Structural, Field Emission and Ammonia Gas Sensing Properties of Multiwalled Carbon Nanotube Graphene Like Hybrid Films Deposited by Microwave Plasma Enhanced Chemical Vapor Deposition Technique
This paper reports the direct deposition of multiwalled carbon nanotube (MWCNT) graphene like hybrid films on nickel substrate using a 2.45 GHz microwave plasma enhanced chemical vapor deposition (MW PECVD) system in the temperature range of 500 700 degrees C at 20 Torr pressure. The films have been characterized by Raman spectra, high resolution transmission electron microscope (HRTEM) scanning electron microscope, high resolution X ray diffraction and contact angle measurement. Raman spectroscopy and HRTEM reveal the formation of MWCNT and graphene like hybrid carbon sheet structures. The effect of processing temperature on the field emission properties of MWCNT graphene like hybrid films has been investigated. Field emission measurement reveals that the turn on field decrease and the emission current density increase with the increase of deposition temperature. The rambutan structure of MWCNT formed at 700 degrees C is responsible for the improvement in the field emission properties. The film deposited at 700 degrees C shows fast response and recovery time of 40 and 96 s, respectively, for ammonia gas sensing due to the high surface area of the film. It has also been found that the hydrophobic surface of the film helps to perform the gas sensing in the humid environment.