on a glass substrate using the following process steps to prepare the polymer layer coating solution for the examples described below 7 5 g of poly methyl 2 cyanoacrylate co ethyl 2cyanoacrylate in a 50 50 blend of acetonitrile and cyclopentanone and 0 5 g of a 5 solution of surfactant fhlorad u2122 fc 431 a perfluorinated alkyl sulfonamidoalkyl ester surfactant 3m corp were combined and passed through a 0 2 u03bcm filter the thermal resist material was formulated substantially as described in pct international application no wo 97 39894 cited earlier and incorporated herein in its entirety to prepare 100 g of thermal resist coating solution stock solutions comprised of 84 5 g of 20 wt wt solution of novalak pd494 6 76 g of 3 basonyl violet 610 8 45 g of 3 solution of ir dye and 0 3 g of 10 surfactant byk307 a polyethoxylated dimethylpolysiloxane copolymer as supplied by byk chemie wallingford conn in 80 1 methoxy 2 propanol and 20 methyl ethyl ketone were combined and passed through a 0 2 u03bcm filter a 1 1 mm glass substrate was pre patterned with a gate layer gate dielectric layer and a semiconductor layer as described earlier above 1 the polymer layer solution of methyl 2 cyanoacrylate co ethyl 2cyanoacrylate was spin coated at 5000 rpm for.