Sam Zeloof and Jim Keller start a new semiconductor fab
Judging from [1], Sam Zeloof's plan might include using electron beam lithography, which scans an electron beam over a wafer surface, instead of normal photolithography. This can get high resolution (10nm) comparable with EUV, and could theoretically be built out of a hacked scanning electron microscope. Photolithography is the step that limits fabrication size, so e-beam litho allows cheap transistors comparable with state-of-the-art.The main problem is e-beam litho is extremely slow. It might take ~1 day to do a single photolithography step for a 1x1cm chip, whereas an EUV machine can pattern a 300mm diameter silicon wafer in Maybe that's enough for extremely-low-volume production?[1] https://mobile.twitter.com/szeloof/status/154993704406717235...