form an arrangement of cooperating ground yarn stitches 40 extending in relatively closely spaced parallel rows along the substrate material 30 by way of example only and not limitation the cooperating ground yarn stitches 40 may be held in a full chain stitch configuration although other stitch arrangements including tricot stitches and the like may likewise be utilized if desired preferably the spacing of the stitch lines formed by the ground yarn 36 will be close enough that the ground yarn stitches 40 define a substantially continuous covering across the user contact surface 41 of the substrate material 30 the ground yarn 36 and the substrate material 30 thus define a substantially stable stitch bonded structure by way of example only and not limitation one ground yarn 36 that may be particularly suitable is a 70 denier polyester filament yarn although other yarns may likewise be utilized if desired according to one exemplary practice a first collection of loop elements 42 is formed projecting away from and standing above the ground yarn stitches across the fabric defining a user contact surface 41 if desired at least a second collection of loop elements 43 may also be formed projecting away from and standing above the ground yarn stitches across the fabric in the event that multiple collections of loop elements are utilized it is contemplated that the loop elements 42 and 43 may.