illustration of the system 50 for maskless nano scale photolithography in accordance with an embodiment of the present invention a master 52 including a substrate 54 with photo resist layer 56 supported on a linear stage 58 slider 60 has an air bearing surface abs 62 that is oriented toward the master 52 the slider 60 is mounted on a suspension 64 similar to a conventional suspension like that used in magnetic recording disk drives with a head gimbal assembly or flexure 66 that permits the slider 60 to u201c pitch u201d and u201c roll u201d relative to the master 52 the suspension 64 is connected to support arm 68 that is supported by controller 70 the support arm 68 applies a preload to the suspension 64 to maintain the flying ability of the slider 60 in one embodiment the support arm 68 is fixedly mounted on controller 70 in another embodiment the support arm 68 is adapted to translate relative to the controller 70 translation can include linear movement in the x y and or z directions as well as rotation around a fixed point for example a linear actuator can move the support arm 68 in the x direction and or y direction alternatively a rotary actuator such as a rotary voice coil motor vcm actuator rotates the support arm 68 along a generally radial or arcuate path the slider 60 includes a near field assembly 72 that directs radiation from laser assembly 74 to the resist layer 56 the laser assembly 74 typically includes a.