30 200 rpm and it is preferred that the vacuum pump and associated connections allow the pressure in the reaction chamber within the vessel to be selectively reduced down to 30 mt the following are examples of commercial parts that may be incorporated in the system 10 rf power supply 22 plasma therm inc rte 73 kresson n j 08053 amns 3000 e amnps 1 mechanical vacuum pump 45 leibold heraeus vacuum prod inc model d30ac spectra vac inc pressure gauge 32 mks baratron model 622ao1tae digitally controlled rotating system 34 35 dc motor model 4z528 dayton electric mfg co dart controls inc controller in utilizing the plasma treatment system 10 in accordance with the invention it is generally preferred that a plasma enhanced cleaning of the reactor be conducted prior to treatment to eliminate possible contaminants an exemplary cleaning step includes introduction of oxygen gas from one of the tanks 26 into the reaction chamber and ignition of a plasma in the gas at e g a power level of 300 w a gas pressure of 250 mt an oxygen flow rate of 6 sccm and a typical cleaning period of 15 minutes for carrying out treatment of seeds in accordance with the invention the reactor is.