and provides centralized simultaneous control monitoring and recordation for the plurality of sensors and the data provided thereby on a storage medium not shown further beneficial aspects of the present invention thus include but are not limited to 1 the system allows u2018 real time u2019 tool chamber temperature control and recipe setup 2 the system provides design of experiment data based on specific on wafer chip position within the chamber and on the wafer chuck 3 the system enables the superior profiling of chuck zone temperatures due to true to life wafer positioning that is the ability to map wafer chuck temperatures at strategic points on the wafer during an actual process step is a tremendous advantage for the process engineer to calibrate a tool recipe process as well as with real time feedback to maintain chamber chuck temperatures during continued wafer to wafer processing 4 the system provides process parameter consistency calibration using single monitor wafer 5 the system provides improved tool utilization u2014 less time required to setup and profile and apply calibrations 6 the system provides improved process yields due to precise tool and chamber matching ability 7 the system provides and improves the accuracy of temperature measurement when compared to thermal couple no thermal losses due to thermal mass of tc wires and 8 the system provides improved precision of the measurement u2014 dependence of visual perception of color of dots is replaced.