inspection system 100 can be configured for the selection of or conditioning of filters polarizers and the like to pass or reject specific wavelengths to set appropriate attenuation levels in this embodiment scan motion can be synchronized with attenuation value and proper amplitude correction such that dosage d is automatically adjusted as a discrete function of the radial distance r of the scan spot from the center of wafer 102 in another operational embodiment attenuator 204 is motorized such that it can be variably positioned by motion controller 114 between laser 202 and wafer 102 in this manner incidence beam s 104 106 travels through attenuator 204 as the beam is delivered to wafer 102 by manipulating and thus varying the distance of attenuator 204 from the origin or source of the radiation from laser 202 the power level of beam s 104 106 is also made variable in this embodiment scan motion can be synchronized with attenuation value and proper amplitude correction such that as the scan radius r approaches 0 the proper attenuation value is provided by the adjustment of the position of attenuator 204 relative to laser 202 fig3 is a flowchart which provides a general method for managing the radiation or laser power by employing the various embodiments.