crystal display similarly since the exposure dose required for exposing the transparent photoresist is less than that for the black resin the exposure dose required for the transparent photoresist and the black resin is much less than that for the black resin alone in the exposure step in the subsequent developing step the unexposed black resin and the transparent photoresist can be simultaneously dissolved in the developer solution therefore only one photo mask i e one photolithography process is needed to form the black matrixes and the spacers simultaneously the subsequent fabrication processes are well known by persons skilled in the art hence the cross sectional diagrams of the fabrication processes are omitted here and subsequent fabrication processes are described verbally only next another transparent conductive layer is formed on another transparent substrate as a common electrode these two transparent substrates are parallel assembled and the pixel electrodes 160 and the common electrode face each other the periphery of the two transparent substrates is sealed and only one opening is left for pouring liquid crystal into the space between the two transparent substrates after pouring in the liquid crystal to fill the space between the two transparent substrates the opening is sealed to accomplish the fabrication process of a tft lcd fig2 and 4 are cross sectional diagrams.