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# c19) United States c12) Patent Application Publication 

# Hatakeyama 

# (54) POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventor: Jun Hatakeyama, Joetsu-shi (JP) 

(73) Assignee: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(21) Appl. No.: 16/942,981 

(22) Filed: Jul. 30, 2020 

## (30) Foreign Application Priority Data 

Aug. 2, 2019 (JP) ................................. 2019-142916 

<img src='content_image/896045.jpg'>

(51) Int. Cl. 

(52) U.S. Cl. CPC .......... G03F 71039 (2013.01); G03F 7/70025 (2013.01); C0SL 25114 (2013.01); G03F 710045 (2013.01) 

## (57) ABSTRACT 

A positive resist composition comprising a base polymer comprising recurring units (a) of an ammonium salt of a carboxylic acid having an iodized or brominated hydrocar› byl group and recurring units (bl) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and improved dimensional uniformity. 

US 20210033971Al 

# c10) Pub. No.: US 2021/0033971 Al 

# (43) Pub. Date: Feb. 4, 2021 

## Publication Classification 

<img src='content_image/896064.jpg'>

