registration and alignment between the two faces as the stitches offset from the pattern line go through the opposite face which serves to avoid accumulation of any placement errors the process continues as shown in fig4 where the second rows or pieces of both the front and back are folded over as indicated by the heavy arrows so that their right surfaces are exposed their wrong surfaces are then pressed fig5 as by ironing to be tight against the foundation 130 as can be seen this hides the stitches that were placed with a seam allowance offset from the first pattern line 140 the right surfaces of the third and each subsequent patchwork design pieces or rows 220 and 320 for each of the back and front faces are then placed against the right surfaces of the previous work at the next desired pattern line another set of stitches is then inserted with the proper offset for the seam allowance along that pattern line through the current back and front patchwork design pieces 220 and 320 the previous back and front patchwork design pieces 210 and 310 and the foundation 130 the current pieces of the back and front are then folded over to cover the stitches that bind them to the foundation the process continues until working from one edge of the quilt toward the opposite edge both of the back and front design patterns are completed simultaneously in situations where any patchwork design piece from the back face has a different width from that of.