The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure (I), where, R' is selected independently from hydrogen, (C1-C4)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure (II), where, W is a multivalent linking group, R1 to R6 are independently selected from hydrogen, hydroxyl, (C1-C2O) alkyl and chlorine, X1 and X2 are independently oxygen or N-R7, where R7 is hydrogen or (C1-C2O) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition. ® KIPO & WIPO 2009
NEGATIVE PHOTORESIST COMPOSITIONS