An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
It is desirable to reduce the size of features in a lithographic pattern because this allows for a greater density of features on a given substrate area. In photolithography, the increased resolution may be achieved by using radiation of shorter wavelength. However, there are problems associated with such reductions. Current systems are starting to adopt optical sources with wavelengths in the 193 nm regime but even at this level, diffraction limitations become a barrier. At lower wavelengths, e.g. extreme UV with a wave length of 13.5 nm, the transparency of materials is very poor and reflective optics must be used. As the optics only function in ultra high vacuum such optical lithography machines capable of enhanced resolutions require complex optics, ultra high vacuum systems and rare materials and are consequently very expensive.
According to a first aspect of the present invention, there is provided an imprint lithography apparatus comprising a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
According to a second aspect of the present invention, there is provided an imprint lithography apparatus comprising a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being arranged in stripes which alternate between stripes formed by patterns imprinted by the first array.
The first and second aspects of the invention may be arranged such that the entire useable surface of a substrate, or at least the majority of the usable surface, are imprinted by the imprint of the first and second arrays of imprint templates. Alternatively, third and possibly fourth suitably arranged imprint templates may in addition be used.
According to a third aspect of the present invention, there is provided an imprint lithography apparatus comprising an array of template holders, wherein a given template holder, arranged to imprint a given area, falls within a footprint which does not extend into each adjacent imprint area, but instead extends into only a subset of adjacent imprint areas.
According to a fourth aspect of the present invention, there is provided an imprint lithography apparatus comprising an array of template holders, wherein a given template holder, arranged to imprint a given area, falls within a footprint which does not extend beyond a midway point of adjacent imprint areas.
According to a fifth aspect of the present invention, there is provided a method of imprint lithography comprising imprinting a first array of patterns onto a substrate, then imprinting a second array of patterns onto the substrate, the patterns of the second array being interspersed between the patterns of the first array.
According to a sixth aspect of the present invention, there is provided an imprint template to imprint a pattern onto a substrate, the imprint template comprising a lens arranged to direct radiation through the imprint template such that the radiation reaches substantially all regions of a substrate which is to be exposed to the radiation.
According to a seventh aspect of the present invention, there is provided a support to hold an imprint template, the support comprising a lens arranged to direct radiation towards the imprint template with a desired intensity distribution.
The lens referred to in the sixth and seventh aspects of the invention may be plano-convex or plano-concave. The lens may be provided in an uppermost surface of the imprint template. The support may be arranged to hold a template holder which in turn is arranged to hold the imprint template.
According to an eighth aspect of the present invention, there is provided an imprint lithography apparatus comprising an imprint template and a substrate table arranged to support a substrate to be imprinted, wherein the imprint template is provided with at least part of an alignment system.
According to a ninth aspect of the present invention, there is provided an imprint lithography apparatus comprising a template holder and a substrate table arranged to support a substrate to be imprinted, wherein the template holder is provided with at least part of an alignment system.
The alignment system referred to in the eighth and ninth aspects of the invention may comprise an image sensor.
One or more embodiments of the present invention are applicable to any imprint lithography process in which a patterned template is imprinted into an imprintable medium in a flowable state, and for instance can be applied to hot and UV imprint lithography as described herein. For the purpose of understanding one or more embodiments of the present invention, it is not necessary to describe the imprint process in any more detail than has already been given and is known in the art.
FIG. 9 schematically illustrates substrates which have been imprinted by arrays of imprint templates according to an embodiment of the invention.
Upon removal of the template from the solidified resin, a two-step etching process is typically performed as illustrated in FIGS. 2 a to 2 c. The substrate 20 has a planarization and transfer layer 21 immediately upon it, as shown in FIG. 2 a. The purpose of the planarization and transfer layer is twofold. It acts to provide a surface substantially parallel to that of the template, which helps ensure that the contact between the template and the resin is parallel, and also to improve the aspect ratio of the printed features, as described herein.
UV imprint lithography, on the other hand, does not involve such high temperatures and temperature changes nor does it require such viscous imprintable materials. Rather, UV imprint lithography involves the use of a partially or wholly transparent template and a UV-curable liquid, typically a monomer such as an acrylate or methacrylate. for example. UV imprint lithography is discussed, for example, in J. Haisma "Mold-assisted nanolithography: A process for reliable pattern replication", J. Vac. Sci. Technol. B14(6), November/December 1996. In general, any photopolymerizable material could be used, such as a mixture of monomers and an initiator. The curable liquid may also, for instance, include a dimethyl siloxane derivative. Such materials are less viscous than the thermosetting and thermoplastic resins used in hot imprint lithography and consequently move much faster to fill template pattern features. Low temperature and low pressure operation also favors higher throughput capabilities. Although the name 'UV imprint lithography' implies that UV radiation is always used, those skilled in the art will be aware that any suitable actinic radiation may be used (for example, visible light may be used). Hence, any reference herein to UV imprint lithography, UV radiation, UV curable materials, etc. should be interpreted as including any suitable actinic radiation, and should not be interpreted as being limited to UV radiation only.
One approach to addressing this problem is the so-called 'drop on demand' ink jet type printing process in which the resin is dispensed onto a target portion of the substrate in droplets immediately prior to imprinting with the template. The liquid dispensing is controlled so that a certain volume of liquid is deposited on a particular target portion of the substrate. The liquid may be dispensed in a variety of patterns and the combination of carefully controlling liquid volume and placement of the pattern can be employed to confine patterning to the target area.
FIG. 4 shows schematically an arrangement whereby imprinting of a pattern onto a substrate may be performed quickly by imprinting large areas of the substrate at a time. The substrate 100 is imprinted with imprint areas 102. Each imprint area 102 may include a plurality of dies, with each die for example being separated from adjacent dies by scribe lanes. Individual dies are not illustrated in FIG. 4. The streets 110 between the imprint areas 102 may be used for process control purposes, and may also be used as scribe lanes. Referring to FIG. 5, a process whereby the imprint areas 102 may be imprinted onto the substrate 100 will now be described. A substrate 100 is provided, which substrate is typically either sufficiently flat to receive an imprint template or provided with a polished planarization layer. The substrate 100 is placed on a substrate table, which is movable in the x and y directions using electrical motors (the substrate table and motors are not illustrated for ease of understanding). In some instances the flatness of the substrate 100 may be measured by a sensor, and the substrate table may be adjusted to eliminate or reduce measured unflatness.
UV curable imprintable medium is inkjet printed onto some imprint areas 102 a on the substrate 100 (delineated schematically by dotted lines). Other imprint areas 102 b are not provided with imprintable medium, for reasons that will be explained below. The imprintable medium may be provided as discrete droplets 112 as shown schematically in FIG. 5 a.
The provision of the imprintable medium 112 may conveniently be achieved by moving the substrate 100 to a different location using the motors which control the position of the substrate table. The imprintable medium may be provided by, for example, a stationary mounted single or multi-nozzle print head, or an ensemble of single or multi-nozzle print heads.
Once the imprintable medium 112 has been applied, the substrate may be moved to a different location in order to receive one or more imprint templates. It will be appreciated that in an alternative arrangement the substrate is not moved, and that the one or more imprint templates are moved to the location of the substrate. In a further alternative arrangement neither the substrate nor the imprint templates are moved to different locations.
Referring to FIG. 5 b, imprint templates 114 held by template holders 115 are pressed against the substrate 100. It can be seen from FIG. 5 b that the template holders occupy a significant amount of space, such that there is not sufficient space to provide an imprint template to imprint every imprint area 102 a, 102 b at the same time.
The imprint templates 114 are provided with sharp edges 113 which act to inhibit the imprintable medium 112 from flowing out from underneath the imprint templates. This is due to surface tension which pins the imprintable medium 112 at the sharp edges 113. Once the imprintable medium 112 has completely filled gaps between the imprint templates 114 and the substrate 100, the imprint template is prevented from moving further towards the substrate. This is because the surface tension inhibits the imprintable medium 112 from flowing out from underneath the imprint templates 114.
Referring to FIG. 5 c, ultraviolet radiation 120 is directed to the imprintable medium 112 between the imprint templates 114 and the substrate 100. The imprint templates 114 are substantially transparent to ultraviolet radiation, and therefore transmit the ultraviolet radiation to the imprintable medium 112. The imprintable medium 112 is polymerized and solidified by the ultraviolet radiation 120. In one arrangement, the ultraviolet radiation may be provided at a dedicated location within the lithographic apparatus, the substrate 100 and templates 114 being moved to that location to allow it to be illuminated by the ultraviolet radiation, and then subsequently moved to a different location. In an alternative arrangement, the ultraviolet radiation may be administered to the imprintable medium 112 on the substrate 100 without moving the substrate to a different location.
Referring to FIG. 5 d, the imprint templates 114 are removed from the substrate 100, leaving behind a patterned layer of polymerized imprintable medium 112. The imprint process is then repeated, to allow patterns to be imprinted onto the remaining imprint areas (e.g. 102 b).
In some instances it may be desired to provide imprint templates very close to one another, i.e. with a street size which is very narrow (for example as little as 100 microns). A suitable imprint template for achieving this is shown schematically in FIG. 6. Referring to FIG. 6, an imprint template 114 may be provided with gripping handles 130 at a perimeter of the imprint template. The gripping handles 130 allow a template holder (not illustrated) to securely engage with the imprint template 114.
To ensure that ultraviolet radiation 120 passes to imprintable medium located beneath all parts of the imprint template 114, an uppermost surface of the imprint template is provided with a plano-convex lens 132. As shown schematically in FIG. 6, the plano-convex lens 132 directs the ultraviolet radiation 120 to all parts of a lowermost surface of the imprint template 114.
The method described above is particularly suited for imprinting a first patterned layer onto a substrate. Where this is done, there is no requirement to align the pattern to a pattern previously provided on the substrate. Some low accuracy knowledge of the position of the substrate 100 is useful in order to ensure that the areas of imprintable medium 112 and the streets of anti-wetting coating 110 are correctly located, and for example do not overlap with one another.
FIG. 7 shows schematically an imprint template 214 which may be used to imprint a pattern which is aligned with a pattern previously provided on a substrate. FIG. 7 a is a cross-section of the imprint template 214, and FIG. 7 b is the imprint template 214 from below. In order to facilitate understanding of the embodiment of the invention, the cross section shown in FIG. 7 a is not strict, rather includes elements that would not be visible in a strict cross section.
The imprint template 214 is attached to a template holder 240, and has a lowermost surface which is provided with a pattern 242. The imprint template 214 and template holder 240 are attached via four actuators 244 (of which one is shown in FIG. 7 a and all four shown in FIG. 7 b) to a support 246. The actuators 244 are, for example, piezoelectric actuators, and are capable of movement in the z-direction. The actuators 244 will hereafter be referred to as imprint actuators 244. The imprint template 214 is constructed from quartz, fused silica or optical grade polyolefin. The template holder is made from stress free stainless steel or a comb-like structure 263, and is connected via piezoelectric actuators 262, which are capable of movement in the x and y directions, to the template holder 240. The form of the imprint template 214 can be adapted to elastically by the piezoelectric actuators 262. The piezoelectric actuators 262 will hereafter be referred to as alignment actuators 262.
A central region of the imprint template 214 is provided with a plano-concave lens 232. A correspondingly dimensioned central portion of the template holder 240 is cut away to provide an opening 248. A central portion of the support 246 is provided with an opening 250, within which is a plano-concave lens 252. The opening 250 in the support 246 is substantially co-axial with the opening 248 in the template holder 240.
Four cylindrical bores 254 are provided in the template holder 240 and the support structure 246. An optics holding container of an alignment system 255 is provided in each cylindrical bore 254 (plus associated transversely oriented recesses). The alignment system 255 comprises a radiation source 258 and a semi-transparent mirror 260 arranged to direct radiation through alignment optics (not shown) in the optics holding container(s). The radiation source 258 may, for example, comprise a light emitting diode, or may alternatively be a white light source. A CCD camera 264 is located above the semi-transparent mirror 260 above the alignment optics. The CCD camera receives radiation which has passed through the alignment optics onto a substrate 200, and has been reflected back through the alignment optics and through the semi-transparent mirror 260. It will be appreciated that the CCD camera is an example of an image sensor, and other suitable image sensors may be used. Alignment and magnification correction are guided by alignment marks 272 on the substrate 100 and corresponding alignment marks 271 on the imprint template 214.
The alignment system 255 allows for high precision alignment of the imprint template pattern 242 with a pattern previously provided on the substrate 200, using the alignment actuators 262.
Operation of the imprint template 214 shown in FIG. 7 will now be described. It should be borne in mind that several imprint templates may be provided on the support 246. Indeed, a sufficient number of imprint templates may be provided to allow an entire substrate to be imprinted at one time.
Imprintable medium 270 is applied to the substrate 200, for example using ink jet printing to provide the imprintable medium in a certain pattern. This may be done by using a substrate table 274 to move the substrate 200 to another location, for example an imprintable medium application location. Further different locations may be used to measure the flatness of the substrate 200, and to imprint a pattern onto the substrate.
The substrate 200 is then located beneath the imprint template 214. The imprint template 214 is moved downwards and/or the substrate 200 is moved upwards until the imprint template is located around 10 microns above the substrate 200. The imprint actuators 244 push the imprint template 214 onto the substrate 200 with a controlled force. At the moment the imprint layer is completely formed the force needed to push the template further down increases considerably. This is because sharp edges 230 of the imprint template 214 inhibit imprintable medium from flowing beyond the imprint template. This change in force is used in a closed loop control set-up for leveling the imprint template 214 with respect to the substrate 200.
When the gap between the imprint template 214 and the substrate 200 is sufficiently small, alignment marks 272 provided on the substrate 200 and the corresponding alignment marks 271 on the imprint template 214 are both in focus and recorded by the alignment optics 255 and the CCD camera 264. Alignment of the imprint template 214 to the substrate alignment marks 272 is then performed. This is done by comparing the location of substrate alignment marks 272 with fiducial alignment marks 271 using the CCD camera 264, and actuating the alignment actuators 262 in the x and y directions appropriately. Some movement of the imprint actuators 244 may also be used during alignment. Some elastic deformation of the imprint template 214 and the template holder 240 will take place. The elastic deformation is such that the flatness of the lowermost surface of the imprint template 214 is not significantly changed.
Where three or more alignment marks located at different positions on the substrate 200 are used, adjustment by the alignment actuators 262 may include magnification correction (i.e. making the imprint template 214 larger or smaller).
Once alignment of the imprint template 214 to the substrate 200 has been completed, ultraviolet radiation 266 is directed through the imprint template onto the imprintable medium 270, such that the imprintable medium polymerizes and solidifies. The ultraviolet radiation 266 passes through the opening 250, through the piano-concave lens 252 and the plano-concave lens 232. The ultraviolet radiation then passes via the imprint template 214 onto the imprintable medium 270 provided on the substrate 200. The ultraviolet radiation has an intensity distribution which is arranged such that the intensity of ultraviolet radiation incident upon the imprintable medium 270 is substantially uniform. The intensity of the UV beam on passing into the support 246 is lower at a central portion of the radiation and has a higher intensity at its edges, such that when the ultraviolet radiation is directed outwards by the lenses 252, 232 the intensity of the ultraviolet radiation becomes substantially uniform.
Once the imprintable medium 270 has polymerized and solidified, the imprint template is removed from the substrate 200 by using the imprint actuators 244 to draw the imprint template 214 upwards. The solidified imprintable medium 270 retains a pattern imprinted by the imprint template 214.
Although only one imprint template 214 is visible in FIG. 7, it will be understood that a plurality of imprint templates may be provided together. For example, sufficient imprint templates may be provided to allow an entire substrate to be imprinted with a pattern at one time.
Although FIG. 7 shows parts of the alignment system 255 as being located in the template holder 240, it will be appreciated that the alignment system may provided in different locations. For example, the alignment system may be provided in the template holder only, the template holder being arranged such that it extends along sides of the imprint template 214. In a further example, the alignment system may be provided in the template holder and the support 246.
FIG. 8 shows an alternative template holder 280. The template holder 280 is fabricated from Zerodur ceramic (made by Schott A.G.), but may be fabricated from any other suitable material. The template holder 280 is provided with a channel 281 through which a low pressure is applied which is used to hold an imprint template 282. Piezo actuators 283 are provided in recesses 284 located on either side of the imprint template 282. The piezo actuators 283 are connected between different parts of the template holder, and may be used to stretch or compress the template holder 280 in the x and y directions. This in turn stretches or compresses the imprint template 282. This may be done in order to match the imprint template 282 to a pattern already present on a substrate to be imprinted. A plurality of piezo actuators may be provided to each side of the imprint template 282. This will assist in adjusting the imprint template to match, for example, distortion present in the pattern on the substrate. The template holder 280 may be provided with one or more of the features described above in relation to FIG. 7.
The separation between adjacent areas to be imprinted may be small, for example around 100 microns or less, and this may render it difficult to individually attach all imprint templates to, for example, a support (there may not be sufficient space for suitable attachment means to be provided). A further or alternative problem which may arise is that the forces required in order to remove all of the imprint templates from the substrate following polymerization of the imprintable medium may be so large that they cause the substrate to become damaged.
A template holder may extend laterally into adjacent regions which are to be imprinted. Referring to FIG. 9 a, a template holder 301 may be arranged such that it only extends into four adjacent regions, and does not extend beyond the center of those regions, i.e., occupy as much space so as to extend almost halfway into the neighboring imprint fields. This allows an array of template holders (and associated imprint templates) to be used at the same time to imprint into an array of regions. Dark gray/black shading is used in FIG. 9 a to indicate the regions that may be imprinted simultaneously.
Four imprints are required in order to substantially fully cover the surface of a substrate 300, and these are illustrated schematically in FIGS. 9 a to 9 d. Following the first imprint, regions which are diagonally adjacent the imprinted regions are imprinted using a second array of imprint templates, as shown in FIG. 9 b. To aid understanding, the regions that are currently being imprinted are represented in dark gray/black, the regions that have already been imprinted are represented in intermediate gray, and the regions not yet imprinted are represented by light gray.
A third imprint, by a third array of imprint templates, is represented in FIG. 9 c, dark gray/black again being used to represent those regions that are currently being imprinted, intermediate gray again being used to represent regions that have already been imprinted, and light gray again being used to represent regions not yet imprinted. A fourth imprint by a fourth array of imprint templates is represented in FIG. 9 d, dark gray/black again being used to represent those regions that are currently being imprinted and intermediate gray again being used to represent regions that have already been imprinted.
Each of the imprints shown in FIGS. 9 a to 9 d may be performed by moving each array of imprint templates in turn to be over the substrate 300 and then imprinting the substrate. Alternatively, the arrays of imprint templates may remain in specific locations, with the substrate being moved between the arrays of imprint templates. Where this is done, imprinting may be performed in parallel, for example with a first substrate being imprinted by the first array of imprint templates, and the second substrate being imprinted by the second array of imprint templates, etc. A combination of moving the arrays of imprint templates and moving the substrates may also be used (for example, allowing two substrates to be imprinted in parallel rather than four).
It is not essential that the template holder exactly occupies the space illustrated in FIG. 9. Rather, it is preferred that the template holder falls within a footprint defined by the shape shown in FIG. 9 (the template holders may, for example, be smaller than the shape).
It will be understood by those skilled in the art that the template holders may be designed such that they occupy spaces which differ from those illustrated in FIG. 9. For example, the template holder shown in FIG. 9 a may be rotated through 45 degrees, such that it does not overlap with diagonally adjacent regions. Alternatively, the template holder may be provided on only two sides of the imprint template, for example such that it extends into only two adjacent regions. Other alternative sizes and shapes of the spaces occupied by the template holder will be apparent to those skilled in the art. In some instances a different number of imprints being required.
The imprint templates referred to above may, for example, be constructed from optical grade polyolefin or, if only very small elastic deformation of the imprint template is desired, from quartz glass. The pattern provided in an imprint template may be written by an electron beam pattern generator in resist, followed by an etch step. An alternative method of making an imprint template comprises using an electron beam pattern generator to provide a pattern on a nickel stamp, then using precision injection molding to form the imprint templates. This is similar to the manufacturing process used to make compact discs. The plano-concave lens 132 and gripping handles 130 shown in FIG. 6, may be included when injection molding the imprint template.
Although the above description refers to ultraviolet radiation it will be appreciated that, as explained further above, any suitable actinic radiation may be used.
1. An imprint lithography apparatus comprising a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged to hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being imprinted after and interspersed between the patterns imprinted by the first array.
2. The apparatus of claim 1, wherein the apparatus further comprises a third array of template holders arranged to hold an array of imprint templates that can be used to imprint a third array of patterns onto the substrate, the patterns imprinted by the third array being interspersed between the patterns imprinted by the first and second arrays.
3. The apparatus of claim 2, wherein the apparatus further comprises a fourth array of template holders arranged to hold an array of imprint templates that can be used to imprint a fourth array of patterns onto the substrate, the patterns imprinted by the fourth array being interspersed between the patterns imprinted by the first, second and third arrays.
4. The apparatus of claim 1, wherein the first and second arrays of template holders are in fixed locations, and the substrate is moveable between the first and second arrays.
5. The apparatus of claim 2, wherein the first, second and third arrays of template holders are in fixed locations, and the substrate is moveable between the first, second and third arrays.
6. The apparatus of claim 1, further comprising imprint templates held by the arrays of template holders, at least some of the imprint templates each comprising a lens arranged to direct radiation through the imprint template such that the radiation reaches substantially all regions of a substrate which is to be exposed to the radiation.
7. The apparatus of claim 6, wherein the lens is a plano-concave lens.
8. The apparatus of claim 6, wherein the lens is provided in an uppermost surface of the imprint template.
9. The apparatus of claim 1, further comprising a support configured to hold the template holders, the support comprising a plurality of lenses arranged to direct radiation towards the imprint template with a desired intensity distribution.
10. The apparatus of claim 9, wherein the lenses are plano-concave lenses.
11. The apparatus of claim 1, further comprising imprint templates held by the arrays of template holders, at least some of the imprint templates each comprising at least part of an alignment system.
12. The apparatus of claim 11, wherein the alignment system comprises an image sensor.
13. The apparatus of claim 1, wherein at least some of the template holders comprise at least part of an alignment system.
14. The apparatus of claim 13, wherein the alignment system comprises an image sensor.
a substrate table arranged to support the substrate to be imprinted and to move from one array of template holders to an other array of template holders.
23. The apparatus of claim 22, wherein the plurality of arrays comprises a first array of template holders and a second array of template holders and is configured to imprint patterns by the second array after and interspersed between patterns imprinted by the first array.
24. The apparatus of claim 22, wherein the plurality of arrays of template holders comprises at least four arrays of template holders.
25. The apparatus of claim 22, wherein the plurality of template holders are arranged in a two dimensional array.
26. The apparatus of claim 22, wherein each template holder is arranged to imprint a respective template held by the template holder onto a substrate and has a footprint that includes the imprint area of the respective template and an area of a portion of an adjacent imprint area.
27. An imprint lithography apparatus comprising an array of adjacent template holders, each template holder arranged to hold a template and to imprint a separate area on a same substrate, each template holder of the array of template holders having at least part of an alignment system.
28. The apparatus of claim 27, wherein the alignment system comprises an image sensor.
29. The apparatus of claim 27, further comprising imprint templates held by the array of template holders, at least some of the imprint templates each comprising at least part of the alignment system.
30. The apparatus of claim 27, wherein the at least part of the alignment system comprises an optic.
(ii) having a footprint that includes the imprint area of the respective template and an area of a portion of an adjacent imprint area.
32. The apparatus of claim 31, wherein the plurality of template holders are arranged in a two dimensional array.
33. The apparatus of claim 31, wherein each template holder has at least part of an alignment system.
imprinting the second array of templates onto the substrate using an array of template holders holding the second array of templates.
35. The method of claim 34, comprising the moving the substrate.
36. The method of claim 34, wherein patterns imprinted by the second array of templates are interspersed between patterns imprinted by the first array of templates.
37. The method of claim 34, wherein the first array of templates and second array of templates are respectively arranged in a two dimensional array.
imprinting an array of templates onto a substrate using an array of template holders holding the array of templates, wherein a given template holder, imprinting a respective template of the array of templates, falls within a footprint which extends into at least one adjacent imprint area, but does not extend into each adjacent imprint area.
39. The method of claim 38, wherein the footprint of the given template holder does not extend beyond a midway point of each adjacent imprint area.
40. The method of claim 38, further comprising aligning each template of the array of templates with the substrate using an alignment system, wherein each template holder has at least part of the alignment system.
imprinting an array of templates onto a substrate using an array of template holders holding the array of templates, wherein a given template holder, imprinting a respective template of the array of templates, falls within a footprint which extends into at least one adjacent imprint area, but does not extend beyond a midway point of the at least one adjacent imprint area.
42. The method of claim 41, further comprising aligning each template of the array of templates with the substrate using an alignment system, wherein each template holder has at least part of the alignment system.
44. The method of claim 43, wherein the portion of the adjacent imprint area does not extend beyond a midway point of the adjacent imprint area.
imprinting an array of templates onto a substrate using an array of template holders holding the array of templates, no more than 4 times to substantially fully cover the substrate with imprinted patterns.
next after, imprinting a plurality of patterns onto a respective second set of imprint areas of the substrate using the imprint lithography apparatus, the second set of imprint areas diagonally adjacent the first set of imprint areas.
47. The method of claim 46, further comprising imprinting a plurality of patterns onto a respective third set of imprint areas of the substrate using the imprint lithography apparatus, the third set of imprint areas laterally adjacent the second set of imprint areas.
48. The method of claim 47, wherein the third set of imprint areas are adjacent the first set of imprint areas.
49. The method of claim 46, further comprising imprinting a plurality of patterns onto a respective fourth set of imprint areas of the substrate using the imprint lithography apparatus, the fourth set of imprint areas diagonally adjacent the third set of imprint areas.
50. The method of claim 49, wherein the fourth set of imprint areas are adjacent the first and second sets of imprint areas.


text:
Q: Numeric assignment should throw error I was making some tests with numeric conversions and casts in Java and I found this strange behaviour (for me)
class Test {
public static void main(String[] args) {
    //int y = 100000000000000; //does not compile
    int x = 100000 * 1000000000; //compile (why?)
    System.out.println(x); //x is 276447232
   }
}

Basically x and y should be the same number: why does it compile?

A: Integer overflow goes undetected in Java, that's why the multiplication works fine. However, the literal you were stating was too large and thus is a compiler error.
I guess while the vast majority of Java compilers will precompute that value at compilation time that is not required by the JLS. Thus it cannot be an error, since then different compilers may compile a piece of code or yield errors – something that isn't so nice.
The Sun Java compiler actually performs the calculation as the disassembly shows:
Compiled from "x.java"
class x extends java.lang.Object{
x();
  Code:
   0:   aload_0
   1:   invokespecial   #1; //Method java/lang/Object."<init>":()V
   4:   return

public static void main(java.lang.String[]);
  Code:
   0:   ldc     #2; //int 276447232
   2:   istore_1
   3:   getstatic       #3; //Field java/lang/System.out:Ljava/io/PrintStream;
   6:   iload_1
   7:   invokevirtual   #4; //Method java/io/PrintStream.println:(I)V
   10:  return

The important thing to note here is that for all intents and purposes the result must be the same as if it were computed during runtime. Therefore no compiler error can occur here.

A: Java deals with overflowing an integer not by an exception but by instead flipping over to negative values and continuing upward.
As an example, here's this code snippet:
int x = Integer.MAX_VALUE + 1;
System.out.println(x);

Java deals with it the best it can. That snippet outputs:
-2147483648

Which is the value of Integer.MIN_VALUE. You just have to be careful when you are dealing with really big numbers. That's why Java has a BigInteger class to deal with arbitrarily big numbers that go beyond the limit of integers.

redpajama_set_name: RedPajamaStackExchange


Today a new version of the SAP TM collaboration portal enhancement guide was published here: SAP TM Collaboration Portal – Customer Extensions.
Update in chapter 1 "Overwrite labels delivered by SAP as standard": introduction of a the new prerequisite note "Collaboration Portal: Window title not replaced when app title is changed". This note is needed if you overwrite the application title.
New chapter 3 "Create a custom Component": we re-structured the guide and extracted the information about how to create a new custom component into an own chapter.
New chapter 7 "Add new buttons to a table toolbar": We listened to your requirements. If you want to add a custom button to one of our table toolbars, this is the chapter to read.
New Appendix B "Technical IDs of views": We extracted the technical IDs of views which you need for several chapters into an own appendix.
If you are interested to read more about the SAP TM collaboration portal and thoughts/updates on work related topics, you can follow my blog here: SAP TM collaboration portal and more by Jan Rumig.
I am looking forward to your suggestions & feedback!


text:
January 29 Sports Schedule
TIMES TELEGRAM
Berne-Knox-Westerlo at Canajoharie, 7 p.m.
Herkimer vs. Utica Academy of Science at Mohawk Valley Community College, 7 p.m.
Richfield Springs at Worcester, 7 p.m.
Oppenheim-Ephratah-St. Johnsville at Fort Plain, 6 p.m.
West Canada Valley at Poland, 7:30 p.m.
Mohawk Valley Community College at Herkimer College, 7 p.m.
Fort Plain at Fonda-Fultonville, 4 p.m.
Oppenheim-Ephratah-St. Johnsville at Berne-Knox-Westerlo, 4 p.m.
Schenectady-Notre Dame-Bishop Gibbons at Canajoharie, 4 p.m.
Sauquoit Valley at Little Falls, 4:30 p.m.
Brookfield at Owen D. Young, 6 p.m.
Little Falls at Frankfort-Schuyler, 6:30 p.m.
Herkimer at Stockbridge Valley, 7 p.m.
Mt. Markham at Unatego/Unadilla, 6:15 p.m.
Poland at Rome Free Academy, 6:30 p.m.

redpajama_set_name: RedPajamaCommonCrawl


text:
<?php

namespace Ups\Entity;

use DOMDocument;
use DOMElement;
use Ups\NodeInterface;

class EEIFilingOption implements NodeInterface
{
    const FO_SHIPPER = '1'; // Shipper Filed
    const FO_UPS     = '3'; // UPS Filed

    /**
     * @var string
     */
    private $code;

    /**
     * @var string
     */
    private $emailAddress;

    /**
     * @var string
     */
    private $description;

    /**
     * @var UPSFiled
     */
    private $upsFiled;

    /**
     * @var ShipperFiled
     */
    private $shipperFiled;

    /**
     * @param null|object $attributes
     */
    public function __construct($attributes = null)
    {
        if (null !== $attributes) {
            if (isset($attributes->Code)) {
                $this->setCode($attributes->Code);
            }
            if (isset($attributes->EmailAddress)) {
                $this->setEmailAddress($attributes->EmailAddress);
            }
            if (isset($attributes->Description)) {
                $this->setDescription($attributes->Description);
            }
            if (isset($attributes->UPSFiled)) {
                $this->setUPSFiled(new UPSFiled($attributes->UPSFiled));
            }
            if (isset($attributes->ShipperFiled)) {
                $this->setShipperFiled(new ShipperFiled($attributes->ShipperFiled));
            }
        }
    }

    /**
     * @param null|DOMDocument $document
     *
     * @return DOMElement
     */
    public function toNode(DOMDocument $document = null)
    {
        if (null === $document) {
            $document = new DOMDocument();
        }

        $node = $document->createElement('EEIFilingOption');

        $code = $this->getCode();
        if (isset($code)) {
            $node->appendChild($document->createElement('Code', $code));
        }

        $emailAddress = $this->getEmailAddress();
        if (isset($emailAddress)) {
            $node->appendChild($document->createElement('EMailAdress', $emailAddress));
        }

        $description = $this->getDescription();
        if (isset($description)) {
            $node->appendChild($document->createElement('Description', $description));
        }

        $upsFiled = $this->getUPSFiled();
        if (isset($upsFiled)) {
            $node->appendChild($upsFiled->toNode($document));
        }

        $shipperFiled = $this->getShipperFiled();
        if (isset($shipperFiled)) {
            $node->appendChild($shipperFiled->toNode($document));
        }

        return $node;
    }

    /**
     * @return string
     */
    public function getCode()
    {
        return $this->code;
    }

    /**
     * @param string $code
     *
     * @return $this
     */
    public function setCode($code)
    {
        $this->code = $code;

        return $this;
    }

    /**
     * @return string
     */
    public function getEmailAddress()
    {
        return $this->emailAddress;
    }

    /**
     * @param string $emailAddress
     *
     * @return $this
     */
    public function setEmailAddress($emailAddress)
    {
        $this->emailAddress = $emailAddress;

        return $this;
    }

    /**
     * @return string
     */
    public function getDescription()
    {
        return $this->description;
    }

    /**
     * @param string $description
     *
     * @return $this
     */
    public function setDescription($description)
    {
        $this->description = $description;

        return $this;
    }

    /**
     * @return UPSFiled
     */
    public function getUPSFiled()
    {
        return $this->upsFiled;
    }

    /**
     * @param UPSFiled $upsFiled
     *
     * @return $this
     */
    public function setUPSFiled(UPSFiled $upsFiled)
    {
        $this->upsFiled = $upsFiled;

        return $this;
    }

    /**
     * @return ShipperFiled
     */
    public function getShipperFiled()
    {
        return $this->shipperFiled;
    }

    /**
     * @param ShipperFiled $shipperFiled
     *
     * @return $this
     */
    public function setShipperFiled(ShipperFiled $shipperFiled)
    {
        $this->shipperFiled = $shipperFiled;

        return $this;
    }
}

redpajama_set_name: RedPajamaGithub


One day I saw that one of my shackles was missing. The thought of someone stealing something off my Jeep made me very angry. I know some folks say it could have rattled off, but I do not believe that was the case in this instance. I told myself not to dwell on the fact that it was gone. So I turned it into something positive.
I decided to paint the two shackles I received from Jeep when I bought my Rubicon. And I bet you can guess what color I decided to paint them. Yep -- Plum Crazy Purple to match my grille inserts. I will put the original shackle in my recovery bag and order another one. So I will have 4 in all.
I emailed John from Regenbogen Auto Works. He did a fabulous job! When we were putting the purple shackles on the Jeep I noticed there was some wear in the paint and rust in the hooks where the shackles were. So I guess the theft was a blessing in disguise.
I got to work today on removing the rust and fixing up the chipped paint. I am sure this might be a yearly maintenance for me but it is worth it.
The first step was to sand off the existing rust. I used a wire brush and sandpaper.
Then I sprayed it with a rust treatment. I used this Rust Treatment spray from Napa / Permatex. This spray is suppose to destroy rust on contact. Now I will wait 24 hours for it to dry then add the top coat.
This will be the same process I will take on my skid plates that have been scratched up from my trail rides at Rausch Creek Off Road Park.
Tomorrow I finish this process with step 3 which is adding the final coat by using a black spray paint.
This will be my first attempt at any sort of Jeep maintenance. When I had my Sahara I began this process with the skid plates but never finished it because I traded her in for the Rubicon.
If the shackle never went missing or was stolen I would have never discovered the rust. So now I am able to take care of it before it gets too bad. So now I will start looking for the silver lining in my black clouds!
Check in tomorrow to see the finished project!


Monday on the NewsHour, Hillary Clinton and Donald Trump are still revving up voters on the eve of the election. We offer a full analysis of what to watch for on Election Day. Also: Reconnecting with a Syrian family one year since they fled their home and students offer advice to the next president of the United States.


As far back as the 1980's there has been a very clear desire from rotational moulders and designers: "We need more variety of resins to work with, other than "Polyethylenes". As time has gone by the request for more variety of resins has continued. The intensity of this message has not waned; the industry just kept hoping and asking for more.
It readily sinters and so is easy to mould.
It has good physical properties and can be adapted to a variety of applications.
Tradition - moulders are very familiar with it and therefore confident to use it.
Market Identification – end users know rotomoulding is a Polyethylene based industry and therefore design products to suit the capabilities of the material.
Cost – it is a lower cost material offering a cost competitive solution to end users.
These are all compelling reasons to stick with the tried and tested material. However, Polyethylenes do have some limitations and continued requests for new resins suggest that there are opportunities that are being missed. As previously mentioned, there are other rotomoulding options to Polyethylene. In this article we are going to focus on Polypropylene.
Where strength is concerned (stiffness, tensile strength, resistance to creep), it is superior to Polyethylene.
It has good impact at ambient temperatures and reasonable impact at temperatures down to 0oC.
It has significantly higher operating temperature than Polyethylene.
It has excellent chemical resistance.
It has better abrasion resistance with harder surface and high gloss.
It has lower shrinkage than Polyethylene which combined with higher stiffness yields flatter parts, with minimal warpage and tighter tolerances.
It is not difficult to mould, it just requires higher temperatures.
It brings added value and is cost competitive.
If we as an industry desire to expand our horizons, we must move beyond the Polyethylene based identity. Polypropylene is the next best addition to a rotomoulder's product offering. Why? Primarily because it is not difficult to mould and existing moulds and equipment can be used. With a few slight modifications to operating parameters, you are able to mould Polypropylene as readily as Polyethylene.
In addition to being easy to mould, it is a logical choice because under certain product performance requirements, Polypropylene offers performance characteristics significantly superior to Polyethylene. It will open up new markets for those willing to bring Polypropylene to their moulding capabilities.
The table below provides a comparison of typical properties between LMDPE Polyethylene and Polypropylene (PP).
Table 1 : Material Property Comparison of Polyethylene v Polypropylene – clearly shows significant advantages that Polypropylene has over Polyethylene.
Figure 1 illustrates an underground manhole that benefits greatly from Polypropylene's increased strength and resistance to creep. This is especially true when forces are applied over a long period of time, as in underground applications, and it is easy to install.
Needs to be moulded hotter: Polypropylene requires a higher Peak Internal Air Temperature (PIAT) which is achieved by using a higher oven temperature and/or extending the oven residency time.
Can be demoulded hotter: Polypropylene has higher crystallization temperature, the product solidifies earlier, and the part can be demoulded sooner during the cooling phase.
Polypropylene exhibits a natural lubricity compared to Polyethylene. This allows Polypropylene to run without use of mould release or a minimal amount if absolutely necessary.
Polypropylene has lower shrinkage than Polyethylene, i.e., 1.5% to 2.5% compared with 3% to 3.5%.
There are many opportunities that exist for rotational moulding that exceed the performance capabilities of Polyethylene. Polypropylene's higher mechanical strength, superior resistance to long term creep, superior environmental stress crack resistance, excellent chemical resistance, significantly higher thermal capability, higher scuff resistance, and gloss and smoother flatter surfaces, allows for its use in underground/infrastructure applications, chemical storage, large tanks, under hood automotive parts, hydraulic and hot water tanks, hot fill applications, and furniture & display items.
Other special applications in the Health Industry, Life Sciences, Pharmaceutical & Biotech industries, Research Labs, Food and Beverage industry applications where autoclaving /sterilization is required. Basically, Polypropylene provides a solution for moulders where product requirements limit the use of Polyethylene resins in a multitude of applications.
We live in a changing world. New products with new requirements are being developed more rapidly than ever. If the rotational moulding industry is to keep up with this changing world, a one dimensional resin approach will not work. The good news is that learning how to design, process, and promote Polypropylene is not a difficult step for rotomoulders. The product is available and technical specifications and processing guides will make the change easy.
New grades of Polypropylene are evolving, with new products being developed specifically for rotational moulding. The recent introduction of "RMPP141" rotomouldable Polypropylene by PSD Rotoworx, Australia, is a unique new entrant. Most existing grades of Polypropylene have to trade off between stiffness and toughness. RMPP141 offers a very attractive balance between both stiffness and impact, while still maintaining or enhancing other performance. Another major achievement with this new Polypropylene "RMPP141" is that it can be pulverized at ambient conditions, eliminating the necessity for expensive cryogenic grinding, and thereby reducing costs. Further this means the moulder can process any scrap generated.
It is hoped that this article has demonstrated the many reasons to consider Polypropylene as part of your rotomoulding capabilities and product offering. There is very little standing in the way of expanding your business through diversified offerings except your decision to do so.
Compiled by PSD Rotoworx P/L in conjunction with 4Roto LLC (distributors in the Americas for RMPP141).
For more information contact sales@psdrotoworx.com, or info@4roto.com.


Established in 2007, the Ice-Watch brand is now sold in over 55 countries. With around 500 products, its unique design comes in several different models and colours, to suit all tastes, styles and desires. The Ice-Watch brand enjoys high visibility, whether on the wrist, in the 'BeCubic' presentation box, on social media (4,500,000 Facebook fans) or through the vast network of Flagship Stores, Ice-Stores, kiosks and retail points of sale.
« A galaxy of sparkling dials" Each of these feminine and refined watches radiates ultra-stellar charm, dazzling with crystals from Swarovski®.


If you want to YouTube it instead, here's your link.
. Especially after touring through Europe, where their old name, mom, had a way of coming out as "mum."
Since 2009's Houseboat, the Denton-based ambient electro-instrumental act says it's been fine-tuning its live act when they all get together rather than write much new material--just jamming, really. And, as they told us during last week's taping, they're likely to be taking a little time off to grow each of their individual projects: Northern, Abacus, Melting Season and Sunnybrook.
Which is all for the best in the end for Sleep Whale, too, they say--better to evolve with their individual interests than to wallow in the same old thing.
(with uncut versions of each track from the video above).


text:
ASIA – AFRICA
Russia takes full control of Kherson in Ukraine as war enters 20th day
EUROPESPECIAL
Russia's Defense Ministry says its troops have taken control of Ukraine's southern region of Kherson as the Russian military campaign enters its 20th day.
Russia takes full control of Kherson in Ukraine as war enters 20th day – Russia's Defense Ministry says its troops have taken control of Ukraine's southern region of Kherson as the Russian military campaign enters its 20th day.
"The armed forces of the Russian Federation have taken full control of all the territory of Kherson region," the ministry's spokesman, Igor Konashenkov, said at a briefing on Tuesday, without further elaboration.
The city of Kherson, the provincial capital of nearly 250,000 people, was the first key urban center to be captured by Russian troops after Moscow launched a military campaign against Ukraine on February 24.
The spokesman also said that the Russian troops seized 10 American-made Javelin anti-tank missile systems and a number of other weapons provided to Ukraine by Western countries.
Russian President Vladimir Putin announced a "special military operation" on February 24, aimed at the "demilitarization" of the Donetsk and Lugansk regions, largely populated by ethnic Russians, in eastern Ukraine. In 2014, the two regions – collectively known as the Donbass – declared themselves new republics, refusing to recognize Ukraine's Western-backed government.
Beijing denies US claim that Russia sought China military aid
Several US officials claimed that Moscow had asked China for military equipment after it launched the operation in Ukraine. The claims have been denied by the Kremlin.
Beijing also rejected the claims on Tuesday, noting that Washington has been spreading "malicious disinformation" that risked escalating the situation.
"The US has repeatedly spread malicious disinformation against China on the Ukraine issue," the Chinese embassy in London told Reuters in a statement, noting that "China has been playing a constructive role in promoting peace talks."
"The top priority now is to ease the situation, instead of adding fuel to the fire, and work for diplomatic settlement rather than further escalate the situation," the statement added.
Three EU leaders visiting Ukraine in show of support
Amid the US claims, the prime ministers of three member countries of the European Union headed to Ukraine to show support for the country on behalf of the bloc.
The premiers of the Czech Republic, Poland, and Slovenia were traveling to Kiev by train on Tuesday.
Michal Dwoczyk, a top aide to Polish Prime Minister Mateusz Morawiecki, said the trio had crossed the Polish-Ukraine border by train after 8 am (0700 GMT), adding that the idea of the trip was agreed at an EU leaders' summit in France last week.
"The purpose of the visit is to confirm the unequivocal support of the entire European Union for the sovereignty and independence of Ukraine," Czech Prime Minister Petr Fiala said in a statement also released by the Polish government.
The statement said that the visit also aims to "present a broad package of support for Ukraine and Ukrainians."
(The views expressed in this article do not necessarily reflect BalkanTimes editorial stance.)
balkantimeseuropeRussiaspecialukraine
Share FacebookTwitterReddItWhatsAppPinterestEmailLinkedinTumblrTelegramPrint
Ukraine is NATO war contractor against Russia
Violence and strikes in France, UK alongside anti-Iran propaganda
Veza između CIA i terorističke organizacije MKO
The troubled U.S.-Saudi relationship
EU Ombudsman to probe gas projects in Western Balkans
Aliya Izetbegovic's colleague Hasan Cengic lost his life
PANDEMIC AND CIVILIZATION, THE NEW PARADIGM SHIFT IN OUR…
New book: Desecrating Jerusalem
Refugees freezing at burnt-out camp in Bosnia after heavy…
Violence and strikes in France, UK alongside anti-Iran…
Author: U.S. outrage about human rights is selective
Chile shows bravery with Palestine embassy plan
We have provided you with analyzes from the Regional Studies from Balkans to the Middle East, from Europe to the Americas, and Asia and Africa. Accurate information about crises, events, elections, wars, etc. BalkanTimes will be a different voice for the audience. Stay with BalkanTimes.


text:
F/T - Digital Preservation Consultant - AudioVisua...
F/T - Researcher - Association of National Adverti...
F/T - Competitive Intelligence Assoc Dir - Novo No...
F/T - Information Specialist III - Bank of America...
F/T - University Librarian - Fordham University
F/T - Associate Dir of Library - St. Josephs Semin...
F/T - Japanese Studies Librarian - Princeton Univ
F/T - Medical Info Specialist - Pharma Co (NJ)
F/T (Provisional) - Senior Librarian - Bedford Hil...
F/T - Web Services Librarian - NYC Law firm
F/T - Library Research Mgr - Dechert (NYC, other)
F/T - Knowledge Manager - Notch Partners (Millburn...
F/T - Info Architect/Sports Media Grp - Gannett (N...
F/T - Library Tech Assistant Gen Res Div- NYPL (Ma...
F/T - Library Info Assistant - Chatham Sq Library ...
F/T - Record IM Lead Controls Analyst - MefLife (B...
F/T - Assoc Dir/Director Competitive Intelligence ...
F/T - Legal Research Mgr - Global Law Firm (NY or ...
F/T - Librarian for Asian Christianity - Yale Univ...
F/T - Records and Archives Manager - Ford Foundati...
F/T - Archivist - Institute of Jazz Studies, Rutge...
F/T - Digital Asset Librarian - RCI Technologies (...
F/T - Global Knowledge Manager - Heidrick and Stru...
F/T - Dir of Library and Info Svcs - Grace Church ...
F/T - Associate Dir of Development - Museum/Res Li...
F/T - Chief of Staff Office of the President - NYP...
F/T - Taxonomist - UNICEF (New York, NY)
F/T - Dir, Reference and Research Svcs - NYPL
F/T - Referencing Coordinator - Ruder Finn (New Yo...
F/T - Data Architect - Deloitte (Princeton, NJ)
F/T - Knowledge Mgmt Analyst - Raritan (Somerset, ...
F/T - Dir Library and Info Svces - Culinary Instit...
F/T - Dir of Libray Info Tech Office - Columbia Un...
F/T - Ref Instruction Librarian - Mercy College (D...
P/T - Library Tech - JFK Medical (Edison, NJ)
F/T - Head of Info Mgmt - UBS (Weehawken, NJ)
F/T - Library Associate - Met Museum of Art Librar...
F/T - Knowledge Engineer Lead - Merck (Rahway, NJ)...
F/T - Executive Director - NY Library Association ...
F/T - Instruction Libarian - LaGuardia CC (Queens,...
F/T - Information Services Librarian - NYMC (Valha...
F/T - Medical Librarian Admin Coordinator - Mt Sin...
F/T - Library Operations Manager - Duane Morris LL...
F/T - Collections Procurement Librarian - Yale Uni...
F/T (temp) - Project Manager - Brooklyn Public Lib...
F/T - Records Management Analyst - Cardinal TS (NJ...
F/T - Collections Procurement Librarian - Yale Univ Library
Collections Procurement Librarian
Acquisitions Department, Technical Services
Sterling Memorial Library
Rank: Librarian 2-3
Schedule: Full time (37.5 hours per week); Standard Work Week (M-F, 8:30-5:00)
Yale University offers exciting opportunities for achievement and growth in New Haven, Connecticut. Conveniently located between Boston and New York, New Haven is the creative capital of Connecticut with cultural resources that include two major art museums, a critically-acclaimed repertory theater, state-of-the-art concert hall, and world-renowned schools of Architecture, Art, Drama, and Music.
THE UNIVERSITY AND THE LIBRARY
The Yale University Library, as one of the world's leading research libraries, collects, organizes, preserves, and provides access to and services for a rich and unique record of human thought and creativity. It fosters intellectual growth and is a highly valued partner in the teaching and research missions of Yale University and scholarly communities worldwide. A distinctive strength is its rich spectrum of resources, including more than 12.5 million volumes and information in all media, ranging from ancient papyri to early printed books to electronic databases. The Library is engaged in numerous digital initiatives designed to provide access to a full array of scholarly information. Housed in the Sterling Memorial Library and sixteen school and departmental libraries, it employs a dynamic, diverse, and innovative staff of over 500 who have the opportunity to work with the highest caliber of faculty and students, participate on committees, and are involved in other areas of staff development. For additional information on the Yale University Library, please visit the Library's web site at http://www.library.yale.edu/ .
Within the University Library, Technical Services departments pursue a course of continual change and innovation in building integrated, university-wide information access systems. These systems are designed to provide readers timely access to new materials in all formats as well as a high-quality bibliographic record of Yale's extraordinary library collections, which have developed over the last three centuries. Our collections continue to grow at more than 200,000 volumes per year, including an increasing number of materials in digital form. The Library's serials collection consists of over 90,000 currently received print titles and over 63,000 titles in electronic format. Yale is a member of the NERL Consortium and the Program for Cooperative Cataloging (PCC), contributing to the NACO and BIBCO programs.
Yale University librarians work in libraries across the Central, West, Medical, and Science campuses, to build, manage, and provide access to a rich and unique record of human thought and creativity. They demonstrate flexibility, creativity, and imagination in their work and adapt to and help shape a continuously evolving work environment. Yale librarians provide consistently high quality service to the University, and help meet the needs of the local, national, and international teaching and research communities.
Departmental Focus
Reporting to the Chief Acquisitions Librarian and Head of the Acquisitions Department under the Library's Technical Services Division, the Collections Procurement Librarian provides professional, technical, and fiscal expertise in the overall management of orders and approvals, including management of gifts and exchanges. Manages the work of the Order Support unit and supervises (hires, trains, evaluates) staff who perform a variety of activities related to ordering of materials in all formats. Works collaboratively and collegially Library-wide with all acquisitions units, selectors, catalogers, and Information Technology Office to develop best practices to support the management of orders and approval plans for all formats of library collections. Keeps abreast of trends in publishing, and pricing practices and of vendor technologies and software developments as they relate to library fund accounting, budget analysis, and ordering technologies.
Manages Order Support unit
Hires, trains and evaluates clerical & technical staff in the Order Support Unit within the Acquisitions Department.
Manages process change and workflow shifts based on organizational and departmental changes.
Assesses ordering activity throughout the Library. In collaboration with the Chief Acquisitions Librarian, develops best practices, policies and procedures for managing and ensuring accountability for procurement of collections materials.
Makes recommendations for staffing needs and level of expertise needed for ordering units.
Manages Approval Plans
Serves as the Library's point of contact with approval plan vendors. Coordinates with subject specialists (selectors, curators, et al) on development of approval plan profiles. Communicates with selectors and vendors about desired changes to approval plans.
Ensures that vendors adhere to profiles. Works closely with subject specialists and the Team Leader of the Monograph Support Team to monitor approval plan activity. Identifies reasons for duplication against other plans and orders and make appropriate adjustments to avoid further duplication. Monitors and evaluates all approval rejections.
Works closely with the Chief Acquisitions Librarian and the Director of Collection Development to develop best practices, policies and procedures related to approval plans and approval plan materials. Works closely with the Acquisitions Technology, Training & Documentation Librarian to document said best practices, policies and procedures.
Manages processing of Gifts
Oversees processing for accession of selected gift material and processing for disposition of unwanted gift material. Serves as the Library's point of contact with Better World Books.
Manages the Exchange Program
Develops a system for tracking the Library's Exchange Program.
Oversees and monitors Exchange activity.
May be required to assist in disaster recovery efforts. May be assigned to work at West Campus location in West Haven, CT.
Master's degree from an ALA-accredited program for library and information science and a minimum of two years of professional experience and demonstrated professional accomplishments appropriate to the rank. Appointment to the Librarian III rank requires at least five years of professional experience and demonstrated professional accomplishments appropriate to the rank.
Experience managing library technical services with an emphasis on acquisitions, particularly management of procurement of collections materials in all formats (print and electronic), and vendor relations. Two or more years of demonstrated supervisory experience, including training and staff development.
Experience with use of integrated library systems (preferably Voyager). Knowledge of the complex, ever-changing electronic publishing environment and scholarly communications issues.
Ability to plan, initiate, and implement effective programs, projects, and services. Excellent organizational skills; demonstrated ability to solve problems and manage complex workflows; a high level of numeracy and ability to deal effectively with complex budgets.
Excellent oral and written communication skills, including public presentations. Excellent interpersonal and team collaboration skills; and the ability to work effectively in a fast-paced, rapidly changing and ambiguous environment. Must be able to work with faculty, staff and students in a culturally diverse environment.
Demonstrated knowledge of one or more Western European languages. Experience managing acquisition of materials from non-Western countries. Demonstrated record of designing projects and bringing them to a conclusion in a timely fashion.
We invite you to discover the excitement, diversity, rewards and excellence of a career at Yale University. One of the country's great workplaces, Yale University offers exciting opportunities for meaningful accomplishment and true growth. Our benefits package is among the best anywhere, with a wide variety of insurance choices, liberal paid time off, fantastic family and educational benefits, a variety of retirement benefits, extensive recreational facilities, and much more.
Applications consisting of a cover letter, resume, and the names and contact information of three professional references should be sent by creating an account and applying online at www.yale.edu/jobs for immediate consideration - the STARS req ID for this position is 16196BR. Please be sure to reference #16196BR in your cover letter.
BACKGROUND CHECK REQUIREMENTS
All external candidates for employment will be subject to pre-employment background screening for this position, which may include motor vehicle and credit checks based on the position description and job requirements. All offers are contingent on successful completion of a background check. Please visitwww.yale.edu/hronline/careers/screening/faqs.html for additional information on the background check requirements and process.
Yale University is an affirmative action/equal opportunity employer. Yale values diversity in its faculty, staff, and students and strongly encourages applications from women and members of underrepresented minority groups.


text:
HomeWritingEssays & OpinionDoubly Negative BBC Language Reveals Political Bias
Doubly Negative BBC Language Reveals Political Bias
What is the UK government's policy on the 'spare room subsidy', also known as the 'bedroom tax'? They have removed the subsidy. In other words, they have reduced benefits payments to some occupants of social housing. Whatever anyone thinks of the policy, this is a literal fact. So how would we re-phrase this fact, if we wanted to describe the current government's policy in terms of a so-called 'bedroom tax'? Well, we would be forced to say that the government have raised tax. Again, whatever anyone thinks of the government's policy, this is not literal fact. The government has not literally raised tax. Now contemplate this BBC headline, found on the BBC's news website this morning:
Labour 'would axe spare room subsidy'
In truth, Britain's government has cut benefits. And Labour has repeatedly said they opposed the cut, though they have not yet promised to reverse it. So this new BBC headline should have come as a shock, to anyone who understands English. It says that Labour will definitely not reverse the government's benefit cut.
The debate between the government and Labour is about a decision to cut, or maintain, benefit expenditure. This, again, is literal fact. In describing this, my words are boringly plain and simple. The BBC, when reporting on this debate, should seek to avoid confusion. However, they do not. Unlike the simple language of an amateur like me, it takes an army of BBC professionals to confuse the presentation of this debate. And the end result is that they create an upside-down world where tax means the same as benefit, and Labour supposedly agrees with the government's plans.
The effect of the government's policy is a reduction in expenditure. When explaining government policy, the BBC should use words like cutting, ending, axing, lowering, or reducing expenditure. The Department of Work and Pensions uses the verb remove to describe the impact on benefits. To literally describe the policy, without introducing colour or bias, the BBC needs to use verbs indicating that government spending will fall.
Labour, for its own political reasons, wants the public debate to take a metaphorical turn. Labour is a political party; they are entitled to create and spread propaganda as they please. But nobody is obliged to repeat it. Knowing that benefits payments are unpopular, and that polls repeatedly show that the majority of the British public want them to be reduced, Labour avoids saying they are in favour of more benefits spending than the government, even though that is the plain and literal truth. On the other hand, taxes are also unpopular. So Labour reframed this debate as if it relates to taxes. Their goal is to conflate lower government spending with higher government taxation. This only makes sense if describing the government's policy as raising, increasing, ballooning, levying, charging, adding, or imposing additional tax on some occupants of social housing. In this way, Labour can position themselves as opposed to tax, in the belief that this way of framing of the debate will make their policies more popular with voters.
So far, so simple. For reasons that the BBC will never admit to, their staff repeatedly prefer to use Labour's choice of language, even though the phrase 'bedroom tax' is a metaphorical truth at best, a literal lie at worst. As a result of their repeated muddling and meddling with the meaning of everything, this morning the BBC reached a nadir of crooked language and political obfuscation. This is how the BBC reported what Jackie Baillie, Labour Scottish welfare spokesperson, said about the policy.
"We are very clear. Labour rejected this approach when it was put to them in government, for social landlords. We have campaigned for its abolition."
"Yes we will abolish it. My understanding is that you can expect an announcement relatively soon."
Baillie is very clear. She must be saying that Labour would 'abolish' the 'bedroom tax', surely? By that, she means Labour would reinstate the housing benefits that the government have cut. But hold on… the BBC says that Labour would abolish the spare room subsidy. They would abolish the subsidy that the government has already abolished. Is that what Baillie really said? What does the BBC think, per its own headlines?
A UK Labour government would abolish the spare room subsidy, the party's Scottish welfare spokeswoman has said.
Axing. Abolishing. The current government has already axed/abolished/ended/removed the spare room subsidy, so if Labour would also axe it, then they must now be in agreement…!?
Jackie Baillie, Labour's Scottish welfare spokesperson, is a full-time professional politician. Her party is in opposition, both in Scotland and the UK. This means she has only one real job – to communicate with voters. Is she incompetent at that task?
The answer is no. In this debate, the incompetents are all paid by the BBC. The BBC took what Baillie said on their own Good Morning Scotland radio show, then put themselves into a self-imposed tizzy about the rights and wrongs of repeating propaganda. In the end, they garbled Baillie's message beyond recognition. By so doing, they proved the BBC is only fit for spreading confusion, and unfit for sharing information. The following is an actual verbatim transcript of what was said by the BBC's presenter, and Baillie's genuinely clear answers, taken from the actual audio recording.
Presenter: Would a Westminster Labour government abolish the bedroom tax?
Baillie: We're very clear, Labour rejected this approach when it was put to them in government, ummm, for social landlords. We've campaigned for its abolition. Yes we will abolish it.
Presenter: A Westminster Labour government would repeal the existing legislation.
Baillie: My understanding is that you can expect an announcement relatively soon.
For once, a politician would be justified in defending herself by asserting she was quoted out of context. And Baillie deserves praise for speaking unusually plainly! Baillie was asked about the abolition of the 'bedroom tax', not the abolition of the spare room subsidy. Of course, it is literally impossible to abolish the bedroom tax, as there is no literal tax to abolish. Thanks to the mirror-world language that the BBC chooses to use, reinstating a benefit is presented as abolishing a tax. Baillie's questioner framed the debate in terms of bedroom tax, before Baillie spoke. But unfortunately for the incompetents at the BBC, other BBC journalists stepped half way through the mirror glass, realized how biased the BBC word's really are, and then stopped. A quick u-turn involved reinjecting the government's preferred, and slightly less tainted nomenclature – 'spare room subsidy' – into the BBC's coverage. But the net result was to completely reverse the meaning of Baillie's words.
This begs another important question. Is the BBC guilty of fabricating quotes and deliberately misrepresenting what people actually said?
Labour 'would axe spare room subsidy' says Jackie Baillie
The speech marks are from the BBC, not from me. And yet, Jackie Baillie never used the words 'would axe spare room subsidy'. She never used the word 'axe' at any time during the show. And she never used the words 'spare room subsidy' at any time during the show. She did use the word 'abolish' in response to a question about the 'bedroom tax'. And yet, the BBC reported what they wanted her to say, not what was said. Of course, they simultaneously goofed whilst doing so. But this does give us a revealing insight into BBC bias.
To avoid accusations of being biased, the BBC's news website repeatedly uses speech marks in its headlines, in the sense of 'this is not literally true' or 'this is the gist of what somebody said'. It is a clever tactic. Speech marks imply the BBC is merely reporting somebody else's position. Reporting somebody else's speech elevates it to the level of fact, of a sort. Whilst the person quoted might be wrong, or a liar, or a fool, it is a fact that they said what they said. The BBC uses these speech marks a lot, especially when headlining objections to government policy. Bias results because of the BBC's highly selective decisions about when to use speech marks in headlines. Whether repeating the propaganda of the Syrian government, or the propaganda of a left-wing think tank, the BBC is increasingly using speech marks to present any and all opinions contrary to those of the British government as if they were literal statements of fact. It is the quick way of generating a sensational headline whilst dodging accusations that the anti-government BBC uses exactly the same slanted techniques as commonly found in (pro-government) British newspapers. But the Baillie quote-that-never-was evidences how the addiction becomes unhealthy, giving BBC journalists free reign to frame any argument exactly as they please, and dispensing with the responsibility to report language exactly as it was said, or to state facts literally as they are.
The BBC, conscious of their own bias, and conscious that support for the BBC tax depends on maintaining the pretense of impartiality, wrong-footed themselves when misquoting Baillie. Their difficulties were plain. The BBC knows that 'bedroom tax' is a biased propaganda term, and yet they still keep using it, over and over. One BBC journalist, writing for a news website, tried to cover up the bias of another BBC journalist, speaking on a radio show. Whilst the BBC repeatedly misuses the phrase 'bedroom tax', they show unequivocal signs that they know the implications of what they are doing. The website post that misquoted Baillie also states:
Ms Baillie's comments came ahead of two rallies in Glasgow against the new subsidy, which critics have labelled the "bedroom tax".
And Baillie's interviewer said, prior to asking her question:
…cuts to welfare, and specifically reducing someone's housing benefit if they have an unused room – the so-called bedroom tax.
Even more honestly, and tellingly, this is an excerpt from the news broadcast given at the top of the same Good Morning Scotland broadcast:
But first, a summary of the news… [Nick Clegg] could be greeted by a protest against the spare room subsidy, or bedroom tax as it's been dubbed by opponents…
'Critics have labelled', 'so-called' and 'dubbed by opponents'. The BBC knows perfectly well who is responsible for the phrase 'bedroom tax', and why those people use the phrase. So, if the phrase 'bedroom tax' is the baby of critics and opponents of the government, why does the BBC use it more often than not. Why does the BBC rarely use government phrases like 'spare room subsidy'? Why is the BBC unable to just keep the description literal, by referring to a cut in housing benefit and leaving it at that? There can be only one rational explanation. BBC journalists use the phrase 'bedroom tax' because they are critics and opponents of the government.
Even on the rare occasions when the BBC avoids the phrase 'bedroom tax', the BBC keeps twisting our language to reflects its bias. Consider this BBC headline (italics are mine):
MSPs hear from tenants hit by UK spare room charge policy
Householders affected by the new spare room charge
Whilst re-using the propaganda term 'bedroom tax' might be considered a necessary evil, in order to communicate with a wide audience that also uses the phrase, what is the BBC's justification for talking about a 'charge'? There is no charge here. Not even Labour calls it a 'charge'. The only reason to label it as a charge is because of a desire to exert a biased influence on how ordinary people understand government changes of housing benefits.
The BBC is guilty of bias, though it has now reached a point where it is immune to this criticism, because everybody working for the BBC is equally biased. Groupthink has set in like rot. And the proof comes in the BBC's vain attempts to cover up their bias, not once but twice. First, a BBC journalist working for their website tried to cover up the bias of a BBC radio presenter. Having utterly goofed in those hopeless bid to reinvent the actual conversation between Baillie and the BBC's presenter, the BBC have now completely rewritten their piece for the web:
Labour 'will abolish bedroom tax' claims Jackie Baillie
In fact, the BBC keeps changing and rechanging the article whilst I am writing this, meaning I sometimes fail to take copies of all the versions that have been published. Whilst proofreading this blog, the BBC has changed the headline again, this time to:
Labour disputes 'bedroom tax' claim by Jackie Baillie
Doubtless the BBC keeps making changes because they have received complaints from Labour Party representatives about the misrepresentation of Baillie, and then the misrepresentation of official policy. But this shows how the BBC, in their zeal to present anti-government stories, can outrun even the political parties that are trying to favour!
Unlike any decent newspaper or website, which would openly admit their errors and clearly state the need to publish corrections, the BBC takes the easy and Orwellian route. Unable to completely extricate the mess they created, the emphasis shifts back to 'bedroom tax', as they are unable to crowbar the phrase 'spare room subsidy' into the coverage, as that would mean rewriting every word that came out of Baillie's mouth. So the BBC does the best job they can of covering up their bias and incompetence, repeatedly rewriting the piece from top to bottom, hiding their failings. A screen grab of the original post can be found here. But if you look at the version currently on the BBC's website, you would see no admission of previous error, nor sign of revision.
The BBC has a public service responsibility to explain events to ordinary people, including political debates. That public service obligation is the sole justification for levying a tax on British citizens. The BBC tax is a real, literal tax, though they choose to mislabel it as a 'television licence fee'. They talk as if watching television needs to be licensed in the same way that driving cars needs to be licensed or owning guns needs to be licensed. But nobody pays Toyota a tax, for permission to drive a Ford.
Over time, we can see how the BBC routinely plays games with the meaning of words, especially when the words relate to taxation, or to the selfish interests of the BBC. Despite the BBC's passionate zeal to explain the consequences of the 'bedroom tax', they never talk about the 'BBC tax', even though that would be a perfect and succinct description. People, by law, have to pay money to the BBC. Hence, they pay the BBC tax. And non-payment of the BBC tax now accounts for one in eight of all magistrates' court cases. But the BBC are very keenly aware of the unpopularity of the word 'tax', which is why they are so careful about when they use the word. And so, there is no excuse for the BBC to feign ignorance about the way the word 'tax' can influence public debate. If their real goal was only to inform the public, they would be talking about the BBC tax all the time, for the sake of brevity and clarity.
Our language should remain untainted, no matter what we believe about government policy. Whether someone supports or opposes a government policy should not lead to a confusion between a rise in taxes and a fall in spending. This is necessary for voters to make informed choices, and for our democracy to function properly. The fourth estate has a crucial role to play in a healthy democracy. But the BBC is diseased, and they know it. The BBC no longer supports our democracy. Instead, they feed on its corruption. Afraid that their rotting carcass might otherwise be cut into pieces, BBC journalists are lying, cheating and misrepresenting, over and over and over, in order to protect their own jobs. And that is why they are no longer capable of reforming themselves, or of reoccupying a genuinely neutral role in the reporting of information. Through so many BBC scandals, their management repeatedly talk of failures of editorial control, as if they lacked adequate bureaucracy, and so need more tax to pay for more staff. But the BBC does not need more control, whether it comes from internal or external sources. To serve the real public interest, Britain needs to cut the BBC.


text:
Q: Extract Normal Form from XML <Historic>
   -----<ReturnData Year="2010">
             -----   -----<ReturnHistory>
               -----   -----<Return StoreDate="2010-07-31" Type="1">
                 -----   -----<EndDate>2010-01-31</EndDate>
                 -----   -----<ReturnDetail TimePeriod="1">
                   -----   -----   -----<Value>2.83</Value>
   -----   -----   </ReturnDetail>
   -----   -----</Return>
   -----        </ReturnData>
 -----<ReturnData Year="2010">
             -----   -----<ReturnHistory>
               -----   -----<Return StoreDate="2010-07-31" Type="1">
                 -----   -----<EndDate>2010-01-31</EndDate>
                 -----   -----<ReturnDetail TimePeriod="2">
                   -----   -----   -----<Value>1.83</Value>
   -----   -----   </ReturnDetail>
   -----   -----</Return>
   -----        </ReturnData>
   <Historic>
I'm storing this in a table as follows:
Table Name = Historical
Columns
StockId : int
StockCode: string
Year:int
StoreDate: datetime
EndDate: datetime
ReturnTypeId: int
TimePeriodId: int

Is my table in the third normal form?
Would you recommend this structure or should I create corresponding tables for each parent node i.e. normalise it further?

A: Just from the structure, there's no clear way to answer this - whether a table is in 3NF or not is largely dependant on the meaning and the "semantics" of the data stored in that table.
I'm just guessing here: the Year column is most likely dependent on the StoreDate (or EndDate) column - right?
Also, more guessing: StockCode and StockId are dependant on one another - this also violates 3NF - try to put your stock information into a separate table:
Stock Information
StockId    INT
StockCode  STRING

and then keep only the StockId in your actual table and add a reference from your table to StockInformation on the StockId column.
If you remove those two issues, there's a good chance your table could now be in 3NF - but again, that depends on that data stored and what that really means - cannot accurately check for 3NF just based on the structure of the fields.


Troubleshooting Disposals | Nor Cal Realty, Inc.
SAFETY FIRST: NEVER PUT YOUR HAND IN THE HOPPER (down the drain into the disposal)!
If the breaker has not tripped and the reset button is not popped out, then it's either a faulty switch or a faulty garbage disposal.
If after following these steps the disposal is still not working, call the office and submit a maintenance request.
Your garbage disposer is a workhorse appliance in your kitchen and one often taken for granted. Your disposal will have no problem grinding most food waste, but that's not where the problems with a "clog" lies. Clogs are most often caused by how the ground food waste reacts to water or lack of water after the disposal unit has ground it up and sends it on its way into waste line. When a garbage disposer clogs you will often find the problem in the trap found on the waste discharge side of the disposal.
Not putting enough water down the disposal when it's grinding is a sure way to get a clog. Over time the lack of flushing water does not carry the waste material fully through the drainage system and it builds up in the drain lines.
These items may not seem like a problem but are a big problem. Grinding egg shells or coffee grounds will create very tiny granular waste that will stick to any sludge in the pipe and quickly create a clog.
Potato peels are notorious clog makers. Once ground up they form a starchy paste similar to mashed potatoes and quickly clog the drain. Grinding Banana Peels. These are a similar problem to potato peels except they also add stringy fibers to the mix.
The simplest way to avoid a clog is to make sure you flush the disposal with plenty of water when it is grinding and for 30 seconds afterward. Then occasionally maintain your disposal by regularly grinding up pieces of lemon peel and ice cubes.
Follow these simple guidelines to keep your garbage disposal running well.


CHS -> Home -> MAST -> What Will Your Verse Be?
You are leaving Chapin High School – saying goodbye. Make sure that in the joy of leaving that there is at least a moment of conscious goodbye.
One of the hardest things about teaching seniors is saying goodbye to them. We look at you today and still remember the gawky, awkward freshmen you once were. Even this year all of you walked into our rooms in August a little different – younger, less confident, more stressed? – than the you who sits in front of us today. And we need just one more thing from you.
Read Whitman's poem O Me! O Life! Write a page that explains your "identity" or how "you may contribute a verse." Who is the "you" leaving CHS? What will be your contribution – your meaningful contribution – amid "eyes that vainly crave the light, of the objects mean, of the struggle ever renewed…"? How do you see yourself as a part in the "powerful play" of life? Think of this as your final statement, your final philosophy upon leaving this chapter of your life. Who are you now, who are we saying goodbye to, and how will you contribute later?
One more time: Move our souls.
Handout: What will your verse be?


text:
The Future Of Multi-Ethnic Britain (Paperback)
The Parekh Report
Bookshop.org Waterstones Foyles Blackwell's Amazon.co.uk Hive
Britain has made some progress towards reducing racist violence and racial discrimination, but it still has a long way to go before it can claim to be a tolerant and just multi-ethnic society that is at ease with, delights in and profits from its rich diversity. This report by the Commission on the Future of Multi-Ethnic Britain describes and analyses the contemporary reality and suggests the way forward. The Commission was established by the Runnymede Trust and was composed of people with a long record of intellectual and political engagement with race related issues. They were drawn from a range of community backgrounds and walks of life and spent nearly two years working out a comprehensive agenda of action in such key areas as criminal justice, employment, health, the media, education, the arts, immigration, political representation, legislation and human rights. No other European country, nor even the United States, has produced such a report. All discussions of multi-ethnic Britain from now onwards will have to take this as their basis. Visit the website of the Runnymede Trust
Imprint: Profile Books
Subject: Current Affairs, Politics & Economics


Ultra high gain ACTIVE directional antenna. Wide frequency range from 400MHz to 2.5GHz. Optional laser, compass etc..
Every HyperLOG antenna goes through rigorous testing in our laboratories before dispatch and is equipped with a high quality GOLD COATING, a high-tech antenna-case (radome) which offers protection against mechanical damage and environmental influence, a top-quality integrated tripod connection and a SMA connector (18GHz version) with twist protection.
All HyperLOG X antennas can be equipped with various options which highly expand the functionality. More details about possible options for this HyperLOG are available at above section "Options".


This month, the most awaited collab, Oyster Holdings' Twinstrike collaboration, is aiming to drop their Adidas Twinstrike ADV. This pair comes dressed in white with some colorful details. It features an upper constructed out of mesh and leather, covered in white. A grey color breaks this off-white look, in the panels and the pull tabs. A colorful mix of Red, Blue, Yellow, and Green, hits the midsole adding a flair to this magical look.
Expect to see this Oyster Holdings x Adidas Twinstrike ADV on September 28th at select retailers and on Adidas Store Online. Take a detailed look below, grab a pair for yourself, retailing at $225 USD.