of a micron or greater accuracy finally layer 34 is brought past optical patterning subsystem 16 which is used to selectively form an image in the dampening fluid by image wise evaporating the dampening fluid layer using laser energy for example with reference to fig3 which is a magnified view of a region of imaging member 12 and reimageable surface 30 having a layer of dampening fluid 34 applied thereover the application of optical patterning energy e g beam b from optical patterning subsystem 16 results in selective evaporation of portions of layer 34 this produces a pattern of ink receiving wells 56 in the dampening fluid relative motion between imaging member 12 and optical patterning subsystem 16 for example in the direction of arrow a permits a process direction patterning of layer 34 as shown in fig4 inking subsystem 18 may then provide ink over the surface of layer 30 due to the nature of the ink surface 30 dampening fluid comprising layer 34 and the physical arrangements of the elements of the inking subsystem 18 ink selectively fills ink receiving wells 56 shown in fig3 by providing a precisely controlled thickness of layer 34 the extent profile and other attributes of each ink receiving well are well controlled the amount of ink filling each ink receiving well is controlled and ultimately the quality of the resulting image applied to the substrate is therefore improved and consistent fig5 illustrates another embodiment of the present.