micro structure and referring to fig7 a and fig7 b after a horn shaped micro structure 110 is constituted by the sacrificial oxide film 102 being separated and eliminated a polymer thick film 112 is deposited thereon here the polymer thick film 112 is deposited up to a thickness enough to cover the whole space where the eliminated first photosensitive film 104 pattern existed next referring to fig7 c and fig7 d the second photosensitive film 114 is coated thereon and thereafter a pattern of the second photosensitive film 114 is formed by patterning process using a mask not described in the figure at which a pattern is formed to lithograph the light only to the center portion and then referring to fig7 e and fig7 f a round 116 is formed at the surface of the polymer thick film 112 exposed by the pattern of the second photosensitive film 114 by performing dry etching process on the whole surface thereafter the second photosensitive film 114 pattern is eliminated next referring to fig7 g the second metal film 118 is deposited thereon and thereafter a polishing process is performed using cmp process until the round 116 of the second metal film 118 is eliminated next referring to fig8 a and fig8 b the third metal film 120 is deposited thereon and the third photosensitive film 122 is coated on the third metal film 120 and then a pattern of the third photosensitive film 122 is formed by patterning process by which the pattern is formed only at the portion designated to be a waveguide of 3 d antenna next referring to fig8 c and fig8 d a pattern of the third metal film 120 is formed to be superposed on the pattern of the.