content_image/893062.jpg content_image/893072.jpg content_image/893073.jpg content_image/893063.jpg
<img src='content_image/893062.jpg'>

<img src='content_image/893072.jpg'>

19. The radiation-sensitive composition according to claim 17, wherein the repeating unit (C) represented by the general formula (VI) is selected from the group consisting of the following repeating units: 

<img src='content_image/893073.jpg'>

20. A radiation-sensitive composition comprising: 

a resin (P) having 

a repeating unit (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid; and 

a repeating unit (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, 

wherein 

the ionic structural site of the repeating unit (A) contained in the resin (P) is a structure capable of generating an acid in a side chain of the resin upon irradiation with an actinic ray or radiation; 

the repeating unit (A) is a repeating unit represented by general formula (III-1) or (III-4): 

<img src='content_image/893063.jpg'>

