PURPOSE: To provide a negative type photosensitive thermosetting resin composition having excellent shelf stability, developable with a weakly basic aqueous solution, having high resolution, excellent transparency, heat and chemical resistances and insulating property and to provide a material for transferring negative type photosensitive thermosetting resin layer. CONSTITUTION: The negative type photosensitive thermosetting resin composition contains at least 10-90 mass% alkali-soluble resin obtained by copolymerizing a polymerizable monomer of formula (I) and a carboxylic acid-containing monomer, 5-50 mass% ethylenically unsaturated compound and 0.1-50 mass% photopolymerization initiator, based on the total solid content. The material for transferring negative type photosensitive thermosetting resin layer is obtained by disposing a layer comprising the negative type photosensitive thermosetting resin on a temporary base body. In the formula (I), R1 is H or methyl and X is halogen, hydroxy, alkoxy which may have a 1-12C substituent, aryloxy or the like.
NEGATIVE PHOTOSENSITIVE THERMOSETTING RESIN COMPOSITION, TRANSFER MATERIAL FOR NEGATIVE PHOTOSENSITIVE THERMOSETTING RESIN LAYER, AND METHOD OF FORMING IMAGE HAVING NEGATIVE RESISTANCE