similar t shapes each third opening 92 b in a same row oriented differently from an adjacent third opening in the same row arrangements of openings in the first shadow mask 90 r the second shadow mask 90 g and the third shadow mask 90 b are similar a difference being that the arrangement of openings in each shadow mask is offset from the arrangement of openings in each other shadow mask the arrangement of openings in the shadow mask increases a distance between each opening so that production of the shadow mask does not face the above mentioned process limitation arising due to the consideration of the structural strength of the shadow mask as can be seen from fig8 10 for the first shadow mask 90 r the second shadow mask 90 g and the third shadow mask 90 b the distance separating each of the plurality of first openings 92 r the distance separating each of the plurality of second openings 92 g and the distance separating each of the plurality of third openings 92 b are all far over the process limitation by utilizing the first shadow mask 90 r the second shadow mask 90 g and the third shadow mask 90 b in order in the evaporation deposition process the pixel structure shown in fig5 can be fabricated in such a way although.