Low loss amorphous silicon on insulator technology for photonic integrated circuitry
Abstract We report the fabrication of low loss amorphous silicon photonic wires deposited by plasma enhanced chemical vapor deposition. Single mode photonic wires were fabricated by 193 nm optical lithography and dry etching. Propagation loss measurements show a loss of 3.46 dB/cm for photonic wires 480 x 220 nm and 1.34 dB/cm for ridge waveguides.