or a flame the temperature of the enclosure 81 is maintained at a value ranging from about 50 c to about 450 c during the processing time interval enclosure 81 heats apparatus 30 indirectly from heat conducted through pinchoff tube 38 and heat radiated inward from the walls of enclosure 81 at the end of the helium impurity 50 evacuation process the outer volume 63 is returned to ambient pressure the access panel 67 is removed the valve 39 is closed the pinchoff tube 38 is closed the apparatus 30 is removed and ready for service apparatus 30 can reevacuated at a later time the used pinchoff tube 38 is removed and replaced apparatus 30 is replaced into the processing and degassing apparatus 80 through access panel 67 the open end of the pinchoff tube 38 is sealed to port 82 vacuum v is activated the valve 39 is opened and access panel 67 is closed the evacuation process is repeated as described above next referring to fig8 apparatus 30 is placed into a purge gas enclosure 95 enclosure 95 incorporates a port 91 a purge gas supply gas injects a desired purge gas 51 into volume 92 via inlet tube 93 excess purge gas 51 and helium impurities 50 exhaust through port 91 purge gas 51 may be a number of gases including but not limited to nitrogen argon co2 as anyone skilled in.