By reversing the field pattern radiated from a uniform line source, for which the electric current is constant along its extent, situated at the focus of a 4Pi focusing system formed by two confocal high-NA objective lenses, the required illumination distribution at the pupil plane for creating optical focal field with desired properties can be obtained. 
4Pi focusing system
By reversing the field pattern radiated from a uniform line source, for which the electric current is constant along its extent, situated at the focus of a 4Pi focusing system formed by two confocal high-NA objective lenses, the required illumination distribution at the pupil plane for creating optical focal field with desired properties can be obtained. 
high-NA objective lenses