a doped film 47 is deposited onto a substrate 46 as by spin coating with dopant in solution fig1 b illustrates the treatment of the structure of fig1 a by annealing in certain ambients or washing with solvent to the cause the reduction of dopant in layer 47 washing by applying the drop may not remove the dopant from the film but cause it to move to the edge of the drop location leaving little dopant in the center of the drop fig2 a u2013 20 c illustrate the patterned removal of dopant from the top of the film in fig2 a doped polymer film 49 is deposited onto substrate 48 in fig2 b patterned impermeable layer 50 is applied over the doped polymer layer 49 in fig2 c annealing the structure of fig2 b causes dopant to evaporate in areas without barrier 50 this evaporation may also be accomplished by washing with solvent to remove dopant in the areas without barrier 50 or treating with a solvent vapor fig2 a u2013 21 d show the formation of an active matrix oled display in fig2 a glass substrate 51 has patterned insulator 52 and electrodes 53 formed thereon the electrodes are connect to transistors not shown in the pixels in fig2 b undoped.