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## EXAMPLES AND COMPARATIVE EXAMPLES 

[0165] Resist compositions were prepared by dissolving the polymer and selected components in a solvent in accor› dance with the recipe shown in Tables 1 and 2, and filtering through a filter having a pore size of 0.2 µm. The solvent contained 100 ppm of surfactant FC-4430 (3M). The com› ponents in Tables 1 and 2 are as identified below. 

## Organic Solvents: 

[0166] PGMEA (propylene glycol monomethyl ether acetate) 

[0167] GBL (y-butyrolactone) 

[0168] CyH (cyclohexanone) 

[0169] PGME (propylene glycol monomethyl ether) 

## Acid Generators: PAG 1 to PAG 6 of the Following Structural Formulae 

[0170] 

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