6355
Chemical resistance in trifluoroacetic acid and 8 common organic solvents , including CH2Cl2 and toluene , were also investigated and no signs of degradation or weight changes were observed from parts submerged for 1 week in each solvent .
 machanical property: Chemical resistance; concept or principle: degradation; process parameter: weight
Given options, please tell me the categories of all the listed entity words.Output format is "type1: word1; type2: word2". 
Option: manufacturing standard, machanical property, manufacturing process, material, engineering feature, process parameter, machine or equipment, application, process characterization, enabling technology, biomedical, concept or principle 
Text: {0} 
 Entities: Chemical resistance, degradation, weight 
Answer:
 machanical property: Chemical resistance; concept or principle: degradation; process parameter: weight