thermal degradation of the photosensitizer in general one desires to minimize the concentration of solvents and thus this first temperature treatment is conducted until substantially all of the solvents have evaporated and a thin coating of photoresist composition on the order of a micron in thickness remains on the substrate this treatment is normally conducted at temperatures in the range of from about 20 u00b0 c to about 100 u00b0 c in a preferred embodiment the temperature is conducted at from about 50 u00b0 c to about 90 u00b0 c a more preferred range is from about 70 u00b0 c to about 90 u00b0 c this treatment is conducted until the rate of change of solvent removal becomes relatively insignificant the temperature and time selection depends on the resist properties desired by the user as well as equipment used and commercially desired coating times commercially acceptable treatment times for hot plate treatment are those up to about 3 minutes more preferably up to about 1 minute in one example a 30 second treatment at 90 u00b0 is useful the coating substrate can then be exposed to actinic radiation especially ultraviolet radiation in any desired pattern produced by use of suitable.