secondary systems of machine direction yarns in a weave pattern that provides adjacent balancing yarns that maintain the seam loops in substantially vertical alignment application_number US 13215098 A description the preferred embodiment will be described with reference to the drawing figures wherein like numerals represent like elements throughout referring to fig4 and 5 the preferred fabric 100 generally comprises a base fabric 110 with batt material 112 attached thereto the base fabric 110 comprises three layers of machine direction md yarns 114 116 and 118 interwoven with a system of cross machine direction cmd yarns 120 md layers 114 and 116 are woven in stacked pairs and form seam loops 122 at each end of the base fabric 110 the third layer md yarns 118 extend above md layers 114 and 116 and are substantially parallel thereto in the preferred embodiment two third layer md yarns 118 are provided for every pair of stacked md yarns 114 and 116 the fabric 110 is preferably endless woven using a two shuttle loom the first shuttle weaves the lower and intermediate md layers 114 and 116 and the second shuttle weaves the upper md layer 118 as shown in fig6 the base fabric 110 is woven on the loom doubled over upon itself that is the base fabric 110 is woven with an upper weaving layer 130 and a lower weaving layer 132 which are opened after weaving as shown in fig7 to provide a base fabric 110 which is approximately twice the length of the fabric on the loom reference to position of the yarns relative to one another is the relative position after the fabric is opened unless otherwise specified the cmd yarns 120 interweave with all three md yarn layers 114 116 and 118.