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# c12) United States Patent Tsuruta et al. 

# (54) RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 

(71) Applicant: FUJIFILM Corporation, Minato-Ku, Tokyo (JP) 

(72) Inventors: Takuya Tsuruta, Haibara-gun (JP); Tomotaka Tsuchimura, Haibara-gun (JP); Kaoru Iwato, Haibara-gun (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by O days. This patent is subject to a terminal dis› claimer. 

(21) Appl. No.: 14/586,129 

(22) Filed: Dec. 30, 2014 

## (65) Prior Publication Data 

US 2015/0118623 Al Apr. 30, 2015 

(63) Continuation of application No. PCT/JP2013/068303, filed on Jun. 26, 2013. 

## (30) Foreign Application Priority Data 

Jul. 27, 2012 (JP) ................................. 2012-167509 

(51) Int. Cl. 

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(52) U.S. Cl. CPC ................ C08F 12124 (2013.01); C08F 8102 (2013.01); C08F 12132 (2013.01); C08F 212114 (2013.01); G03F 71004 (2013.01); G03F 710045 (2013.01); G03F 710382 (2013.01); G03F 710392 (2013.01); G03F 7120 (2013.01); G03F 7/0388 (2013.01) 

(58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

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## Related U.S. Application Data 

## U.S. PATENT DOCUMENTS 

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# (IO) Patent No.: US 9,718,901 B2 

# (45) Date of Patent: * Aug. 1, 2017 

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Machine translation ofjp 2009-086353 (2009).* 

Primary Examiner - Martin Angebranndt 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): 

[Chem.!] 

wherein 

R$_{1 }$ represents a hydrogen atom, a methyl group, or a halogen atom; 

R$_{2 }$ and R$_{3 }$ represent a hydrogen atom, an alkyl group, or a cycloalkyl group; 

L represents a divalent linking group or a single bond; 

Y represents a substituent excluding a methylol group; 

Z represents a hydrogen atom or a substituent; 

m represents an integer of O to 4; 

n represents an integer of 1 to 5; and 

m+n is 5 or less. 

US009718901B2 

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## FOREIGN PATENT DOCUMENTS 

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## OTHER PUBLICATIONS 

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## 28 Claims, 9 Drawing Sheets 

