are described for example in u s pat no 4 712 392 the disclosure of which is incorporated herein by reference once the substrate being cleaned is inserted in or subjected to the machine employed for cleaning the ordinary cleaning cycle is run typically between about three 3 minutes to about one 1 hour and the substrate is cleaned thus to demonstrate cleaning it is not required to add anything to the cleaning machine other than the substrate comprising the contaminant targeted for removal having the stain removal composition applied thereon and the solvent that is a gas at standard temperature and pressure a biodegradable functionalized hydrocarbon or a silicon comprising solvent in a preferred embodiment however a polar solvent such as water is employed along with a continuous phase surfactant i e surfactant which is substantially soluble in the solvent that is capable of forming a reverse micelle in a continuous phase formed by the solvent when a polar solvent and a continuous phase surfactant are employed the amount of polar solvent used is typically about 0 5 to about 8 times and preferably from about 1 to about 5 times most preferably from about 1 5 to about 2 5 times the amount of continuous phase surfactant employed in the resulting dry cleaning composition the amount of continuous phase surfactant used in the dry cleaning composition is typically.