of the page upon which fig2 appears such other conductive terminal members can form together with the illustrated terminal members respective pairs of upstanding spaced apart terminal members one such exemplary pair is shown in fig1 at 20 21 and discussed in more detail below referring to fig3 a first masking material layer 26 is formed over substrate 16 and the illustrated conductive terminal members accordingly first layer 26 is formed over and between conductive terminal members which lie into and out of the plane of the page upon which fig3 appears an exemplary masking material is photoresist although other masking materials can of course be used referring to fig4 first layer 26 is patterned over outer surface 18 to form at least one and preferably a plurality of conductive line patterns 28 30 and 32 in one aspect conductive line patterns 28 30 and 32 expose at least portions of respective conductive terminal members 20 22 and 24 and their respective mated terminal members which define the respective pairs of upstanding terminal members mentioned above ideally and with reference to fig5 this forms a trough 23 through first layer 26 which extends between and joins respective terminal member pairs such as exemplary pairs 20 21 yet trough 23 does not extend to surface 18 such can be accomplished by limiting the time of light exposure of the preferred photoresist of layer 26 such that only an outermost portion is light transformed for subsequent stripping alternately where layer 26 constitutes another material such as sio 2 the formation of a trough between the silicon pairs in a manner which avoids surface 18 exposure could be.