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# c12) United States Patent 

# Nihashi et al. 

# (54) PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventors: Wataru Nihashi, Shizuoka (JP); Hideaki Tsubaki, Shizuoka (JP); Toru Tsuchihashi, Shizuoka (JP); Tomotaka Tsuchimura, Shizuoka (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

( *) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by O days. 

(21) Appl. No.: 15/718,659 

Sep. 28, 2017 (22) Filed: 

## (65) Prior Publication Data 

US 2018/0017872 Al Jan. 18, 2018 

## Related U.S. Application Data 

(63) Continuation of application No. PCT/JP2016/059522, filed on Mar. 24, 2016. 

## (30) Foreign Application Priority Data 

Mar. 31, 2015 (JP) ................................. 2015-074229 

(51) Int. Cl. 

<img src='content_image/897119.jpg'>

(52) U.S. Cl. CPC .............. G03F 71325 (2013.01); G03F 71038 (2013.01); G03F 710382 (2013.01); G03F 710392 (2013.01); G03F 7116 (2013.01); G03F 7120 (2013.01); G03F 712004 (2013.01) 

( 58) Field of Classification Search CPC ......... G03F 7/325; G03F 7/0382; G03F 7/038 See application file for complete search history. 

## (56) References Cited 

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## U.S. PATENT DOCUMENTS 

<img src='content_image/897103.jpg'>

# (IO) Patent No.: US 10,394,127 B2 

# (45) Date of Patent: Aug. 27, 2019 

<img src='content_image/897137.jpg'>

## FOREIGN PATENT DOCUMENTS 

<img src='content_image/897136.jpg'>

Park et al ,"Polymers with Acid-amplifying Side Chainsas Positive› type Photoresists", Journal of Photopolymer Science and Technol› ogy, vol. 17, No. 3 , 2004,pp. 427-432. (Year: 2004).* 

English Translation of JP 2015-096932 A generated machine trans› lation from AIPN Japan Patent Office National Center for Industrial Property Information and Training, generated Oct. 19, 2018, 62 pages. (Year: 2018). * 

Communication dated Feb. 20, 2018, from the Japanese Patent Office in counterpart Application No. 2017-509886. 

International Search Report, issued by International Searching Authority in corresponding International Application No. PCT/ JP2016/059522, dated Jun. 21, 2016, (PCT/ISA/210). 

Written Opinion, issued by International Searching Authority in corresponding International Application No. PCT/JP2016/059522, dated Jun. 21, 2016, (PCT/ISA/237). 

* cited by examiner 

Primary Examiner - Cynthia Hamilton (74) Attorney, Agent, or Firm - Sughrue Mion, PLLC 

## (57) ABSTRACT 

Provide are a pattern forming method including a step (1) of forming a film using an actinic ray-sensitive or radiation› sensitive resin composition including a resin having an acid-decomposable repeating unit capable of decomposing by the action of an acid to generate an acid having a pKa of 3.0 or less, a step (2) of exposing the film using actinic rays or radiation, and a step (3) of carrying out development using a developer including an organic solvent after the exposure to form a negative tone pattern; and a method for manufacturing an electronic device, including the pattern forming method. 

US010394127B2 

## OTHER PUBLICATIONS 

## 12 Claims, No Drawings 

