Examples of the commercially available surfactant include MEGAFACE F178, F-470, F-473, F-475, F-476, and F-472 (manufactured by DIC Corp.): a copolymer of an acrylate ( or methacrylate) having a C$_{6}$F $_{13 }$ group with a (poly(oxyalkylene)) acrylate (or methacrylate); and a capo- lymer of an acrylate (or methacrylate) having a C$_{3}$ F$_{7 }$ group with a (poly(oxyethylene)) acrylate (or methacrylate) and a (poly(oxypropylene)) acrylate (or methacrylate). 

Moreover, in the present invention, surfactants other than fluorine-based and/or silicon-based surfactants can also be used. Specific examples thereof include nonionic surfac› tants, for example, polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene cetyl ether, and polyoxyethylene oleyl ether, polyoxyethylene alkylallyl ethers such as polyoxyeth- ylene octylphenol ether and polyoxyethylene nonylphenol ether, polyoxyethylene/polyoxypropylene block copoly› mers, sorbitan fatty acid esters such as sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan ;~;~~~e~:;1~~:b~!!i~~l~=t~ :i~ ~~~~!~~u~~s~:~~tl~o:;~ ethylene sorbitan monolaurate, polyoxyethylene sorbitan monopalmitate, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan trioleate, and polyoxyethylene sorbitan tristearate. 

These surfactants may be used singly or in combination of some kinds thereof. 

The content of the surfactant (F) to be used is preferably 0.01 % to 10% by mass, and more preferably 0.1 % to 5° % by mass, with respect to the total amount ( excluding the solvent) of the actinic ray-sensitive or radiation-sensitive resin composition. 

(G) Onium Carboxylate Salt 

The actinic ray-sensitive or radiation-sensitive resin com› position in the present invention may contain an onium carboxylate salt (G). Examples of the onium carboxylate salt include a sulfonium carboxylate salt, an iodonium carboxy› late salt, and an ammonium carboxylate salt. In particular, as the onium carboxylate salt (G), an iodonium carboxylate salt and a sulfonium carboxylate salt are particularly preferable. Further, it is preferable that the carboxylate residue of the onium carboxylate salt (H) does not contain an aromatic group and a carbon-carbon double bond. As the anionic moiety, a linear, branched, monocyclic, or polycyclic alky› lcarboxylate anion having 1 to 30 carbon atoms is prefer› able. Further, a carboxylate anion in which a part or all of the alkyl groups are substituted with fluorine is more preferable. An oxygen atom may be contained in the alkyl chain, by which the transparency to the lights of 220 nm or less is ensured, thus, sensitivity and resolving power are enhanced, and density dependency and exposure margin are improved. 

Examples of the fluorine-substituted carboxylate anion include anions of fluoroacetic acid, difluoroacetic acid, trifluoroacetic acid, pentafluoropropionic acid, heptafluo› robutyric acid, nonafluoropentanoic acid, perfluorodode› canoic acid, perfluorotridecanoic acid, perfluorocyclohexan› ecarboxylic acid, 2,2-bistrifluoromethylpropionic acid, and the like. 

These onium carboxylate salts (G) can be synthesized by reacting sulfonium hydroxide, iodonium hydroxide, or ammonium hydroxide and carboxylic acid with silver oxide in an appropriate solvent. 

The content of the onium carboxylate salt (G) in the composition is generally 0.1 % to 20% by mass, preferably 0.5% to 10% by mass, and more preferably 1 % to 7% by mass, with respect to the total solid contents of the compo› sition. 

(H) Other Additives 

The actinic ray-sensitive or radiation-sensitive resin com› position of the present invention can further contain a dye, 

a plasticizer, a light sensitizer, a light absorbent, an alkali› soluble resin, a dissolution inhibitor, a compound that pro› motes solubility in a developer (for example, a phenol compound with a molecular weight of 1,000 or less, an alicyclic or aliphatic compound having a carboxyl group), and the like, if desired. 

Such a phenol compound having a molecular weight of 1,000 or less may be easily synthesized by those skilled in the art with reference to the method described in, for example, JP1992-122938A (JP-H04-122938A), JP1990- 28531A (JP-H02-28531A), U.S. Pat. No. 4,916,210, EP219294B, and the like. 

Specific examples of the alicyclic compound or aliphatic compound having a carboxyl group include, but not limited to, a carboxylic acid derivative having a steroid structure such as a cholic acid, deoxycholic acid or lithocholic acid, an adamantane carboxylic acid derivative, adamantane dicarboxylic acid, cyclohexane carboxylic acid, and cyclo› hexane dicarboxylic acid. 

In the organic solvent developer, the alkali developer, and/or the rinsing liquid which can be used in the present invention, the content of various fine particles or impurities such as metal element is preferably small. In order to obtain such a chemical solution with few impurities, it is preferable to reduce the impurities, for example, by producing the chemical solution in a clean room or carrying out filtration through various filters such as a Teflon (registered trade- mark) filer, a polyolefin-based filter, and an ion exchange filter. As for the metal element, any of metal element concentrations of Na, K. Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni, and Zn is preferably 10 ppm or less, and more preferably 5 ppm or less. 

Furthermore, the container for storing the developer or rinsing liquid is not particularly limited, and a container made of a polyethylene resin, a polypropylene resin, a polyethylene-polypropylene resin or the like, which is used in the application of electronic materials, may be used, but in order to reduce impurities dissolved out from the con› tainer, it is also preferred to select a container that is less likely to cause elution of a component from the inner wall of the container to the chemical solution. Such a container includes a container where the inner wall of the container is formed of a perfluororesin (for example, a FluoroPure PFA composite drum (inner surface coming into contact with liquid: PFA resin lining) manufactured by Entegris, and a steel-made drum (inner surface coming into contact with liquid: zinc phosphate coat) manufactured by JFE), and the like. 

It is preferable that various materials (for example, a developer, a rinsing liquid, a composition for forming an antireflection film, and a composition for forming a topcoat) used in the actinic ray-sensitive or radiation-sensitive resin composition of the present invention, and the pattern form- ing method of the present invention do not include impuri› ties such as a metal. The content of the metal components included in these materials is preferably 10 ppm or less, more preferably 5 ppm or less, still more preferably 1 ppm or less, and particularly preferably substantially not metal components (no higher that the detection limit of a mea› surement device). 

Examples of the method for removing impurities such as a metal from various materials include filtration using a filter. As for the filter pore diameter, the pore size is preferably 50 nm or less, more preferably 10 nm or less, and still more preferably 5 nm or less. As the material of the filter, a polytetrafluoroethylene-made filter, a polyethylene› made filter, or a nylon-made filter is preferable. In the step of filtration using a filter, plural kinds of filters may be connected in series or in parallel, and used. In a case of using plural kinds of filters, a combination of filters having dif- 

