formulate the problem that must be solved by the proposed method it should be noted that in spite of the fact that the problem of synthesis of a holographic mask is a major one for use in holographic photolithography it is a very specific one from the point of view of holography as a whole an endless amount of methods for mathematical synthesis of approximation to a holographic pattern exists some of these methods are presented in patent publications listed above furthermore these methods differ from each other in details however the majority of these methods do not allow calculation of a holographic pattern for a time acceptable for practical industrial application because even an insignificant increase in pattern dimensions leads to a catastrophic increase in computing power that is why until now in spite of attractiveness of the aforementioned methods they did not find practical application the method of the invention for holographic synthesis of digital holograms for use in microlithography proposed by the inventors decreases synthesis time by a factor of 10 or greater the method of the invention is described in more detail below in the form of sequential steps designated in alphabetic order the first step a consists of introducing an orthogonal coordinate system x y z having three mutually perpendicular axes x x y y and z z choosing a point o see fig1 on the axis z z and passing through this point o a virtual digital hologram plane vdhp which is perpendicular to the axis z z and which is to be used as a plane of a virtual digital hologram vdh for assisting in manufacture of the actual digital hologram not shown in fig1 the.