content_image/890736.jpg content_image/890737.jpg content_image/890739.jpg content_image/890738.jpg content_image/890740.jpg
group consisting ofbutyl acetate, pentyl acetate, isopen› tyl acetate, propylene glycol monomethyl ether acetate, and anisole. 

28. The pattern-forming method as claimed in claim 24, further comprising: 

(5) a process of rinsing the film with a rinsing liquid con› taining an organic solvent after the process ( 4). 

29. The pattern-forming method as claimed in claim 24, wherein 

the resin (A) further contains a repeating unit represented by the following formula 

(Al): 

wherein 

Xa$_{1 }$ represents a hydrogen atom or an alkyl group; 

T represents a single bond or a divalent linking group; and each of Rx i, Rx $_{2 }$and Rx$_{3 }$independently represents an alky I group or a cycloalkyl group, and Rx$_{2 }$ and Rx$_{3 }$ may be bonded to each other to form a cyclic structure. 

30. The pattern-forming method as claimed in claim 24, which is a method for forming a fine circuit of a semiconduc› tor device. 

31. The pattern-forming method as claimed in claim 24, wherein the repeating unit having an alicyclic hydrocarbon structure substituted with a hydroxyl group or a cyano group is a repeating unit represented by any of the formula (Alla) to (AIId): 

<img src='content_image/890736.jpg'>

<img src='content_image/890737.jpg'>

wherein in formulae (Alla) to (AIId), R$_{1}$c represents a hydrogen atom, a methyl group, a trifluoromethyl group or a hydroxymethyl group; 

each of R$_{2}$c to R$_{4}$ c independently represents a hydrogen atom, a hydroxyl group or a cyano group, provided that at least one ofR$_{2}$c to R$_{4}$ c represents a hydroxyl group or a cyano group. 

32. The pattern-forming method as claimed in claim 24, wherein the resin (A) contains a repeating unit having a lactone structure. 

33. The pattern-forming method as claimed in claim 29, wherein the content of the repeating unit represented by for› mula (1) in the resin is in the range of 1 to 40 mo!% based on all the repeating units, and the content of the repeating unit represented by formula (AI) in the resin is in the range of 20 to 70 mo! % based on all the repeating units, and the content in the resin of the repeating unit having an alicyclic hydro› carbon structure substituted with a hydroxyl group or a cyano group is 1 to 40 mo! %, based on all the repeating units. 

<img src='content_image/890739.jpg'>

<img src='content_image/890738.jpg'>

-continued 

<img src='content_image/890740.jpg'>

* * * * * 

