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# c12) United States Patent Pohlers et al. 

# (54) IONIC THERMAL ACID GENERATORS FOR LOW TEMPERATURE APPLICATIONS 

(71) Applicant: Rohm and Haas Electronic Materials LLC, Marlborough, MA (US) 

(72) Inventors: Gerhard Pohlers, Needham, MA (US); Cong Liu, Shrewsbury, MA (US); Cheng-Bai Xu, Southborough, MA (US); Kevin Rowell, Brighton, MA (US); Irvinder Kaur, Westborough, MA (US) 

(73) Assignee: Rohm and Haas Electronic Materials LLC, Marlborough, MA (US) 

( * ) Notice: Subject to any disclaimer, the term ofthis patent is extended or adjusted under 35 U.S.C. 154(b) by 276 days. 

(21) Appl. No.: 13/691,689 

(22) Filed: Nov. 30, 2012 

## (65) Prior Publication Data 

US 2015/0212414 Al Jul. 30, 2015 

(51) Int. Cl. 

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(52) U.S. Cl. CPC ............... G03F 7140 (2013.01); C07C 309/03 (2013.01); C07C 309/06 (2013.01); C07D 

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# (IO) Patent No.: US 9,541,834 B2 

# (45) Date of Patent: Jan.10,2017 

(58) Field of Classification Search None See application file for complete search history. 

## (56) References Cited 

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Chemical Abstract for CN 102117022 (Accession No. 2011:857786) (2011).* 

Primary Examiner - Sin Lee 

(74) Attorney, Agent, or Firm - Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.; Peter F. Corless 

## (57) ABSTRACT 

New ionic thermal acid generator compounds are provided. Also provided are photoresist compositions, antireflective coating compositions, and chemical trim overcoat compo› sitions, and methods of using the compositions. 

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US009541834B2 

239/26 (2013.01); C07D 241112 (2013.01); C07D 263132 (2013.01); C07D 277122 (2013.01); C07D 333/48 (2013.01); G03F 710397 (2013.01); G03F 7109 (2013.01); G03F 71091 (2013.01); G03F 7111 (2013.01); G03F 7130 (2013.01); G03F 71405 (2013.01) 

## U.S. PATENT DOCUMENTS 

(Continued) 

## FOREIGN PATENT DOCUMENTS 

(Continued) 

## OTHER PUBLICATIONS 

## 16 Claims, 1 Drawing Sheet 

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