present invention note the pattern of voids 310 across the surface as discussed below these voids are used when attaching the present invention to the fabric the preferred embodiments of the present invention will now be described by reference to fig1 fig1 is a perspective view illustrating the relationship between a seam assist device 130 according to the present invention and a fabric 100 to be seamed the fabric 100 is of a type described above having voids 150 in its surface preferably this fabric has been loaded onto a papermaking machine and is ready for seaming at this point the fabric has a first end 110 which must be seamed with a second end 120 in order to form an endless loop preferably widthwise across the edges of each of the two ends are seaming loops to facilitate the seaming process the seaming can be performed using any of the common techniques known in the art the present invention is independent of the seaming technique used also shown in fig1 is the assist device 130 the assist device 130 is comprised of two pieces each labeled 130 each half has an attaching edge 170 and a connecting edge 140 preferably the assist device 130 has substantially the same width across as the fabric this means the attaching edge will span widthwise across the entire surface of the fabric and ensures even tensioning when the device is secured the attaching.