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# c12) United States Patent 

# Tsubaki et al. 

# (54) ORGANIC SOLVENT DEVELOPMENT OR MULTIPLE DEVELOPMENT PATTERN-FORMING METHOD USING ELECTRON BEAMS OR EUV RAYS 

(75) Inventors: Hideaki Tsubaki, Shizuoka (JP); Koji Shirakawa, Shizuoka (JP); Toru Tsuchihashi, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 67 days. 

(21) Appl. No.: 13/202,389 

(22) PCT Filed: Feb.19,2010 

(86) PCT No.: PCT I JP2010/053014 § 371 (c)(l), (2), ( 4) Date: Aug. 19, 2011 

(87) PCT Pub. No.: WO2010/095763 

PCT Pub. Date: Aug. 26, 2010 

## (65) Prior Publication Data 

US 2011/0300485 Al Dec. 8, 2011 

## (30) Foreign Application Priority Data 

Feb. 20, 2009 (JP) ................................. 2009-038666 

(51) Int. Cl. G03C 5100 (2006.01) 

(52) U.S. Cl. USPC ........... 430/296; 430/325; 430/326; 430/331; 430/942 

(58) Field of Classification Search USPC .......................... 430/296, 325,326, 331, 942 See application file for complete search history. 

## (56) References Cited 

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## U.S. PATENT DOCUMENTS 

<img src='content_image/904335.jpg'>

# (IO) Patent No.: US 8,546,063 B2 

# Oct. 1, 2013 (45) Date of Patent: 

<img src='content_image/904321.jpg'>

## FOREIGN PATENT DOCUMENTS 

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International Search Report [PCT/ISA/210] issued in corresponding International application No.PCT/JP2010/053014 on Mar. 23, 2010. Written Opinion of the International Searching Authority [PCT/ISA/ 237] issued in corresponding International application No. PCT/ JP2010/053014 on Mar. 23, 2010. 

Extended European Search Report dated Jun. 12, 2012 issued by the European Patent Office in counterpart European Application No. 10743883.0. 

Office Action dated Jan. 9, 2013 in U.S. Appl. No. 13/588,762. 

* cited by examiner 

Primary Examiner - Christopher Young 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

Provided is a pattern-forming method including, in the fol› lowing order: (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition com› prising a resin which contains an acid-decomposable repeat› ing unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; (2) a process of exposing the film with an electron beam or an EUV ray; and (4) a process of developing the film with a developer contain› ing an organic solvent. 

US008546063B2 

## OTHER PUBLICATIONS 

## 33 Claims, No Drawings 

