Aluminum electrocrystallization is studied by means of electrochemical impedance spectroscopy (EIS). A model based on random birth and deterministic growth of monolayers is proposed, in which the edges are assumed to follow a propagation law. The high frequency impedance data show charge transfer reaction of AlCl4 − reduction while the low frequency features signifies the growth mode of deposits. The inductive response observed in the course of polycrystalline deposition reflects the activation of electrode area while a capacitive loop appears in regular growth. Parameters of impedance model in this system can be calculated from the fitting of experimental data to the Faradaic impedance function derived theoretically. The physical parameters of this function are analyzed by means of the dependence of simulated EIS spectra on kinetic parameters.