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# c19) United States c12) Patent Application Publication 

# Hatakeyama et al. 

# (54) RESIST COMPOSITION AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventors: Jun Hatakeyama, Joetsu-shi (JP); Takayuki Fujiwara, Joetsu-shi (JP) 

(73) Assignee: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(21) Appl. No.: 16/934,259 

(22) Filed: Jul. 21, 2020 

## (30) Foreign Application Priority Data 

Aug. 14, 2019 (JP) ................................. 2019-148848 

<img src='content_image/904691.jpg'>

(51) Int. Cl. 

(52) U.S. Cl. CPC .......... G03F 710045 (2013.01); G03F 7/2006 (2013.01); G03F 710382 (2013.01); G03F 710392 (2013.01) 

## (57) ABSTRACT 

A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C$_{1 }$-C$_{20 }$ hydrocarbylene group and an anion derived from an iodized or brominated phenol offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone. 

US 20210048748Al 

# c10) Pub. No.: US 2021/0048748 Al 

# (43) Pub. Date: Feb. 18, 2021 

## Publication Classification 

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