PROBLEM TO BE SOLVED: To provide a method of forming a pattern with negative-tone development (NTD) using an antireflective coating layer.SOLUTION: A method of forming a pattern with negative-tone development comprises (1) forming on a substrate a layer of an antireflective coating composition containing (a) an organic polymer, (b) a photoacid generator, and (c) a crosslinking agent; (2) forming a layer of a photoresist composition on the antireflective coating composition layer; (3) exposing the photoresist composition layer and the antireflective coating composition layer simultaneously to an actinic radiation and subsequently baking them; and (4) developing the exposed photoresist composition layer with an organic solvent developer.
PATTERN FORMATION METHOD USING ANTIREFLECTIVE COATING COMPOSITION CONTAINING PHOTOACID GENERATOR