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# c19) United States c12) Patent Application Publication 

# NAKAMURA et al. 

# (54) RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 

(75) Inventors: Tsuyoshi NAKAMURA, Kawasaki-shi (JP); Masaru TAKESHITA, Kawasaki-shi (JP); Jiro YOKOYA, Kawasaki-shi (JP); Hideo HADA, Kawasaki-shi (JP); Kensuke MATSUZAWA, Kawasaki-shi (JP); Kazushige DOHTANI, Kawasaki-shi (JP) 

Correspondence Address: KNOBBE MARTENS OLSON & BEAR LLP 2040 MAIN STREET, FOURTEENTH FLOOR IRVINE, CA 92614 (US) 

(73) Assignee: TOKYO OHKA KOGYO CO., LTD., Kawasaki-shi (JP) 

(21) Appl. No.: 12/788,160 

(22) Filed: May 26, 2010 

## (30) Foreign Application Priority Data 

May 29, 2009 (JP) ................................. 2009-130943 

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(51) Int. Cl. 

(52) U.S. Cl. ...................................... 430/270.1; 430/326 

## (57) ABSTRACT 

A resist composition including: a base component which exhibits changed solubility in an alkali developing solution under the action of acid; and an acid-generator component containing an acid generator (B 1) consisting of a compound represented by general formula (bl); dissolved in an organic solvent containing an alcohol-based organic solvent having a boiling point of at least 150° C., wherein R 7 " to R 9 " represents an aryl &"oup or an alkyl group, provided that at least one of R 7 " to R "represents a substituted aryl group which has been substituted with a group represented by the formula: ---O-R$^{70 }$(R$^{70 }$represents an organic group), and two ofR 7 " to R 9 " may be mutually bonded to form a ring with the sulfur atom; X represents a hydrocarbon group of 3 to 30 carbon atoms; Q$^{1 }$represents a divalent linking group containing an oxygen atom; and Y$^{1 }$represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms. 

US 20110008728Al 

# c10) Pub. No.: US 2011/0008728 Al 

# (43) Pub. Date: Jan. 13, 2011 

## Publication Classification 

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[Chemical Formula 1] 

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