Next, the Si/Ag(110) system is used as a novel one-dimensional Si template to guide the growth of Co dimer nanolines on top of the Si nanoribbons, taking advantage of the fact that the thermally activated process of Co diffusion into the Si layer is efficiently hindered at 220 K. Magnetic characterization of the Co nanolines using X-ray magnetic circular dichroism reveals that the first atomic Co layer directly adsorbed onto the Si nanoribbons presents a weak magnetic response. 
THERM
Next, the Si/Ag(110) system is used as a novel one-dimensional Si template to guide the growth of Co dimer nanolines on top of the Si nanoribbons, taking advantage of the fact that the thermally activated process of Co diffusion into the Si layer is efficiently hindered at 220 K. Magnetic characterization of the Co nanolines using X-ray magnetic circular dichroism reveals that the first atomic Co layer directly adsorbed onto the Si nanoribbons presents a weak magnetic response. 
THERM
Next, the Si/Ag(110) system is used as a novel one-dimensional Si template to guide the growth of Co dimer nanolines on top of the Si nanoribbons, taking advantage of the fact that the thermally activated process of Co diffusion into the Si layer is efficiently hindered at 220 K. Magnetic characterization of the Co nanolines using X-ray magnetic circular dichroism reveals that the first atomic Co layer directly adsorbed onto the Si nanoribbons presents a weak magnetic response. 
THERM
Next, the Si/Ag(110) system is used as a novel one-dimensional Si template to guide the growth of Co dimer nanolines on top of the Si nanoribbons, taking advantage of the fact that the thermally activated process of Co diffusion into the Si layer is efficiently hindered at 220 K. Magnetic characterization of the Co nanolines using X-ray magnetic circular dichroism reveals that the first atomic Co layer directly adsorbed onto the Si nanoribbons presents a weak magnetic response. 
THERM