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# c12) United States Patent 

# Seshimo et al. 

# (54) POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND 

(75) Inventors: Takehiro Seshimo, Kawasaki (JP); Yoshiyuki Utsumi, Kawasaki (JP); Yoshitaka Komuro, Kawasaki (JP); Takeyoshi Mimura, Kawasaki (JP); Daichi Takaki, Kawasaki (JP) 

(73) Assignee: Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by 215 days. 

(21) Appl. No.: 12/781,540 

(22) Filed: May 17, 2010 

## (65) Prior Publication Data 

US 2010/0297560Al Nov. 25, 2010 

## (30) Foreign Application Priority Data 

May 20, 2009 (JP) ................................. 2009-122566 

(51) Int. Cl. G03F 71004 (2006.01) C0SF 228102 (2006.01) 

(52) U.S. Cl. ..................... 430/270.1; 430/905; 430/910; 430/921; 430/922; 526/286; 526/287; 526/288 

(58) Field of Classification Search ............... 430/270.1, 430/905, 910, 921, 922; 526/286, 287, 288 See application file for complete search history. 

## (56) References Cited 

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JP H09-208554 8/1997 

Kozawa, Takahiro et al., "Analysis of acid yield generated in chemi› cally amplified electron beam resist," J. Vac. Sci Technology. B, vol. 24, No. 6, pp. 3055 to 3060 (2006). 

Primary Examiner - John Chu 

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## FOREIGN PATENT DOCUMENTS 

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## OTHER PUBLICATIONS 

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# (IO) Patent No.: US 8,298,748 B2 

# (45) Date of Patent: Oct. 30, 2012 

(74) Attorney, Agent, or Firm -Knobbe Martens Olson & BearLLP 

## (57) ABSTRACT 

A positive resist composition including a base component (A’) which exhibits increased solubility in an alkali develop› ing solution under action of acid and generates acid upon exposure, the base component (A’) including a polymeric compound (Al’) having a structural unit ( a5- l) represented by general formula (a5-l), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) con› taining a group represented by general formula (a0-2’) (wherein x- represents an anion moiety represented by one of general formulas (1) to (5)). 

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US008298748B2 

## 6 Claims, No Drawings 

