deposited over the structure filling vias 70 and 72 as well as fuse recess 50 as shown in fig8 metal layer 80 may comprise any metal conventionally used in via formation including titanium tungsten and titanium tungsten preferably metal layer 80 will comprise tungsten or a tungsten based alloy i e an alloy containing at least 50 wt tungsten therefore by way of illustration and not of limitation metal layer 80 will hereinafter be referred to as tungsten layer 80 after deposition of tungsten layer 80 and the filling of vias 70 and 72 as well as fuse recess 50 thereby with tungsten metal tungsten layer 80 is planarized to remove all of the tungsten over insulation layer 20a leaving only tungsten portions 80a and 80b respectively in vias 70 and 72 and tungsten stringers 82 84 86 and 88 respectively on the four sidewalls of rectangular fuse recess 50 as shown in fig9 11 following this step electrical connections may be made to the fuse of the invention simultaneous with the steps of depositing and patterning a metal layer comprising metal lines 92 and 94 over insulation layer 20a to connect to tungsten filled vias 70 and 72 thus as shown in fig1 metal lines 92 and 94 are shown formed over insulation layer 20a with metal line 92 overlying and electrically connected to tungsten plugs 80a and 80b respectively in filled vias 70 and 72 as well as overlying stringer 88 while second metal line 94 overlies stringer 84 stringers 82 and 86 extending between lines 92 and 94 thus collectively comprise a fuse electrically connecting lines 92 and 94 together it should be noted that regardless of what metal constitutes metal layer 80 from which stringers 82.