layer 215 and on which is deposited a layer 220 of resist that can for example be spun on and cured or dried as an example the recording layer 215 may be comprised of copt fept or further alloys thereof such as alloys of copt including any of cr cu ag ta ti o and b further in place of pt other elements include pd ru rh ir os and au substrate 205 can be formed according to known methods and from known materials and for example can be formed from aluminum and magnesium al u2014 mg glass silicon quartz sapphire and so on ruthenium seed layer 210 is often used as a buffer layer between substrate 205 and recording layer 215 and helps to achieve a desired orientation in the recording layer 215 a person of ordinary skill would be able to make suitable substitutes and omit or add further layers for supporting recording layer 215 for example a variety of magnetically soft underlayers suls can be used in magnetic recording media and can be disposed under the recording layer 215 fig3 illustrates a cross sectional view of the portion 200 of media after further processing of resist layer 220 to produce a pattern that exposes some areas of recording layer 215 and masks other areas in particular resist portions 320 a.