PURPOSE: A photosensitive copolymer is provided to offer improved line width roughness, and improved resolution capable of reaching a sub-22 nm feature size. CONSTITUTION: A copolymer includes a polymerizate of an electron-sensitizing acid de-protecting monomer denoted by chemical formula XX, and a comonomer. In the chemical formula: R^a is H, F, -CN, C_(1-10) alkyl, or C_(1-10) fluoroalkyl; R^x and R^y are a substituted or non-substituted C_ (1-10) alkyl group or a C_(3-10) cycloalkyl group, respectively; and R^z is a substituted or non-substituted C_(6-20) aromatic-containing group, or a C_(6-20) alicyclic-containing group. R^x and R^y form a ring together. At least one from R^x, R^y, and R^z is halogenated.
PHOTOSENSITIVE COPOLYMER PHOTORESIST COMPRISING THE COPOLYMER AND ARTICLES FORMED THEREFROM