temperatures and times and within an oxygen atmosphere at different flow rates post deposition annealing can also be conducted in different gaseous atmospheres to enhance the structural and electrical properties depending on the type of substrate and the processing procedure crystalline films with different morphologies can be obtained the most common product is polycrystalline film with no apparent preferred crystallographic orientations however texture oriented films may be obtained under several special conditions major candidates for bottom electrode for ta 2 o 5 based composite insulating thin films include noble metals conductive metal oxides hybrid metal oxide perovskite metal oxides and traditional semiconductor materials the term bottom electrode includes any structure on which the insulating film is deposited for the top electrodes any material can be selected that will allow for good interface with the insulating film and retain high capacitance as well as low leakage current the top electrode can be deposited by any appropriate physical and or chemical deposition process the adhesion between the top electrode and the film can be improved by further heat treatment the capacitor configuration formed by depositing the top electrode can be used for various integrated electronic devices the pure modified ta 2 o 5 thin films with enhanced properties are suitable for discrete and integrated microwave components and systems the pure modified ta 2 o 5 thin film 2 can be deposited by the present fabrication technique on any substrate 1 glass single crystal or polycrystalline ceramic for the fabrication of microwave components.