includes a film formation chamber a film formation stage that is provided below the film formation chamber and loaded with molded products a target electrode that is provided above the film formation stage so as to face the film formation stage a target that is provided on the target electrode a dc power source that supplies a dc voltage to the target electrode a vacuum source that sucks air from the film formation chamber an inert gas tank or an inert gas supply source that supplies an inert gas such as a carbon dioxide gas to the film formation chamber and the like incidentally the film forming device 5 is provided with a conveying stage 13 that can slide into and out of the film formation chamber thus the film forming device 5 is loaded with molded products and is configured to convey the molded products into the film formation chamber or to convey molded products on which films have been formed in the film formation chamber to the outside in this exemplary embodiment the conveying stage 13 is formed of the above described film formation stage the film formation stage is relatively large such that the film forming device 5 of this exemplary embodiment is loaded with twelve molded products 1 and can collectively form films on the molded products the time required for the film forming device 5 of this exemplary embodiment to perform a single film forming step is substantially one minute the apparatus 3 for manufacturing a molded product having a thin film according to this exemplary embodiment is provided.