
{"publication_number": "US-2004106063-A1", "abstract": "although use of a nitrogen - containing compound as a basic compound component of a resist composition makes it possible to ease the t - top problem at an acid dissociation constant pka falling within a range of 2 to 6 , it is accompanied with the problem that the reaction , that is , acid diffusion upon use of a highly - reactive acid - labile group cannot be controlled . in order to overcome this problem , one or more basic compounds selected from those represented by the following formulas to and to are employed .", "application_number": "US-61568303-A", "description": "the present invention relates to a resist composition containing one or more basic compounds selected from those represented by formulas ( i ) to ( iii ) and ( 1 ) to ( 4 ). specific examples of the basic compounds represented by formulas ( i ) to ( iii ) and ( 1 ) to ( 4 ) include , but not limited to , tris ( 2 - formyloxyethyl ) amine , tris ( 2 - acetoxyethyl ) amine , tris ( 2 - propionyloxyethyl ) amine , tris ( 2 - butyryloxyethyl ) amine , tris ( 2 - isobutyryloxyethyl ) amine , tris ( 2 - valeryloxyethyl ) amine , tris ( 2 - pivaloyloxyethyl ) amine , n , n - bis ( 2 - acetoxyethyl )- 2 -( acetoxyacetoxy ) ethylamine , tris ( 2 - methoxycarbonyloxyethyl ) amine , tris ( 2 - tert - butoxycarbonyloxyethyl ) amine , tris [ 2 -( 2 - oxopropoxy ) ethyl ] amine , tris [ 2 -( methoxycarbonylmethyl ) oxyethyl ] amine , tris [ 2 -( tert - butoxycarbonylmethyloxy ) ethyl ] amine ; and tris [ 2 -( cyclohexyloxycarbonylmethyloxy ) ethyl ] amine { corresponding to the formulas ( 1 ) and ( iii )