A photographic light-sensitive material including a support, a non-light sensitive uppermost layer consisting of at least one organic synthetic high polymer compound as a film forming material and at least one light-sensitive layer between the support and the uppermost layer, said organic high polymer compound being selected from the group consisting of the following polymers (A) to (F): polymer (A) comprising repeating units a.sub.1 and a.sub.2 ; \n Wherein M represents a cation, and m represents 0, 3 or 4; Polymer (B) comprising repeating units b.sub.1, b.sub.2 and b.sub.3 ; b.sub.1 : ##STR3## 5 - 30 mol% b.sub.2 : ##STR4## 5 - 75 mol% b.sub.3 : ##STR5## 20 - 65 mol% Wherein R.sub.1 and R.sub.2 each represents --CH.sub.3 or --C.sub.2 H.sub.5, R.sub.3 and R.sub.5 each represents --H or --CH.sub.3, and R.sub.4 represents --CH.sub.3, --C.sub.2 H.sub.5, --C.sub.3 H.sub.7 or --C.sub.4 H.sub.9 ; polymer (C) comprising repeating units c.sub.1 and c.sub.2 ; c.sub.1 : ##STR6## 10 - 40 mol% c.sub.2 : ##STR7## 60 - 90 mol% Wherein R.sub.6 represents --H or --CH.sub.3, and Z represents --COOH, --COOCH.sub.3, --COOC.sub.2 H.sub.5, --COOC.sub.3 H.sub.7, --COOC.sub.4 H.sub.9 or --CONH.sub.2 ; polymer (D) comprising repeating units d.sub.1 and d.sub.2 ; d.sub.1 : ##STR8## 10 - 40 mol% d.sub.2 : ##STR9## 60 - 90 mol% \n Wherein R.sub.7 represents --H or --CH.sub.3 ; polymer (E) comprising repeating units e.sub.1 and e.sub.2 ; e.sub.1 : ##STR10## 20 - 60 mol% e.sub.2 : ##STR11## 40 - 80 mol% \n wherein R.sub.8 and R.sub.9 each represents --H or --CH.sub.3, and X represents --CH.sub.3, --C.sub.2 H.sub.5, --C.sub.3 H.sub.7 or --C.sub.4 H.sub.9 ; and polymer (F) comprising repeating unit f.sub.1 ; f.sub.1 : ##STR12## wherein Y represents --CH.sub.3 or --COCH.sub.3, R.sub.10 represents --H or --C.sub.n H.sub.2n+1, n being an integer of 1 to 12, said organic synthetic high polymer compound being insoluble to a processing solutions during processing.
Layers used to prevent reticulation in photographic elements