high pressure mercury lamp subsequently spray development was conducted using 30 u00b0 c water at a jet pressure of 3 kg cm 2 for 30 seconds to form a pattern evaluation of the thus obtained pattern with respect to adhesion revealed that residual minimum line width was 50 u03bcm in addition in order to evaluate burn out properties of the pattern it was subjected to baking treatment of heating at a temperature raising rate of 10 u00b0 c min and maintaining at 520 u00b0 c for 30 minutes as a result it was confirmed that no pattern remained on the substrate i e the pattern was completely removed from the substrate surface a solution of a photopolymerizable composition was prepared in the same manner as in example 1 except for using the compound represented by the following formula 20 then the thus prepared solution of the photopolymerizable composition was coated on a soda lime glass substrate in a dry thickness of 30 u03bcm then subjected to uv ray exposure through a test pattern in an exposure amount of 100 mj cm 2 using a super high pressure mercury lamp subsequently spray development was conducted using 30 u00b0 c water at a jet pressure of 3 kg cm 2 for 30 seconds to form a pattern evaluation of the thus obtained pattern with respect to adhesion revealed that residual minimum line width was 50 u03bcm in addition in order to evaluate burn out properties of the pattern it was subjected to the same baking treatment as in example 1 as a result it was confirmed that no pattern remained on the substrate i e the pattern was completely removed from the substrate surface a solution of a photopolymerizable composition.