When manufacturing semiconductor devices, there is a problem in
that when the demand for accuracy with respect to a
semiconductor pattern dimension comes close to a resist molecule
size with miniaturization, the device performance is
deteriorated due to edge roughness of a resist pattern which
exerts a bad influence on the system performance. Hitachi Ltd.
(Tokyo, JP) researchers overcame the problem by a procedure in
which super-molecules which are small in dimension as compared
with the conventional polymers are used as main components. The
reaction number required for the change of molecule solubility
is made constant and as large as possible. An acid generator is
made of clathrate or combinatory n super molecules to make the
acid catalyst concentration large. As a result, it is possible
to form a pattern of molecular accuracy with high productivity
even with respect to the pattern dimension less than 50
nanometers, thereby realizing a high performance system,
according to inventors Hiroshi Fukuda, Yoshiyuk