SiO2 is Low Tridymite-like structured and crystallizes in the monoclinic C2/m space group. The structure consists of four water atoms inside a Si8O15 framework. In the Si8O15 framework, there are four inequivalent Si sites. In the first Si site, Si(1) is bonded to one O(2), one O(5), one O(7), and one O(8) atom to form corner-sharing SiO4 tetrahedra. In the second Si site, Si(2) is bonded in a trigonal non-coplanar geometry to one O(5), one O(6), and one O(7) atom. In the third Si site, Si(3) is bonded to one O(1), one O(3), one O(4), and one O(6) atom to form corner-sharing SiO4 tetrahedra. In the fourth Si site, Si(4) is bonded to one O(1), one O(2), one O(8), and one O(9) atom to form corner-sharing SiO4 tetrahedra. There are nine inequivalent O sites. In the first O site, O(1) is bonded in a bent 150 degrees geometry to one Si(3) and one Si(4) atom. In the second O site, O(2) is bonded in a bent 150 degrees geometry to one Si(1) and one Si(4) atom. In the third O site, O(3) is bonded in a bent 150 degrees geometry to two equivalent Si(3) atoms. In the fourth O site, O(4) is bonded in a linear geometry to two equivalent Si(3) atoms. In the fifth O site, O(5) is bonded in a bent 150 degrees geometry to one Si(1) and one Si(2) atom. In the sixth O site, O(6) is bonded in a bent 150 degrees geometry to one Si(2) and one Si(3) atom. In the seventh O site, O(7) is bonded in a bent 150 degrees geometry to one Si(1) and one Si(2) atom. In the eighth O site, O(8) is bonded in a bent 150 degrees geometry to one Si(1) and one Si(4) atom. In the ninth O site, O(9) is bonded in a bent 150 degrees geometry to two equivalent Si(4) atoms.
SiO2 is Low Tridymite-like structured and crystallizes in the monoclinic C2/m space group. The structure consists of four water atoms inside a Si8O15 framework. In the Si8O15 framework, there are four inequivalent Si sites. In the first Si site, Si(1) is bonded to one O(2), one O(5), one O(7), and one O(8) atom to form corner-sharing SiO4 tetrahedra. The Si(1)-O(2) bond length is 1.62 Å. The Si(1)-O(5) bond length is 1.63 Å. The Si(1)-O(7) bond length is 1.63 Å. The Si(1)-O(8) bond length is 1.62 Å. In the second Si site, Si(2) is bonded in a trigonal non-coplanar geometry to one O(5), one O(6), and one O(7) atom. The Si(2)-O(5) bond length is 1.64 Å. The Si(2)-O(6) bond length is 1.64 Å. The Si(2)-O(7) bond length is 1.65 Å. In the third Si site, Si(3) is bonded to one O(1), one O(3), one O(4), and one O(6) atom to form corner-sharing SiO4 tetrahedra. The Si(3)-O(1) bond length is 1.61 Å. The Si(3)-O(3) bond length is 1.63 Å. The Si(3)-O(4) bond length is 1.62 Å. The Si(3)-O(6) bond length is 1.63 Å. In the fourth Si site, Si(4) is bonded to one O(1), one O(2), one O(8), and one O(9) atom to form corner-sharing SiO4 tetrahedra. The Si(4)-O(1) bond length is 1.62 Å. The Si(4)-O(2) bond length is 1.63 Å. The Si(4)-O(8) bond length is 1.62 Å. The Si(4)-O(9) bond length is 1.62 Å. There are nine inequivalent O sites. In the first O site, O(1) is bonded in a bent 150 degrees geometry to one Si(3) and one Si(4) atom. In the second O site, O(2) is bonded in a bent 150 degrees geometry to one Si(1) and one Si(4) atom. In the third O site, O(3) is bonded in a bent 150 degrees geometry to two equivalent Si(3) atoms. In the fourth O site, O(4) is bonded in a linear geometry to two equivalent Si(3) atoms. In the fifth O site, O(5) is bonded in a bent 150 degrees geometry to one Si(1) and one Si(2) atom. In the sixth O site, O(6) is bonded in a bent 150 degrees geometry to one Si(2) and one Si(3) atom. In the seventh O site, O(7) is bonded in a bent 150 degrees geometry to one Si(1) and one Si(2) atom. In the eighth O site, O(8) is bonded in a bent 150 degrees geometry to one Si(1) and one Si(4) atom. In the ninth O site, O(9) is bonded in a bent 150 degrees geometry to two equivalent Si(4) atoms.