layer 10 with a thickness of 30 nm was formed by depositing 4 4 u2032 bis 2 2 diphenylvinyl biphenyl dpvbi represented by the following formula electron injecting layer 11 with a thickness of 20 nm was formed by depositing aluminum chelate alq represented by the following formula then the substrate was taken out of the vacuum deposition chamber and installed in another resistance heated vacuum deposition chamber to form a cathode 12 with a thickness of 200 nm with mg ag alloy in a weight ratio of 10 to 1 coating liquid containing polystyrene and trialkoxysilane was spin coated on the color conversion filter fabricated by the same method as in example 1 after air drying at 80 u00b0 c and vacuum drying at 120 u00b0 c transparent and even protective layer of 7 u03bcm thick was obtained an organic el cell anode organic layer and cathode was formed on the protective layer in the same manner as described in example 1 polycyclic olefin resin zeonex made by nippon zeon co ltd diluted with toluene was spin coated on the color conversion filter fabricated by the same method as in example 1 and vacuum dried at 120 u00b0 c to obtain a protective layer which is transparent and even and has 7 u03bcm thick tg of the protective layer formed was 130 u00b0 c an organic el cell anode organic layer and cathode was formed on the protective layer in the same manner as those described in example 1 ultraviolet hardening resin sd 715 made by dainippon ink and chemicals inc was spin coated on the color.