was applied through sw 1 and sw 2 and latent images 12 39 were formed on the portions of the first photoresist layer 12 exposed to the light that is to say the portions exposed to the light exhibited a reticular structure and hardened by the crosslinking agent contained in the photoresist layer 12 this made a difference in solubility between the exposed and unexposed portions with respect to a developer furthermore addition of a developer left only the hardened portions carrying latent images 12 39 of the first photoresist layer 12 to produce a first pattern mask while using this mask as a guide the portions of the first layer being colored 11 corresponding to the portions i and ii were etched away as shown in fig3 c the first pattern mask was then scraped off and as shown in fig3 d the unetched portions of the first layer being colored 11 were coated with a dye of one of the three primary colors for example blue to form a first colored layer 11 39 after that as shown in fig3 e a first diffusion preventing layer 13 was formed on the upper surface of the first colored layer 11 39 in fig3 f on the.