was manufactured as follows the layer built photosensitive conductor piece was manufactured by the similar procedure of example a except for using 3 3 tpd having the amorphous phase prepared in example 1 instead of using beta npd having the amorphous phase prepared in example 5 the layer built photosensitive conductor piece using alpha npd having the amorphous phase was manufactured as follows the layer built photosensitive conductor piece was manufactured by the similar procedure of example a except for using alpha npd having the amorphous phase prepared in example 4 instead of using beta npd having the amorphous phase prepared in example 5 the layer built photosensitive conductor piece using beta npd having the crystal phase was manufactured as follows the layer built photosensitive conductor piece was manufactured by the similar procedure of example a except for using beta npd having the crystal phase prepared in comparative example 5 instead of using beta npd having the amorphous phase prepared in example 5 the layer built photosensitive conductor piece using 3 3 tpd having the crystal phase was manufactured as follows the layer built photosensitive conductor piece was manufactured by the similar procedure of example a except for using 3.