content_image/904085.jpg content_image/904070.jpg content_image/904093.jpg
# c19) United States c12) Patent Application Publication 

# Tsuchimura et al. 

# (54) ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, MASK BLANK WITH RESIST FILM, METHOD FOR PRODUCING PHOTOMASK, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE 

(71) Applicant: FUJIFILM Corporation, Tokyo (JP) 

(72) Inventors: Tomotaka Tsuchimura, Haibara-gun (JP); Takashi Kawashima, Haibara-gun (JP); Akihiro Kaneko, Haibara-gun (JP); Michihiro Ogawa, Haibara-gun (JP); Michihiro Shirakawa, Haibara-gun (JP); Hajime Furutani, Haibara-gun (JP); Kyohei Sakita, Haibara-gun (JP) 

(73) Assignee: FUJIFILM Corporation, Tokyo (JP) 

(21) Appl. No.: 16/905,566 

(22) Filed: Jun. 18, 2020 

(63) Continuation of application No. PCT/JP2018/ 040207, filed on Oct. 30, 2018. 

## (30) Foreign Application Priority Data 

Dec. 22, 2017 (JP) ................................. 2017-246971 

(51) Int. Cl. 

<img src='content_image/904085.jpg'>

(52) U.S. Cl. CPC .............. G03F 710045 (2013.01); G03F 1122 (2013.01); G03F 71038 (2013.01); G03F 71039 (2013.01); G03F 712037 (2013.01); C08F 212124 (2020.02); C08F 220/1806 

## Related U.S. Application Data 

## Publication Classification 

<img src='content_image/904070.jpg'>

## (57) ABSTRACT 

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can provide a resist film with excellent sensitivity and a pattern with excellent LER performance, and can suppress pattern col› lapse during pattern formation. In addition, the present invention also provides a resist film, a pattern forming method, a mask blank with a resist film, a method for producing a photomask, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sen› sitive or radiation-sensitive resin composition of an embodi› ment of the present invention includes a resin X having a repeating unit A represented by General Formula (I), a repeating unit B having an acid-decomposable group, and a repeating unit C selected from a repeating unit cl repre› sented by General Formula (II) and the like; a compound Y which is a basic compound or ammonium salt compound whose basicity is reduced upon irradiation with actinic rays or radiation; and a photoacid generator Z which is a com› pound other than the compound Y. 

US 20200319551Al 

# c10) Pub. No.: US 2020/0319551 Al 

# (43) Pub. Date: Oct. 8, 2020 

(2020.02); C08F 2201282 (2020.02); C08F 220/1811 (2020.02); C08F 2201281 (2020.02); C08F 220/1804 (2020.02); G03F 712004 (2013.01) 

<img src='content_image/904093.jpg'>

