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using 4-methyl-2-pentanol as a rinsing solution, spun at a rotational speed of 4,000 rpm for 30 seconds and baked at 90° C. for 60 seconds to obtain a resist pattern composed of a 1: 1 line-and-space pattern having a line width of 50 nm. 

10 Preparation of an electron beam-sensitive or extreme ultra› violet-sensitive resin composition and pattern formation were performed in the same manner as in Example 1 except for changing the formulation as shown in the Table below, per› forming the development with an aqueous alkali solution (TMAH, an aqueous 2.38 mass % tetramethylammonium 15 hydroxide solution) in pace of the organic developer, and using water as the rinsing solution. 

(3) Evaluation of Resist Pattern 

The obtained resist pattern was evaluated for sensitivity, resolution and LWR by means of a scanning electron micro- scope (S-9220, manufacture by Hitachi Ltd.) by the following methods. The results obtained are shown in the Table below. 

## Comparative Examples 3 to 6 

## Electron Beam (EB) Exposure 

(3-1) Sensitivity 

The irradiation energy below which a 1: 1 line-and-space pattern having a line width of 50 nm cannot be resolved was taken as the sensitivity (Eop ). A smaller value indicates higher performance. In Comparative Examples 3 to 5, the 1: 1 line-and-space pattern with a line width of 50 nm could not be resolved and therefore, the irradiation energy below which a 1: 1 line-and-space pattern with a line width of 100 nm is not resolved was taken as the sensitivity (Eop). 

(3-2) Resolution 

The minimum line width below which the line-and-space (1: 1) pattern at the Eop above cannot be separated was taken as the resolution. A smaller value indicates higher perfor- mance. 

(3-3) Line Width Roughness (LWR) 

With respect to the line width roughness, at arbitrary 50 points in the longitudinal 0.5 µm region of a line-and-space space pattern having a line width of 50 nm (in Comparative Examples 3 to 5, a 1:1 line-and-space pattern having a line width of 100 nm), the line width at the Eop above was mea› sured and after determining the standard deviation thereof, 3 a was computed. A smaller value indicates higher performance. 

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