PURPOSE: To form a negative image resist by constituting it of a polymer of specific monomers and using anionic or amphoteric ion polymerizable monomers. CONSTITUTION: This polymer photoresist coating film is composed of the polymer of the monomer expressed by formula I. In the formula I, each of X and Y is a strong electron attractive group, R4 expresses H or can be a hydrocarbyl, an aryl or an alkalyl if both X and Y are -CN. The hydrocarbyl contains an alkyl, an alkenyl and an alkynyl. The strong electron attractive group is stronger than halogen and the electron attractive group X and Y are individually selected from among -SO2 R6 , -SO3 R6 , -CN, -COOR5 and -COR6 . Where, R5 expresses hydrocarbyl or a substituted hydrocarbyl group, R6 expresses H or the hydrocarbyl, preferably 1-12C hydrocarbyl. As a result, thermal stability is improved.
POLYMER PHOTO-RESIST FILM