u03bcm films by logarithmic base 10 regression 1 for each sample spin coat 3 wafers at the appropriate speed to obtain 1 5 u03bcm films 3 determine the thickness of each film in u03bcm at n 1 64 using a rudolf film thickness monitor 4 develop all sample films individually with no agitation in 2 38 tetramethylammonuim hydroxide at 25 u00b1 0 5 u00b0 c film loss during development is monitored by interferometry using a xinix end point controller the dissolution rate is calculated from the interferogram the average dissolution for each sample is determined dissolution rates for example 7 26 novolak blends are listed in table 2 make a 7 solution of the resin 1 75 grams in 25 00 ml volumetric flask in cyclohaxanone solvent filter the solution through a 5 micron membrane syringe filter fill a size 100 200 viscometer in the inverse position to the second line place the viscometer in the viscosity bath at 25 u00b0 c constant temperature for 15 20 minutes take flow time of the resin solution sec and repeat until two consistent readings are obtained check solvent flow time in the same manner a resist was made by dissolving 20 g of the novolak resin blend prepared in examples 7 26 with 5 g of a photoactive compound composed.