r sub f ch sub 2 ch ococh sub 3 ch sub 2 n sup ch sub 3 sub 2 ch sub 2 co sub 2 sup tbs r sub f ch sub 2 ch sub 2 so sub 3 x x h and______________________________________ nh sub 4 the 34 group 34 of partially fluorinated compounds shown in the table above fall into the class of compounds called 34 surfactants 34 as a general proposition surfactants are generally employed in soap solutions and the like their usefulness as a tar over photoresist displays unexpected results for compounds intended to be used as surfactants the compounds can be applied in any suitable manner over the photosensitive material e g photoresist for example by spraying the compounds onto the photoresist coated wafer as discussed above partially fluorinated compounds are suitable for top anti reflective coatings over photoresist two issues are paramount the refractive index and the ability to adhere to photoresist generally theless fluorinated the compound the higher its refractive index and the better its adhesion hence a balance must be struck between these two criteria the present invention is primarily directed to thin films of photoresist for example 1 2 u03bcm thick applicability to other photomasking materialsis indicated by applying the resist with more uniform thickness aerosol or powder or by providing a top antireflective tar coating or by performing both techniques reflectivity is uniformized and with tar is minimized absorption of incident photolithographic light is uniformized and increased with tar and better control over feature size from feature to feature is effected this provides effective control over the cd of features especially features in different topographical areas e g active areas versus i o areas and eliminates the need for differential biasing differentially sizing the mask patterns for the various.