112 e formed at positions along the other diagonal lines for reducing eddy current produced by magnetic fluxes generated by the magnetic flux detecting substrate 120 or the position pointer 200 the shape of the slits 112 e shown in fig5 is an example and the shape and the number of such slits 112 e can be changed suitably the capacitance measuring unit 150 detects the variation of the capacitance of the detection electrode groups in the x direction formed from the plural detecting electrodes 112 a in a unit of a group and detects the variation of the capacitance of the detection electrode groups in the y direction formed from the plural detecting electrodes 112 b in a unit of a group the processing circuit 154 specifies detection electrode groups in the x direction and the y direction whose capacitance indicates some increase in response to approaching of a fingertip to thereby calculate the position pointed to by the fingertip the wiring line region 114 includes a neighboring wiring line region 114 a in which wiring lines connected to the detecting electrodes 112 a and 112 b are included and lead wiring line regions 114 b used for connection between the wiring lines included in the neighboring wiring line region 114 a and the processing circuit 154 side that is the capacitance measuring unit 150 the neighboring wiring line region 114 a and the lead wiring line regions 114 b are disposed adjacent to the periphery of the detection region 112 in fig4 the wiring.