content_image/894160.jpg
<img src='content_image/894160.jpg'>

[0472] -Cation Moiety 

[0473] In formula ( dl-3), Mm+ is an organic cation having a valency of m, and is the same as defined for Mm+ in the aforementioned formula ( dl -1). 

[0474] As the component (dl-3), one type of compound may be used, or two or more types of compounds may be used in combination. 

[0475] As the component (Dl), one type of the aforemen› tioned components (dl-1) to (dl-3), or at least two types of the aforementioned components (dl-1) to (dl-3) can be used in combination. 

[0476] When the resist composition contains the compo› nent (D 1 ), the amount of the component (D 1) relative to 100 parts by weight of the component (A) is preferably within a range from 0.5 to 10 parts by weight, more preferably from 0.5 to 8 parts by weight, and still more preferably from 1 to 8 parts by weight. 

[0477] When the amount of the component (Dl) is at least as large as the lower limit of the above-mentioned range, excellent lithography properties and excellent resist pattern shape can be more reliably obtained. On the other hand, when the amount of the component (D 1) is no more than the upper limit of the above-mentioned range, sensitivity can be maintained at a satisfactory level, and through-put becomes excellent. 

[0478] Production method of component (D 1): 

[0479] The production methods of the components (dl-1) and (dl-2) are not particularly limited, and the components ( dl-1) and ( dl-2) can be produced by conventional methods. 

[0480] Further, the production method of the component (dl-3) is not particularly limited, and the component (dl-3) can be produced in the same manner as disclosed in US2012-0149916. 

[0481] -Component (D2) 

[0482] The acid diffusion control component may contain a nitrogen-containing organic compound (D2) (hereafter, referred to as component (D2)) which does not fall under the definition of component (D 1 ). 

[0483] The component (D2) is not particularly limited, as long as it functions as an acid diffusion control agent, and does not fall under the definition of the component (Dl). As the component (D2), any of the conventionally known compounds may be selected for use. Among these, an aliphatic amine is preferable, and a secondary aliphatic amine or tertiary aliphatic amine is more preferable. 

[0484] An aliphatic amine is an amine having one or more aliphatic groups, and the aliphatic groups preferably have 1 to 12 carbon atoms. 

[0485] Examples of these aliphatic amines include amines in which at least one hydrogen atom of ammonia (NH$_{3}$ ) has been substituted with an alkyl group or hydroxyalkyl group 

of no more than 12 carbon atoms (i.e., alkylamines or alkylalcoholamines ), and cyclic amines. 

[0486] Specific examples of alkylamines and alkylalcoho› lamines include monoalkylamines such as n-hexylamine, n-heptylamine, n-octylamine, n-nonylamine, and n-decylamine; dialkylamines such as diethylamine, di-n› propylamine, di-n-heptylamine, di-n-octylamine, and dicy› clohexylamine; trialkylamines such as trimethylamine, tri› ethylamine, tri-n-propylamine, tri-n-butylamine, tri-n› hexylamine, tri-n-pentylamine, tri-n-heptylamine, tri-n› octylamine, tri-n-nonylamine, tri-n-decylamine, and tri-n› dodecylamine; and alkyl alcohol amines such as diethanolamine, triethanolamine, diisopropanolamine, tri› isopropanolamine, di-n-octanolamine, and tri-n-oc› tanolamine. Among these, trialkylamines of 5 to 10 carbon atoms are preferable, and tri-n-pentylamine and tri-n-oc› tylamine are particularly desirable. 

[0487] Examples of the cyclic amine include heterocyclic compounds containing a nitrogen atom as a hetero atom. The heterocyclic compound may be a monocyclic compound (aliphatic monocyclic amine), or a polycyclic compound (aliphatic polycyclic amine). 

[0488] Specific examples of the aliphatic monocyclic amine include piperidine, and piperazine. 

[0489] The aliphatic polycyclic amine preferably has 6 to 10 carbon atoms, and specific examples thereof include 1,5-diazabicyclo[4.3.0]-5-nonene, 1,8-diazabicyclo[5.4.0]- 7-undecene, hexamethylenetetramine, and 1,4-diazabicyclo [2.2.2]octane. 

[0490] Examples of other aliphatic amines include tris(2- methoxymethoxyethyl)amine, tris { 2-(2-methoxyethoxy) ethyl }amine, tris { 2-(2-methoxyethoxymethoxy) ethyl }amine, tris { 2-(1-methoxyethoxy)ethyl }amine, tris { 2-(1-ethoxyethoxy)ethyl }amine, tris { 2-(1-ethoxypropoxy) ethyl }amine, tris[2-{ 2-(2-hydroxyethoxy)ethoxy }ethyl] amine and triethanolamine triacetate, and triethanolamine triacetate is preferable. 

[0491] Further, as the component (D2), an aromatic amine may be used. 

[0492] Examples of aromatic amines include 4-dimethyl› aminopyridine, pyrrole, indole, pyrazole, imidazole and derivatives thereof, as well as tribenzylamine, 2,6-diisopro› pylaniline and N-tert-butoxycarbonylpyrrolidine. 

[0493] As the component (D2), one type of compound may be used alone, or two or more types may be used in combination. 

[0494] When the resist composition contains the compo› nent (D2), the amount of the component (D2) is typically used in an amount within a range from 0.01 to 5 parts by weight, relative to 100 parts by weight of the component (A). When the amount of the component (D) is within the above-mentioned range, the shape of the resist pattern and the post exposure stability of the latent image formed by the pattern-wise exposure of the resist layer are improved. 

[0495] <<At Least One Compound (E) Selected from the Group Consisting of an Organic Carboxylic Acid, or a Phosphorus Oxo Acid or Derivative Thereof>> 

[0496] In the resist composition of the present embodi› ment, for preventing any deterioration in sensitivity, and improving the resist pattern shape and the post exposure stability of the latent image formed by the pattern-wise exposure of the resist layer, at least one compound (E) (hereafter referred to as the component (E)) selected from 

