injection layer of platinum pt having a thickness of 5 nm is then applied through the use of electron beam evaporation the process pressure being 10 u2212 6 mbar the pt injection layer is then patterned photolithographically in a manner known per se to suit the intended application through the use of organic molecular beam deposition ombd at a process vacuum of 10 u2212 8 mbar the low molecular weight compound 4 4 u2032 4 u2033 tris n 1 naphthyl n phenyl amino triphenylamine tnata for transporting positive charge carriers and the aluminum iii salt of 8 hydroxyquinoline as the emission and electron transport material are then deposited successively the layer thicknesses of the materials being 60 nm each and the growth rates being 2 nm min on top of the device thus obtained a cathode is applied through the use of a shadow mask the cathode is formed of a magnesium layer having a thickness of 120 nm and a silver layer having a thickness of 120 nm which are successively deposited by thermal evaporation from tungsten boats at a process pressure of 10 u2212 6 mbar the contact areas of the leds thus defined are round and have a diameter of 1 5 mm the spacing between adjacent components is 4 5 mm the emission color is greenish yellow and distinctly visible even in bright daylight with sunshine on top of a device fabricated in accordance with example 1 a cathode is applied which is formed of a layer of a magnesium silver alloy having a thickness of 100 nm this layer is deposited by simultaneous thermal evaporation of magnesium and silver from two tungsten boats in an atomic mass ratio of 10 1 at a process pressure of.