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# c12) United States Patent Takizawa et al. 

# (54) PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE 

(71) Applicant: FUJIFILM Corporation, Minato-ku, Tokyo (JP) 

(72) Inventors: Hiroo Takizawa, Shizuoka (JP); Tomotaka Tsuchimura, Shizuoka (JP); Takeshi Kawabata, Shizuoka (JP); Takuya Tsuruta, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 160 days. 

(21) Appl. No.: 14/451,901 

(22) Filed: Aug. 5, 2014 

## (65) Prior Publication Data 

US 2014/0349224 Al Nov. 27, 2014 

(63) Continuation of application No. PCT/JP2013/052969, filed on Feb. 4, 2013. 

## (30) Foreign Application Priority Data 

Feb. 6, 2012 (JP) ................................. 2012-023386 

(51) Int. Cl. 

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(52) U.S. Cl. CPC ........... G03F 710388 (2013.01); G03F 710045 (2013.01); G03F 710046 (2013.01); G03F 71038 (2013.01); G03F 710397 (2013.01); G03F 7120 (2013.01); G03F 712002 (2013.01); G03F 71325 (2013.01) 

( 58) Field of Classification Search CPC .... G03F 7/0045; G03F 7/0046; G03F 7/0397; G03F 7/2002; G03F 7/038; G03F 7/0388; G03F 7/20; G03F 7/325; G03F 7/0382 USPC .... 430/18, 270.1, 286.1, 296, 311, 319, 325 See application file for complete search history. 

## (56) References Cited 

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## Related U.S. Application Data 

## U.S. PATENT DOCUMENTS 

<img src='content_image/904389.jpg'>

# (IO) Patent No.: US 9,557,643 B2 

# Jan.31,2017 (45) Date of Patent: 

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Search Report dated Mar. 5, 2013, issued by the International Searching Authority in counterpart International Application No. PCT/JP2013/052969. 

Written Opinion dated Mar. 5, 2013, issued by the International Searching Authority in counterpart International Application No. PCT/JP2013/052969. 

Office Action dated May 19, 2015, issued by the Japanese Patent Office in counterpart Japanese Application No. 2012-023386. 

Office Action issued on Apr. 26, 2016, by the Taiwanese Patent Office in counterpart Taiwanese Application No. 102104643. 

Office Action dated Mar. 7, 2016, issued by the Korean Intellectual Property Office in corresponding Korean Application No. 10-2014- 7022075. 

Office Action dated Aug. 15, 2016, issued by the Taiwanese Patent Office in counterpart Taiwanese Application No. 102104643. 

Office Action dated Aug. 23, 2016 issued by the Korean Intellectual Property Office in corresponding Korean Application No. 10-2014- 7022075. 

Office Action dated Oct. 17, 2016 issued by the Korean Intellectual Property Office in counterpart Korean Patent Application No. 10-2014-7022075. 

Primary Examiner - John A McPherson 

(74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility for an organic solvent› containing developer by the action of an acid, (B) a com› pound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a compound capable of decom› posing by the action of an acid to generate an acid, and (D) a solvent; (2) a step of exposing the film by using an actinic ray or radiation, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern. 

## FOREIGN PATENT DOCUMENTS 

## OTHER PUBLICATIONS 

## 14 Claims, No Drawings 

