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# c12) United States Patent Ohashi et al. 

# (54) ONIUM SALT COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS 

(71) Applicant: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

(72) Inventors: Masaki Ohashi, Joetsu (JP); Jun Hatakeyama, Joetsu (JP); Masahiro Fukushima, Joetsu (JP) 

(73) Assignee: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

( * ) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by O days. days. 

(21) Appl. No.: 14/829,832 

(22) Filed: Aug. 19, 2015 

## (65) Prior Publication Data 

US 2016/0259242 Al Sep. 8, 2016 

## (30) Foreign Application Priority Data 

Aug. 21, 2014 (JP) ................................. 2014-168165 

(51) Int. Cl. 

<img src='content_image/891322.jpg'>

(52) U.S. Cl. CPC ......... G03F 710045 (2013.01); C07D 209/04 (2013.01); C07D 209/08 (2013.01); C07D 209/18 (2013.01); C07D 209/42 (2013.01); C07D 209/60 (2013.01); C07D 209162 (2013.01); C07D 215106 (2013.01); C07D 215114 (2013.01); C07D 215148 (2013.01); C07D 215150 (2013.01); C07D 231/06 (2013.01); C07D 231112 (2013.01); C07D 

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# (IO) Patent No.: US 9,989,847 B2 

# Jun.5,2018 (45) Date of Patent: 

(58) Field of Classification Search CPC ........ G03F 7/0397; G03F 7/2041; G03F 7/40; G03F 7/0045; C07D 209/04; C07D 209/08; C07D 215/14; C07D 275/06; C07D 277/64; C07D 263/56; C07D 261/20; C07D 249/20; C07D 235/08; C07D 231/12; C07D 233/18; C07D 209/60; C07D 231/06; C07D 231/56 USPC ....... 430/270.1, 326, 921, 922, 920; 546/26, 546/113, 122, 123, 139, 147, 152, 168, 546/170; 548/179, 180,207,217,241, 548/260, 261, 304.4, 309.4, 341.5, 352.1, 548/358.1, 361.1, 362.5, 379.4, 427, 469, 548/490, 491, 492 

## (56) References Cited 

<img src='content_image/891323.jpg'>

office Action dated Sep. 8, 2016, issued in corresponding Taiwanese Patent Application No. 104126780 (4 pages). 

Primary Examiner - John S Chu 

(74) Attorney, Agent, or Firm - Westerman, Hattori, Daniels & Adrian, LLP 

## (57) ABSTRACT 

Sulfonium and iodonium salts of nitrogen-containing car› boxylic acids are novel. The onium salt functions as an acid diffusion controlling agent in a resist composition, enabling to form a pattern of good profile with high resolution, improved MEF, LWR and DOF. 

See application file for complete search history. 

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US00998984 7B2 

231156 (2013.01); C07D 233/18 (2013.01); C07D 235/06 (2013.01); C07D 235/08 (2013.01); C07D 241144 (2013.01); C07D 249118 (2013.01); C07D 249120 (2013.01); C07D 261/20 (2013.01); C07D 263/56 (2013.01); C07D 263/58 (2013.01); C07D 275106 (2013.01); C07D 277164 (2013.01); C07D 277168 (2013.01); C07D 277174 (2013.01); G03F 710046 (2013.01); G03F 71038 (2013.01); G03F 710397 (2013.01); G03F 71168 (2013.01); G03F 712041 (2013.01); G03F 712053 (2013.01); G03F 7132 (2013.01); G03F 7138 (2013.01); G03F 7/40 (2013.01) 

## U.S. PATENT DOCUMENTS 

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## FOREIGN PATENT DOCUMENTS 

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## OTHER PUBLICATIONS 

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## 9 Claims, 1 Drawing Sheet 

