to direct the pixel elements to a portion of the subject at any one time a computing system may be used to generate the pixel elements and provide the pixel elements to the panel in a predetermined sequence application_number US 86355701 A description the present disclosure relates to exposure systems such as can be used in semiconductor photolithographic processing it is understood however that the following disclosure provides many different embodiments or examples for implementing different features of the invention specific examples of components and arrangements are described below to simplify the present disclosure these are of course merely examples and are not intended to limit the invention from that described in the claims with reference now to fig1 a maskless photolithography system 30 as described in presently incorporated u s pat ser no 09 480 796 includes a light source 32 a first lens system 34 a computer aided pattern design system 36 a pixel panel 38 a panel alignment stage 39 a second lens system 40 a subject 42 and a subject stage 44 a resist layer or coating 46 may be disposed on the subject 42 the light source 32 is an incoherent light source e g a.