3 come into contact with the carriage 4 simultaneously the gap adjusting device 6 is also driven in the z direction b to increase the gap between the wafer 5 and the mask 15 here the current for electromagnetically attracting the carriage 4 is applied to the coil 219 in the coarse adjustment stage 2 e and the current for interrupting the electromagnetic attraction to the carriage 4 is applied to the coil 219 in the fine adjustment stage 3 f at the time point t 7 rechucking of the carriage 4 from the fine adjustment stage 3 to the coarse adjustment stage 2 is finished through the above procedure the carriage 4 is subjected to a series of operations of step movement alignment and exposure thereby completing exposure of one shot it is to be noted that y direction displacement of the coarse adjustment stage 2 y direction displacement and u03b8 direction rotation of the fine adjustment stage 3 and rotations of the fine adjustment stage 3 in the u03b1 and u03b2 directions can be performed in a like manner to the above and hence will not be further explained fig2 provides an example of one embodiment of a system for implementing the procedure of controlling the sample moving apparatus of the present invention as shown in fig1 the y drive mechanism 205 is driven by a coarse y controller 1701.