content_image/907895.jpg content_image/907894.jpg content_image/907896.jpg content_image/907897.jpg content_image/907898.jpg
20. The pattern formation method according to claim 19, 

wherein B$_{8 }$ in General Formula (V) is a group which has a phenol structure having a hydroxymethyl group or an alkoxymethyl group (here, the hydroxymethyl group is not directly bonded to a nitrogen atom, and the alkoxymethyl group is not directly bonded to a nitrogen atom). 

21. The pattern formation method according to claim 17, 

wherein the content of the repeating unit represented by General Formula (V) is 1 mo! % to 20 mo! % with respect to the entirety of repeating units in the resin (A). 

22. The pattern formation method according to claim 17, 

wherein R$_{3 }$ in General Formula (II’) is a group having 2 15 or more carbon atoms. 

23. The pattern formation method according to claim 22, 

wherein R$_{3 }$ in General Formula (II’) is a group represented by the following General Formula (II-2), and 

<img src='content_image/907895.jpg'>

wherein, in General Formula (II-2), each ofR$_{8}$ $^{i, R}$82, and Rg$_{83 }$ independently represents an alkyl group, an alk› enyl group, a cycloalkyl group, or an aryl group; n81 represents O or 1; and at least two of R$_{81 }$ to R$_{83 }$may be connected to each other to form a ring. 

24. The pattern formation method according to claim 17, 

wherein the bond between X$_{4 }$ and L$_{4 }$ in General Formula (I) is a single bond. 

25. The pattern formation method according to claim 17, 

wherein the content of the repeating unit represented by General Formula (I) is 10 mo! % to 40 mo! % with respect to the entirety of repeating units in the resin (A). 

26. The pattern formation method according to claim 17, 

wherein the active light-sensitive or radiation-sensitive resin composition further includes a compound (B) that generates an acid by active light or radiation. 

27. The pattern formation method according to claim 26, 

wherein the compound (B) that generates an acid by active light or radiation is a compound that generates an acid having a volume of 240 Angstroms 3 or greater. 

28. The pattern formation method according to claim 17, 

wherein an electron beam or extreme ultraviolet rays are used as the active light or the radiation. 

29. A production method for an electronic device, com› prising: 

the pattern formation method according to claim 17. 

30. An active light-sensitive or radiation-sensitive resin composition comprising a resin (A) having a repeating unit represented by General Formula (I), a repeating unit repre- sented by any one of General Formulas (II) to (IV), and a repeating unit represented by General Formula (V), 

<img src='content_image/907894.jpg'>

wherein, in General Formula (I), each ofR$_{41}$, R 42 , and R 43 independently represents a hydrogen atom, an alkyl group, a halogen atom, a cyano group, or an alkoxy› carbonyl group; here, R$_{42 }$may be bonded to Ar$_{4 }$ to form a ring, and R$_{42 }$in this case represents a single bond or an alkylene group; X$_{4 }$ represents a single bond, --COO-, or -CONR$_{44}$-, and, in the case of form› ing a ring with R$_{42}$ , represents a trivalent connecting group; R$_{44 }$ represents a hydrogen atom or an alkyl group; L$_{4 }$ represents a single bond or an alkylene group; Ar$_{4 }$ represents an (n+l) valent aromatic ring group, and, in the case of being bonded to R$_{42 }$to form a ring, represents an (n+2) valent aromatic ring group; and n represents an integer of 1 to 4, 

<img src='content_image/907896.jpg'>

<img src='content_image/907897.jpg'>

<img src='content_image/907898.jpg'>

wherein, in Formula (II), each of R$_{61}$, R 62 , and R 63 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group; here, R$_{62 }$ may be bonded to Ar 6 to form a ring, and R$_{62 }$ in this case represents a single bond or an alkylene group; X$_{6 }$ represents a single bond, -COO-, or ----CONR$_{64}$-; R$_{64 }$represents a hydrogen atom or an alkyl group; L$_{6 }$ represents a single bond or an alkylene group; Ar$_{6 }$ 

