shown in fig2 or another configuration suitable for a particular imaging application films of lu 2 o 3 eu 3 were successfully deposited using physical vapor deposition pvd carried out in a radio frequency rf magnetron sputtering device see fig2 the setup used a 2 inch diameter target angled at 45 degrees with respect to the substrate the target was made by hot pressing lu 2 o 3 powder doped with 5 mol eu 2 o 3 at 1700 u00b0 c using a graphite uniaxial hot press a thin 2 inch diameter graphite disc was used as the substrate and it was rotated at approximately 20 rpm to increase uniformity the rf power source was an advanced energy rfx600 capable of producing 600 watts coatings were deposited at 50 75 and 100 watts and examined it was determined that 100 watts was the maximum useable power level above which charging and target damage occurred the coatings were examined using a bruker d8 focus x ray diffraction xrd unit using cu k u03b1 radiation to determine orientation and a zeiss field emission scanning electron microscope sem to examine the microstructure microstructural analysis of the top surface and the fractured cross sections as shown in fig3 revealed that growth morphology depended on input power the surface images showed a clear transition from what appears to be cellular growth to plate growth at 50 w and 100 w the columnar growth appeared to be of uniform width and perpendicular to the surface whereas at 75 w the columnar growth became radial.