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[0031] each of n$_{1 }$ and n$_{2 }$ independently is an integer of 1 to 6. 

[0032] [2] The composition according to the above item [1], wherein the organic group is an alkyl group or an aryl group. 

[0033] [3] The composition according to the above item [1] or [2], wherein the compound (R) is expressed by general formula (1 ), and wherein at least one ofR$_{4 }$ and R$_{7 }$ is a hydro› gen atom. 

[0034] [ 4] The composition according to the above item [3], wherein both of R$_{4 }$ and R$_{7 }$ are hydrogen atoms. 

[0035] [5] The composition according to the above item [1] or [2], wherein the compound (R) is expressed by general formula (2), and wherein R$_{7 }$ is a hydrogen atom. 

[0036] [6] The composition according to any of the above items [1] to [5], wherein the repeating unit (A) is expressed by general formula (V) or (VI) below. 

[0037] In general formula (V), each of Rs 1, Rs$_{2 }$ and Rs$_{3 }$ independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, provided that Rs$_{2 }$may be bonded to Ls to thereby form a ring, which Rs$_{2 }$ represents an alkylene group, 

[0038] Ls represents a single bond or a bivalent connecting group, provided that when a ring is formed in cooperation with Rs$_{2}$ , Ls represents a trivalent connecting group, and 

[0039] Rs$_{4 }$ represents an alkyl group, and each ofRss and Rs$_{6 }$ independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or a monovalent aromatic ring group, provided that Rss and Rs $_{6 }$may be bonded to each other to thereby form a ring, and provided that Rss and Rs$_{6 }$are not simultaneously hydrogen atoms. 

[0040] In general formula (VI), each of R$_{61}$, R$_{62 }$and R$_{63 }$ independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, provided that R$_{62 }$may be bonded to Ar$_{6 }$ to thereby form a ring, which R$_{62 }$represents an alkylene group, 

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[0041] X$_{6 }$ represents a single bond, --COO- or ----CONR$_{64}$- in which R$_{64 }$represents a hydrogen atom or an alkyl group, 

[0042] L$_{6 }$ represents a single bond or an alkylene group, 

[0043] Ar$_{6 }$represents a bivalent aromatic ring group, 

[0044] Y $_{2}$ , when n2:2 each independently, represents a hydrogen atom or a group that when acted on by an acid, is cleaved, provided that at least one ofY $_{2}$s is a group that when acted on by an acid, is cleaved, and 

[0045] n is an integer of 1 to 4. 

[0046] [7] The composition according to any of the above items [1] to [6], wherein the resin (P) further contains any of repeating units (B) expressed by general formula (I) below. 

[0047] In general formula (I), each of R$_{41}$, R$_{42 }$and R$_{43 }$ independently represents a hydrogen atom, an alkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, 

[0048] X$_{4 }$ represents a single bond, --COO- or ----CONR$_{64}$- in which R$_{64 }$represents a hydrogen atom or an alkyl group, 

[0049] L$_{4 }$ represents a single bond or an alkylene group, 

[0050] Ar$_{4 }$ represents a (n+l)-valent aromatic ring group, and 

[0051] n is an integer of 1 to 4. 

[0052] [8] The composition according to the above item [7], wherein the repeating unit (B) has a hydroxystyrene structure. 

[0053] [9] The composition according to any of the above items [1] to [8], further comprising a basic compound other than the compound (R). 

[0054] [10] The composition according to the above item [9], wherein the basic compound contains no hydroxyl group. 

[0055] [ 11] The composition according to any of the above items [1] to [10] for use in a pattern formation including exposure by EUV. 

[0056] [12] An actinic-ray- or radiation-sensitive resin film formed from the composition according to any of the above items [1] to [11]. 

[0057] [ 13] A method of forming a pattern, comprising: 

[0058] exposing the film according to the above item [12] to light, and 

[0059] developing the exposed film. 

[0060] [ 14] The method according to item [ 13], wherein the exposure is carried out by EUV light. 

[0061] [15] A process for manufacturing an electronic device, comprising the pattern forming method according to the above item [13] or [14]. 

[0062] [16] An electronic device manufactured by the pro› cess according to the above item [15]. 

[0063] The present invention has made it feasible to pro› vide an actinic-ray- or radiation-sensitive resin composition that can attain high sensitivity, favorable pattern shape, favor- 

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