4 rinse is for approximately 5 minutes and the second ccl 4 rinse is for approximately 15 minutes at this juncture the micromachine is prepared for monolayer lubricant formation block 24 the first step associated with monolayer lubricant formation is the application of a octadecyltrichlorosilane ots pre cursor block 44 in a preferable embodiment an ots pre cursor solution is applied for 5 20 minutes the ots pre cursor solution may be 2 mm ots in 4 1 hexadecane ccl 4 this step constitutes the ots self assembly application the resulting surfaces become autophobic almost immediately to remove unbonded ots material a first post ots ccl 4 rinse is employed block 46 preferably this rinse step is for approximately 5 minutes a second post ots ccl 4 rinse for approximately 15 minutes is subsequently employed block 48 thereafter a post ots methanol rinse block 50 is invoked for approximately 15 minutes to remove any unbonded ots material thus at this juncture a monolayer lubricant exists on the processed micromachine the final processing steps relate to drying the micromachine the processing of the invention is compatible with conventional drying steps thus a supercritical or sublimation drying step block 52 may be included but is not necessary the final step associated with the processing of fig2 is an oven dry to cure the ots block 54 the oven drying may be accomplished in approximately 10 minutes at approximately 150 u00b0 c this step desorbs any remaining unbonded ots material and improves monolayer wear resistance properties by cross linking neighboring ots molecules processing of micromachines consistent with the described steps will produce a uniform lubricant monolayer film of approximately 2 3 2 5 nm the foregoing descriptions of specific embodiments of the present invention are presented for.