131 is smaller than or equal to 5 of the amount of stripper material 120 the stripper material 120 which is mingled with the antifoaming agent 131 in the bath 113 and drained to the stripper storing unit 121 can be reused meanwhile even though the antifoaming agent 131 and koh stripper material 120 differ in chemical properties from each other it can be confirmed that the phase fails to be separated during the stripping process and no additional product is produced as mentioned in the forgoing description if the photoresist 111 coated on the substrate 110 is removed and the foam is removed by the antifoaming agent 131 the stripper material 120 collected in the bath 113 is drained to the stripper storing unit 121 through the stripper drain pipe 122 the stripper material 120 transferred to the stripper storing unit 121 is recycled to the stripper supplying unit 114 for reuse as mentioned in the foregoing description the residue of the photoresist remaining on the substrates is washed by water in a cleaning device such a water cleaning is possible since the koh stripper which is an inorganic material is used as the photoresist stripper the stripping apparatus according to the present invention can be applied to other fabricating processes of semiconductor devices plasma display panel devices e g and the like as well as liquid crystal display devices although one embodiment according to the present invention uses a koh as the photoresist stripper the same stripping apparatus shown in fig4 can be applied to the.