using a cooperation of said cylindrical rotating magnetron with side cathodes a process of deposition of tiain layer on coating apparatus pi300 consists of following phases using also generally known steps evacuation of the deposition chamber warming up tools to a working temperature ion cleaning of the tools by a glow discharge or by an arc discharge from side cathodes cleaning of a cylindrical rotating magnetron deposition of the layer using the cooperation of the cylindrical rotation magnetron with side cathode or cathodes cooling the apparatus from the working process temperature and finally aerating of the deposition chamber following phases involve using the cylindrical rotation unbalanced magnetron and the side cathodes according to the invention and according to the method used for the apparatus which is apparent on fig1 1 cleaning the surface of the cylindrical rotation unbalanced magnetron 1 to the room behind the cylindrical shield 4 what is possible to see on fig6 the surface of the cathode of said cylindrical rotation magnetron 1 created here in a form of rotating cylindrical hollow target 1 a can be contaminated for example by the oxygen and nitrogen from a preliminary aerating of the deposition chamber 2 or from a preliminary deposition process the purpose of this phase is eliminating residual particles using a method suppressing or eliminating the deposition of residual particles released before and deposited on the surface of the substrates 3 b intended to be coated by relevant layer or layers the cleaning phase begins by swivelling the magnetic field of said cylindrical rotation magnetron 1 according to a.