<P>PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition which excels in performances such as adhesive force, heat resistance, insulation, flatness, chemical resistance and room-temperature storage stability and is suitable for an image forming material of a liquid crystal display element, which is suitable for use as an interlayer organic insulating film because of excellent sensitivity, film retention and UV transmittance particularly in the formation of an organic insulating film of a liquid crystal display element, and which can improve sensitivity and film retention when used as a resist resin for an overcoat, for a black matrix, for column spacers or for a color filter. <P>SOLUTION: The negative photosensitive resin composition comprises (a) an acrylic copolymer obtained by copolymerizing (i) a phenylmaleimide compound, (ii) an allyl acrylic compound and (iii) an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride or a mixture of these, (b) a photoinitiator, (c) a polyfunctional monomer having an ethylenically unsaturated bond, (d) a silicon compound containing an epoxy group or an amine group, and (e) a solvent. <P>COPYRIGHT: (C)2008,JPO&INPIT 
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION