one of the plurality of dc voltages a polarity and absolute value of output voltage and current of dc power supply unit 82 and switching on and off of switch 84 are controlled by a dc power supply controller 83 under instructions from a control unit 88 to be described below filter circuit 86 is configured to apply the dc voltage v dc from dc power supply unit 82 to upper electrode 48 and to allow an rf current input from susceptor 16 through processing space ps and upper electrode 48 to flow to a grounded line but not to flow to dc power supply unit 82 side in the present exemplary embodiment the configuration and the circuit constant of filter circuit 86 are very important and will be described below in detail a dc grounded component not illustrated made of a conductive material for example si or sic is attached to an appropriate position facing the processing space ps within chamber 10 the dc grounded component is grounded through a ground line not illustrated at all times control unit 88 includes a microcomputer and controls individually and comprehensively the operations of respective components for example switch 24 for the electrostatic chuck first second third rf power supplies 35 36 38 matching units 40 42 43 process gas supply units 60 62 64 gas exhaust apparatus 76 dc power supply unit 82 and switch 84 for dc bias a chiller unit and a heat transfer gas supply unit provided in the plasma etching apparatus further control unit 88 is connected with a touch panel not illustrated that serves as a man machine interface and a storage device not illustrated that stores various programs.