Chapter 10 Atomistic Film Growth and Some Growth Related Film Properties
Publisher Summary Atomistic film growth occurs as a result of the condensation of atoms that are mobile on a surface. The stages of film growth are condensation and nucleation of the adatoms on the surface, nuclei growth, interface formation, film growth, and postdeposition changes due to postdeposition treatments, exposure to the ambient, subsequent processing steps, in storage changes, or in service changes. Atoms that impinge on a surface in a vacuum environment are either reflected immediately, re evaporate after a residence time, or condense on the surface. The depositing film material may diffuse and react with the substrate to form an "interfacial region." The material in the interfacial region has been called the "interphase material," and its properties are important to the adhesion, electrical, and electronic properties of film substrate systems. Films grow by the continued nucleation of depositing atoms on previously deposited material, and the surface is continually being buried under newly depositing material. The film growth, as well as the nucleation mode, determines many film properties such as film density, surface area, surface morphology, and grain size. After a film has been deposited, it may be treated to further increase its functionality. After deposition, a film of a reactive material can react with gases and vapors in the ambient.