His research focuses on rational and directed design of nanostructured materials for efficient reactions and separations technologies. Atomic/Molecular Layer Deposition (ALD/MLD) thin film coating technique will be used for this research program. ALD/MLD is a thin film growth technique based on sequential, self-limiting surface chemical reactions and allows for precise deposition of ultra-thin, highly conformal coatings over complex 3D topography structures, with excellent control over stoichiometry and properties. His current active research directions include lithium-ion battery cathodes with enhanced performance and nanostructured size-selective catalysts.