An antistatic silver halide photographic light-sensitive material having a support, provided thereon, at least one light-sensitive layer and at least one non-light-sensitive layer is disclosed. Said at least one non-light-sensitive layer comprises a polymer compound consisting essentially of a repeated structural unit represented by Formula [I], and a formamide compound represented by Formula [II]; <CHEM> wherein Z1 and Z2 represent the group of the atoms necessary to form a six-membered ring with - N<(+)> -; R represents a divalent group; R1 and R2 represent independently one selected from the group consisting of an alkyl group and an aryl group; R3 represents a hydrocarbon group; R5 and R6 represent independently a hydrogen atom or an alkyl group; X1<(-)> and X2<(-)> represent an anion; a and l represent an integer of 0 and 1.
Antistatic silver halide photographic light-sensitive material.