content_image/901298.jpg content_image/901297.jpg content_image/901299.jpg content_image/901294.jpg content_image/901295.jpg content_image/901296.jpg
# c12) United States Patent 

# Takahashi et al. 

# (54) ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 

(75) Inventors: Hidenori Takahashi, Shizuoka (JP); Shuji Hirano, Shizuoka (JP); Takayuki Ito, Shizuoka (JP); Hideaki Tsubaki, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 13/393,173 

(22) PCT Filed: Aug. 31, 2010 

(86) PCT No.: PCT I JP2010/065192 § 371 (c)(l), (2), ( 4) Date: Feb.28,2012 

(87) PCT Pub. No.: WO2011/025070 

PCT Pub. Date: Mar. 3, 2011 

## (65) Prior Publication Data 

US 2012/0156618Al Jun. 21, 2012 

## (30) Foreign Application Priority Data 

Aug. 31, 2009 (JP) ................................. 2009-200912 

(51) Int. Cl. G03F 71004 G03F 7100 (2006.01) (2006.01) 

(52) U.S. Cl. CPC ................ G03F 710045 (2013.01); G03F 7120 (2013.01); G03F 710046 (2013.01); G03F 710392 (2013.01); G03F 710397 (2013.01) 

(58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

<img src='content_image/901298.jpg'>

<img src='content_image/901297.jpg'>

## U.S. PATENT DOCUMENTS 

## FOREIGN PATENT DOCUMENTS 

(Continued) 

(Continued) 

(Continued) 

<img src='content_image/901299.jpg'>

# (10) Patent No.: US 9,052,590 B2 

# (45) Date of Patent: Jun.9,2015 

Wang, Mingxing, et al., "Sythesis and Properties of New Anionic Photoacid Generators Bound Polymer Resists for e-beam and EUV lithography", Proc. ofSPIE, pp. 692312-1-692312-7, vol. 6923. 

Primary Examiner - Cynthia H Kelly 

Assistant Examiner - Alyssa L Cepluch 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

According to one embodiment, an actinic-ray- or radiation› sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the mean› ings mentioned in the description.) 

<img src='content_image/901294.jpg'>

<img src='content_image/901295.jpg'>

<img src='content_image/901296.jpg'>

US009052590B2 

## OTHER PUBLICATIONS 

## (Continued) 

## 14 Claims, No Drawings 

(I) 

(II) 

(III) 

