Her research, built upon the knowledge and expertise in low pressure plasma chemical vapor deposition (CVD) of thin films, now includes other deposition approaches, such as initiated-CVD and atomic layer deposition (ALD). Currently, Adriana is focusing her research on atomic scale processing for next generation energy technologies. The aim is to design and engineer thin films and interfaces at the nanoscale by means of atomic layer deposition, toward efficient and selective transport of charges in next generation of energy conversion and storage technologies. Selected examples are thin film (e.g. organo-metal halide perovskite) solar cells, photo-electrocatalytic cells (e.g. sun-driven fuel production) and 3D all- solid state batteries (e.g. Li-ion based). These application areas are investigated in close collaboration with international academic partners, research institutes and industry.