content_image/898854.jpg content_image/898866.jpg content_image/898865.jpg content_image/898855.jpg content_image/898856.jpg content_image/898861.jpg content_image/898862.jpg content_image/898864.jpg content_image/898863.jpg
<img src='content_image/898854.jpg'>

## Examples 1 to 27 and Comparative Examples 1 to 7 

## Preparation of Resist Compositions 

[0165] Resist compositions were prepared by dissolving components in a solvent in accordance with the recipe shown in Tables 1 to 3, and filtering through a filter having a pore size of 0.2 µm. The solvent contained 100 ppm of surfactant FC-4430 (3M). The components in Tables 1 to 3 are as identified below. 

Base polymers: Polymers 1 to 3 of the above structural formulae 

Organic Solvents: 

[0166] PGMEA (propylene glycol monomethyl ether acetate) 

[0167] CyH (cyclohexanone) 

[0168] PGME (propylene glycol monomethyl ether) Acid generators: PAG 1 to PAG 4 of the following structural formulae 

<img src='content_image/898866.jpg'>

<img src='content_image/898865.jpg'>

<img src='content_image/898855.jpg'>

<img src='content_image/898856.jpg'>

Comparative Quenchers 1 to 5: 

[0169] 

<img src='content_image/898861.jpg'>

<img src='content_image/898862.jpg'>

<img src='content_image/898864.jpg'>

<img src='content_image/898863.jpg'>

PAG4 

