provide for variable placement of curing surface 12 with respect to reflector assembly 50 allowing operator control and selection of the spectral intensity at the curing surface 12 by varying the distance between reflector assembly 50 and curing surface 12 curing oven 70 provides containment of all electromagnetic radiation 32 emitted by lamp 10 curing oven 70 also includes mechanical and electrical safety means and cooling means not shown to prevent hazardous operation of the oven as is known in the prior art fig9 a c show schematic representations of further embodiments of the present invention in which the evasive rays 38 are redirected directly towards the curing surface 12 while each of these embodiments contemplate locating planar secondary reflectors adjacent an elongate concave reflecting surface as previously described for clarity the primary reflector is not shown in fig9 a c fig9 a depicts a planar reflector 44 positioned adjacent lamp 10 in the path of the evasive rays 38 and at approximately a 10 u00b0 angle to an orthogonal to curing surfaces 12 fig9 b depicts a secondary planar reflector 44 orthogonally aligned with the curing surfaces 12 similarly fig9 c illustrates secondary planar reflector 44 having a negative alignment with respect to an orthogonal to the curing surfaces 12 in each of the embodiments of positioning a secondary planar reflector illustrated.