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# c12) United States Patent 

# Enomoto et al. 

# (54) POLYMER, RESIST COMPOSITION CONTAINING POLYMER, AND METHOD FOR MANUFACTURING DEVICE USING SAME 

(71) Applicant: TOYO GOSEI CO., LTD., Chiba (JP) 

(72) Inventors: Satoshi Enomoto, Chiba (JP); Takumi Yoshino, Chiba (JP) 

(73) Assignee: TOYO GOSEI CO., LTD., Chiba (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 227 days. 

(21) Appl. No.: 15/763,600 

(22) PCT Filed: Sep. 29, 2016 

(86) PCT No.: PCT/JP2016/078761 § 371 (c)(l), (2) Date: Mar. 27, 2018 

(87) PCT Pub. No.: WO2017/057537 PCT Pub. Date: Apr. 6, 2017 

## (65) Prior Publication Data 

US 2018/0273664 Al Sep. 27, 2018 

## (30) Foreign Application Priority Data 

Oct. 1, 2015 (JP) ................................. 2015-195863 

(51) Int. Cl. 

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(52) U.S. Cl. CPC .......... C08F 220130 (2013.01); C08F 220134 (2013.01); C08F 220138 (2013.01); G03F 710045 (2013.01); G03F 71031 (2013.01); G03F 71038 (2013.01); G03F 710397 (2013.01) 

( 58) Field of Classification Search CPC .... C08F 220/30; C08F 220/38; C08F 220/34; C08F 212/22 USPC . ... ... ... .. ... ... ... ... ... .. ... ... ... ... ... .. ... . 522/904-905 See application file for complete search history. 

## (56) References Cited 

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## U.S. PATENT DOCUMENTS 

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# (IO) Patent No.: US 10,781,276 B2 

# Sep.22,2020 (45) Date of Patent: 

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"Benzenoid", Hawleys Condensed Chemical Dictionary, first pub› lished Mar. 15, 2007 , https://doi.org/10.1002/9780470114735. hawley0 1674, one page ,obtained from Wiley Online Library. (Year: 2007).* 

Parker , ed, "benzenoid" from McGraw-Hill Dlctioanry of Chem› istry, International Edition, United States of America, The McGraw› Hill Company, 1997, p. 42. (Year: 1997).* 

Katritzky, Alan R. Ramsden, Christopher A. Joule, John A. Zhdankin, Viktor V.. (2010). Handbook of Heterocyclic Chemistry (3rd Edi› tion). (pp. 332). Elsevier. Retrieved from https://app.knovel.com/ hotlink/toc/id:kpHHCE0002/handbookheterocyclic/handbook› heterocyclic p. 332. (Year: 2010).* 

International Search Report dated Dec. 6, 2016 of corresponding International application No. PCT/JP2016/078761; 2 pgs. 

* cited by examiner 

Primary Examiner - Cynthia Hamilton (74) Attorney, Agent, or Firm - Maier & Maier, PLLC 

## (57) ABSTRACT 

An object of the present invention is to provide a polymer used for a resist composition having high absorption effi› ciency for a particle beam or an electromagnetic wave, and excellence in sensitivity, resolution and pattern performance characteristics, and provide a resist composition containing the polymer and a method of manufacturing a device using thereof. 

The polymer comprises: a unit A; and a unit B, wherein the unit A has an onium salt structure and generates a first radical by irradiation with a particle beam or an electromag› netic wave, the unit B has a radical generating structure containing at least one multiple bond which is between a carbon atom and a carbon atom or between a carbon atom and a heteroatom, and generates a second radical by irra› diation with a particle beam or an electromagnetic wave, and the multiple bond is not one contained in a benzenoid aromatic. 

US010781276B2 

## FOREIGN PATENT DOCUMENTS 

## OTHER PUBLICATIONS 

## 13 Claims, No Drawings 

