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radiation as a result of extensive studies. The present inven› tion has been conducted based on these findings. 

In other words, the present invention is as follows in one embodiment. 

[1] An actinic ray-sensitive or radiation-sensitive resin composition (A) including; a compound which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. 

[Chem.!] 

In the formula, 

Y $_{1 }$ and Y $_{2 }$ each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group; 

Z represents a hydrogen atom or a substituent; and * represents a linking site with a residue of the compound (A). 

[2] The actinic ray-sensitive or radiation-sensitive resin composition according to [1], wherein the compound (A) has two or more groups represented by the general formula (M). 

[3] The actinic ray-sensitive or radiation-sensitive resin composition according to [1] or [2], wherein the group represented by the general formula (M) is a hydroxymethyl group or an alkoxymethyl group. 

[4] The actinic ray-sensitive or radiation-sensitive resin composition according to any one of [ 1] to [3] which is used for the formation of a negative-tone pattern further includ› ing; (Bl) a compound having a phenolic hydroxyl group. 

[5] The actinic ray-sensitive or radiation-sensitive resin composition according to [4], wherein the compound (Bl) having the phenolic hydroxyl group is a polymer compound having a repeating unit represented by the following general formula (1). 

[Chem. 2] 

In the formula, 

R$_{11 }$ represents a hydrogen atom, a methyl group which may have a substituent, or a halogen atom; 

B$_{1 }$ represents a single bond or a divalent linking group; 

Ar represents an aromatic ring; and ml represents an integer of 1 or more. 

[6] The actinic ray-sensitive or radiation-sensitive resin 65 composition according to any one of [1] to [5], further including; (C) a cross-linking agent. 

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[7] The actinic ray-sensitive or radiation-sensitive resin composition according to any one of [1] to [6], further including; (D) a compound that generates an acid which dose not include a cross-linking group in a molecule by irradiation with actinic rays or radiation. 

[8] The actinic ray-sensitive or radiation-sensitive resin composition according to [6] or [7], including; a compound having two or more groups represented by the general formula (M) in a molecule as the cross-linking agent (C). 

[9] The actinic ray-sensitive or radiation-sensitive resin composition according to [6] or [7], including; a compound having two or more alkoxymethyl groups in a molecule as the cross-linking agent (C). 

(M) 

[10] The actinic ray-sensitive or radiation-sensitive resin composition according to any one of [1] to [3], further including; (B2) a compound having a group which is capable of decomposing by the action of an acid. 

[11] A negative-tone pattern forming method including; forming a film using the actinic ray-sensitive or radiation- sensitive resin composition according to [10], exposing the film and developing the exposed film with a developer containing an organic solvent. 

[12] An actinic ray-sensitive or radiation-sensitive film which is formed from the actinic ray-sensitive or radiation- sensitive resin composition according to any one of [1] to [10]. 

[13] Mask blanks including; the actinic ray-sensitive or radiation-sensitive film according to [12]. 

[14] A pattern forming method including; exposing the actinic ray-sensitive or radiation-sensitive film according to [12], and developing the exposed film. 

[15] A pattern forming method including; exposing the actinic ray-sensitive or radiation-sensitive film of the mask blanks according to [ 13], and developing the exposed actinic ray-sensitive or radiation-sensitive film. 

[16] The pattern forming method according to [14] or [15], wherein the exposing is performed using an electron beam or extreme ultraviolet rays. 

[17] A photomask which is manufactured by a method including; exposing the actinic ray-sensitive or radiation› sensitive film of the mask blanks according to [13], devel› oping the exposed actinic ray-sensitive or radiation-sensitive film to form a pattern and etching mask blanks using the pattern. 

[18] A compound represented by the following general formula (I): 

(1) 

[Chem. 3] 

(In the formula, M+ represents a sulfonium cation. X represents an alkyl group, a cycloalkyl group, an aryl group, a halogen atom, a hydroxyl group, an alkoxy group, or an acyl group. Z represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an acyl group. n repre› sents an integer of 1 to 3. o represents an integer of 1 to 5, p represents an integer of Oto 4, and o+ps5 is satisfied.) 

According to the present invention, an actinic ray-sensi› tive or radiation-sensitive resin composition that can form a pattern which satisfies high sensitivity, high resolution (for 

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(I) 

