Thin Film Coating Thin film coating and vacuum coating processes
use vacuum technology to create a sub-atmospheric pressure
environment and an atomic or molecular condensable vapor source
to deposit thin films and coatings. The vapor source may be from
a solid or liquid surface (physical vapor deposition - PVD), or
from a chemical vapor precursor (chemical vapor deposition -
CVD). Temescal systems are used for coating wafers with thin
layers of metal for compound semiconductor manufacturing and
other precision metalization applications. Ferrotec Electron
Beam Evaporation guns are used for coating lens and other
materials with thin layers of metal. Ferrofluidic seals are used
in many thin film coating solutions because these manufacturing
processes are performed in a vacuum. For more information on
thin film coating, go to Ferrotec's vacuum coating products
page.