Explainable AutoML (xAutoML) with adaptive modeling for yield enhancement in semiconductor smart manufacturing
<|reference_start|>Explainable AutoML (xAutoML) with adaptive modeling for yield enhancement in semiconductor smart manufacturing: Enhancing yield is recognized as a paramount driver to reducing production costs in semiconductor smart manufacturing. However, optimizing and ensuring high yield rates is a highly complex and technical challenge, especially while maintaining reliable yield diagnosis and prognosis, and this shall require understanding all the confounding factors in a complex condition. This study proposes a domain-specific explainable automated machine learning technique (termed xAutoML), which autonomously self-learns the optimal models for yield prediction, with an extent of explainability, and also provides insights on key diagnosis factors. The xAutoML incorporates tailored problem-solving functionalities in an auto-optimization pipeline to address the intricacies of semiconductor yield enhancement. Firstly, to capture the key diagnosis factors, knowledge-informed feature extraction coupled with model-agnostic key feature selection is designed. Secondly, combined algorithm selection and hyperparameter tuning with adaptive loss are developed to generate optimized classifiers for better defect prediction, and adaptively evolve in response to shifting data patterns. Moreover, a suite of explainability tools is provided throughout the AutoML pipeline, enhancing user understanding and fostering trust in the automated processes. The proposed xAutoML exhibits superior performance, with domain-specific refined countermeasures, adaptive optimization capabilities, and embedded explainability. Findings exhibit that the proposed xAutoML is a compelling solution for semiconductor yield improvement, defect diagnosis, and related applications.<|reference_end|>
@article{zhai2024explainable,
    title={Explainable AutoML (xAutoML) with adaptive modeling for yield
  enhancement in semiconductor smart manufacturing},
    author={Weihong Zhai and Xiupeng Shi and Yiik Diew Wong and Qing Han and
  Lisheng Chen},
    journal={arXiv preprint arXiv:2403.12381},
    year={2024},
    archivePrefix={arXiv},
    eprint={2403.12381},
    primaryClass={cs.CE}
}