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# c12) United States Patent 

# Kotake et al. 

# (54) CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventors: Masaaki Kotake, Joetsu (JP); Satoshi Watanabe, Joetsu (JP); Keiichi Masunaga, Joetsu (JP); Kenji Yamada, Joetsu (JP); Masaki Ohashi, Joetsu (JP) 

(73) Assignee: SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP) 

( * ) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by O days. This patent is subject to a terminal dis› claimer. 

(21) Appl. No.: 15/854,990 

(22) Filed: Dec. 27, 2017 

## (65) Prior Publication Data 

US 2018/0180998 Al Jun. 28, 2018 

## (30) Foreign Application Priority Data 

Dec. 28, 2016 (JP) ................................. 2016-255025 

(51) Int. Cl. 

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(52) U.S. Cl. CPC .......... G03F 710045 (2013.01); C07C 303132 (2013.01); C07C 317104 (2013.01); C07C 317/28 (2013.01); C07C 323120 (2013.01); C07C 381112 (2013.01); C08F 212114 (2013.01); G03F 710382 (2013.01); G03F 712002 (2013.01); G03F 712053 (2013.01); G03F 712059 (2013.01); G03F 7130 (2013.01); G03F 71322 (2013.01); C07C 2601/16 (2017.05); C08F 2800/10 (2013.01); G03F 7/039 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7120 (2013.01); G03F 7/2004 (2013.01); G03F 7/327 (2013.01) 

(58) Field of Classification Search CPC ..... G03F 7/0045; G03F 7/033; C07C 381/12; C07C 317/04; C07C 317/28; C07C 303/32 

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# (IO) Patent No.: US 10,725,377 B2 

# *Jul. 28, 2020 (45) Date of Patent: 

USPC .............. 430/270.1, 905, 910; 562/100, 113; 568/34, 35 See application file for complete search history. 

## (56) References Cited 

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## FOREIGN PATENT DOCUMENTS 

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* cited by examiner 

Primary Examiner - John S Chu (74) Attorney, Agent, or Firm - Westerman, Hattori, Daniels & Adrian, LLP 

## (57) ABSTRACT 

A negative resist composition comprising a sulfonium com› pound having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER. 

US010725377B2 

## U.S. PATENT DOCUMENTS 

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## 17 Claims, 3 Drawing Sheets 

