21 and 23 as is readily evident based on the ram position shown in dashed lines of fig2 in fig1 is shown a target 24 on sputter station 21 schematically in dashed lines a connection line 25 connects the sputter chamber process volume p with the interior of the transport chamber 3 it is understood that the connection line 25 shown schematically for reasons of clarity is integrated for example into the flange 26 for mounting the sputter station 21 and or into the wall of transport chamber 3 which is readily possible in particular since said bypass connection is not valve controlled via this line 25 the interior volume of the transport chamber 3 and process volume of sputter station 21 communicate permanently and form if desired intentionally a pressure stage as is further evident the workpiece receiving plate 17 acts on the particular ram 15 oriented to the lock station 23 as a lock valve facing the transport chamber the lock station 23 realized essentially within the wall thickness of the transport chamber 3 for circular disk form workpieces in particular magnetic or optic storage disks therein in particular optic storage disks preferably cds of all types such as cdrs or cdrws 27.