ASML EUV lithography machine could keep Moore’s Law on track
> EUV necessitates an entirely new way to generate light. It’s a remarkably complex process that involves hitting molten tin droplets in midflight with a powerful CO2 laser. The laser vaporizes the tin into a plasma, emitting a spectrum of photonic energy. From this spectrum, the EUV optics harvest the required 13.5-nm wavelength and direct it through a series of mirrors before it is reflected off a patterned mask to project that pattern onto the waferThis is incredible and feels like the most sci-fi sentence I've read in a long time.It's unbelievable to think that this works, not just in a lab, but in commercial systems that will produce hundreds of chip wafers an hour (>100 anyway, they didn't clarify further).