layer of the insulation element 16 the anchoring element 18 is preferably located on the top surface of the second layer 16 u2032 of the insulation element 16 the electrode site 12 in this variation is preferably buried in and or under the anchoring element 18 with a portion of the electrode site exposed the exposed portion will record stimulate perform any other suitable function or any combination thereof the anchoring element 18 is preferably patterned to form a lip or a rim around the perimeter portion of the electrode site 12 alternatively the anchoring element 18 may have any other suitable geometry as shown in fig5 a and 5b the third variation of the anchoring element 18 also functions to normalize or u201c make more uniform u201d the initial current distribution along the electrode site 12 in conventional implantable electrodes as a stimulation pulse is sent to the electrode site 12 the initial current density along the electrode site 12 is not uniform the current density along the perimeter of the electrode site 12 is higher than that at the center of the electrode site 12 leading to uneven changing across the electrode site 12 and creating a potential difference between the perimeter and the center of the electrode site 12.