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# c12) United States Patent Takizawa et al. 

# (54) ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND RESIST FILM USING THE COMPOSITION, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THESE 

(71) Applicant: FUJIFILM CORPORATION, Tokyo (JP) 

(72) Inventors: Hiroo Takizawa, Shizuoka (JP); Tomotaka Tsuchimura, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 14/458,660 

(22) Filed: Aug. 13, 2014 

## (65) Prior Publication Data 

US 2014/0349221 Al Nov. 27, 2014 

( 63) Continuation of application No. PCT /JP2013/05067 5, filed on Jan. 16, 2013. 

## (30) Foreign Application Priority Data 

Feb. 16,2012 (JP) ................................. 2012-032099 

(51) Int. Cl. 

<img src='content_image/896591.jpg'>

(52) U.S. Cl. CPC ................ G03F 71027 (2013.01); G03F 71004 (2013.01); G03F 71038 (2013.01); G03F 71039 (2013.01); G03F 710045 (2013.01); G03F 710046 (2013.01); G03F 710382 (2013.01); G03F 710397 (2013.01) 

( 58) Field of Classification Search CPC ....... G03F 7/004; G03F 7/038; G03F 7/0382; G03F 7/039; G03F 7/0392 USPC ....................................... 430/270.1, 325, 326 See application file for complete search history. 

## Related U.S. Application Data 

<img src='content_image/896572.jpg'>

# (IO) Patent No.: US 9,069,246 B2 

# (45) Date of Patent: Jun.30,2015 

## (56) References Cited 

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International Search Report dated Feb. 19, 2013 issued in Interna› tional Application No. PCT/JP2013/050675 (PCT/ISA/210). Written Opinion dated Feb. 19, 2013 issued in International Appli› cation No. PCT/JP2013/050675 (PCT/ISA/237). Conununication from the Japanese Patent Office dated Sep. 9, 2014, in a counterpart Japanese application No. 2012-032099. 

* cited by examiner 

Primary Examiner - John A McPherson 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

An actinic ray-sensitive or radiation-sensitive resin composi› tion containing a compound capable of generating an acid upon irradiation with an actinic ray or radiation, represented by the formula (Zl), and the formula (Zl) is defined as herein, 

and a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method comprising a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, a step of exposing the film, and a step of developing the exposed film, a method for manufacturing an electronic device, comprising the pattern forming method, and an elec› tronic device manufactured by the method for manufacturing an electronic device. 

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US009069246B2 

## U.S. PATENT DOCUMENTS 

## FOREIGN PATENT DOCUMENTS 

## OTHER PUBLICATIONS 

## 14 Claims, No Drawings 

