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The actinic-ray- or radiation-sensitive resin composition of the present invention can further according to necessity con› tain a basic compound, a resin that when acted on by an acid, is decomposed to thereby increase its rate of dissolution in an alkali aqueous solution, any of conventional photoacid gen› erators, a surfactant, an acid-decomposable dissolution inhib› iting compound, a dye, a plasticizer, a photosensitizer, a com› pound capable of increasing the solubility in a developer, a compound having a functional group as a proton acceptor and the like. 

<Basic Compound> 

The actinic-ray- or radiation-sensitive resin composition of the present invention preferably contains a basic compound. The basic compound is preferably a nitrogenous organic basic compound. 

Useful basic compounds are not particularly limited. How› ever, for example, the compounds of categories (1) to ( 4) below are preferably used. 

(1) Compounds of General Formula (BS-1) Below 

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In general formula (BS-1 ), each of Rs independently rep› resents any of a hydrogen atom, an alkyl group (linear or branched), a monovalent aliphatic hydrocarbon ring group (monocyclic or polycyclic), a monovalent aromatic ring group and a combination of an alkylene group and a monova› lent aromatic ring group, provided that in no event all the three Rs are hydrogen atoms. 

The numberof carbon atoms of the alkyl group represented by R is not particularly limited. However, it is generally in the range of 1 to 20, preferably 1 to 12. 

The number of carbon atoms of the monovalent aliphatic hydrocarbon ring group represented by R is not particularly limited. However, it is generally in the range of 3 to 20, preferably 5 to 15. 

The number of carbon atoms of the monovalent aromatic ring group represented by R is not particularly limited. How- 

