The IPEC 676 automated CMP system is capable of throughput of 40 or more wafers per hour and offers one of the industry's smallest footprints. The 676 can be used to polish either oxide or metal layers, allowing customers to reduce the number of different CMP systems in a wafer fabrication facility. The 676 is designed to improve yields by use of an orbital polishing motion rather than conventional rotational CMP techniques to enable higher levels of reliability and ease of use.