stage also known as d2 can be inserted following the angle corrector 670 parameters known as d1 and d2 suppression and d2 focus can also be adjusted based on the currents measured by the collecting cups in the array because of the speed at which the detectors can determine the angle of incidence real time adjustment of the beam line components is now possible previously this process could take minutes or even hours to complete the adjustments to the beam line components can be made in a number of ways in one embodiment the results of the measurements are reported to an operator these results can be in the form of a list of the actual currents measured by each collecting cup or in the form of processed data these results are then used by the operator to adjust the various controls on the ion implantation system based on previous experience and expertise alternatively the implantation system can be configured so that it calibrates itself automatically a controller such as a computing device is used to control the various adjustable beam line components this controller also has access to the currents measured by the collecting cups by being able to control the components and view the results of any adjustment the controller is able to tune the system for optimal beam performance in one embodiment the controller determines the optimal settings for the system by empirical analysis the controller configures the system and performs a measurement the controller then varies one or more components and repeats the measurements in one embodiment the controller exhaustively tests the various settings of each adjustable component to determine the optimal settings for the entire system in a second embodiment the controller utilizes one.