shows a state where gold nanoparticles aunps are secured onto the dna nanostructures to form composite nanostructures in the invention in which the nanostructures are selectively adsorbed using the electrostatic attraction it is possible to form oppositely charged nanostructures using the oppositely charged adsorbent layers as well as to adjust the characteristics of the nanostructures by adjusting the line width of the adsorbent layer fig7 a to 7f are diagrams schematically illustrating a procedure of selectively positioning nanostructures on a substrate according to another embodiment of the invention fig7 a shows a state where a photoresist pattern having a line width in the micrometer unit is formed on a substrate the substrate 10 may employ an si wafer a wafer having sio2 deposited thereon a glass substrate a glass substrate coated with a transparent conductive oxide film a flexible substrate such as polyimide a photoresist pattern 20 having a line width in the micrometer unit is formed on the substrate 10 using a photolithography process here it is preferable that the line width of the photoresist pattern 20 and the gap between the photoresist patterns 20 are 2 u03bcm or less this is because the nanostructures can be properly adsorbed when the line width of the adsorbent layer is about 2 u03bcm as shown in fig2 b this is also because the nanostructures are adsorbed in the center of the adsorbent layer having the highest potential energy fig7 b shows a state.