0 53 u03bb0first layer al sub 2 o sub 3 0 12 u03bb0outgoing medium synthetic silica ______________________________________ table 5 below summarizes the arrangement of the anti reflection film for ultraviolet rays which has a designed central wavelength reference wavelength u03bb0 193 nm the anti reflection film was fabricated using sputtering by stacking layers on a fluorite substrate to have film thicknesses shown in table 5 below and its reflection characteristics were measured fig7 shows the measurement results of the reflectivity optical characteristics the wavelength bandwidth corresponding to a reflectivity of 0 2 or less was as broad as 26 nm table 5______________________________________ optical film thickness material unit nm ______________________________________incidence medium air sixth layer sio sub 2 0 25 u03bb0fifth layer al sub 2 o sub 3 0 24 u03bb0fourth layer sio sub 2 0 24 u03bb0third layer al sub 2 o sub 3 0 28 u03bb0second layer sio sub 2 0 55 u03bb0first layer al sub 2 o sub 3 0 12 u03bb0outgoing medium fluorite synthetic silica ______________________________________ table 6 below summarizes the arrangement of the anti reflection film for ultraviolet rays which has a designed central wavelength reference wavelength u03bb0 248 nm the anti reflection film was fabricated using sputtering by stacking layers on a fluorite substrate to have film thicknesses shown in table 6 below and its reflection characteristics were measured fig8 shows the measurement results of the reflectivity optical characteristics the wavelength bandwidth corresponding to a reflectivity of 0 2 or less was as broad as 39 nm table 6______________________________________ optical film thickness material unit nm ______________________________________incidence medium air eighth layer sio sub 2 0 25 u03bb0seventh layer al sub 2 o.