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11. The pattern formation method according to claim 1, 

wherein the bond between X$_{4 }$ and L$_{4 }$ in General Formula (I) is a single bond. 

12. The pattern formation method according to claim 1, 

wherein the content of the repeating unit represented by General Formula (I) is 10 mo! % to 40 mo! % with respect to the entirety of repeating units in the resin (A). 

13. The pattern formation method according to claim 1, 

includes a compound (B) that generates an acid by active light or radiation. 

14. The pattern formation method according to claim 13, 

wherein the compound (B) that generates an acid by active light or radiation is a compound that generates an acid having a volume of 240 Angstroms 3 or greater. 

15. The pattern formation method according to claim 1, 

wherein an electron beam or extreme ultraviolet rays are used as the active light or the radiation. 

16. A production method for an electronic device, com- prising: 

the pattern formation method according to claim 1. 

17. A pattern formation method, comprising: 

(1) forming a film using an active light-sensitive or radiation-sensitive resin composition; 

(2) exposing the film to active light or radiation; and 

(3) developing the exposed film using a developer includ› ing an organic solvent, 

wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having a repeat› ing unit represented by General Formula (I), a repeating unit represented by General Formula (II’), and a repeat› ing unit represented by General Formula (V), 

<img src='content_image/917041.jpg'>

wherein, in General Formula (I), each ofR$_{41}$, R 42 , and R 43 independently represents a hydrogen atom, an alkyl group, a halogen atom, a cyano group, or an alkoxy- carbonyl group; 

here, R$_{42 }$may be bonded to Ar$_{4 }$ to form a ring, and R$_{42 }$in this case represents a single bond or an alkylene group; X$_{4 }$ represents a single bond, --COO-, or ----CONR$_{44}$ -, and, in the case of forming a ring with 60 R$_{42}$, represents a trivalent connecting group; R$_{44 }$rep› resents a hydrogen atom or an alkyl group; L$_{4 }$ repre› sents a single bond or an alkylene group; Ar$_{4 }$ represents an (n+l) valent aromatic ring group, and, in the case of being bonded to R$_{42 }$to form a ring, represents an (n+2) 65 valent aromatic ring group; and n represents an integer of 1 to 4, 

<img src='content_image/917043.jpg'>

wherein, in Formula (II’), each of R$_{6}$ i, $^{R}$62, and R 63 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group; here, R$_{62 }$ may be bonded to Ar 6 to form a ring, and R$_{62 }$ in this case represents a single bond or an alkylene group; X$_{6 }$ represents a single bond, -COO-, or ----CONR$_{64}$-; R$_{64 }$represents a hydrogen atom or an alkyl group; L$_{6 }$ represents a single bond or an alkylene group; Ar$_{6 }$ represents a divalent aromatic ring group, and, in the case of being bonded to R$_{62 }$to form a ring, represents a trivalent aromatic ring group; R$_{3 }$ represents a hydro› gen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, an alkoxy group, an acyl group, or a heterocyclic group; M$_{3 }$ represents a single bond or a divalent connecting group; Q$_{3 }$ represents an alkyl group, a cycloalkyl group, an aryl group, or a heterocyclic group; and at least two of Q$_{3}$ , M$_{3}$, and R$_{3 }$ may be bonded to each other to form a ring; and 

<img src='content_image/917042.jpg'>

wherein, in Formula (V), each of Rg$_{1}$ , Rg$_{2}$ , and Rg$_{3 }$ independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group; here, Rg$_{2 }$ may be bonded to Lg to form a ring, and Rg$_{2 }$ in this case represents a single bond or an alkylene group; Xg represents a single bond or a divalent connecting group; Lg represents a single bond or an (s+l) valent connect› ing group, and in the case of being bonded to Rg$_{2 }$ to form a ring, represents an (s+2) valent connecting group; s represents an integer of 1 to 5; here, in a case where Lg is a single bond, s is 1; and Bg represents a group containing a cross-linking group. 

18. The pattern formation method according to claim 17, 

wherein a cross-linking group included in Bg in General Formula (V) is a hydroxymethyl group, an alkoxym› ethyl group, an oxirane ring, or an oxetane ring. 

19. The pattern formation method according to claim 17, 

wherein Bg in General Formula (V) is a group which has a phenol structure, a urea structure, or a melamine structure, having a hydroxymethyl group or an alkoxymethyl group. 

