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# c19) United States c12) Patent Application Publication 

# Fukushima 

# (54) NOVEL ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS 

(71) Applicant: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(72) Inventor: Masahiro Fukushima, Joetsu-shi (JP) 

(73) Assignee: Shin-Etsu Chemical Co., Ltd., Tokyo (JP) 

(21) Appl. No.: 16/660,081 

(22) Filed: Oct. 22, 2019 

## (30) Foreign Application Priority Data 

Oct. 24, 2018 (JP) ................................. 2018-199659 

<img src='content_image/913291.jpg'>

(51) Int. Cl. 

(52) U.S. Cl. CPC .......... G03F 710045 (2013.01); G03F 710382 (2013.01); G03F 71322 (2013.01); C08L 33/14 (2013.01); C07C 381112 (2013.01) 

## (57) ABSTRACT 

A novel onium salt and a resist composition comprising the same as a PAG are provided. When processed by photoli› thography using KrF or ArF excimer laser, EB or EUV, the resist composition is reduced in acid diffusion and improved in exposure latitude, MEF, and LWR. 

US 20200133122Al 

# c10) Pub. No.: US 2020/0133122 Al 

# (43) Pub. Date: Apr. 30, 2020 

## Publication Classification 

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