be made it will be desirable that separately from said organic material an organic material which very readily permits minute photolithography working be used as the material forming the second protective layer as such organic material mention may preferably be made for example of polyimide isoindolo qinazoline dione trademark 34 piq 34 producted by hitachi kasei polyimid resine trademark 34 pyralin 34 producted by du pont cyclized polybutadiene trademark 34 jsr cbr or cbr m901 34 producted by nippon gosei rubber photoneece trademark producted by toyo rayon co ltd or photosensitive polyimide resin for the formation of each said layer the film coating method can be used besides the conventional technique thus simplifying the process in order that liquid may not leak from the outer surface around an orifice 204 and may not go around the outside of the orifice 204 it is preferable to apply a water repellent treatment in a case where the liquid is of the water system and to apply an oil repellent treatment in a case where the liquid is of the non water system the formation of the orifice 204 may be accomplished by attaching photosensitive resin to the base plate 202 forming a pattern by photolithography and further attaching a top plate thereto also by using photosensitive resin flow path walls for forming the liquid flow path may be formed simultaneously with the formation of the orifice 204.