Integrated circuit with a non-volatile variable resistor which is particularly adapted for use in a neuronic network. The integrated circuit comprises a symmetrically replicated structure including a floating gate MOS transistor (TRP; TRN) and an EEPROM memory cell based upon N-channel MOS transistors and including a read-out MOS transistor (TSP; TSN) and a tunnel-effect charge injection MOS element (TUNP; TUNN), with floating gates. The floating gates of all transistors and of the tunnel-effect element are connected together, with the ends of the resistor (R1P, R2P; R1N, R2N) being taken out from the source and drain regions of the floating gate MOS transistor.
Integrated circuit with non-volatile, variable resistor, for use in neuronic network