back or cmp process may be performed on the second filter layer 120 until the upper surface of the first color filter pattern 110 is exposed thereby forming a second color filter pattern 120 a subsequently the interface between the first and second color filter patterns 110 120 a has a slope 130 the second color filter pattern 120 a is formed to have the slope 130 by the pattern profile of the first color filter pattern 110 thus process margin increases in exposure and development processes the interface of the first and second color filter patterns 110 120 a is formed without a step difference therebetween a decoloring effect may be obtained at this interface portion resulting in a light shielding effect referring to fig5 the slope 130 is inclined at a predetermined angle of u03b8 to have an overlap horizontal length of u2018 d u2019 which represents the interface thickness between the first and second color filter patterns 110 120 a the horizontal interface length may be formed at twice the dead space of the subsequently formed microlenses fig6 is a spectrograph illustrating the general primary colors and fig7 is a spectrograph illustrating overlay g r colors as shown in fig6 and 7 an optical black effect can be improved by absorbing unclear.