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Absorbing Molecules Produce 65-Nanometer Patterns Two-photon
asborbing molecules fabricate 3D polymer line structures Atlanta
(March 26, 2007) — Producing three-dimensional polymer line
structures as small as 65 nanometers wide just became easier
with new two-photon absorbing molecules that are sensitive to
laser light at short wavelengths, allowing researchers to create
them without highly sophisticated fabrication methods.
Fabricating such small features normally requires expensive
electron beam or extreme ultraviolet lithography equipment.
However, using a technique called 3D multi-photon lithography
simplifies the process and reduces the cost. The technique could
compete with existing processes for fabricating nanoscale
electronic, photonic and microfluidic devices. "Being able to
obtain line widths down to 65 nanometers, which is substantially
below prior published work of 100 nanometers, open