 

<img src='content_image/909909.jpg'>

(51) Int. Cl. 

(52) U.S. Cl. CPC ............ G03F 710045 (2013.01); G03F 71039 (2013.01); G03F 7/0048 (2013.01); G03F 712004 (2013.01); C07C 395/00 (2013.01); G03F 712059 (2013.01) 

## (57) ABSTRACT 

A photosensitive compound which can be suitably used for a resist composition having superior sensitivity with respect to light of short wavelength such as KrF and the like, especially to extreme ultraviolet or electron beam, superior resolution and depth of focus in lithography, and can sup› press LER (line edge roughness) in fine pattern, a resist composition using the photosensitive compound, and a manufacturing method of a device is provided. A photosen› sitive compound including a divalent Te atom is provided. 

US 20190243238Al 

# c10) Pub. No.: US 2019/0243238 Al 

# (43) Pub. Date: Aug. 8, 2019 

## Publication Classification 

<img src='content_image/909928.jpg'>

