sold by jipelec under the name u201c inject syst u00e8me d 39 injection et d 39 u00e9vaporation de pr u00e9curseurs liquides purs ou sous forme de solutions u201d coupled with a chemical vapour deposition chamber the jipelec device comprises several parts the storage tank for the chemical solution an injector petrol diesel connected to the liquid tank by a feed line and controlled by an electronic control device a carrier gas feed line and a vaporisation device evaporator the deposition chamber which contains the substrate to be coated comprises a heating system a gas feed and pumping and pressure control means the deposition chamber and the substrate are heated to a temperature above that of the evaporator in order to create a positive thermal gradient the chemical solution is introduced into the pressurised tank 2 bar in the present case and sent via the injector or injectors by pressure differential into the evaporator the injection flow rate is controlled for frequency and opening time by the injector for the deposition examples below the platinum pt nanoparticles were produced on commercial diffusion layer substrate of the elat type e tek product sold by de nora the chemical deposition solutions comprised organometallic precursors respectively in toluene for cr co 6 and in xylene for pt cod the temperatures of the evaporator and the substrate were set respectively at 140 and 290 u00b0 c the other operating conditions of the examples are given in table i below the deposits produced by dli mocvd on an e tek diffusion layer were viewed under the microscope the corresponding images.