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# c12) United States Patent 

# Hatakeyama 

# (54) CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS 

(71) Applicant: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

(72) Inventor: Jun Hatakeyama, Joetsu (JP) 

(73) Assignee: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by 182 days. 

(21) Appl. No.: 15/814,659 

(22) Filed: Nov. 16, 2017 

## (65) Prior Publication Data 

US 2018/0143532 Al May 24, 2018 

## (30) Foreign Application Priority Data 

Nov. 18, 2016 (JP) ................................. 2016-224748 

(51) Int. Cl. 

<img src='content_image/917229.jpg'>

(52) U.S. Cl. CPC .............. G03F 71028 (2013.01); C08F 12124 (2013.01); C08F 212114 (2013.01); C08F 220138 (2013.01); C08K 5119 (2013.01); C09D 125118 (2013.01); G03F 710045 (2013.01); G03F 710397 (2013.01); G03F 712004 (2013.01); G03F 71425 (2013.01); G03F 71426 (2013.01); C08F 220/281 (2020.02); C08F 220/282 (2020.02); C08F 220/283 (2020.02); C08F 220/301 (2020.02); C08F 220/302 (2020.02); C08F 220/303 (2020.02); C08L 25/04 (2013.01); C08L 33/08 (2013.01); 

<img src='content_image/917211.jpg'>

# (IO) Patent No.: US 10,698,314 B2 

# Jun.30,2020 (45) Date of Patent: 

(58) Field of Classification Search USPC ............................................ 430/270.1, 280.1 See application file for complete search history. 

## (56) References Cited 

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<img src='content_image/917237.jpg'>

Frechet , Jean "The photogeneration of acid and base within polymer coatings: Approaches to polymer curing and imaging", Pure & Appl. Chem, vol. 64, No. 9, pp. 1239-1248, 1992. (Year: 1992).* 

Shiraishi et al "N ovolak resin-based positive electron-beam resist system untilizing acid sensitive polymeric dissolution inhibitor with solubility reversal reactivity", J. Vac. Sci. Technol., B, vol. 9 Issue: 6, pp. 3343-3347, Nov. 1991. (Year: 1991).* 

Toshio Sakamizu, Tadashi Arai, Hidenori Yamaguchi, Hiroshi Shiraishi, "Acid diffusion control in chemical amplification positive resists by exchange reaction of conjugate bases," Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (Jul. 7, 1997) pp. 448-458; doi: 10.1117/12.275845 (Year: 1997).* 

* cited by examiner 

Primary Examiner - Cynthia Hamilton 

(74) Attorney, Agent, or Firm - Westerman, Hattori, Daniels & Adrian, LLP 

## (57) ABSTRACT 

A chemically amplified resist composition comprising a quencher containing a quaternary annnonium iodide, dibro› moiodide, bromodiiodide or triiodide, and an acid generator exhibits a sensitizing effect and an acid diffusion suppress› ing effect and forms a pattern having improved resolution, LWR and CDU. 

US010698314B2 

C08L 33/10 (2013.01); C08L 41/00 (2013.01); G03F 7/0046 (2013.01) 

## U.S. PATENT DOCUMENTS 

## FOREIGN PATENT DOCUMENTS 

## OTHER PUBLICATIONS 

## 15 Claims, No Drawings 

