Ex situ results and extracted ellipsometric parameters results from in situ measurements of a silicon substrate and a SiO2 film thermally grown on the silicon substrate exhibited excellent agreement and provided significance of this method.
THERM
Ex situ results and extracted ellipsometric parameters results from in situ measurements of a silicon substrate and a SiO2 film thermally grown on the silicon substrate exhibited excellent agreement and provided significance of this method.
THERM
Ex situ results and extracted ellipsometric parameters results from in situ measurements of a silicon substrate and a SiO2 film thermally grown on the silicon substrate exhibited excellent agreement and provided significance of this method.
THERM