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Have you or your staff ever been caught in an emergency situation where access to emergency procedures and policies was important? The new Rapid Global App for administrators provides your emergency procedures straight to your phone or iPad to make them available at the tap of your finger.
The App is free to download and the emergency feature is available for all clients with a Rapid Induct package and registered in the single sign on portal MyRapid.


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Discovery & Insights
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The Control Of Language Damages Cultural Identity And Diversity
We live in an incredibly diverse world. This rich tapestry of people, cultures, and languages has formed over thousands of years. Roughly 6,900 spoken languages are in use in the world today, but many are endangered as the number who speak them decreases. These languages are intrinsic to the cultures that speak them, and as they disappear so do the cultural identities that intertwine with them.
Throughout history, it has been common for conquering nations to enforce their languages upon the people who they have conquered. This continues to this day across the globe, such as in China where ethnic minorities are having their languages replaced by Mandarin. How is control of language used to manipulate people? How Is linguicide used as a form of control? What is lost when a language disappears? What can be done to save endangered languages? In this article we will be looking at exactly these questions as well as the importance of language in maintaining cultures and diversity.
These conquering tendencies are not limited to any one nation or culture. No example used in this article is intended to pick on or call out a particular nation or people. Instead, it is to look critically at the results of this common trait and desire to dominate others. The goal should be to see a better path where we see the damage of presenting one culture or worldview as superior. The loss of a culture is a loss for all of humanity and the realization of that is the first step on a path where we support others instead of stamping them down.
How Is Language Related To Culture?
In order to understand why we need to keep languages alive to ensure the existence of their related cultures, we first need to understand the relationship between the two. One of the first things a child learns is how to communicate with their parents and family. Even before that child learns to speak their first word, they begin to understand what the words they hear mean. This is one of the first transmissions of a culture from a parent to their child.
As a child grows up, words then are used to explain and transmit the traditions of the culture to them. The language itself gives words to ideas and concepts that might not even exist in other tongues. As an example, Mamihlapinatapei is a word from the Yámana language of Chile's indigenous Yagán culture that roughly translates to: "The wordless, meaningful look shared by two people who both desire to initiate something, but are both reluctant to do so." This word and the tongue that gave birth to it is at risk of being lost by the Yagan people, as by 2019 only one native speaker remained.
Merriam-Webster defines culture as "the customary beliefs, social forms, and material traits of a racial, religious, or social group". If we then look at American anthropologist Alfred L. Krober's statement that "culture, then, began when speech was present, and from then on, the enrichment of either means the further development of the other", we can see the ways languages and cultures intertwine. We then can begin to process the loss that occurs when these languages are taken away.
1. How Is Control Of Language Used To Manipulate Us?
Now that we have seen the relationship of language and culture, we need to look at how language is used to manipulate and change a culture. As mentioned in our introduction, conquering nations have commonly used language as a tool of subjugation and assimilation. With knowledge of the connection between culture and language, it is obvious why this is a common colonization tactic. Colonizing cultures usually "imposed their language onto the peoples they colonized, forbidding natives to speak their mother tongues." Native-tongues were prohibited and punishments meted out for the use of them.
By controlling the language that people use to communicate, the transmission of culture through it becomes restricted as well. Now, the vernacular of the colonizing culture becomes used to transmit its beliefs and ideals instead. Over time, this new tongue and its culture has become the dominant one in the community and the indigenous culture to which it was connected begins to fade away.
This control of language is a tool used to manipulate people beyond just those who are victims of colonization. It also finds an effective use manipulating those who speak a language natively, by tying the use of the language to a sense of cultural supremacy or as a sign of patriotism. In early twentieth century America, "English Only" laws were established as part of an "Americanization" campaign targeting immigrants from across Southern and Eastern Europe. This wave of "Americanization" not only served to stir up a patriotic fervor, but also to show who was a good American by tying the speaking of English to loyalty to country.
The "Americanization" campaign did not just manipulate English speakers by tying the act of speaking English to patriotism. It also had a similar effect on immigrants as well. Immigrants dropped their names and abandoned their mother-tongues, if not by choice than by education policies that made English the only acceptable language of study. This lasted until the case of a teacher charged with teaching a bible story to a child in German was brought before the Supreme Court in Meyer v. Nebraska, which ultimately ruled the laws unconstitutional. Not that the ruling has stopped language control advocates from attempting to revive these laws, including pushes for a constitutional amendment to make English the official language.
2. Linguicide As A Form Of Control
As discussed before, one of the most effective uses of language control to oppress and manipulate people is through the practice of linguicide. This can happen in several ways, but whether done by violence or educational manipulation it serves the same goal. Restriction and control of native-tongues has brought many to extinction and many more to the brink, oftentimes taking the cultural identities they are born from with them.
More than half of the nearly 6,900 spoken languages in the world today are at risk of extinction in the next 100 years. Cultural superpowers spent centuries spreading a few hegemonic languages across the globe, and have left a graveyard of voices in their wake. In many cases, this was done as intentional policy as a part of colonization efforts. In others, it was the result of languages falling out of favor due to the dominance of trading languages.
The Kurdish language is a case of a language that has been driven to the brink by a mixture of nearly every form of language control over centuries. The Ottoman Empire presided over policies that stripped away Kurdish cultural and language identity, and restricted education in Kurdish inhabited areas. The Ottoman Empire fell and was then replaced by the Republic of Turkey and the Hashemite monarchy in Iraq. Until its fall in 1958 the Iraqi monarchy incorporated nationalism into its development of its Language Education Policy. In Turkey the speaking of Kurdish was banned and speakers were painted as uncivilized and poorly educated.
Things would not be better for the Kurds in Iraq, after the overthrow of the monarchy there was a brief golden age. However; then the Ba'ath Party of Saddam Hussein imposed even stricter restrictions on speaking Kurdish which were usually backed by violence. These restrictions went hand in hand with policies of assimilative education as an attempt to reduce the number of Kurdish people. As happens in many of these stories, this cultural genocide soon gave way to a physical one.
As mentioned in the beginning of the article, similar policies are happening across the globe today. As countries seek to increase control over their minority populations, language control continues to be an often used tool to control the population. Restricting use of a language, banning a language from being taught, teaching language superiority, and encouraging stereotyped perceptions of speakers of a language are all methods of manipulation and control.
3. What Is Lost When A Language Goes Extinct?
One does not have to look far to see languages that have gone extinct or are on the verge. At one point there were 176 languages known to be spoken in the United States. Of those, 52 are now thought dormant and many of the rest are dwindling down to their last speakers. From the policies of the past to urbanization of the present, all of it has led to this era of mass linguistic extinction.
One of the motivating factors of the existence of this article came from the search for contributors to the Navajo language content for the Encore!!! app. There are less than 17,000 people alive who speak Navajo according to Wikipedia, but it was difficult to find speakers with the fluency and vocabulary needed for conversation on a wide variety of topics. Proof that sometimes just looking at the numbers does not give the full picture of the problem.
What is lost with those languages? We have established that language and culture are intertwined, and so when one dies the other suffers at the very least. Children lose the ability to bond with the elders of their communities in their native-tongue along with the connection to their cultural roots. This leads to them not possessing a sense of cultural identity, as they instead identify with the larger hegemonic culture.
Without language, religious and cultural ceremonies also start to disappear. The words that are spoken and passed down through generations, the stories that form mythologies and bond communities, these are all lost without the words to speak and understand them. Foods, arts, and worldviews all are also lost with language and culture. These traditions pass into the past only to be replaced by the traditions of the dominant culture at large.
Cultural identity is important to the understanding of oneself. Having a sense of cultural identity has correlation to positive effects on self esteem as well as your relationship to the world around you. At the same time, having more people with diverse cultural identities also helps us all by allowing us to interact with people with a wider range of experiences. It is not just members of a culture that lose when languages die, but society as a whole.
4. What Can Be Done to Save Endangered Languages?
This leaves us with one last question. What is there to do in this dire situation? How can we save these remaining languages and possibly revive some of the ones which are now gone? It is not hopeless, but it does require reforms of thought both on a personal and societal level.
Encourage governmental reforms to encourage education in these languages and preserve them, and end policies that stigmatize their use.
Family involvement in language and cultural preservation, including exposure to and communication with grandparents and family elders who speak the native-tongue.
Involvement of indigenous peoples in governmental and policymaking, especially in education.
Taking advantage of technology to preserve and teach languages and the related cultural traditions for future generations.
There are already some great strides being made on the community level to revitalize dying languages, and bring back lost ones. Spoken Hawaiian has had a great resurgence thanks to an island wide movement to revive it, taking the number of speakers from 2,000 to over 18,000. Similar efforts have happened with the Māori in New Zealand, and even a revival of both Welsh and Cornish in the U.K.
On an individual level, learning languages is one way to start. Remember that when you learn a language your understanding and ability to learn increases by learning the culture as well. Do not just simply think about the words you are saying, but think of why you are saying them. How they came to be. The worldview they reflect. Taking the opportunity to learn your own cultural identity and the native-tongue (or tongues) of your ancestors.
There is a mistaken belief that we can only speak one language and that learning more is not an efficient use of time or resources. This is not true though. Across Asia, Europe, and Africa we see people who can speak several languages while seamlessly switching between them. Very useful when you live in locations where several languages intersect. Learning to speak new languages is also useful for increasing your ability to understand the world around you, avoiding falling into groupthink, and great for brain health too!
Learning languages that are endangered or isolated also has a positive economic impact on the communities that speak them. Increasing the ability for them to interact and trade with others, while also maintaining their cultural roots and not losing their native-tongue to the "lingua franca".
Given the proper resources, anyone can learn five or six languages especially when starting as children. Adults and older teens can learn a new language in one or two years on average, and less with proper dedicated study.
Outside of the local level and what we can do as individuals and communities, we also must be aware of linguicide and cultural erasures that happen across the globe. Speaking out when possible and encouraging our own governments to take positions to protect peoples and the ways of life they carry with them.
Throughout history control of language has been a tool of manipulation and oppression. It leads to the death of languages as well as the cultures that those mother-tongues bear. Those types of language control policies need to come to an end and be left in the past to prevent further linguicide. The spoken word and the culture that speaks it are intertwined, and when we lose one we risk losing the other. Efforts on both the community level as well as in national governments should be made to preserve and revitalize these languages as much as possible and ensure their survival.
Take this opportunity to learn a new language, or perhaps an old one. Connect with your cultural roots or with a culture that is new to you. If you have kids, make it a family project! An app such as Encore!!! can be a great way to learn, and well worth your effort to try.
The Encore!!! app even has the MyEntry feature, which allows users to create language lessons to help teach others to speak any language. Soon you will even be able to create your own "no-code" app through the MyEntry feature, allowing those who speak a language to seed it to others. Those seeds can grow and flourish in the beauty of revitalization of what was at risk of being lost!
Download Encore!!! and elevate your language learning to the next level
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Copyright ©2021 Encore!!! by Gurmentor Inc

redpajama_set_name: RedPajamaCommonCrawl


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Q: How to select the first child from all similar class in css How to select the first child from all similar class in css
HTML

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CSS
.parent .child:nth-child(1) span {
  color:red;
}

.parent .child:nth-child(1) span {
  color: red;
}

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Here I want a red color:

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A: One approach to achieve this effect requires two stages:

*

*Declare a style for a given class

*Undo that style for all elements of that class which follow the first element of that class

Working Example:

/* Declare a style for a given class */

.child {
  color: rgb(255, 0, 0);
}

/* Undo that style for all elements of that class which follow the first */

.child ~ .child {
  color: inherit;
}

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A: I'm not sure if I understood well, but i guess you want just the first class child to be in red, and not the class no-a-child...if so, just use this

.parent :nth-of-type(2) span{
  color: red;
}

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A: If you want the first div that has class child you could try something like:
div.child:nth-of-type(1).

A: Use a adjacent sibling combinator https://developer.mozilla.org/en-US/docs/Web/CSS/Adjacent_sibling_combinator to target the next element after the no-a-child class element as that seems to be what you really desire.
I added another example (cyan color) that illustrates that option

.parent > .no-a-child+.child>span {
  color: #FF0000;
}

.parent-second> div:first-of-type + div>span {
  color: #00FFFF;
}

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redpajama_set_name: RedPajamaStackExchange


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UnitedHealth Group is committed to the highest standards of integrity.
Our relationships with the people we serve and our team members must rest on a foundation of integrity, which is a core value of our company. Compliance with the laws and regulations applicable to our business and upholding the highest ethical standards are fundamental goals of UnitedHealth Group. To that end, our Compliance & Ethics Program is designed to promote compliance with legal requirements and inform our employees and business partners of our standards for ethical business conduct.
The UnitedHealth Group Code of Conduct: Our Principles of Ethics & Integrity provides guidelines for helping us sustain the highest possible standards of ethical behavior in our work.
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UnitedHealth Group believes supporting human rights is core to advancing our mission to help people live healthier lives and help make the health system work better for everyone.
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Commitment to Ethical Marketing
Our enterprise's marketing activities follow our highest ethical standards of integrity, honesty, respect, responsibility, and compliance with the laws and regulations that govern our business activities around the world.
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The school district's superintendent has resigned and new school bus fees approved last month have been slashed in half.
Greg Luterbach, superintendent of School District 20, gave his notice approximately two weeks ago and will be leaving his position on Aug. 1. The board has already approved Bill Ford, the current assistant superintendent, as Luterbach's replacement.
"We're really pleased to make that announcement and we're really sad to lose Greg," said Teri Ferworn, chair of the board.
As of yet, no replacement has been found for the assistant superintendent position.
The board has also agreed to cut busing fees in half after the district was allowed to keep "$178,000 of funding originally required to go back to government." The decision was made at a closed board meeting on Tuesday, June 7 and parents were informed on Friday.
"We approved $125,000 of that going directly to reduce the busing fees by 50 per cent, and the remaining [$53,000] is going to repair projects on buildings in the district," explained Ferworn.
Repair projects include repairs to the Stanley Humphries Secondary School roofs.
"They're minor projects, because there wasn't enough money for major projects," said Ferworn.
Anyone who already registered and paid will have 50 per cent of what they paid refunded electronically. The district says those refunds will be processed sometime this week.
Wednesday, June 15 at 11 p.m. is still the deadline for early bird pricing. Anyone wishing to pay via the 10-month payment plan should still register between Thursday, June 16 and Sunday, July 31.


Since leaving Bewdley High School Rachel attended college and was awarded with a qualification in office administration. She has enjoyed a varied career which includes a recruitment consultant as well as lettings administrator role located in Leeds. Returning back to her home town, Rachel joined Doolittle and Dalley in 2010. She plays an important role within the company supporting her colleagues in sales, lettings and commercial departments. During her spare time, Rachel regularly attends her local gym and enjoys walking.


Last weekend, while on campus to celebrate the grand reopening of Kyle Field as the largest collegiate football stadium in Texas (and the third largest in the country), we stumbled upon a tradition we hadn't yet experienced or even heard about, for that matter.
We started walking back toward our car, but paused when we noticed Aggies gathering three and four deep alongside one of the streets near the stadium. Tom asked a friendly-looking Aggie what everyone was waiting for, and when he explained that the Spirit Walk was about to begin we decided to stick around...despite the heat-related whining and having no idea what "Spirit Walk" meant.
As we soon discovered, the Spirit Walk is appropriately named. Approximately two hours and 15 minutes prior to kick-off, the football players arrive via bus at the Association of Former Students. The Aggie Band, already assembled and having just performed for the crowd, leads the players as they walk from the Association of Former Students to their locker room in the Bright Complex. Little kids stick their hands out for high fives, adults take photos of their favorite players, and Aggie players soak in the overwhelming amount of support radiating from the crowd.
*Here are a few of my favorite "Tradition" blog posts.
Let's Get Our Yell On!
No Summer Bucket List? No Problem!


asap. Any help would be greatly appreciated.
Hi Derek, In Store Operation you can use UPC/EAN random weight barcode.
You can enable the UPC/EAN from SO Manager | Settings..
Now you must change the scale labels with this information..
PLUPL is the PLU of your item..
(serial line, or network line) and put the ticket into ItemClass table..
Thanks Antonio. I will give that a try. I will let you know if it works.
price, or what should I expect?
Price to obtain the quantity..
Price Of Label / Item.Price = Quantity * SalePrice = Extended Price.
I report this bug some times, but in release 1.20 the bug is present.
discount at the scale anyhow.
method, but it will not even let me manually add the item at the POS screen.
listed. This only happens when a #2 is the first digit of the itemlookupcode.
Also, today I noticed that another weighed item at the store began with 22.
Is there any other advice anyone can give me? Or should I get a support pack?
There's a knowledge base article on this.
Random weight UPCS use the following format (note the prefix is "2" not "20"
implementation guide does not contain this information.
Does anyone know what format this is?
you need to re-program the scanner _not_ to drop the leading 0.
the scanner and maybe someone here can help.
article post it for the rest of us.
Maintenance to post the full contents of this article.
is copyright infringement and unfair to those of us that pay.


wherein the optical density at 248 nm of 1 μm thick coating of the composition is not more than 1.4 and the optical density at 248 nm of the coating exposed to light of 248 nm is less than the optical density of the coating before exposed to light.
The light-sensitive composition is highly responsive to light of Deep-UV regions and excellent in image resolution.
The present invention relates to a light-sensitive composition which comprises an alkali-soluble resin, a compound which is decomposed by an acid and is made alkali-soluble and a specific compound which generates an acid upon irradiation with actinic rays or radiant rays, and which is sensitive to radiation such as ultraviolet rays, far ultraviolet rays, electron rays, molecular beam, γ-rays and synchrotron radiation. In particular, the present invention relates to a photoresist, especially a photoresist composition suitable for fine processing which is high in image resolution and sensitivity and excellent in storage stability.
The photoresist of the present invention is applied to a substrate such as a semiconductor wafer, glass, ceramic and metal by a spin coating or a roller coating in thickness of 0.5 to 3 μm, which is then heated and dried, and imagewise exposed to light through an exposure mask having an image such as a circuit pattern to form a positive image. Further, the positive image is used as a mask to etch the substrate to make the pattern on the substrate. Typical applications include a process for the production of a semiconductor element such as integrated circuits (IC), a process for the production of a circuit board such as liquid crystal and thermal head and other photofabrication processes.
As so-called positive working photoresists, there have been used compositions comprising an alkali-soluble resin and a naphthoquinonediazide compound as a light-sensitive material. For example, novolak phenol resin/naphthoquinone diazide substituted compounds are disclosed in U.S. Pat. Nos. 3,666,473, 4,115,128 and 4,173,470 and as the most typical composition, an example of novolak resin comprising cresolformaldehyde/trihydroxy benzophenone-1,2-naohthoquinonediazide sulfonic acid ester is disclosed in L. F. Thompson "Introduction to Microlithography" (ACS Publishing, No. 2, 19, pp. 112-121).
Novolak resins used as a binder are suitable for this applications because they are soluble in alkaline water without swelling and highly resistant to plasma etching when the resulting resist image is used as a mask for the etching. Naphthoquinonediazide compounds are suitable for a light-sensitive material of the positive working photoresist because they change their property upon light exposure, i.e., they serve as a dissolution inhibitor to reduce alkali-solubility of the novolak resins but upon exposure to light, they decompose to form an alkali-soluble substance and serve as an accelerator to enhance alkali-solubility of the novolak resins.
There have been developed and practically used a number of positive working photoresists comprising novolak resins and naphthoquinonediazide compounds and sufficient results have been obtained for the processing of patterns having lines of 1.5 to 2.0μm in width.
However, the packaging density of integrated circuits becomes higher and higher. It is required the processing of ultrafine patterns having lines of not more than 1 μm in width in the production of substrates for semiconductor such as ultra LSI. In these applications, such photoresists are required that are high in image resolution, high in pattern reproduction to faithfully reproduce a pattern of an exposure mask, high in sensitivity from the view point of high productivity and excellent in storage stability.
There have been attempts to increase the content of quinonediazide light-sensitive radicals so as to obtain high image resolution. For example, J.P.KOKAI No. Sho 60-158440 discloses the use of a light-sensitive compound containing a higher amount of triester and J.P.KOKAI No. Sho 61-118744 discloses the attempt to increase the number of quinondiazide light-sensitive radicals contained in one molecule of a light-sensitive compound.
However, these light-sensitive compounds have disadvantages that they are insoluble in a solvent conventionally used, or soluble but form deposits during the storage of the photoresist compositions, which cause troubles in a photofabrication process or a device production process and reduce the yield (i.e., the number of IC chips obtained from one piece of silicon wafer). In order to prevent the deposition of the light-sensitive composition, J.P.KOKAI No. Sho 61-260239 discloses the use of an organic solvent having a solubility parameter of 11 to 12. However, since such a solvent as dimethyl sulfoxide is used, the resist composition is low in storage stability, i.e., the sensitivity and image resolution are significantly reduced over time.
It is also considered to use a light source emitting light of shorter wavelength so as to attain high image resolution. For instance, there have been studied to use conventional g-ray (436 nm), i-ray (365 nm), Deep-UV rays (200-300 nm) and KrF excimer laser (248 nm). In order to form a resist pattern having a good shape using the above-mentioned light sources, it is required that a resist composition is low in the absorption of light in these wavelength regions and high in bleaching property ("bleaching" means the reduction in the intrinsic absorption of a substance, in particular herein the reduction in the absorption in Deep-UV regions when exposed to light of Deep-UV regions, e.g., 248 nm) at the wavelength of light exposed. However, naphthoquinonediazide light-sensitive materials conventionally used are high in the absorption of light in Deep-UV regions and low in bleaching property at the wavelength and therefore they are insufficient to meet the requirements to make the wavelength of a light source shorter.
These quinonediazide compounds are decomposed by irradiation with actinic rays to form 5-membered carboxylic acids and they are thus made alkali-soluble. In these applications of the light-sensitive material, such properties of the compounds are utilised. However, their light-sensitivity is insufficient. This stem from the fact that their quantum yield essentially never exceeds 1.
Many attempts have been made to improve the light-sensitivity of light-sensitive compositions containing quinonediazide compounds. However, it is very difficult to improve the light-sensitivity while maintaining the development latitude during development.
On the other hand, there have been proposed some positive working light-sensitive compositions free of quinonediazide compounds. One example thereof comprises a polymeric compound having o-nitrocarbinol ester groups as disclosed in J.P. KOKOKU No. Sho 56-2696. However, such a composition does not provide high sensitivity for the same reasons as those discussed above in connection with quinonediazide compounds.
Separately, there have been proposed methods to improve light-sensitivity using a light-sensitive system which is catalytically activated, wherein a known principle is used that a photolytically generated acid causes a second reaction which makes resist in exposed areas soluble. Examples of the methods include combinations of photolytically acid producing compound and acetal or O- or N-acetal compound (J.P.KOKAI No. Sho 48-89003), orthoester or amideacetal compound (J.P.KOKAI No. Sho 51-120714), polymer having in the main chain acetal or ketal groups (J.P.KOKAI No. Sho 53-133429), enolether compound (J.P.KOKAI No. Sho 55-12995), N-acylimino carbonic acid compound (J.P.KOKAI No. Sho 55-126236), polymer having in the main chain orthoester groups (J.P.KOKAI No. Sho 56-17345), silyl ester compound (J.P.KOKAI No. Sho 60-10247), and silyl ether compound (J.P.KOKAI Nos.Sho 60-37549 and 60-121446). Since quantum yield principally exceeds 1 in these combinations, high light-sensitivity is realized.
There have been also proposed systems which are stable over time at room temperature but are decomposed by heat in the presence of an acid to become alkali-soluble. Examples of such systems include a combination of a compound which produces an acid upon exposure to light and secondory or tertiary carbon (e.g. t-butyl or 2-cyclohexenyl) ester or carbonic acid ester compound disclosed in J.P.KOKAI Nos. Sho 59-45439, 60-3625, 62-229242, and 63-36240, Polym. Eng. Sci., vol. 23, page 1012, (1983), ACS.Sym.,vol.242, page 11 (1984), Semiconductor World (1987), November, page 91, Macromolecules, vol. 21, page 1475 (1988) and SPIE, vol. 920, page 42 (1988). These systems are also high in sensitivity and lower in absorption in Deep-UV regions than naphthoquinonediazide/novolak resin systems so that they can be a useful system wherein a wavelength of a light-source can be made shorter. However, since the acid generating agent used in combination does not cause photo-bleaching, the systems are not sufficient to obtain a resist pattern having a good shape.
A system comprising a combination of a silyl ether compound and a disulfone compound as an acid generating agent is disclosed in J.P.KOKAI No. Sho 61-166544 and German patent No. 3,804,533. However, the former system has disadvantage that the absorption in Deep-UV regions is large and the latter has disadvantage that alkali developability of exposed areas and dissolution inhibition of unexposed areas in the developer are not sufficient.
Accordingly, an object of the present invention is to provide a photoresist composition which makes it possible to solve the foregoing problems, particularly to provide a photoresist composition having high sensitivity and high image resolution.
More specifically, an object of the present invention is to provide a photoresist composition which is low in the absorption and photobleaching property in Deep-UV regions so that a light source emitting light of shorter wavelength can be used.
The inventors of this invention have conducted various studies to achieve the foregoing objects and have completed the present invention.
The present invention will now be explained in detail.
Component (a) of the present invention is a compound which has at least one acid-decomposable group and whose solubility in an alkaline developer increases by the action of an acid.
Y represents a single bond or a divalent aromatic group, preferably a single bond or an arylene group having 6 to 15 carbon atoms, more specifically phenylene or naphthylene group.
R4, R5, R6, R7 and R8 may be same or different and represent hydrogen atoms, alkyl, cycloalkyl, alkenyl or aryl groups. The alkyl groups may be linear, branched or cyclic ones and preferably have 1 to 8 carbon atoms. Specific examples include methyl, ethyl, propyl, butyl, hexyl, octyl, isopropyl, isobutyl and 2-ethylhexyl. The alkyl groups may be substituted by a halogen atom such as chlorine atom, an alkoxy group having 1 to 6 carbon atoms such as methoxy group, an aryl group such as phenyl, an aryloxy group such as phenoxy group, etc. Specific examples include monochloromethyl, dichloromethyl, trichloromethyl, bromomethyl, 2-chloroethyl, 2-bromoethyl, 2-methoxyethyl, 2-ethoxyethyl, phenylethyl and phenoxyethyl.
The cycloalkyl groups preferably have 3 to 8 carbon atoms and include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclopentenyl and cyclohexenyl.
The alkenyl groups include vinyl group and the substituted alkenyl groups include those substituted by an alkyl group such as methyl group and an aryl group such as phenyl group, for example, 1-methylvinyl, 2-methylvinyl, 1,2-dimethlyvinyl, 2-phenylvinyl, 2-(p-methylphenyl)vinyl, 2-(p-methoxyphenyl)vinyl, 2-(p-chlorophenyl)vinyl and 2-(o-chlorophenyl)vinyl groups.
The aryl groups are preferably monocyclic or bicyclic ones such as phenyl, α-naphthyl and β-naphthyl groups. The substituted aryl groups may be those listed above which are substituted with alkyl groups having 1 to 6 carbon atoms such as methyl and ethyl groups; alkoxy groups having 1 to 6 carbon atoms such as methoxy and ethoxy groups; halogen atoms such as chlorine atom; nitro, phenyl, or cyano groups. Specific examples thereof are 4-chlorophenyl, 2-chlorophenyl, 4-bromophenyl, 4-nitrophenyl, 4-phenylphenyl, 4-methylphenyl, 2-methylphenyl, 4-ethylphenyl, 4-methoxyphenyl, 2-methoxyphenyl, 4-ethoxyphenyl, 4-cyanophenyl, 4-methyl-1-naphtyl, 4-chloro-1-naphthyl, 5-nitro1-naphthyl, 5-hydroxy-1-naphthyl, 6-chloro-2-naphthyl and 4-bromo-2-naphthyl groups.
R9 is an alkyl or an aryl group, preferably an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 15 carbon atoms, more preferably an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 10 carbon atoms as well as these listed above which are substituted with a halogen atom, an alkoxy, nitro or cyano group. At least two of R4 to R6 are not hydrogen atoms and two of R4 to R6 or two of R7 to R8 may combine to form a ring.
Specific examples of the compounds having at least one acid-decomposable group used in the present invention include the polymers such as poly (p-t-butyl carbonyloxy styrene) as disclosed in J.P.KOKAI No. Sho 59-45439 (U.S. Pat. No. 4,491,628); polymers such as poly[N-(t-butoxycarbonyl) maleimide-co-styrene]as disclosed in J.P.KOKAI No. Sho 62-29242 and SPIE, vol. 631, page 68 (1986); polymers such as poly[N-(p-t-butoxycarbonyloxyphenyl)maleimide-co-styrene] as disclosed in J.P.KOKAI No. Sho 63-36240 (=EP-A-0254853) and ACS Symp., vol. 346, page 200 (1987); polymers such as poly(t-butyl p-vinylbenzoate) as disclosed in SPIE, vol. 771, page 24 (1987); polymers such as poly(t-butyl methacrylate), poly(2-cyclohexenyl methacrylate), poly(2-cyclopropyl-propyl methacrylate) and poly(2-phenyl-propyl methacrylate) as disclosed in Macromolecules, vol. 21, page 14755 (1988); polymers such as poly(p-trimethylsiloxy styrene) as disclosed in J.P.KOKAI No. Sho 60-52845 and U.S. Pat. No. 4,689,288 and SPIE, vol. 926, page 162 (1988); polymers such as poly(p-t-butoxy styrene) as disclosed in J.P.KOKAI No. Sho 63-250642 (=EP-A-0284868) and EP-A-0366590; polymers such as poly(p-2-cyclohexenyloxy styrene) as disclosed in Polymer Bull., vol.20, page 427 (1988); polymers such as poly(p-2-pyranyloxy styrene) as disclosed in ACS Polym. Mater. Sci. Tech., vol. 61, page 417 (1989); and polymers such as poly(silyl methacrylate) as disclosed in J.P.KOKAI No. Sho 62-40450 (=U.S. Pat. No. 4,820,607). In addition, there may be used poly phthaldehydes as disclosed in ACS Symp., vol. 242, page 11 and polycarbonates as disclosed in J.P.KOKAI No. Sho 62-136638 (=EP-A-0225454), J. Imaging Sci., vol. 30, page 59 (1986) and Makromol. Chem., Rapid Commun., vol. 7, page 121 (1986).
A weight average molecular weight of these polymers is preferably not less than 500 and more preferably in a range of from 1,000 to 500,000.
An amount of the component (a) contained in the light-sensitive composition of the present invention is in a range of from 10 to 95%, preferably 20 to 90% and more preferably 25 to 75% by weight based on the total weight of the composition.
Component (b) of the present invention is a disulfone compound of the formula (I).
In the formula (I), the alkyl groups may be linear, branched or cyclic ones and preferably have 1 to 10 carbon atoms. Specific examples include methyl, ethyl, propyl, butyl, hexyl, octyl, decyl, isopropyl, isobutyl, t-butyl, 2-ethylhexyl and cyclohexyl. The alkyl groups may be substituted by a halogen atom such as chlorine atom, an alkoxy group having 1 to 6 carbon atoms such as methoxy group, an aryl group such as phenyl group, an aryloxy group such as phenoxy group, etc. Specific examples include monochloromethyl, dichloromethyl, trichloromethyl, bromomethyl, 2-chloroethyl, 2-bromoethyl, 2-methoxyethyl, 2-ethoxyethyl, phenylethyl, naphthylmethyl and phenoxyethyl.
The aryl groups are preferably monocyclic or bicyclic ones such as phenyl, α-naphthyl and β-naphthyl groups. The substituted aryl groups may be those listed above which are substituted with alkyl groups having 1 to 6 carbon atoms such as methyl and ethyl groups; alkoxy groups having 1 to 6 carbon atoms such as methoxy and ethoxy groups; halogen atoms such as chlorine atom; nitro, phenyl, carboxy, hydroxy, amide, imide or cyano groups. Specific examples thereof are 4-chlorophenyl, 2-chlorophenyl, 4-bromophenyl, 4-nitrophenyl, 4-hydroxyphenyl, 4-phenylphenyl, 4-methylphenyl, 2-methylphenyl, 4-ethylphenyl, 4-methoxyphenyl, 2-methoxyphenyl, 4-ethoxyphenyl, 2-caboxyphenyl, 4-cyanophenyl, 4-methyl-1-naphtyl, 4-chloro-1-naphthyl, 5-nitro-1-naphthyl, 5-hydroxy-1-naphthyl, 6-chloro-2-naphthyl, 4-bromo-2-naphthyl and 5-hydroxy-2-naphthyl groups.
wherein R1 and R2 have the same meaning as defined above for the formula (I).
An amount of the disulfone compounds of the formula (I) contained in the light-sensitive composition of the present invention is in a range of from 0.01 to 20%, preferably 0.5 to 15% and more preferably 1 to 10% by weight based on the total weight of the composition.
The alkali-soluble polymers usable in the present invention are preferably those having an acidic hydrogen atom having pKa of not more than 11, such as a phenolic hydroxyl group, carboxylic acid group, sulfonic acid group, imido group, sulfonamido group, N-sulfonylamido group, N-sulfonylurethane group or active methylene group. Suitable alkali-soluble polymers include, for example, novolak-type, phenolic resins such as phenol/formaldehyde resin, o-cresol/formaldehyde resin, m-cresol/formaldehyde resin, p-cresol/formaldehyde resin, xylenol/formaldehyde resin and copolycondensates of them. It is possible to use the phenolic resin in combination with a phenol/formaldehyde or cresol/formaldehyde condensate substituted with an alkyl group having 3 to 8 carbon atoms such as t-butylphenol/formaldehyde resin. In addition, there may also be used polymers comprising, as a comonomer, a phenolic hydroxy group-containing monomer such as N-(4-hydroxyphenyl) methacrylamide and homo- or co-polymers of p-hydroxystyrene, o-methacrylamid hydroxystyrene, m-isopropenyl phenol, p-isopropenyl phenol, etc.; the above-mentioned polymers partially etherified or partially esterified.
Further, there may also be used polymers of carboxyl group-containing monomers such as acrylic acid and methacrylic acid, carboxyl group-containing polyvinylacetal resin described in J.P. KOKAI No. 61-267042 and carboxyl group-containing polyurethane resin described in J.P. KOKAI No. 63-124047 (=U.S. Pat. No. 4,898,803).
In addition, there may also be used polymers comprising N-(4-sulfamoylphenyl) methacrylamide, N-phenylsulfonyl methacrylamide or maleimide as a comonomer, and polymers having an active methylene group described in J.P. KOKAI No. 63-27237.
These alkali-soluble polymers can be used alone or in combination. An amount of the alkali-soluble polymer (c) contained in the light-sensitive composition of the present invention is in a range of from 3 to 85%, preferably 5 to 75% and more preferably 10 to 65% by weight based on the total solid weight of the composition.
The light-sensitive composition of the present invention comprises the components (a), (b) and (c) in the amounts described above, wherein the optical density at 248 nm of 1 μm thick coating of the composition is not more than 1.4, preferably not more than 1.3 and more preferably 1.0 and the optical density at 248 nm of the coating exposed to light of 248 nm is less than the optical density of the coating before exposed to light.
The positive working light-sensitive composition of the present invention may optionally contain a dye, pigment, plasticizer and a compound (sensitizer) enhancing the efficiency of the photolysis.
The sensitizers include, for example, benzoin, benzoin methyl ether, benzoin ethyl ether, 9-fluorenone, 2-chloro-9-fluorenone, 2-methyl-9-fluorenone, 9-anthrone, 2-bromo-9-anthrone, 2-ethyl-9-anthrone, 9,10-anthraquinone, 2-ethyl-9,10-anthraquinone, 2-t-butyl-9,10-anthraquinone, 2,6-dichloro-9,10-anthraquinone, xanthone, 2-methylxanthone, 2-methoxyxanthone, thioxanthone, benzil, dibenzalacetone, p-(dimethylamino)phenyl styryl ketone, p-(dimethylamino)phenyl p-methylstyryl ketone, benzophenone, p-(dimethylamino)benzophenone (or Michler's ketone), p-(diethylamino)benzophenone and benzanthrone. Among these compounds, the Michler's ketone is particularly preferable.
D represents a non-metallic atomic group necessary for forming a nitrogen-containing heterocyclic ring of an ordinary cyanine dye such as a benzothiazole (for example, benzothiazole, 5-chlorobenzothiazole or 6-chlorobenzothiazole), a naphthothiazole (for example, α-naphthothiazole or β-naphthothiazole), a benzoselenazole (for example, benzoselenazole, 5-chlorobenzoselenazole or 6-m ethoxybenzoselenazole), a naphthoselenazole (for example, α-naphthoselenazole or β-naphthoselenazole), a benzoxazole (for example, benzoxazole, 5-methylbenzoxazole or 5-phenylbenzoxazole) or naphthoxazole (for example, α-naphthoxazole or β-naphthoxazole).
The compounds of the general formula (IX) have chemical structures having a combination of D, R10 and R11. Various compounds of the general formula (IX) are known. Therefore, the compound of the general formula (IX) is suitably selected from the known compounds.
Preferred sensitizers usable in the present invention include those described in U.S. Pat. No. 4,062,686 such as 2-[bis(2-furoyl)methylene]-3-methylbenzothiazoline, 2-[bis(2-thienoyl)methylene]-3-methylbenzothiazoline and 2-[bis(2-furoyl)methylene]3-methylnaphtho[1,2-d]thiazoline.
Dyes can be used as a colorant. Preferred dyes are oil-soluble dyes and basic dyes. Examples of such dyes include Oil Yellow #101, Oil Yellow #130, Oil Pink #312, Oil Green BG, Oil Blue BOS, Oil Blue #603, Oil Black BY, Oil Black BS and Oil Black T-505 (products of Orient Kagaku Kogyo Co.), Crystal Violet (CI 42555), Methyl Violet (CI 42535), Rhodamine B (CI 45170B), Malachite Green (CI 42000) and Methylene Blue (CI 52015).
The composition of the present invention may contain also a cyclic acid anhydride for further increasing the sensitivity, a printing-out agent for forming a visible image immediately after the exposure, and a filler. The cyclic acid anhydrides include, for example, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, 3,6-endoxy-Δ4 -tetrahydrophthalic anhydride, tetrachlorophthalic anhydride, maleic anhydride, chloromaleic anhydride, α-phenylmaleic anhydride, succinic anhydride and pyromellitic acid as described in U.S. Pat. No. 4,115,128. The sensitivity can be increased three times as much as by incorporating 1 to 15% by weight based on the total composition, of the cyclic acid anhydride. The typical example of the printing-out agent for forming the visible image immediately after the exposure is a combination of a light-sensitive compound which releases an acid upon exposure with a salt-forming organic dye. Examples of them include a combination of an o-naphthoquinone diazide-4-sulfonyl halide with a salt-forming organic dye as described in J.P. KOKAI Nos. 50-36209 (=U.S. Pat. No. 3,969,118) and 53-8128 and a combination of a trihalomethyl compound with a salt-forming organic dye, as described in J.P. KOKAI Nos. 53-36223 (=U.S. Pat. No. 4,160,671) and 54-74728 (=U.S. Pat. No. 4,232,106).
The positive working light-sensitive composition of the present invention is dissolved in a solvent and the solution as it is can be applied to a support to prepare a resist material for semiconductor elements. The solvents usable herein include, for example, ethylene dichloride, cyclohexanone, methyl ethyl ketone, methanol, ethanol, propanol, ethylene glycol monomethyl ether, 1-methoxy-2-propanol, ethylene glycol monoethyl ether, 2-methoxyethyl acetate, 2-ethoxyethyl acetate, 1-methoxy-2-propyl acetate, dimethoxy ethane, methyl lactate, ethyl lactate, N,N-dimethylacetamide, N,N-dimethylformamide, tetramethylurea, N-methylpyrrolidone, dimethyl sulfoxide, sulfolane, γ-butyrolactone, toluene and ethyl acetate. These solvents may be used alone or in combination.
The concentration of the solvent in the composition (total solid components including the additives) is 2 to 50% by weight.
Actinic ray sources usable in the present invention include, for example, mercury lamp, metal halide lamp, xenon lamp, chemical lamp and carbon arc lamp. Radiant ray sources include electron rays, X-rays, ion beams and far-ultraviolet rays. Preferably, g-rays, i-rays and Deep-UV rays are used for a photoresist. Further, a scanning exposure method using a high-density energy beam (laser beam or electron rays) can also be employed for the exposure of the light-sensitive composition of the present invention. The laser beams include, for example, helium/neon laser, argon laser, krypton ion laser, helium/cadmium laser and KrF excimer laser.
The developer for the positive working light-sensitive composition of the present invention is preferably an aqueous solution of an inorganic alkali such as sodium silicate, potassium silicate, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium tertiary phosphate, disodium hydrogenphosphate, ammonium tertiary phosphate, diammonium hydrogenphosphate, sodium metasilicate, sodium bicarbonate or aqueous ammonia or an organic alkali such as an OH salt of tetraalkylammonium. An amount of the alkali is in a range of from 0.1 to 10%, preferably 0.5 to 5% by weight based on the developer.
If necessary, a surfactant or an organic solvent such as an alcohol can be added to the alkaline aqueous solution.
The positive working light-sensitive composition of the present invention is high in sensitivity, good in response to a light source of shorter wavelength in Deep-UV regions and excellent in image resolution.
The following Examples will further illustrate the present invention, which by no means limit the scope of the present invention.
Meta- and para-cresol novolak resin (molecular weight: 3380, meta/para ratio: 50/50) (2 g) and the disulfone compound of the formula I-14 (0.2 g) were dissolved in dimethyl acetamide (DMAc) (6.0 g). The solution was filtered through a membrane filter having a pore size of 0.4μm to prepare a light-sensitive composition. The optical density of the composition was measured at 248 nm to give about 1.2 μm-1 before the exposure to light of 248 nm and about 0.9 μm -1 after the exposure. The light-sensitive composition was applied to a 3 inch bare silicon treated with hexamethyl disilazane and pre-baked for 90° C. on a hot plate maintained at 100° C. to prepare a coating film of about 8000Å in thickness. The exposure was conducted using a contact aligner (PLA501F manufactured by CANON) provided with a low pressure mercury lamp as a light source and a band pass filter which transmits far-ultraviolet rays of 254 nm. After the exposure to light in a contact mode, paddle development was conducted for 60 seconds in a 1.43% aqueous solution of tetramethylammonium hydroxide (hereinafter referred to as TMAH) to obtain a positive image with the degree of the coating film unremoved in unexposed areas being 95%. Eta sensitivity (the minimum exposure energy required to form an image, i.e., to remove the resist in light-exposed areas) was about 50 mj/cm2 and image resolution was 0.75μm L/S.
Meta- and para-cresol novolak resin (molecular weight: 3400, meta/para ratio: 50/50) (1.2 g) and an alkali-soluble polymer (molecular weight: about 8000) (0.8 g) of the following formula: ##STR4## were mixed, to which the disulfone compound of the formula I-7 (0.2 g: 10% based on the resin weight). The mixture was dissolved in DMAc (7.9 g). In the same manner as in Example 1, the solution was filtered through a membrane filter having a pore size of 0.4 μm to prepare a light-sensitive composition. The optical density of the composition was measured at 248 nm to give about 1.0 μm -1 before the exposure to light of 248 nm and about 0.8 μm -1 after the exposure. In the same manner as in Example 1, the light-sensitive composition was applied to a silicon wafer to prepare a coating film of about 8000 Å in thickness. After the exposure, paddle development was conducted for 45 seconds in a 1.19% TMAH solution to obtain a positive image with the degree of the coating film unremoved being 90%. Eta sensitivity was about 30 mj/cm2 and image resolution was 0.75 μm L/S.
Meta- and para-cresol novolak resin (molecular weight: about 6000, meta/para ratio: 60/40) (1.4 g), a silyl ether polymer (a degree of the silyl etherification: 27.5%) (1.4 g) of the following formula: ##STR5## and the disulfone compound of the formula I-16 (0.12 g) were dissolved in DMAc (7.5 g). In the same manner as in Example 1, the solution was filtered through a membrane filter having a pore size of 0.4 μm to prepare a light-sensitive composition. The optical density of the composition was measured at 248 nm to give about 0.79 μm -1 before the exposure to light of 248 nm and about 0.73 μm -1 after the exposure. In the same manner as in Example 1, the light-sensitive composition was applied to a silicon wafer to prepare a coating film of about 8000 Å in thickness. After the exposure in the same manner as in Example 1, paddle development was conducted for 45 seconds in a 1.19% TMAH solution to obtain a positive image with the degree of the coating film unremoved being 90%. Eta sensitivity was 20 mj/cm2 and image resolution was 0.7 μm L/S.
The same procedures as in Example 3 were repeated except that the disulfone compound of the formula I-13 (0.3 g) was substituted for the disulfone compound of the formula I-16 (0.12 g) to prepare a light-sensitive composition. The optical density of the composition was measured at 248 nm to give about 1.0μm-1 before the exposure to light of 248 nm and about 0.85 μm-1 after the exposure. In the same manner as in Example 1, the image forming property of the light-sensitive composition was evaluated using a 1.19% TMAH solution. Eta sensitivity was 65 mj/cm2 and image resolution was 0.8μm L/S.
A silyl ether polymer of the following formula: ##STR6## was mixed with m/p cresol/novolak resin and disulfone compound in a ratio as shown in Table 1 to prepare a light-sensitive composition. In the same manner as in Example 1, coating, exposure to light and development were conducted to evaluate the image forming property of the light-sensitive composition. The results are shown in Table 2. In all cases, the minimum size of 0.7 μm in the mask was resolved.
R9 is an alkyl or an aryl group, provided that at lest two of R4 to R6 are not hydrogen atoms and two of R4 to R6 or two of R7 to R9 may combine to form a ring.
3. The positive working light-sensitive composition of claim 1, wherein the compound which has at least one acid-decomposable group is selected from the group consisting of poly(p-t-butyl carbonyloxy styrene), poly[N-(t-butoxycarbonyl)maleimide-costyrene], poly[N-(p-t-butoxycarbonyloxyphenyl)maleimide-costyrene], poly(t-butyl p-vinylbenzoate), poly(t-butyl methacrylate, poly(2-cyclohexenyl methacrylate), poly(2-cyclopropyl-propyl methacrylate) and poly(2-phenyl-propyl methacrylate), poly(p-trimethylsiloxy styrene), poly(p-t-butoxy styrene), poly(p-2-cyclohexenyloxy styrene), poly(p-2-pyranyloxy styrene), poly(silyl methacrylate), poly phthaldehydes and polycarbonates.
4. The positive working light-sensitive composition of claim 1, wherein the compound which has at least one acid-decomposable group has a weight average molecular weight in a range of from 1,000 to 500,000.
5. The positive working light-sensitive composition of claim 1, wherein the compound which has at lest one acid-decomposable group is contained in a range of from 10 to 95% by weight based on the total weight of the composition.
6. The positive working light-sensitive composition of claim 1, wherein the disulfone compound is selected from the group consisting of those represented by the formula (I) wherein the alkyl group is a linear, branched or cyclic group having 1 to 10 carbon atoms or a linear, branched or cyclic group having 1 to 10 carbon atoms substituted by a halogen atom, an alkoxy group having 1 to 6 carbon atoms an aryl group or an aryloxy group; the alkenyl group is vinyl group or an alkenyl group substituted by an alkyl group or an aryl group; and the aryl group is monocyclic or bicyclic one or monocyclic or bicyclic one substituted with an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogen atom, a nitro, phenyl, carboxy, hydroxy, amide, imide or cyano group.
8. The positive working light-sensitive composition of claim 1, wherein the alkali-soluble polymer is one which has an acidic hydrogen atom having pKa of not more than 11 selected from the group consisting of a phenolic hydroxyl group, carboxylic acid group, sulfonic acid group, imido group, sulfonamido group, N-sulfonylamido group, N-sulfonylurethane group and active methylene group.
9. The positive working light-sensitive composition of claim 1, wherein the alkali-soluble polymer is selected from the group consisting of novolak-type phenolic resins; combinations of the novolak-type phenolic resins with a phenol-formaldehyde or cresol-formaldehyde condensate substituted with an alkyl group having 3 to 8 carbon atoms; polymers comprising, as a comonomer, a phenolic hydroxy group-containing monomer; the above-mentioned polymers partially etherified or partially esterified; polymers of carboxyl group-containing monomers; carboxyl group-containing polyvinylacetal resins; carboxyl group-containing polyurethane resins; polymers comprising N-(4-sulfamoylphenyl) methacrylamide, N-phenylsulfonyl methacrylamide or maleimide as a comonomer; and polymers having an active methylene group.
10. The positive working light-sensitive composition of claim 1, wherein the optical density at 248 nm of 1 μm thick coating of the composition is not more than 1.3.
11. The positive working light-sensitive composition of claim 1, wherein the optical density at 248 nm of 1 μm thick coating of the composition is not more than 1.0.
12. The positive working light-sensitive composition of claim 1, wherein the composition further contains at least one selected from the group consisting of a dye, pigment, plasticizer and a compound (sensitizer) enhancing the efficiency of the photolysis of the composition.
13. The positive working light-sensitive composition of claim 1, wherein the sensitizer is selected from the group consisting of benzoin, benzoin methyl ether, benzoin ethyl ether, 9-fluorenone, 2-chloro-9-fluorenone, 2-methyl-9-fluorenone, 9-anthrone, 2-bromo-9-anthrone, 2-ethyl-9-anthrone, 9,10-anthraquinone, 2-ethyl-9,10-anthraquinone, 2-t-butyl-9,10-anthraquinone, 2,6-dichloro-9,10-anthraquinone, xanthone, 2-methylxanthone, 2-methoxyxanthone, thioxanthone, benzil, dibenzalacetone, p-(dimethylamino)phenyl styryl ketone, p-(dimethylamino)phenyl p-methylstyryl ketone, benzophenone, p-(dimethylamino)benzophenone (or Michler's ketone), p-(diethylamino)benzophenone and benzanthrone.
14. The positive working light-sensitive composition of claim 1, wherein the composition is dissolved in a solvent selected from the group consisting of ethylene dichloride, cyclohexanone, methyl ethyl ketone, methanol, ethanol, propanol, ethylene glycol monomethyl ether, 1-methoxy-2-propanol, ethylene glycol monoethyl ether, 2-methoxyethyl acetate, 2-ethoxyethyl acetate, 1-methoxy-2-propyl acetate, dimethoxy ethane, methyl lactate, ethyl lactate, N,N-dimethylacetamide, N,N-dimethylformamide, tetramethylurea, N-methylpyrrolidone, dimethyl sulfoxide, sulfolane, γ-butyrolactone, toluene and ethyl acetate.
15. A semiconductor device comprising the positive working light-sensitive composition of claim 1.


A new report from the World Health Organization found that nearly a quarter of children under five die from preventable environmental conditions.
A girl wading through mountains of trash; a boy up to his neck in toxic waters—these photos show just some of the children exposed to potentially fatal environmental conditions.
At least one in four deaths of children under five, almost 1.7 million children, can be attributed to pollution, according to a newly released report from the World Health Organization (WHO).
A lack of access to potable drinking water leaves children vulnerable to preventable diseases such as diarrhea, malaria, and pneumonia. About 570,000 children also suffer from exposure to air pollutants and indoor pollution, from such causes as cigarette smoke and cooking fires, leading to a greater likelihood they will develop chronic respiratory diseases later in life.
Developing nations are most at risk of exposure to air pollution. A 2014 study from WHO found that, in these nations, 98 percent of cities with more than 100,000 people do not have access to safe air conditions. Delhi, India, is estimated to be the world's most polluted city.
"A polluted environment is a deadly one—particularly for young children," said Margaret Chan, WHO's director-general, in a press release. "Their developing organs and immune systems, and smaller bodies and airways, make them especially vulnerable to dirty air and water."
Women who come in contact with unsafe environmental conditions during pregnancy also have a greater likelihood of delivering premature babies. The report found that 270,000 children die within their first month of life from exposure to preventable environmental hazards such as unsafe air and water.
Further, children are increasingly at risk from the improper disposal of electronic devices, which can result in toxic chemicals seeping into the environment. Toxins like lead, arsenic, and other dangerous materials can impede mental development and increase rates of cancer.
The amount of improperly disposed waste is estimated to increase by 19 percent by 2018, totaling more than 50 million metric tons.
WHO made several recommendations for improving living conditions for children, including more stringent waste regulations for industries, removing toxic materials (such as lead paint) from building materials, reducing the amount of pesticides used in agriculture, and improving access to clean air and water.
"Investing in the removal of environmental risks to health, such as improving water quality or using cleaner fuels, will result in massive health benefits," said Maria Neira, WHO's director of the Department of Public Health, Environmental and Social Determinants of Health.
The UN's Sustainable Development Goals program is currently working with developing nations to improve access to basic services. The goal is an end to preventable deaths of children under five by 2030.
Iceland's volcanic formations offer a new possibility for trapping carbon emissions.


Los Angeles-based fast fashion retailer Forever 21 will bring its less expensive F21 Red concept to Canada, with its first stores set to open in 2015. F21 Red launched its first store in suburban Los Angeles in May of this year.
Four Canadian F21 Red locations will open next year, according to the retailer's Canadian broker Jeffrey Berkowitz ofAurora Realty Consultants Inc. in Montreal. F21 Red will feature 'trend led' stapes of the Forever 21 line plus 21Men, Forever 21+and Forever 21 Girls.
F21 Red seeks retail space in the 10,000 to 18,000 square foot range, according to Aurora Realty.


Folks, this is a post I never anticipated writing. It has nothing to do with what my blog's about, whatever that might be. And at first I wasn't going to write these words at all, but then I took a look at the smiling face of blogger April Greene and was charmed into proceeding.
You see, a number of years ago someone out there in the blogging community came up with the idea that bloggers would do well to recognize and encourage and promote their peers. Can't argue with that. And that same someone decided that a good way for this to happen would be for newish bloggers to bestow an award upon other newish bloggers. And that same someone, as far as I know, also named the award. The Liebster Award, that's what it's called. Why Liebster? Who knows? The award's origins are about as clear as the waters of the Ganges River. In other words, not. Whatever, Liebster Awards have been granted to oodles of bloggers over the years. And April Greene, an excellent writer whose blog and smiling face may be viewed by clicking right here, has nominated me for (meaning, she has awarded me) a Liebster. Thanks, April, for thinking of me.
Wouldn't you know it, though? This whole Liebster thing is a form of a chain letter, so it's kind of a pain. More than kind of, actually. Yet, at this point I'm pretty happily playing along because, as April Greene mentioned on her website, Liebster Awards are all about spreading the love. OK, I'm ready! Let's go!
Naturally, the Liebster Awards come with various rules that seem to have evolved over the years without firm consensus as to what are the rules. For the sake of making things somewhat easier and less time-consuming, I'm going to modify the rules once again by reducing the number of hoops a Liebster nominee need jump through.
Most versions of Liebster's regulations ask nominees to answer 11 questions posed to them by their nominators, and to nominate 11 bloggers for the Liebster. To that I say: "Huh? Who's got all day to do this stuff?" And thusly if any or all of my nominees decide to accept the Liebster from me, and by so doing decide to keep the ol' chain in motion, they need answer only three questions. And I suggest that they propel the Liebster mechanism by nominating no more than three bloggers.
What's the coolest award you've ever gotten? (You can say the Liebster Award if you want.) — Hey, I've been awardless till now, so Liebster it is.
When did you last ride a public bus? — I only take limos.
Have you ever slipped when getting out of the shower and felt older than you actually are? — No comment.
Which of your childhood friends are you saddest to have lost touch with, and what do you think they're doing now? — My teddy bear. He's exploring Antarctica these days.
Honestly: Do you really consider it the three-second rule? Have you ever extended it to more seconds? If so, how many? — Thousands upon thousands.
Why do you think all those houseplants have died under your care? — How did you know?
Please describe the time you sung most humiliatingly in public. — It would take too long.
Best popcorn topping. Go. — I like the classics (ketchup and mustard).
Would you rather dream of a spider infestation or a snake infestation? Why? — Yuck!
What is your least favorite color? Explain. — Only my psychiatrist is privy to this.
Should 7-Eleven have discontinued their Sour Patch Watermelon Slurpee flavor? Why or why not? — No. The masses will revolt.
Moving right along, I now am obliged to ask questions of my nominees. I'm not feeling smart-alecky anymore, so the questions will be legit.
What television series, if any, are you currently watching?
If anyone out there has read all of this, my condolences.
Normal programming will resume with my next article.


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Amilcare Ponchielli (Paderno Ponchielli, Llombardia, 31 d'agost de 1834 - Milà, 17 de gener de 1886) va ser un compositor italià d'òpera.

Va nàixer a Paderno Fasolaro (actualment Paderno Ponchielli), prop de Cremona. Als nou anys va guanyar una beca per a estudiar música al Conservatori de Milà, i va compondre la seua primera simfonia a l'edat de 10 anys.

Dos anys abans de deixar el conservatori, va compondre la seua primera òpera, basada en la novel·la I promessi sposi ('Els promesos') d'Alessandro Manzoni. L'òpera va ser el gènere en què va destacar i en què aconseguiria la fama.

Els seus inicis professionals van ser descoratjadors. Va ser despatxat amb estranyes maniobres d'una plaça de professor al Conservatori de Milà que havia guanyat per oposició, i on va tenir alguns alumnes que més endavant serien coneguts, com Emilio Pizzi, Armando Seppilli, Arturo Vanbianchi, i el llombard Giovanni Tebaldini, i va haver de guanyar-se la vida amb faenes eventuals en diverses ciutats petites. No va ser fins a l'estrena de la versió revisada de I promessi sposi, l'any 1872, que la sort li va somriure. Aquesta estrena li va proporcionar un contracte amb l'editor G. Ricordi & Co. i el reconeixement del Conservatori i del teatre La Scala. El ballet Le due gemelle (1873) va confirmar el succés.

L'òpera que va compondre després, I Lituani (Els lituans) (1874), també va tenir una bona acollida, perquè fou representada a Sant Petersburg (com Aldona - el 20 de novembre de 1884), però la seua òpera més difosa és La Gioconda, sobre llibret d'Arrigo Boito, adaptat d'un drama de Victor Hugo. Va ser estrenada l'any 1876 i després va ser revisada diverses vegades.

El 1881, Ponchielli va ser nomenat maestro di cappella de la Catedral de Bèrgam, i el mateix any va accedir a un lloc de professor de composició del Conservatori de Milà, on va tenir com a alumnes Giacomo Puccini i Pietro Mascagni.

Després de La Gioconda, Ponchielli va compondre el monumental melodrama bíblic en 4 actes Il figliuol prodigo (Milà, Teatro alla Scala, 26 de desembre de 1880) i Marion Delorme, sobre un altre drama de Victor Hugo (Milà, Teatro alla Scala, 17 de març de 1885). Malgrat la seua riquesa d'invenció musical, cap d'aquestes dues obres van aconseguir l'èxit de la precedent, tot i que van exercir una gran influència sobre els compositors de l'emergent generació, com Puccini, Mascagni i Giordano.

Va morir a Milà i fou soterrat al Cimitero Monumentale.

Tot i que durant la seua vida Ponchielli va ser molt popular i influent, a causa que va introduir en l'òpera italiana la gran orquestra i una orquestració més complexa, sols La Gioconda es representa avui dia amb regularitat. Conté la romança per a tenor Cielo e mar; un meravellós duet per a tenor i baríton Enzo Grimaldo; l'escena per a soprano Suicidio! i la música de ballet coneguda com La dansa de les Hores. Aquesta escena de ballet va esdevenir molt popular arran d'aparèixer al film de Walt Disney Fantasia (1940).

Òperes
 Il sindaco babbeo, 1881 (un exercici d'estudis)
 I promessi sposi, Cremona 1856. Ignorada per la premsa.
 Bertrando del Bornio, 1858 (encàrrec per a Torí, però no representada)
 La Savoiarda, 1861; revisada com Lina, 1877
 Roderico, re dei Goti, 1863
 I promessi sposi, Milà (T. Dal Verme) 1872. Èxit en la versió revisada.
 Il parlatore eterno, 1873 (monòleg per a baríton)
 I Lituani, 1874; revisada el 1875
 La Gioconda, Milà 1876; estrenada pel tenor Julián Gayarre; revisada en els anys 1876 i 1880
 Il figliuol prodigo, Milà 1880. Estrenada per Francesco Tamagno
 Marion Delorme, Milà 1885; Estrenada per Francesco Tamagno; revisada per a Brescia, 1885.
 I mori di Valenza (inacabada; completada per Arturo Cadore i estrenada a Monte Carlo, el 17 de març de 1914); Estrenada per Giovanni Martinelli

Referències

Enllaços externs

 Llista d'òperes amb detalls complementaris

Bibliografia
 Kaufman: Annals of Italian Opera: Verdi and his Major Contemporaries; Garland Publishing, New York and London, 1990. (conté els repartiments de les estrenes i la història de les representacions de les seues òperes)
 Diversos autors: Amilcare Ponchielli; Nuove Edizioni, Milan, 1985
 Diversos autors: Amilcare Ponchielli 1834-1886, Cremona, 1984

Compositors d'òpera italians
Compositors italians del Romanticisme
Persones de la província de Cremona
Compositors llombards
Alumnes del Conservatori de Milà
Morts a Milà
Professors del Conservatori de Milà
Morts de pneumònia

redpajama_set_name: RedPajamaWikipedia


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In May 2017 we added a new staff member to our Barber Prosthetics Team. She is shorter and furrier than the rest of us but still has the same enthusiasm and happy smile that the Barber Prosthetics team share in common. If you haven't already met her, I would love to take this opportunity to introduce you to Chica.
Chica has been working at Barber Prosthetics Clinic as our official "Greeter" since May 2017 (when she was only 10 weeks old). With a friendly hello (bark) she will want to bring you one of her favorite toys to play toss/fetch with her. She definitely is a hit with our young patients who seem to share the same amount of energy (Chica also knows she can get flavoured (candy, chips, pop) licks off of their faces). YUM YUM for Chica.
While you are here for your appointment please feel free to pet Chica, toss a toy for Chica, even ask Leslie to open her TREAT drawer and Chica will show you she can sit like a lady to receive her milkbone cookie. If you would like, Leslie can even give you the cookie so that you can have Chica sit for you for a treat.
You might find her walking her rounds here at Barber Prosthetics Clinic. Chica likes to be on the go. She will often be found scoping out the back technical area and then back up promptly to the reception area to see where the rest of her pack (the Barber team) is. She also likes to see who is coming in for their next appointment so she can give you a proper Barber Prosthetics greeting (Hello/bark). You might even see her smiling, don't worry when she shows you her pearly whites it's just her way of smiling with her full teeth to you so that you can see how happy she really is. Chica is now just over 16 months old. Time flies!
There will be moments while you are here for your appointment that Chica finally runs out of steam and needs to take a quick CAT but really DOG nap. This is so she can re-energize for the next appointments so her greeting duties are on-point.
We do have a sign posted about Chica being on premise. If you are not a big fan of dogs or animals in general please let us know. Chica doesn't mind taking a nap or chewing her favorite bone in a private room where we can close the door.
Of course we are all in love with Chica here at Barber Prosthetics Clinic and we hope you love her just as much as we do. One thing is for sure--- She loves you!!!