A wavefront aberration compensating apparatus, which includes: a deformable mirror having electrodes and a thin-film mirror; an optical system provided with the deformable mirror and including an object; a wavefront sensor which measures a wavefront aberration of a light flux; and a controller configured to: calculate a first voltage value applied to each of the electrodes, on the basis of differences between application points on the thin-film mirror and target points both corresponding to the electrodes respectively; determine a superposition amplitude value of each expansion mode according to a polynomial of wavefront aberration, and calculate a second voltage value applied to each of the electrodes by using voltage templates previously stored, such that the wavefront aberration obtained by the wavefront sensor becomes a desired aberration; determine the voltage value applied to each of the electrodes, by mainly using the second voltage value in an initial stage of compensation of the configuration of the thin-film mirror and by mainly using the first voltage value in an end stage of the compensation; and repeat the compensation on the basis of the determined voltage value, such that the wavefront aberration of the light flux is suppressed.
Wavefront aberration compensating apparatus and ophthalmologic unit having the same