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[0171] It is demonstrated in Tables 1 to 3 that resist compositions comprising an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group ( exclusive of an iodized or brominated aromatic ring) form patterns having a high sensitivity, satisfactory resolution, and reduced values of CDU. 

[0172] Japanese Patent Application No. 2019-142875 is incorporated herein by reference. 

[0173] Although some preferred embodiments have been described, many modifications and variations may be made 

thereto in light of the above teachings. It is therefore to be understood that the invention may be practiced otherwise than as specifically described without departing from the scope of the appended claims. 

1. A chemically amplified resist composition comprising a quencher and an acid generator, the quencher comprising an ammonium salt of a carboxylic acid having an iodine or bromine-substituted hydrocarbyl group which does not con› tain an iodine or bromine-substituted aromatic ring. 

