content_image/905515.jpg content_image/905500.jpg content_image/905514.jpg
# c19) United States c12) Patent Application Publication 

# Ono et al. 

# (54) NOVEL SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventors: Emiko Ono, Joetsu-shi (JP); Masayoshi Sagehashi, Joetsu-shi (JP); Masahiro Fukushima, Joetsu-shi (JP); Yuki Kera, Joetsu-shi (JP) 

(73) Assignee: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(21) Appl. No.: 16/669,780 

(22) Filed: Oct. 31, 2019 

## (30) Foreign Application Priority Data 

Nov. 15, 2018 (JP) ................................. 2018-214718 

(51) Int. Cl. 

<img src='content_image/905515.jpg'>

## Publication Classification 

<img src='content_image/905500.jpg'>

(52) U.S. Cl. CPC .......... G03F 710045 (2013.01); G03F 710397 (2013.01); G03F 710382 (2013.01); C07D 307177 (2013.01); C07C 381112 (2013.01); G03F 7/162 (2013.01); C07D 311/00 (2013.01); C07D 333176 (2013.01); C07D 333/08 (2013.01); C07D 327106 (2013.01); C08F 220118 (2013.01); C07C 309112 (2013.01) 

## (57) ABSTRACT 

A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition com› prising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV. 

US 20200159115Al 

# c10) Pub. No.: US 2020/0159115 Al 

# (43) Pub. Date: May 21, 2020 

<img src='content_image/905514.jpg'>

