film 27 a can be formed on the surface of the planarization insulating film 26 a with a uniform thickness this makes it possible to eliminate the following problems existing in the related art examples difference in the thickness of the alignment film attributed to the slit aperture and the upper electrode coating unevenness of the alignment film at the slope part of the step of the upper electrode and nonuniformity of rubbing treatment due to irregularity of the alignment film surface the array substrate ar of the liquid crystal display panel 10 a of the first embodiment is an example for the ffs mode and the inter electrode insulating film 23 is formed between the lower electrode 21 and the upper electrode 24 however because the planarization insulating film 26 a is formed between the upper electrode 24 and the first alignment film 27 a the path of the electric field between the lower electrode 21 and the upper electrode 24 is in the following order as shown in fig4 b lower electrode 21 u2190 u2192 insulating layer inter electrode insulating film 23 planarization insulating film 26 a lt u2190 u2192 first alignment film 27 a u2190 u2192 liquid crystal layer lc u2190 u2192 first alignment film 27 a u2190 u2192 insulating.