z 1 to z n can be formed to have thinner widths because of the organic layer 504 on the surface of the photoelectric conversion layer 503 as in the case of the connecting electrode layers e 1 to e n in the case of forming the insulating resin layers z 1 to z n by an ink jet method a composition containing a photosensitive material may be used as a material of the insulating resin layer for example a positive resist obtained by dissolving or dispersing a novolac resin and a naphthoquinone diazide compound which is a photosensitive agent in a solvent or a negative resist obtained by dissolving or dispersing a base resin diphenylsilanediol an acid generating agent and the like in a solvent is used as the solvent an organic solvent like esters such as butyl acetate or ethyl acetate alcohols such as isopropyl alcohol or ethyl alcohol organic solvents such as methyl ethyl ketone or acetone is used the concentration of the solvent is set appropriately according to a type or the like of a resist in the case of forming the insulating resin layers z 1 to z n by a screen printing method the insulating resin layers z 1 to z n are formed according to the following steps a phenoxy resin cyclohexane isophorone high resistance carbon black aerosil a dispersing agent an antifoaming agent and a leveling agent are prepared as insulating resin materials for forming the insulating resin layers z.