with the metal oxide of the transparent conductive film 130 occurs during the process of forming the transparent conductive film 130 on the light scattering layer 120 by chemical vapor deposition cvd this will be described in more detail later in relation to the method of fabricating an substrate for an organic light emitting device the remaining pores that are not filled with the zno serve to scatter light like the light scattering particles 121 according to this exemplary embodiment the number of light scattering particles 121 can be formed from at least one selected from among but not limited to zno sio 2 and tio 2 the diameters of the light scattering particles 121 may range from 50 to 500 nm it is preferred that the light scattering particles 121 have a variety of diameters within this range in order to realize a better light scattering effect the transparent conductive film 130 is disposed on the light scattering layer 120 the metal oxide of the transparent conductive film 130 occupies some of the pores defined between the light scattering particles 121 of the light scattering layer 120 and during this process comes into contact with the base substrate 110 in the structural aspect the light scattering layer 120 is disposed inside the transparent conductive film 130 more particularly inside the lower layer portion of the transparent conductive film 130 which forms the boundary to the base substrate 110 in addition the upper layer of the transparent conductive film 130 is made only of the metal oxide accordingly the transparent conductive film 130 has dual structural roles as a matrix layer which fixes the light scattering particles 121 therein and as the anode of.