**Create a hyper-realistic image of a chip wafer in the midst of the lithography process. The wafer should be bathed in deep ultraviolet (DUV) or extreme ultraviolet (EUV) light, with the 'reticle' holding the blueprint of the pattern to be printed. The pattern should be intricately detailed and replicated onto the resist layer of the wafer. The setting should be a high-tech clean room, with the lithography machine as the central focus. The image should be captured in high-resolution 16k, with a focus on the minute details of the wafer and the machine. The lighting should be dramatic, emphasizing the glow of the ultraviolet light against the sterile environment of the clean room. The shot should be taken with a macro lens to capture the fine details of the wafer and the pattern. --ar 16:9 --v 5.1 --style raw --q 2 --s 750** - Image #4 <@647826431199674398>
Create a hyperrealistic image of a chip wafer in the midst of the lithography process. The wafer should be bathed in deep ultraviolet DUV or extreme ultraviolet EUV light, with the reticle holding the blueprint of the pattern to be printed. The pattern should be intricately detailed and replicated onto the resist layer of the wafer. The setting should be a hightech clean room, with the lithography machine as the central focus. The image should be captured in highresolution 16k, with a focus on the minute details of the wafer and the machine. The lighting should be dramatic, emphasizing the glow of the ultraviolet light against the sterile environment of the clean room. The shot should be taken with a macro lens to capture the fine details of the wafer and the pattern.