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# c12) United States Patent Takizawa et al. 

# (54) ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventors: Hiroo Takizawa, Shizuoka (JP); Shuji Hirano, Shizuoka (JP); Natsumi Yokokawa, Shizuoka (JP); Wataru Nihashi, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by O days. This patent is subject to a terminal dis› claimer. 

(21) Appl. No.: 14/605,631 

Jan. 26, 2015 (22) Filed: 

## (65) Prior Publication Data 

US 2015/0140484 Al May 21, 2015 

(63) Continuation of application PCT/JP2013/070833, filed on Jul. 25, 2013. No. 

(30) Foreign Application Priority Data 

<img src='content_image/888097.jpg'>

(51) Int. Cl. 

<img src='content_image/888098.jpg'>

(52) U.S. Cl. CPC ............. G03F 710388 (2013.01); C08F 12120 (2013.01); C08F 12122 (2013.01); C08F 12124 (2013.01); C08F 12130 (2013.01); C08F 12132 (2013.01); C08F 212114 (2013.01); C08F 220128 (2013.01); C09D 125118 (2013.01); G03F 710392 (2013.01); G03F 710397 (2013.01); G03F 7111 (2013.01); G03F 712002 

## Related U.S. Application Data 

<img src='content_image/888072.jpg'>

# (IO) Patent No.: US 9,551,933 B2 

# (45) Date of Patent: *Jan. 24, 2017 

(58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

<img src='content_image/888111.jpg'>

<img src='content_image/888099.jpg'>

Machine translation of JP 2007-086284 (Apr. 2007).* 

Machine translation of JP 2010-217-884 (2010).* 

Dewent abstract for JP 2001337452 (2001).* 

Conununication from the Japanese Patent Office dated May 19, 2015 in counterpart Japanese Application No. 2013-054400. 

Primary Examiner - Martin Angebranndt 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

There is provided an actJmc ray-sens1t1ve or radiation› sensitive resin composition comprising: (A) a resin contain› ing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit repre› sented by the first specific formula is 35 mo! % or more based on all repeating units in the resin (A), a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition. 

US009551933B2 

(2013.01); G03F 712037 (2013.01); G03F 712041 (2013.01); G03F 7130 (2013.01); G03F 71325 (2013.01); C08F 2220/281 (2013.01) 

## U.S. PATENT DOCUMENTS 

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## FOREIGN PATENT DOCUMENTS 

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## OTHER PUBLICATIONS 

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## 24 Claims, No Drawings 

