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# c12) United States Patent Hirano et al. 

# (54) ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME 

(71) Applicant: FUJIFILM Corporation, Minato-Ku, Tokyo (JP) 

(72) Inventors: Shuji Hirano, Haibara-gun (JP); Hiroo Takizawa, Haibara-gun (JP); Hideaki Tsubaki, Haibara-gun (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by 0 days. 

(21) Appl. No.: 14/478,135 

(22) Filed: Sep.5,2014 

## (65) Prior Publication Data 

US 2015/0004533 Al Jan. 1, 2015 

(63) Continuation of application No. PCT/JP2013/059791, filed on Mar. 25, 2013. 

## (30) Foreign Application Priority Data 

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(51) Int. Cl. 

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(52) U.S. Cl. CPC ............ G03F 710397 (2013.01); C07D 235112 (2013.01); C07D 235/16 (2013.01); C07D 235122 (2013.01); C07D 235/26 (2013.01); C07D 235/28 (2013.01); G03F 710045 (2013.01); G03F 710046 (2013.01); G03F 71027 (2013.01); G03F 71038 (2013.01); G03F 710392 (2013.01); G03F 7109 (2013.01); G03F 7111 (2013.01); G03F 712002 (2013.01); G03F 712041 (2013.01); G03F 7130 (2013.01); G03F 71322 (2013.01); G03F 71325 (2013.01) 

## Related U.S. Application Data 

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# (IO) Patent No.: US 9,323,153 B2 

# (45) Date of Patent: Apr. 26, 2016 

(58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

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Derwent English abstract for JP62-290702 ( 1987). * 

Primary Examiner - Sin Lee 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

An actinic ray-sensitive or radiation-sensitive resin composi› tion in the present invention contains a nitrogen-containing compound (N) which is represented by the following general formula (Nl ): 

[Chem.!] 

wherein, in the general formula (Nl ), 

X represents a group including a hetero atom; 

L represents a single bond or an alkylene group; 

R$_{2 }$ represents a substituent, in the case where a plurality of R/ s are present, they may be the same as or different from each other and a plurality ofR/ s may be bonded to each other to form a ring; 

R$_{3 }$ represents a hydrogen atom or a substituent; and n represents an integer of0 to 4. 

US009323153B2 

## U.S. PATENT DOCUMENTS 

## FOREIGN PATENT DOCUMENTS 

(Continued) 

## OTHER PUBLICATIONS 

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## 17 Claims, No Drawings 

