indeed improvement in sce during operation thus with longer sunlight exposure the reduction in lid as a result of the inventive hilr method of wafer treatment will have an even greater impact with a more substantial improvement in sce over the useful life of the wafers in a solar cell array the test series ii shows that the inventive process can be integrated into a wafer processing line such as a metallization furnace and treat wafers at a rate matching the rate of exit of the wafers from the furnace firing quench zones it is clear that the inventive hilr treatment apparatus and methods of this application has wide applicability to the solar cell processing industry namely to lid reduction whether through boc formation prevention boc deactivation or boc passivation and to restoration of the solar energy conversion efficiency of solar cell wafers back or close to original values and that the rate of hilr treatment can match wafer firing furnace output thus the inventive system has the clear potential of becoming adopted as the new standard for apparatus and methods of lid reduction in the solar cell wafer processing industry it should be understood that various modifications within the scope of this invention can be made by one of ordinary skill in the art without departing from the spirit thereof and without undue experimentation for example the els high intensity light modules can have a wide range of types designs and locations in the integrated processing line to provide the full spectrum functionalities at in the range of intensity 3 10 sols disclosed herein this invention is therefore to be defined by the scope of the appended claims as broadly as the prior art will permit and in view of the specification if need be including a full.