resistor 16 each column line 14 preferably comprises a lateral edge portion 36 that remains from at least one of the conductive lines 22 that was previously adjacent the resistor 16 the remaining lateral edge portion 36 of a patterned conductive line 22 which is preferably disposed laterally adjacent its associated resistor 16 is also referred to herein as a lateral conductive layer 38 preferably each column line 14 includes two lateral conductive layers 38 with at least one resistor 16 disposed therebetween thus as conductive lines 22 are patterned column lines 14 are formed and adjacent columns of pixels 11 or emitter tips 18 are substantially electrically isolated from each other if an etchant or etchants are employed to pattern conductive lines 22 any remaining etchants may be removed from field emission array 10 after the desired patterning has been performed etchants may be removed by known processes such as by washing field emission array 10 the conductive material of substantially longitudinal center portion 34 of conductive lines 22 may be removed therefrom by known processes such as by known etching techniques while either dry etching or wet etching techniques may be employed to pattern conductive lines 22 substantially anisotropic etching of conductive lines 22 is preferred so as to facilitate the formation of lateral conductive layers 38 of substantially uniform thickness for example if conductive lines.