LiMn2O4 thin films were deposited on silica glass substrates by radio frequency (RF) magnetron sputtering. The films were characterized by X-ray diffraction (XRD) and scanning electron microscope (SEM). Li-ion chemical diffusion coefficients D ˜ Li were measured by cyclic voltammetry (CV), potentiostatic intermittent titration technique (PITT), electrochemical impedance spectroscopy (EIS) and limiting current density (LCD). The D ˜ Li values depended on the content of Li in Li x Mn2O4. It was found that the D ˜ Li values by CV, PITT and LCD were in the order of 10−10, 10−11 and 10−12 cm2 s−1, respectively, and those by EIS were in the range of 10−9 to 10−11 cm2 s−1. The D ˜ Li values obtained by above methods were compared with those by an electron blocking method. It turned out that the D ˜ Li values by the electron blocking method were more comparable with those by EIS.