Optimal decentralized wavelength control in light sources for lithography
<|reference_start|>Optimal decentralized wavelength control in light sources for lithography: Pulsed light sources are a critical component of modern lithography, with fine light beam wavelength control paramount for wafer etching accuracy. We study optimal wavelength control by casting it as a decentralized linear quadratic Gaussian (LQG) problem in presence of time-delays. In particular, we consider the multi-optics module (optics and actuators) used for generating the requisite wavelength in light sources as cooperatively interacting systems defined over a directed acyclic graph (DAG). We show that any measurement and other continuous time-delays can be exactly compensated, and the resulting optimal controller implementation at the individual optics-level outperforms any existing wavelength control techniques.<|reference_end|>
@article{kashyap2024optimal,
    title={Optimal decentralized wavelength control in light sources for
  lithography},
    author={Mruganka Kashyap},
    journal={arXiv preprint arXiv:2409.04721},
    year={2024},
    archivePrefix={arXiv},
    eprint={2409.04721},
    primaryClass={eess.SY cs.SY math.OC}
}