The purpose of the present invention is to provide a negative photosensitive resin composition capable of forming a pattern having excellent adhesion using a low light exposure amount, a pattern forming method using the negative photosensitive resin composition, a cured film, an insulating film, and a color filter formed using the negative photosensitive resin composition as well as a display device including the cured film, the insulating film, or the color filter. To achieve the objective of the present invention, provided is the negative photosensitive resin composition containing a compound represented by formula (1). In the formula (1), R^1 is a hydrogen atom or an alkyl group; R^2 is an aromatic group which may have a substituent; R^3 is an alkylene group which may have a substituent; R^4 is a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfonate group, a phosphino group, a phosphinyl group, a phosponato group, or an organic group, respectively; and n is an integer of 0-3.
PHOTOSENSITIVE RESIN COMPOSITION PATTERN FORMING METHOD CURED FILM INSULATING FILM COLOR FILTER AND DISPLAY DEVICE