controlled in synchronism with each other by way of example ion beam generation and the shutter 9 may be so synchronized that the irradiation with the ion beam may be started simultaneously with the irradiation with the evaporated substance beam it is preferred that the vacuum within the vacuum vessel 1 be maintained at most on the order of about 10 3 pa to 10 2 pa even during deposition the ion beam 11 is extracted from the ion source 3 and is irradiated in the specimen 2 energy of the ions can be controlled by controlling the accelerating voltage applied to the plasma electrode 36 the pulsing of the ion beam 11 can be carried out by turning on off the power supply to the arc electrode 33 or by turning on off the power supply to the plasma electrode 36 under the control of the ion beam controller circuit 6 when the power supply to the arc electrode 33 is turned off production of plasma is stopped which means naturally that the ion beam 11 disappears when only the voltage applied to the plasma electrode 36 is turned off the ion beam 11 is no more produced although the plasma is produced thus by breaking the power supply.