Provided, as a negative active-light-sensitive or radiation-sensitive resin composition which is capable of forming a pattern that has excellent sensitivity, resolution and pattern shape, while being reduced in line edge roughness (LER), scum and development defects, is a negative active-light-sensitive or radiation-sensitive resin composition which contains (A) a polymer compound which has (a) a repeating unit that generates an acid when irradiated with active light or radiation and (b) a repeating unit that has a phenolic hydroxyl group, and (B) a crosslinking agent.
NEGATIVE ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD, AND PHOTOMASK