<P>PROBLEM TO BE SOLVED: To provide a new polymerizable monomer having a high transparency and a low refraction index in such a wide wavelength range as from a vacuum ultraviolet ray to an optical communication wavelength area and further having a high adhesion to a substrate, a high film-forming property and a high anti-etching resistance, which can be attained by allowing a polar group to contain in the same molecule even under a high fluorine content, and additionally to provide a polymer compound using the monomer, and an anti-reflection coating material and a resist material using the polymer compound. <P>SOLUTION: The polymerizable monomer is one shown by formula (1) (wherein, R<SB>1</SB>and R<SB>2</SB>are each CH<SB>3</SB>or CF<SB>3</SB>; and R<SB>3</SB>and R<SB>4</SB>are each a hydrogen atom, a straight chained, branched or cyclic 1-25C alkyl group, a fluorinated 1-25C alkyl group, a cyclic group containing an aromatic ring or a group removed by an acid, which may contain such a bond as oxygen and carbonyl). Further, a method for preparation of the said monomer, a polymer or copolymer compound using the said monomer, and further an anti-reflection coating material or a resist material using the said polymer or copolymer compound are disclosed. <P>COPYRIGHT: (C)2003,JPO 
FLUORINE-CONTAINING POLYMERIZABLE MONOMER AND POLYMER COMPOUND, ANTI-REFLECTION COATING MATERIAL AND RESIST MATERIAL USING THE POLYMER