metrology system 300 b that is substantially similar to x ray metrology system 300 a shown in fig3 a except that x ray metrology system 300 b includes a reflective x ray optical element 301 similar to x ray reflector 120 shown in fig1 in accordance with an embodiment of the invention reflective x ray optical element 301 reflects x ray beam portion 351 a onto transmmissive x ray optical element 320 which then focuses the beam onto thin film layer 341 various other combinations of reflective and transmissive x ray optical elements to reshape different portions of an x ray beam or beams in an x ray metrology system can be incorporated into other embodiments of the invention to further enhance the measurement capabilities of an x ray metrology system multiple transmissive x ray optical elements can be used for example fig4 shows an x ray metrology system 400 according to another embodiment of the invention x ray metrology system 400 includes an x ray source 410 transmissive x ray optical elements 421 and 422 a stage 440 for supporting a test sample 442 a detector 430 optional order blocking filters 444 a and 444 b and an optional computer 490 x ray metrology system 400 is substantially similar to x ray metrology system 300 a shown in fig3 a except that two transmissive x ray optical elements are used for focusing the x ray beam onto the test sample during a metrology operation x ray source 410 generates an x ray beam 450 that comprises a set of diverging x rays as indicated by an initial beam portion 451 transmissive x ray optical element 421 intercepts beam portion 451 and.