now the apertures in the planarization layer 22 will be located overlying both this defect region itself plus the safety margin and plateau regions located in the auxiliary portion 39 in case there is a plurality of defect regions to be repaired each defect region being located typically in a separate trench or plateau region then the width u of a specific aperture overlying a specific defect region is still advantageously made equal to the width of the specific defect region plus twice the safety margin s in the auxiliary portion 39 the widths v of the apertures in the chromium layer 23 and hence of the cuts in the planarization layer 22 then typically are all made equal to about 2 u03bcm also as viewed from above the outer contours of these apertures and cuts in the auxiliary portion 39 are typically squares as an alternative to the above described procedure the planarization layer can be a polymer that is chosen such that it is sensitive to electron beam ion beam or photon uv beam radiation by 34 sensitive 34 it is meant for example that upon exposure to an atmosphere of a vapor of an organometallic compound such as an organoaluminum amide the organometallic compound diffuses into the polymer and reacts with it to form an organometallic resist that is resistant to etching by fluorine containing plasmas only in regions of the polymer that were not exposed to the radiation the regions that are exposed to such radiation should overlie both the defect region and the portions of width v located in the auxiliary trench or.