the path of the radiation beam b similarly the first positioner pm and another position sensor if 1 can be used to accurately position the mask ma with respect to the path of the radiation beam b e g after mechanical retrieval from a mask library or during a scan in general movement of the mask table mt may be realized with the aid of a long stroke module coarse positioning and a short stroke module fine positioning which form part of the first positioner pm similarly movement of the substrate table wt may be realized using a long stroke module and a short stroke module which form part of the second positioner pw in the case of a stepper as opposed to a scanner the mask table mt may be connected to a short stroke actuator only or may be fixed mask ma and substrate w may be aligned using mask alignment marks m 1 m 2 and substrate alignment marks p 1 p 2 although the substrate alignment marks as illustrated occupy dedicated target portions they may be located in spaces between target portions these are known as scribe lane alignment marks similarly in situations in which more than one die is provided on the mask ma the mask alignment marks may be located between the dies the depicted apparatus could be used in at least.