the layout template editing window 1000 is displayed in the layout template selection window 800 moreover in the layout template editing window 1000 when a template which has already been set in a recipe is to be edited change in template is reflected in the recipe at this time template change is confirmed for each recipe whose template is being referred to for example the number of shots necessary for wafer position alignment is designated in the recipe when the number of shots does not reach the required number upon re editing the template a warning window is activated to call the operator 39 s attention in this manner even when a template is being referred to by a recipe change in template can be collectively reflected in the referred recipe thus realizing efficient edition according to this embodiment recipe parameters can be efficiently edited thus shortening the editing operation time in particular in editing recipe parameters such an effect becomes conspicuous when recipe parameters are created for a device formed from multiple layers a semiconductor device manufacturing method using the above exposure apparatus will be described next with reference to fig1 and 12 fig1 is a flowchart for explaining the manufacture of a device a semiconductor chip such as an ic or lsi an lcd or a ccd the semiconductor chip manufacture will be exemplified here in step s 1 circuit design a device is designed in step s 2 mask fabrication a mask also called a reticle on which the designed circuit pattern is formed is fabricated in step s 3 wafer manufacture a wafer also called a substrate is manufactured using a material such as silicon in step s 4 wafer process called a pre process an actual.