content_image/899809.jpg content_image/899810.jpg content_image/899803.jpg content_image/899804.jpg content_image/899793.jpg content_image/899807.jpg content_image/899805.jpg content_image/899806.jpg content_image/899808.jpg
In addition, the component (B) is preferably a polymer including a repeating unit represented by the following general formula ( 6) and a repeating unit represented by the following general formula (7), 

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<img src='content_image/899810.jpg'>

wherein, RA represents any of a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; zA rep› resents any of a single bond, a phenylene group, a naphth› ylene group, or a (main chain) ----C(=0)---0-Z’-; Z’ represents a linear, a branched, or a cyclic alkylene group 30 having 1 to 10 carbon atoms optionally containing any of a hydroxy group, an ether bond, an ester bond, or a lactone ring, a phenylene group, or a naphthylene group; XA repre› sents an acid labile group; and yA represents a hydrogen atom, or a polar group having one or more structures 35 selected from a hydroxy group, a cyano group, a carbonyl group, a carboxyl group, an ether bond, an ester bond, a sulfonic ester bond, a carbonate bond, a lactone ring, a sultone ring, and a carboxylic acid anhydride. 25 40 

Such the resist composition including a component (B) provides high dissolution contrast, excellent lithography performance such as LWR, few defects and excellently rectangle patterns. 

Also, XA in the general formula (6) is preferably repre› sented by any of the following general formula (6a), (6b ), or (6c), 

<img src='content_image/899803.jpg'>

<img src='content_image/899804.jpg'>

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wherein, R 66 represents a linear, a branched, or a cyclic monovalent hydrocarbon group having 1 to 10 carbon atoms optionally containing a heteroatom; "q" represents 1 or 2; and "*" represents a bond with an ester site in the general formula (6). 

Such the resist composition including a component (B) provides extremely high dissolution contrast, excellent lithography performance such as LWR, few defects and excellently rectangle patterns. 

zA in the general formula (6) preferably represents a single bond. 

Such the resist composition including a component (B) is more excellent in dissolution contrast and pattern’s rectangle property. 

In addition, the component (D) is preferably represented by the following general formula (8) or the following general formula (9), 

<img src='content_image/899807.jpg'>

wherein, each ofR 10O , R 2OO , and R $^{3OO }$independently repre› sents a linear, a branched, or a cyclic monovalent hydrocar› bon group having 1 to 20 carbon atoms optionally contain› ing a heteroatom, and two or more of R 10O , R 2OO , and R 3OO may be bonded to form a ring together with a sulfur atom in the formula; and xa- represents an anion represented by any of the following general formula (SA), (8B), (SC) or (SD), 

<img src='content_image/899805.jpg'>

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<img src='content_image/899808.jpg'>

-continued 

