content_image/926840.jpg
sigma: 0.812, XY deflection). Ultrapure water was used as the immersion liquid. Then, the wafer was heated at 105° C. for 60 second (PEB: post-exposure baking). Thereafter, the wafer was developed by puddling with a negative tone developer (butyl acetate) or a positive developer (aqueous tetramethylammonium hydroxide (TMAH) solution) for 30 seconds, and the wafer was rotated at a rotation speed of 4,000 rpm for 30 seconds to form a 1: 1 line-and-space pattern with a line thick› ness of 44 nm. 

[0602] <Performance Evaluation> 

[0603] (LWR Performance Evaluation) 

[0604] The 1:1 line-and-space pattern with a line width of 44 nm was observed from the top of the pattern with a critical dimension scanning electron microscope (SEM (S-8840, Hitachi High-Technologies Corpora› tion), the line width was measured at 50 points in the edge range of 2 µm in the longitudinal direction of the line pattern, a standard deviation was determined for the measurement dispersion, and 3a was calculated. A smaller value thereof indicates better performance. 

[0605] The results are shown in Table 4. 

[0606] From the results in Table 4, it is clear that in a case where the composition of Examples is used, a pattern thus formed has excellent LWR in the ArF exposure evaluation. 

[0607] On the other hand, it is clear that a pattern obtained with the compositions of Comparative Examples has LWR not satisfying the desired require› ments. 

[0608] [Preparation of Actinic Ray-Sensitive or Radiation› Sensitive Resin Composition (for EUV Exposure)] 

[0609] The various components included in the actinic ray-sensitive or radiation-sensitive resin composition shown in Table 8 are shown below. 

[0610] <Resin (AXl)> 

[0611] The resins (A-12 to A-15 and B4) shown in Table 8 are shown below. 

[0612] Furthermore, the weight-average molecular weight (Mw) and the dispersity (Mw/Mn) of the resins A-12 to A-15 and B4 were measured by GPC (carrier: THF (tetrahydrofuran)) (amount converted in terms of polystyrene). In addition, the compositional ratio (ratio % by mole) of the resin was measured by $^{13}$C-nuclear magnetic resonance (NMR). 

<img src='content_image/926840.jpg'>

