first system 400 structure with magnetic deflectors disclosed in present invention the electron beam 410 emanating from the cathode tip 420 is accelerated by anode 430 voltage passes through gun aperture 440 beam limit aperture 442 beam tube 450 condenser lens 460 and modified soril lens 480 and then impinges onto the sample surface 490 the modified soril lens 480 includes magnetic objective lens 482 magnetic deflectors 484 which are located outside the beam tube 450 and the modified controlling electrode 486 the secondary electrons 412 emanated from sample surface 490 are collected by the multi channels detector 470 to form a stereo image of the interest area for material identification the x ray 414 generated from the position that is impinged by the electron beam 410 is collected by energy dispersive spectrometer eds detector 472 to reveal material characteristics fig5 a 5 c are the excitation voltages and positions diagrams of the charged particle beam system 400 that operates with magnetic deflectors the first example illustrated in fig5 a is an example of inspecting or reviewing a sample the beam accelerating voltage 15 kv is applied to cathode vc and anode va across the ground potential 0v the beam tube bias.