u2032 at a position corresponding to the any one position on the slit electrode and the lc efficiency x 2 u2032 at a position corresponding to the any other position on the slit electrode as shown in fig3 a the first mode can be implemented by a mask process or a semi transparent mask process the thickness at any position on the first color filter is inversely proportional to the light transmittance at the position the light transmittance is controlled by the thickness given that the lc efficiency at a position a1 on the slit electrode is 100 percent and the lc efficiency at a position a2 on the slit electrode is 80 percent the ratio between the lc efficiency at the position a1 on the slit electrode and the lc efficiency at the position a2 on the slit electrode is 1 0 8 and hence the ratio between the light transmittance at a position b1 corresponding to the position a1 on the first color filter and the light transmittance at a position b2 corresponding to the position a2 on the first color filter is 0 8 1 and in view of the thickness the ratio between the thickness at the position b1 and the thickness at the position b2 should be made 1 0 8 when the semi transparent mask process is adopted the ratio between the exposure amount at the position b1 and the exposure amount at the position b2 can be set to be 1 0 8 therefore after the exposure process and the subsequent processes such as development and baking the ratio between the light transmittance at the position b1 on.