content_image/885281.jpg content_image/885282.jpg content_image/885283.jpg content_image/885284.jpg
<img src='content_image/885281.jpg'>

[0495] Among the examples, as the cation moiety [(Mm+) $_{11}$ml, a cation represented by Formula (ca-1) is preferable, and a cation represented by any of Formulae (ca-1-1) to (ca-1-72) is more preferable. 

[0496] In the component (B), the above-described acid generator may be used alone or in combination of two or more kinds thereof. 

[0497] In a case where the resist composition contains the component (B), the content of the component (B) is pref› erably in a range of 5 to 50 parts by mass, more preferably in a range of 10 to 40 parts by mass, and still more preferably in a range of 10 to 30 parts by mass with respect to 100 parts by mass of the component (A). 

[0498] In a case where the content of the component (B) is in the above-described range, pattern formation can be satisfactorily performed. Further, it is preferable that the content thereof is in the above-described range because a uniform solution is easily obtained at the time of dissolving each component of the resist composition in an organic solvent, and the storage stability of the resist composition becomes excellent. 

[0499] <<Acid Diffusion Control Agent Component (D)» 

[0500] The resist composition of the present embodiment may further contain an acid diffusion control agent compo› nent (hereinafter, referred to as a "component (D)") in addition to the component (A) or the component (A) and the component (B). The component (D) acts as a quencher (an acid diffusion control agent) which traps the acid generated in the resist composition upon exposure. 

[0501] The component (D) may be a photodecomposable base (Dl) (hereinafter, referred to as "component (Dl)") which is decomposed upon exposure and then loses the acid diffusion controllability or a nitrogen-containing organic compound (D2) (hereinafter, referred to as "component (D2)") which does not correspond to the component (Dl). 

[0502] In Regard to Component (Dl) 

[0503] In a case where a resist composition containing the component (Dl) is obtained, the contrast between exposed portions and unexposed portions of the resist film can be improved at the time of formation of a resist pattern. 

[0504] The component (Dl) is not particularly limited as long as decomposition is made upon exposure so that the acid diffusion controllability is lost, and one or more com› pounds selected from the group consisting of a compound represented by Formula (dl-1) (hereinafter, referred to as a "component (dl-1)"), a compound represented by Formula 

-continued 

(dl-2) (hereinafter, referred to as "component (dl-2)"), and a compound represented by Formula (dl-3) (hereinafter, referred to as "component (dl-3)") are preferable. 

[0505] At exposed portions of the resist film, the compo› nents (dl-1) to (dl-3) are decomposed and then lose the acid diffusion controllability (basicity), and therefore the com› ponents (dl-1) to (dl-3) cannot act as a quencher, whereas at unexposed portions, the components (dl-1) to (dl-3) acts as a quencher. 

[0506] [In the formulae, Rd 1 to Rd 4 represent a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent or a chain-like alkenyl group which may have a substituent, provided that, the carbon atom adjacent to the sulfur atom in the Rd 2 in Formula (dl-2) has no fluorine atom bonded thereto; Yd 1 represents a single bond or a divalent linking group; m represents an integer of 1 or greater; and each Mm+ independently repre› sents an m-valent organic cation.] 

[0507] { Component ( dl-1)} 

[0508] Anion Moiety 

[0509] In Formula (dl-1), Rd 1 represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent or a chain-like alkenyl group which may have a substituent, and examples thereof are the same as those described above as R$^{101 }$in Formula (b-1). 

[0510] Among these, as the group as Rd1, an aromatic hydrocarbon group which may have a substituent, an ali› phatic cyclic group which may have a substituent and a chain-like alkyl group which may have a substituent are preferable. Examples of the substituent for these groups include a hydroxyl group, an oxo group, an alkyl group, an 

<img src='content_image/885282.jpg'>

<img src='content_image/885283.jpg'>

<img src='content_image/885284.jpg'>

(ca-5-3) 

