and heat stress using various samples of compound 2 amorphous as starting material are presented in table 10 table 11 and table 12 correspondingly series of experiments targeting hydrate formation using both lot 5 and amorphous material generated during the screen as starting material are presented in table 13 through table 16 in particular table 13 and table 15 present the results of various water activity slurry experiments the conditions and results of antisolvent precipitation with water using lot 5 are summarized in table 14 table 16 presents the results of aqueous vapor stress experiments a starting material sample no 3 unless otherwise indicated percent by volume solvent ratio temperature and duration of experiments are approximate the experiments were conducted at ambient conditions for 6 days unless otherwise indicated d water activities were calculated using unifac calculator v 3 0 at 25 u00b0 c the estimates were not performed under cgmp e tga was acquired on post x ray material sample no 120 in the context of this specification u201c disordered u201d crystalline means that the xrpd pattern for the material has broad peaks relative to instrumental peak widths and or strong diffuse scattering relative to the peaks in an embodiment disordered materials are microcrystalline crystalline with large defect density or mixtures of crystalline and x ray amorphous phases or material c was produced under exclusive conditions by aqueous slurry of amorphous material at elevated temperature u02dc 50 u00b0 c the experimental conditions and tga data for material c suggested that the formation of hydrated material could be possible however any further experiments in aqueous media including slurries in organic solvent water mixtures with various water activity as well as slurry in water using surfactant.