phase shift of 180 degrees the contact region will continue to be exposed in light intensity as desired the fact that the light within the area of exposure now has a phase shift of zero degrees and a phase shift of 180 degrees there within does not affect the exposure of the contact area it would if beneficially applied further minimize negative effects of light interference within the exposed contact area for further clarification and extension of the invention fig6 a through 10 b are presented shown in fig6 a is a cross section of a substrate 10 of an attenuated phase shifter mask over which a patterned layer 50 of shifter material has been created openings 51 created through the layer 50 of phase shifter material are normal contact openings for pattern exposure by incident light 56 fig6 b shows a top view corresponding to the cross section of fig6 a the cross section shown in fig6 a has been taken along the line 6 a u2013 6 a u2032 shown in fig6 b it is clear that the fig6 a and 6 b relate to a normal pattern that is a pattern in which no pinhole defect is present shown in fig7 a is a cross section of a substrate 10 of a attenuated phase shifter mask over which a patterned layer 52 of shifter material has been created opening 51 created through the layer 52 of phase shifter material is a normal contact opening for pattern exposure by incident light 56 opening 53 created through the layer 52 of phase shifter material is a contact opening in which.