the fluid supply unit 110 comprises a first pipe 111 a second pipe 112 a third pipe 113 and a pivot element 114 the first pipe 111 the second pipe 112 and the third pipe 113 are connected to the pivot element 114 the cleaning unit 120 comprises a chamber 121 a plurality of outlets 122 u2032 a first exhaust opening 123 and a second exhaust opening 125 the first exhaust opening 123 is connected to a negative pressure pipe 124 and the second exhaust opening 125 is connected to an exhaust pipe 126 the chamber 121 comprises an entrance 127 in the second embodiment of the invention the outlets 122 u2032 are arranged in a matrix on the bottom of the chamber 121 to provide a uniform flow field fig4 shows a semiconductor apparatus 100 u2033 of a third embodiment of the invention which comprises a stage 102 a fluid supply unit 110 and a cleaning unit 120 a wafer 101 is supported and rotated by the stage 102 the fluid supply unit 110 comprises a first pipe 111 a second pipe 112 a third pipe 113 and a pivot element 114 the first pipe 111 the second pipe 112 and the third pipe 113 are connected to the pivot element 114 the cleaning unit 120 comprises a chamber 121 a plurality of outlets 122.