plurality of raised regions 14 is preferably disposed in a pattern and the recessed regions 18 continue among them while each of the raised regions 14 is illustrated as being of the same size and configuration the present invention contemplates that the raised regions 14 may be constructed with differing sizes and configurations in general the raised regions 14 and in particular the top surface 19 of the raised regions may serve to sweep the electrolyte across the wafer surface 12 as well as polish the wafer surface 12 as with the raised regions 14 the recessed regions 18 among the raised regions may be constructed with the same or differing sizes and configurations fig3 schematically shows a top view of an exemplary embodiment of a wsid 40 with a pattern of raised regions 42 together with recessed regions 44 and channels 46 or holes while fig3 shows the patterns of raised regions 42 and recessed regions 44 in a regular sequence the scope of the present invention also includes a pattern of an irregular sequence in fig3 the raised regions 42 may be in the shape of ribs or blades the raised regions 42 may also have a triangular cross section not shown between the raised regions 42 may be a plurality of recessed regions.